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US20120021556 DEPOSITION SYSTEM  
A selenium deposition system can improve the selenium vapor distribution.
US20130118405 FLUID COOLED SHOWERHEAD WITH POST INJECTION MIXING  
A showerhead that injects two process gases into the processing chamber via separate sets of holes. The showerhead is constructed of upper plate and lower plate. Upper plate has a first set of...
US20140041589 HEATING ELEMENT FOR A PLANAR HEATER OF A MOCVD REACTOR  
A heating element includes a heating body which is directly covered at least partly with a porous sintered coating, wherein the heating body and the porous sintered coating each includes at least...
US20140349012 METHOD AND DEVICE FOR DRYING, MODELLING AND/OR THERMALLY MODIFYING WOODEN PARTS  
The invention relates to a method for drying, modelling and/or thermally modifying wooden parts, comprising the steps of: a) arranging the wooden parts in a bath; b) filling the bath with a...
US20140209027 SHOWERHEAD HAVING A DETACHABLE GAS DISTRIBUTION PLATE  
Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having...
US20140014036 DEPOSITION PARTICLE EMITTING DEVICE, DEPOSITION PARTICLE EMISSION METHOD, AND DEPOSITION DEVICE  
A vapor deposition particle emitting device of the present invention includes: a nozzle section (110) having emission holes (111) from which gaseous vapor deposition particles are emitted out; a...
US20110232573 Catalytic Chemical Vapor Deposition Apparatus  
[Object] To provide a catalytic chemical vapor deposition apparatus capable of prolonging the service life of a catalyst wire. [Solving Means] In a catalytic chemical vapor deposition apparatus...
US20120114855 COATING INSTALLATION AND COATING METHOD  
A coating method can use a coating device containing at least one recipient which can be evacuated and which is adapted to accommodate a substrate, at least one gas supply device which is used to...
US20150027375 DEPOSITION SOURCE FOR DEPOSITION DEVICE  
A deposition source for a deposition device includes a crucible. A heater is disposed outside of the crucible and the heater has a plate shape. The deposition source includes a heater guide. The...
US20120030884 SUPERCRITICAL NOBLE GASES AND COLORING METHODS  
A coloring system can include a noble gas, colorant, and one or more vessels configured to convert the noble gas into a supercritical fluid, and/or receive and color an article of manufacture with...
US20110253034 CRYSTAL PREPARING DEVICE, CRYSTAL PREPARING METHOD, AND CRYSTAL  
In a crystal preparing device, a crucible holds a mixed molten metal containing alkali metal and group III metal. A container has a container space contacting the mixed molten metal and holds a...
US20120251720 VAPOR COLLECTION  
An apparatus for collecting condensed vapor during physical vapor deposition includes an enclosure configured to be placed adjacent to one or more vapor sources in a vacuum chamber. The enclosure...
US20080206970 Production Of Polycrystalline Silicon  
Polysilicon is deposited onto a tube or other hollow body. The hollow body replaces the slim rod of a conventional Siemens-type reactor and may be heated internally with simple resistance...
US20130302520 CO-EVAPORATION SYSTEM COMPRISING VAPOR PRE-MIXER  
A processing system for depositing a plurality of source materials on a substrate, includes a first thermal evaporation source that can evaporate a first source material to produce a first vapor,...
US20140326184 COOLING PEDESTAL WITH COATING OF DIAMOND-LIKE CARBON  
A cooling pedestal for supporting a substrate, comprises a support structure having cooling conduits to flow a fluid therethrough to cool the substrate, and a contact surface comprising a coating...
US20110052809 METHOD FOR APPLICATION OF AN ADHESION PROMOTER COMPOSITION TO A SUBSTRATE  
The present invention relates to a method for application of an adhesion promoter composition, containing at least one adhesion promoter substance, to a substrate. For this purpose, the adhesion...
US20100209628 GROWTH OF COATINGS OF NANOPARTICLES BY PHOTOINDUCED CHEMICAL VAPOR DEPOSITION  
Photoinduced chemical vapor deposition was used to grow coatings on nanoparticles. Aerosolized nanoparticles were mixed with a vapor-phase coating reactant and introduced into a coating reactor,...
US20150064340 FIXED AND PORTABLE COATING APPARATUSES AND METHODS  
A system and method for depositing a coating may comprise a coating chemical reactor, surface activation component, and a deposition component. A target surface may be prepared for deposition with...
US20090004405 Thermal Batch Reactor with Removable Susceptors  
An apparatus and method for uniform heating and gas flow in a batch processing chamber are provided. The apparatus includes a quartz chamber body, removable heater blocks which surround the quartz...
US20080220166 Silicon Spout-Fluidized Bed  
Polysilicon is formed by pyrolytic decomposition of a silicon-bearing gas and deposition of silicon onto fluidized silicon particles. Multiple submerged spout fluidized bed reactors and reactors...
US20060180083 Positioning board for positioning heater lines during plasma enhanced CVD (PECVD)  
A positioning board used in processes of Plasma Enhanced CVD (PECVD) for positioning a heater line on a heater block includes a pressing portion at an underside thereof and a notch is defined in...
US20120111273 COOLED PVD SHIELD  
The present invention generally comprises a top shield for shielding a shadow frame within a PVD chamber. The top shield may remain in a stationary position and at least partially shield the...
US20080124670 Inductively heated trap  
An inductively heated trap for treating and removing compounds from an exhaust stream. More particularly, a method and apparatus for inductively heating a trap installed in the exhaust stream of a...
US20130095243 METAL TITANIUM PRODUCTION DEVICE AND METAL TITANIUM PRODUCTION METHOD  
A metal titanium production device comprising: (a) a magnesium evaporation unit in which solid magnesium is evaporated and a first flow path which is communicated with the evaporation unit and...
US20120021126 Vacuum Vapor Coating Device for Coating a Substrate  
A vacuum vapor coating device for coating a substrate with a coating material, the vacuum vapor coating device comprising a chamber (1) into which vacuum can be created, the chamber (1) comprises:...
US20070266943 Shadow mask and evaporation system incorporating the same  
A shadow mask and an evaporation system incorporating the same. The shadow mask comprises at least one opening. The length and the width of the opening range from about 100 μm to about 200 μm and...
US20140216347 CHEMICAL VAPOR DEPOSITION REACTOR  
A CVD reactor, such as a MOCVD reactor conducting metalorganic chemical vapor deposition of epitaxial layers, is provided. The CVD or MOCVD reactor generally comprises a flow flange assembly,...
US20120111271 CHEMICAL VAPOR DEPOSITION REACTOR  
A CVD reactor, such as a MOCVD reactor conducting metalorganic chemical vapor deposition of epitaxial layers, is provided. The CVD or MOCVD reactor generally comprises a flow flange assembly,...
US20130133579 GAS PREHEATING SYSTEM FOR CHEMICAL VAPOR DEPOSITION  
An embodiment of this invention provides a gas preheating system for heating one or more gases used in a chemical vapor deposition. The preheating system comprises a heating module and a delivery...
US20130078375 DEPOSITION SOURCE INTEGRATION INTO COATER  
An improved deposition source configuration in a process chamber can reduce the overheating in a thin film deposition system.
US20140037846 ENHANCING DEPOSITION PROCESS BY HEATING PRECURSOR  
Heating of precursor before exposing the substrate to the precursor for depositing material on the substrate using a deposition method (e.g., ALD, MLD or CVD). A reactor for injecting precursor...
US20090324823 ROLL-TO-ROLL VACUUM DEPOSITION METHOD AND ROLL-TO-ROLL VACUUM DEPOSITION APPARATUS  
[Object] To carry out high-quality deposition processing while effectively maintaining a function of cleaning a can roller by a cleaning unit. [Solving Means] In the present invention, prior to...
US20110027457 VAPOUR DELIVERY SYSTEM  
A delivery system (10) for delivering species (12) to a processing (chamber 14) comprises a species container (16) for containing species supplied from a source (18) of liquid species. Heating...
US20060204648 Multiple vacuum evaporation coating device and method for controlling the same  
A multiple vacuum evaporation coating device and a method for controlling the same. The vacuum evaporation coating device includes a plurality of evaporation sources, a rotating part adapted to...
US20140109829 LINEAR EVAPORATION SOURCE AND VACUUM DEPOSITION APPARATUS INCLUDING THE SAME  
A linear evaporation source is disclosed. In one aspect, the source includes a crucible storing an evaporated material, a heater unit surrounding the crucible and heating the crucible, and a...
US20110036874 Solid yttrium oxide-containing substrate which has been cleaned to remove impurities  
Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising...
US20120000414 GROWTH OF LARGE ALUMINUM NITRIDE SINGLE CRYSTALS WITH THERMAL-GRADIENT CONTROL  
In various embodiments, non-zero thermal gradients are formed within a growth chamber both substantially parallel and substantially perpendicular to the growth direction during formation of...
US20090305516 METHOD FOR PURIFYING ACETYLENE GAS FOR USE IN SEMICONDUCTOR PROCESSES  
Acetylene is treated to remove some residual storage solvent that may be present with the acetylene in a source of acetylene such as a container. Such treatment may be performed prior to supplying...
US20070062448 CVD apparatus of improved in-plane uniformity  
A CVD apparatus includes a vertical boat extending in a vertical direction and capable of holding plural substrates in a horizontal state such that the substrates are aligned in the vertical...
US20130189433 Vapor Deposition Apparatus and Vapor Deposition Method  
A vapor deposition apparatus includes a stage on which a substrate is mounted; a heater unit that is disposed at a side of the stage and includes a first heater and a second heater, wherein the...
US20110020211 High Throughput Carbon Nanotube Growth System, and Carbon Nanotubes and Carbon Nanofibers Formed Thereby  
A system is provided for forming carbon nanotubes comprising growing carbon nanotubes using a hot filament CVD system.
US20130052804 MULTI-GAS CENTRALLY COOLED SHOWERHEAD DESIGN  
A method and apparatus for chemical vapor deposition and/or hydride vapor phase epitaxial deposition are provided. The apparatus generally include a lower bottom plate and an upper bottom plate...
US20070169701 Tubular or Other Member Formed of Staves Bonded at Keyway Interlocks  
A tubular member formed of silicon staves and arranged in a circular pattern to form a central bore in which a wafer support tower can be inserted for batch thermal processing in an oven. The...
US20050166844 High reflectivity atmospheric pressure furnace for preventing contamination of a work piece  
A furnace incorporating a novel thermal design is disclosed. Heating element temperature is reduced compared to conventional designs while providing a precisely controllable process temperature in...
US20070144435 Adjusting mechanism and adjusting method thereof  
An adjusting mechanism adjusts a boat to be parallel to a furnace having an opening and a receiving space, which has a first symmetrical line. When the boat having a second symmetrical line is...
US20140127406 AUTOMATIC SUPPLY DEVICE FOR AN INDUSTRIAL METAL VAPOR GENERATOR  
The present invention relates to a facility for the continuous vacuum deposition of a metal coating on a substrate in motion, comprising a vacuum deposition enclosure (24), at least one vapor jet...
US20080202425 TEMPERATURE CONTROLLED LID ASSEMBLY FOR TUNGSTEN NITRIDE DEPOSITION  
Embodiments of the invention provide apparatuses for vapor depositing tungsten-containing materials, such as metallic tungsten and tungsten nitride. In one embodiment, a processing chamber is...
US20120037077 LARGE AREA DEPOSITION IN HIGH VACUUM WITH HIGH THICKNESS UNIFORMITY  
The invention relates to an effusing source for film deposition made of a reservoir comprising one hole characterized by the fact that the hole diameter is less than one order of magnitude than...
US20130213299 LIQUID TANK AND THIN FILM DEPOSITION APPARATUS USING THE SAME  
A liquid tank includes at least one main tank, a supplemental tank and a transmission module. The main tank is supplied with a first liquid. The supplemental tank is supplied with a second liquid....
US20150221512 Method of Growing Gallium Nitride-Based Crystal and Heat Treatment Apparatus  
There is provided a method of growing a gallium nitride-based crystal, including: forming an interlayer including aluminum nitride or aluminum oxide on a silicon substrate at a film forming...