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US20080134975 Thermally isolated cryopanel for vacuum deposition systems  
The present invention relates to vacuum depositions systems and related deposition methods. Vacuum deposition systems that use one or more cyropanels for localized pumping of a deposition region...
US20120100310 COATING DEVICE AND COATING METHOD  
A coating installation containing at least one recipient which can be evacuated and which is adapted to accommodate a substrate, at least one gas supply device which is used to introduce at least...
US20080257264 FACILITY FOR DEPOSITING LUBRICANT COATING ON HARD MAGNETIC DISKS  
A facility for depositing lubricant coatings on hard magnetic disks includes load and unload vacuum locks in which cassettes carrying hard magnetic disks to be coated with a lubricant coating are...
US20090145361 EVAPORATION APPARATUS  
Thermal electrons emitted the filament 331 are irradiated in the vicinity of the opening of the nozzle 311 of the sealed evaporation source 31. The vapor 242 of an evaporation material (Cu)...
US20120258256 GUIDED NON-LINE OF SIGHT COATING  
A method for applying a vapor deposition coating onto a substrate with a non line of sight or limited line of sight is disclosed. A vapor stream is provided in a chamber that is below atmospheric...
US20090176036 Method of organic material vacuum evaporation and apparatus thereof  
There is provided a method of vacuum evaporation comprising causing evaporated material (5) from vacuum evaporation source (20) furnished with container (1) with its one side open accommodating...
US20110111132 SYSTEM AND METHOD FOR DEPOSITING COATINGS ON INNER SURFACE OF TUBULAR STRUCTURE  
A system and method for depositing coatings on an inner surface of a tubular structure includes at least one pump for creating and maintaining a vacuum in the tubular structure, a meshed electrode...
US20140087092 PLASMA DEPOSITION ON A PARTIALLY FORMED BATTERY THROUGH A MESH SCREEN  
A plasma deposition method deposits a battery component material on a partially fabricated battery cell comprising a battery component layer containing charge-carrying metal species and having an...
US20090104353 Apparatus For Treating A Gas Stream  
In a method of inhibiting the deposition of aluminium within a vacuum pump during the pumping from a process chamber of a gas stream containing an organoaluminium precursor, chlorine is supplied...
US20130269611 GUIDED NON-LINE OF SIGHT COATING  
A method and apparatus for applying a vapor deposition coating onto a substrate with a non line of sight or limited line of sight is disclosed. A vapor stream is provided in a chamber that is...
US20080254219 Method And Device For Preparing Powder On Which Nano Metal, Alloy, And Ceramic Particles Are Uniformly Vacuum-Deposited  
The present invention relates to a method and device for preparing powder by depositing nano metal, alloy, ceramic particles that are excellent in size uniformity, on a surface of the powder that...
US20140202631 METHOD OF AFFIXING HEAT TRANSFER SHEET  
A heat transfer sheet affixing method where a focus ring is pressed by a pressing part to a heat transfer sheet placed on a heat transfer sheet mounting part of a plasma processing apparatus to...
US20100028562 PLASMA GENERATING APPARATUS, DEPOSITION APPARATUS, DEPOSITION METHOD, AND METHOD OF MANUFACTURING DISPLAY DEVICE  
A deposition apparatus includes a plasma gun including a hollow cathode which generates a plasma beam into a vacuum chamber including an exhaust system and one or more intermediate electrodes to...
US20080202423 VACUUM FILM-FORMING APPARATUS  
A vacuum film-forming apparatus comprising substrate stages; vacuum chamber-forming containers opposed to the stages; a means for moving the substrate between the stages; and gas-introduction...
US20080206477 Apparatus for Plasma-Enhanced Chemical Vapor Deposition (Pecvd) of an Internal Barrier Layer Inside a Container, Said Apparatus Including a Gas Line Isolated by a Solenoid Valve  
A machine (1) for depositing a thin layer of a barrier-effect material inside a container (2) by plasma-enhanced chemical vapor deposition, said machine (1) comprising: a processing unit (4)...
US20140020835 SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL FLOW CHAMBER  
A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a...
US20090223451 METHOD AND APPARATUS FOR PRECURSOR DELIVERY SYSTEM FOR IRRADIATION BEAM INSTRUMENTS  
A precursor delivery system for an irradiation beam instrument having a vacuum chamber includes an injection tube for injecting gasses into the vacuum chamber of the instrument and a main gas line...
US20100080928 Confining Magnets In Sputtering Chamber  
A vacuum chamber has multiple wafer positions, and the wafers are positioned by a rotating pallet. Above a wafer position in the chamber there may be a sputtering target, a flat inductively...
US20110067631 ARC ION PLATING APPARATUS  
An arc ion plating apparatus comprises a vacuum chamber, a rotary table for moving a substrate within the vacuum chamber vertically relative to its height direction, an arc evaporation source for...
US20090023274 Hybrid Chemical Vapor Deposition Process Combining Hot-Wire CVD and Plasma-Enhanced CVD  
Hybrid chemical vapor deposition systems for depositing a semiconductor-containing thin film over a substrate comprise a reaction space, a substrate support member configured to permit movement of...
US20080081128 Film-forming system, film-forming method, insulating film, dielectric film, piezoelectric film, ferroelectric film, piezoelectric element and liquid discharge system  
A film forming system includes a vacuum chamber introduction and discharge of film-forming gas into and from which are capable. A target holder is disposed in the vacuum chamber to hold a target,...
US20150232688 Surface Coatings  
A method of protecting a component from corrosion and providing electrical conductivity to one or more electrical contacts on the component, the method including the steps of placing the component...
US20100024731 PROCESSING TOOL WITH COMBINED SPUTTER AND EVAPORATION DEPOSITION SOURCES  
A substrate processing system particularly suitable for fabricating solar cells. The system has a front end module transporting cassettes, each cassette holding a preset number of substrates...
US20090145553 Suppressor of hollow cathode discharge in a shower head fluid distribution system  
A chamber component configured to be coupled to a process chamber and a method of fabricating the chamber component is described. The chamber component comprises a chamber element comprising a...
US20080292806 Plasma Immersion Ion Processing For Coating Of Hollow Substrates  
The present disclosure relates to an apparatus and method for plasma ion deposition and coating formation. A vacuum chamber may be supplied formed by a hollow substrate having a length, diameter...
US20050196548 Component protected against corrosion and method for the production thereof and device for carrying out the method  
Component having corrosion protection and including a base body made of one of a steel material and a light metal material. A corrosion-inhibiting surface layer that is a dense, fine-grained,...
US20050287296 Method and apparatus for dispersion strengthened bond coats for thermal barrier coatings  
A directed vapor deposition (DVD) method and system for applying at least one bond coating on at least one substrate for thermal barrier coating systems. The method and system provides for alloy...
US20080110400 VACUUM PROCESSING APPARATUS  
The invention provides a plasma processing apparatus for processing a wafer mounted on a sample stage placed in a vacuum processing chamber using a plasma generated in the vacuum chamber. The...
US20090133835 PROCESSING APPARATUS  
Provided is a structure of an improved processing vessel for a processing apparatus which processes a target object, such as a semiconductor wafer, which is heated in the metal cylindrical shaped...
US20110052832 FILM FORMING METHOD AND FILM FORMING APPARATUS  
An object of the present invention is to provide a reflection film formation technology which achieves the simplification of an apparatus structure and the cost reduction thereof. A film forming...
US20140123895 PLASMA PROCESS APPARATUS AND PLASMA GENERATING DEVICE  
A plasma process apparatus includes a vacuum chamber; a substrate holder configured to hold a substrate; a gas supplying part configured to supply a plasma generating gas into the vacuum chamber;...
US20120088038 Method and Device for High-Rate Coating by Means of High-Pressure Evaporation  
The invention relates to a vacuum coating method with very high deposition rates at high layer thickness homogeneity and material yield as well as apparatuses for achieving the coating. In order...
US20120153442 SILICON NITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-READABLE STORAGE MEDIUM, AND PLASMA CVD DEVICE  
Provided is a process of forming a silicon nitride film having concentration of hydrogen atoms below or equal to 9.9×1020 atoms/cm3 in the silicon nitride film by using a plasma CVD device, which...
US20080286495 SYSTEM AND METHOD FOR POWER FUNCTION RAMPING OF SPLIT ANTENNA PECVD DISCHARGE SOURCES  
A system and method for depositing films on a substrate is described. One embodiment includes a vacuum chamber; a split conductor housed inside the vacuum chamber; a magnetron configured to...
US20110311737 VAPOR DEPOSITION APPARATUS FOR MINUTE-STRUCTURE AND METHOD THEREFOR  
A vapor deposition apparatus for a minute-structure includes a surface acoustic wave device 10 that has at least a pair of electrodes 12 and 13 arranged at an interval on a surface of a...
US20080066682 SUBSTRATE SUPPORTING MECHANISM AND SUBSTRATE PROCESSING APPARATUS  
A substrate supporting mechanism includes a function for heating a substrate placed thereon in a process container of a substrate processing apparatus. The substrate supporting mechanism includes...
US20060222767 Production device for multiple-system film and coating tool for multiple-system film  
A production device and a method produce a multicomponent film containing metal components such as TiAlN having greatly different melting points by a melting-evaporation type ion plating method...
US20100144122 Hybrid chemical vapor deposition process combining hot-wire cvd and plasma-enhanced cvd  
Hybrid chemical vapor deposition systems for depositing a semiconductor-containing thin film over a substrate comprise a reaction space, a substrate support member configured to permit movement of...
US20090085172 Deposition Method, Deposition Apparatus, Computer Readable Medium, and Semiconductor Device  
A deposition method includes steps of placing a substrate on a susceptor in a process chamber; supplying to the process chamber a source gas including an organic compound and a plasma gas for...
US20110111963 Apparatus For Fabricating High Temperature Superconducting Film And High Temperature Superconducting Film Fabricated Through Auxiliary Cluster Beam Spraying  
Disclosed herein is a high temperature superconducting film and an apparatus for fabricating a high temperature superconducting film in a vacuum chamber through auxiliary cluster beam spraying...
US20090017217 Apparatus and method for applying coatings onto the interior surfaces of components and related structures produced therefrom  
Provided is a methodology and system for applying coatings onto the interior surfaces of components. The approach comprises a vapor creation device (for example an electron beam or laser that...
US20080152903 System and Process for High-Density, Low-Energy Plasma Enhanced Vapor Phase Epitaxy  
An apparatus and process for fast epitaxial deposition of compound semiconductor layers includes a low-energy, high-density plasma generating apparatus for plasma enhanced vapor phase epitaxy. The...
US20090191327 VACUUM COATING INSTALLATION AND METHOD OF PRODUCING A COATING LAYER ON A SUBSTRATE  
A strip coating system includes a first pulley carrying a flexible metal or Al substrate wound up on the first pulley. A second, take-up, pulley is provided for taking up the coated substrate. The...
US20140065835 PROTECTIVE COATING FOR A PLASMA PROCESSING CHAMBER PART AND A METHOD OF USE  
A flexible polymer or elastomer coated RF return strap to be used in a plasma chamber to protect the RF strap from plasma generated radicals such as fluorine and oxygen radicals, and a method of...
US20110045617 THIN FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE SAME  
A thin film deposition apparatus and an organic light-emitting display device by using the same. The thin film deposition apparatus includes an electrostatic chuck, an a plurality of chambers; at...
US20100183879 PLASMA DEPOSITION APPARATUS  
Apparatus (10) for coating a surface of an article (14) with a thin film polymer layer by plasma deposition, the apparatus comprising: a plurality of processing chambers (12a, 12b, 12c . . . 12n)...
US20090279227 Multi Layer Chip Capacitor, and Method and Apparatus for Manufacturing the Same  
The present invention carries out the vacuum deposition by setting a deposition angle between a single mask set including a shadow mask having a plurality of slits and a deposition source to form...
US20090236040 ELECTRODE ASSEMBLY AND PLASMA PROCESSING CHAMBER UTILIZING THERMALLY CONDUCTIVE GASKET  
The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present...
US20080272463 Method and Apparatus for Growing a Group (III) Metal Nitride Film and a Group (III) Metal Nitride Film  
A process and apparatus for growing a group (III) metal nitride film by remote plasma enhanced chemical vapour deposition are described. The process comprises heating an object selected from the...
US20080032511 Semiconductor Device Manufacturing Method and Plasma Oxidation Treatment Method  
A selective oxidation process is performed on a gate electrode in a plasma processing apparatus 100. A wafer W with the gate electrode formed thereon is placed on a susceptor 2 within a chamber 1....
Matches 1 - 50 out of 78 1 2 >