Matches 1 - 18 out of 18


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US20110079582 PLASMA GENERATING DEVICE AND METHOD  
An object of the invention is to provide a plasma generating device and method for generating plasma through electrodeless discharge within a long tubule and carrying out a plasma process on the...
US20090242131 ECR PLASMA SOURCE  
The invention relates to an ECR plasma source comprising a coaxial microwave supply line with an internal conductor and an external conductor, wherein the internal conductor with one end as the...
US20080141939 ENCAPSULATED AND WATER COOLED ELECTROMAGNET ARRAY  
A electromagnet array structure including multiple electromagnetic coils captured in a rigid encapsulant, for example, of cured epoxy resin, to form a unitary free-standing structure which can be...
US20060254521 Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening  
The invention relates to an electron cyclotron resonance (ECR) plasma source having a linear plasma discharge opening (9, 27, 28, 30), comprised of a plasma chamber, inside of which a centered...
US20070266948 Device for Controlling Electron Temperature in an Ecr Plasma  
A device which is used to control the electronic temperature in an ECR plasma chamber includes at least one moderator which is placed in the path of electrons having an energy greater than a...
US20150020735 METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT  
This application is directed to an apparatus for creating microwave radiation patterns for an object detection system. The apparatus includes a waveguide conduit having first slots at one side of...
US20110232846 MAGNETIC FIELD GENERATOR FOR MAGNETRON PLASMA  
Disclosed is a magnetic field generator for magnetron plasma. The magnetic field generator is provided with a plurality of magnetic segments, and generates a predetermined multi-pole magnetic...
US20120222618 DUAL PLASMA SOURCE, LAMP HEATED PLASMA CHAMBER  
Methods and apparatus for processing semiconductor substrates are described. A processing chamber includes a substrate support with an in-situ plasma source, which may be an inductive, capacitive,...
US20110005461 METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT  
A plasma deposition apparatus includes a waveguide conduit having a plurality of slots therein. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the...
US20050205016 Plasma treatment apparatus and plasma treatment method  
A plasma treatment apparatus generates a plasma in a treatment vessel by an electromagnetic wave radiated from an electromagnetic wave radiation portion into the treatment vessel to perform plasma...
US20050205015 Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatus  
An insulating film is formed with a plasma film forming apparatus which includes a vacuum vessel with an electromagnetic wave incident face F, first gas injection holes made in the vacuum vessel,...
US20060157198 Member for plasma processing apparatus and plasma processing apparatus  
Provided is a plasma processing apparatus, which comprises, as a member facing plasma in a plasma processing chamber, a member composed of a material prepared by incorporating a conductive...
US20050145177 Method and apparatus for low temperature silicon nitride deposition  
Numerous embodiments of a method and apparatus for low temperature silicon nitride deposition are disclosed. In one embodiment, a halogen substituted silicon hydride and a nitrogen-containing...
US20050287824 ECR-plasma source and methods for treatment of semiconductor structures  
The invention relates to microelectronics, more particularly, to methods of manufacturing solid-state devices and integrated circuits utilizing microwave plasma enhancement under conditions of...
US20100089871 PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE MEDIUM  
Provided is a plasma processing apparatus including a processing vessel accommodating a target object; a microwave generator configured to generate a microwave; a waveguide configured to induce...
US20120024229 CONTROL OF PLASMA PROFILE USING MAGNETIC NULL ARRANGEMENT BY AUXILIARY MAGNETS  
Magnetrons for use in physical vapor deposition (PVD) chambers and methods of use thereof are provided herein. In some embodiments, an apparatus may include a support member having an axis of...
US20070281478 Plasma processing method and apparatus  
Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for...
US20160155616 SUBSTRATE PROCESSING APPARATUS  
A substrate processing apparatus includes a chamber, and a plasma generator disposed at an upper portion of the chamber. A susceptor is disposed in the chamber. The susceptor supports the...

Matches 1 - 18 out of 18