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US20120012057 PUCK FOR CATHODIC ARC COATING WITH CONTINUOUS GROOVE TO CONTROL ARC  
A puck for providing a coating material in a cathodic arc coating system has a generally uniform depression formed at the outer periphery. The depression ensures that an arc from the coating...
US20140272456 Spallation-Resistant Thermal Barrier Coating  
A coated article has: a metallic substrate (22); a bondcoat (30); and a thermal barrier coating (TBC) (28). The bondcoat has a first layer (32) and a second layer (34), the first layer having a...
US20130116682 Non-Stick Conductive Coating for Biomedical Applications  
The present disclosure provides a plasma system including a plasma device having at least one electrode; an ionizable media source coupled to the plasma device and configured to supply ionizable...
US20110290183 Plasma Uniformity Control By Gas Diffuser Hole Design  
Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side,...
US20140216343 PLASMA SOURCE AND METHODS FOR DEPOSITING THIN FILM COATINGS USING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION  
The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two...
US20150040829 MULTIZONE HOLLOW CATHODE DISCHARGE SYSTEM WITH COAXIAL AND AZIMUTHAL SYMMETRY AND WITH CONSISTENT CENTRAL TRIGGER  
Embodiments of the present invention relate to hollow cathode plasma sources with improved uniformity. One embodiment of the present invention provides a hollow cathode assembly having a...
US20110100556 Plasma System with Injection Device  
A plasma system with an injection device is provided. The plasma system comprises a plasma cavity and an injection device. The plasma cavity comprises a first electrode and a second for generating...
US20140138030 CAPACITIVELY COUPLED PLASMA EQUIPMENT WITH UNIFORM PLASMA DENSITY  
Techniques disclosed herein include apparatus and processes for generating plasma having a uniform electron density across an electrode used to generate the plasma. An upper electrode of a...
US20130095243 METAL TITANIUM PRODUCTION DEVICE AND METAL TITANIUM PRODUCTION METHOD  
A metal titanium production device comprising: (a) a magnesium evaporation unit in which solid magnesium is evaporated and a first flow path which is communicated with the evaporation unit and...
US20130008603 COAXIAL CABLE AND SUBSTRATE PROCESSING APPARATUS  
According to one embodiment, there is provided a coaxial cable that transmits radio frequency power. The coaxial cable includes an inner tube, an outer tube, and an insulating support member. The...
US20110236599 Plasma processing including asymmetrically grounding a susceptor  
An asymmetrically grounded susceptor used in a plasma processing chamber for chemical vapor deposition onto large rectangular panels supported on and grounded by the susceptor. A plurality of...
US20110126405 Off-Center Ground Return for RF-Powered Showerhead  
An electrical ground (36) of an RF impedance matching network (33) is connected to a connection area (50) on the grounded chamber cover (18) of a plasma chamber. The connection area is offset away...
US20130040072 Plasma Booster for Plasma Treatment Installation  
Vacuum treatment installation particularly for plasma coating workpieces has an arrangement for boosting and/or igniting a glow discharge plasma for the treatment of workpieces, and at least one...
US20140174358 Magnetic Field Assisted Deposition  
Embodiments relate to applying a magnetic field across the paths of injected polar precursor molecules to cause spiral movement of the precursor molecules relative to the surface of a substrate....
US20110318498 Coaxial Hollow Cathode Plasma Assisted Directed Vapor Deposition and Related Method Thereof  
A plasma generation process that is more optimized for vapor deposition processes in general, and particularly for directed vapor deposition processing. The features of such an approach enables a...
US20130309419 Ceramic Coating Deposition  
A ceramic material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The...
US20080251017 Fastening Unit for Ignition Units and Device for Carbon Deposition  
A fastening unit for fastening ignition units as part of a device for carbon deposition is provided, the fastening unit of the device having a first and a second holder, the ignition unit being...
US20100086703 Vapor Phase Epitaxy System  
A vapor phase epitaxy system includes a platen that supports substrates for vapor phase epitaxy and a gas injector. The gas injector injects a first precursor gas into a first region and injects a...
US20130160710 PLASMA FILM DEPOSITION DEVICE  
A plasma film deposition device includes a film deposition chamber, a plasma generator within the deposition chamber, a plurality of gas carrier boards adjustably mounted to the plasma generator,...
US20110120652 PLASMA GENERATING APPARATUS  
A plasma generating apparatus is provided. The plasma generating apparatus includes a plasma process chamber, a top electrode board, a bottom electrode board and at least one pair of impedance...
US20110197814 ANTI-ARC ZERO FIELD PLATE  
Embodiments of the present invention generally relate to apparatus for reducing arcing and parasitic plasma in substrate processing chambers. The apparatus generally include a processing chamber...
US20150187543 PLASMA EQUIPMENT FOR TREATING POWDER  
A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus includes: a chamber configured to perform plasma processing on a powder; a powder supply unit disposed in...
US20120122018 FUEL CELL SEPARATOR AND METHOD FOR SURFACE TREATMENT OF THE SAME  
The present invention provides a fuel cell separator and a method for surface treatment of the same, in which ionized nanoparticles are attached to the surface of a separator to form fine...
US20120097104 RF IMPEDANCE MATCHING NETWORK WITH SECONDARY DC INPUT  
Embodiments of the disclosure may provide a matching network for a physical vapor deposition system. The matching network may include an RF generator coupled to a first input of an impedance...
US20110081477 Plasma Activated Chemical Vapour Deposition Method and Apparatus Therefor  
In plasma activated chemical vapour deposition a plasma decomposition unit is used that is arranged in or connected to a vacuum vessel having a relatively low pressure or vacuum, to which an...
US20110041766 PLASMA SOURCE  
A plasma source comprises a vacuum chamber, a plurality of discharge tubes, a plurality of permanent magnets, a plurality of RF antennas, and an RF power distribution circuit. The RF power...
US20130052369 PLASMA REACTOR  
A plasma reactor with a recipient (33) and an electrode (38) has two exhaust openings (34, 35) spaced apart in a close proximity to the electrode (38). A flow diverter body (37) in the space of...
US20110244690 COMBINATORIAL PLASMA ENHANCED DEPOSITION AND ETCH TECHNIQUES  
According to various embodiments of the disclosure, an apparatus and method for enhanced deposition and etch techniques is described, including a pedestal, the pedestal having at least two...
US20070113786 Radio frequency grounding rod  
A radio frequency (RF) grounding rod employed in a plasma chamber of semiconductor equipment is disclosed. The RF grounding rod includes a contact head and a main rod. The contact head is...
US20050229852 Plant for vacuum coating of objects treated in batches  
A plant for vacuum metallization of objects treated in batches is described, said plant comprising: a vacuum chamber; at least one carousel (15) which rotates about an axis of rotation (A-A) and...
US20100000683 Showerhead electrode  
A showerhead electrode includes inner and outer steps at an outer periphery thereof, the outer step cooperating with a clamp ring which mechanically attaches the electrode to a backing plate.
US20120222815 HYBRID CERAMIC SHOWERHEAD  
Various implementations of hybrid ceramic faceplates for substrate processing showerheads are provided. The hybrid ceramic showerhead faceplates may include an electrode embedded within the...
US20120273976 MOISTURE BARRIER COATINGS FOR ORGANIC LIGHT EMITTING DIODE DEVICES  
A process for fabricating an amorphous diamond-like film layer for protection of a moisture or oxygen sensitive electronic device is described. The process includes forming a plasma from silicone...
US20090183680 Electrode with Improved Plasma Uniformity  
An electrode with improved plasma uniformity is disclosed, which is used for a chamber capable of generating a plasma. The electrode comprises an electrode plate and a perturbation slot. By well...
US20100038033 ANCHORING INSERTS, ELECTRODE ASSEMBLIES, AND PLASMA PROCESSING CHAMBERS  
A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded...
US20060254517 Plasma booster for plasma treatment installation  
An arrangement for boosting or igniting a glow discharge plasma for coating workpieces has at least one hollow body of an electrically conductive material formed such that when an electric signal...
US20070113785 Radio frequency grounding apparatus  
The radio frequency (RF) grounding apparatus of the present invention uses a clamp to clamp an RF grounding rod by surface contact to improve the connection stability. The clamp is connected to a...
US20130034668 Method for Producing Plasma Flow, Method for Plasma Processing, Apparatus for Producing Plasma, and Apparatus for Plasma Processing  
Provided are a plasma stream generation method, a plasma processing method, a plasma generation apparatus, and a plasma processing apparatus using same, which enable plasma processing with...
US20130105087 SOLAR WAFER ELECTROSTATIC CHUCK  
An electrostatic chuck is disclosed, which is especially suitable for fabrication of substrates at high throughput. The disclosed chuck may be used for fabricating large substrates or several...
US20110192348 RF Hollow Cathode Plasma Generator  
An RF hollow cathode plasma source consists of a vacuum chamber, a pipe, a hollow cathode, at least two compartments, a conduit and input electrodes. The pipe is inserted into the chamber for...
US20120045592 Process to Deposit Diamond Like Carbon as Surface of a Shaped Object  
A plasma based deposition process to deposit thin film on the inner surfaces of the shaped objects such as plastic or metallic object like bottles, hollow tubes etc. at room temperature has been...
US20110088849 PLASMA PROCESSING APPARATUS  
A plasma processing apparatus, comprising: a reaction chamber;a gas inlet portion that introduces a reactant gas into the reaction chamber;an exhaust portion that exhausts the reactant gas from...
US20060137610 Plasma processing apparatus with insulated gas inlet pore  
A plasma processing apparatus includes: a reaction chamber; two electrodes provided inside the reaction chamber for generating a plasma therebetween, wherein at least one of the electrodes has at...
US20120175062 CAM-LOCKED SHOWERHEAD ELECTRODE AND ASSEMBLY  
A showerhead electrode and assembly useful for plasma etching includes cam locks which provide improved thermal contact between the showerhead electrode and a backing plate. The cam locks include...
US20100034985 Apparatus and Method for the Plasma Treatment of Hollow Bodies  
The present invention refers to an apparatus for the plasma treatment of hollow bodies, comprising a vacuum treatment chamber and means for generating the plasma, which apparatus is characterized...
US20130136872 PLASMA PROCESSING IN A CAPACITIVELY-COUPLED REACTOR WITH TRAPEZOIDAL-WAVEFORM EXCITATION  
A method is provided for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a...
US20120132368 PLASMA TREATMENT APPARATUS  
To improve durability of an electric discharge part of a dielectric barrier discharge system, a plasma treatment apparatus is configured so that a plasma source of a corona discharge system is...
US20130251917 Device for Plasma Coating Product Containers, Such as Bottles  
The disclosure relates to a device and a method for plasma coating product containers, in particular bottles, the device preferably being a rotary machine comprising a control unit, one or several...
US20120052242 Substrate Structure Grown By Plasma Deposition  
Substrate structure comprising a substrate (6) and a plasma grown layer (6a). The surface of the resulting substrate structure (7) is characterized by interrelated scaling components. The scaling...
US20130277333 PLASMA PROCESSING USING RF RETURN PATH VARIABLE IMPEDANCE CONTROLLER WITH TWO-DIMENSIONAL TUNING SPACE  
In a plasma reactor having a driven electrode and a counter electrode, an impedance controller connected between the counter electrode and ground includes both series sand parallel variable...