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8040721 Creating short program pulses in asymmetric memory arrays  
The present invention provides methods and apparatus for adjusting voltages of bit and word lines to create short programming pulses to program a memory cell. The invention may include setting a...
8040026 Illumination lamp with inner light tube  
An illumination lamp is provided. The illumination lamp includes a hollow pillar tube being light-transmissive, at least one inner light tube accommodated in the hollow pillar tube, and an...
8033772 Transfer chamber for vacuum processing system  
A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body...
8030740 Deposited semiconductor structure to minimize N-type dopant diffusion and method of making  
A microelectronic structure including a layerstack is provided, the layerstack including: (a) a first layer including semiconductor material that is very heavily n-doped before being annealed,...
8029620 Methods of forming carbon-containing silicon epitaxial layers  
In a first aspect, a method is provided for forming an epitaxial layer stack on a substrate. The method includes (1) selecting a target carbon concentration for the epitaxial layer stack; (2)...
8024065 Methods and apparatus for transferring a substrate carrier within an electronic device manufacturing facility  
In one aspect, a method is provided for electronic device manufacturing. The method includes receiving a request to transfer a carrier to or from a first substrate loading station of an electronic...
8020689 Break-away positioning conveyor mount for accommodating conveyor belt bends  
A break-away mounting system for a continuous-motion, high-speed position conveyor system is disclosed. A support cradle may be suspended from a conveyor belt such that the support cradle...
8020427 Methods and apparatus for insitu analysis of gases in electronic device fabrication systems  
Systems and methods are disclosed that include adjusting a pressure level of a sample gas in a testing chamber, for example, using a pressurized inert reference gas, and determining a composition...
8018025 Nonvolatile memory cell comprising a reduced height vertical diode  
A nonvolatile memory cell includes: a rail-shaped first conductor formed at a first height above a substrate; a rail-shaped second conductor formed above the first conductor; and a vertically...
8018024 P-i-n diode crystallized adjacent to a silicide in series with a dielectric antifuse  
A method is described for forming a nonvolatile one-time-programmable memory cell having reduced programming voltage. A contiguous p-i-n diode is paired with a dielectric rupture antifuse formed...
8016542 Methods and apparatus for extending the reach of a dual scara robot linkage  
Methods and apparatus are provided for the use of a dual Selective Compliant Assembly Robot Arm (SCARA) robot. In some embodiments two SCARAs are provided, each including an elbow joint, wherein...
8008187 Method for reducing dielectric overetch using a dielectric etch stop at a planar surface  
A substantially planar surface coexposes conductive or semiconductor features and a dielectric etch stop material. A second dielectric material, different from the dielectric etch stop material,...
8004919 Methods and apparatus for extending the effective thermal operating range of a memory  
Apparatus and systems are provided for thermal regulation of a memory integrated circuit (“IC”). The apparatus and systems may include a thermal sensor on a memory IC, and a heating element...
8004033 High-density nonvolatile memory  
Nonvolatile memory cells and methods of forming the same are provided, the methods including forming a first conductor at a first height above a substrate; forming a first pillar-shaped...
8004013 Polycrystalline thin film bipolar transistors  
A semiconductor device comprising a bipolar transistor having a base region, an emitter region and a collector region, wherein the base region comprises polycrystalline semiconductor material...
8003477 Method for making a P-I-N diode crystallized adjacent to a silicide in series with a dielectric antifuse  
A method is described for monolithically forming a first memory level above a substrate, the method including: (a) forming a plurality of first substantially parallel, substantially coplanar...
8003067 Apparatus and methods for ambient air abatement of electronic manufacturing effluent  
An abatement system is provided which includes 1) an abatement unit adapted to abate effluent; and 2) an ambient air supply system. The ambient air supply system includes an air moving device,...
8002896 Shadow frame with cross beam for semiconductor equipment  
A shadow frame and framing system for semiconductor fabrication equipment comprising a rectangular frame having four edges, the edges forming an interior lip with a top surface and an bottom...
7999529 Methods and apparatus for generating voltage references using transistor threshold differences  
Methods and apparatus are described that develop a reference voltage that is based on a difference between a threshold voltage of a first transistor and a threshold voltage of a second transistor,...
7993485 Methods and apparatus for processing a substrate  
Apparatus and methods adapted to polish an edge of a substrate include a polishing film, a frame adapted to tension and load the polishing film so that at least a portion of the film is supported...
7992956 Systems and methods for calibrating inkjet print head nozzles using light transmittance measured through deposited ink  
The present invention provides inkjet print nozzle calibration systems and methods for calibrating an inkjet print nozzle. The systems may include an inkjet print nozzle adapted to dispense ink...
7985379 Reactor design to reduce particle deposition during process abatement  
The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the...
7984543 Methods for moving a substrate carrier  
Systems, methods, and apparatus are provided for electronic device manufacturing. The invention includes removing a first substrate carrier and a second substrate carrier from a moving conveyor...
7982273 Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure  
A monolithic three dimensional semiconductor device structure includes a first layer including a first occurrence of a first reference mark at a first location, and a second layer including a...
7982209 Memory cell comprising a carbon nanotube fabric element and a steering element  
A rewritable nonvolatile memory cell is disclosed comprising a steering element in series with a carbon nanotube fabric. The steering element is preferably a diode, but may also be a transistor....
7980255 Single wafer dryer and drying methods  
In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating...
7977667 Memory cell that includes a carbon nano-tube reversible resistance-switching element and methods of forming the same  
Methods of forming planar carbon nanotube (“CNT”) resistivity-switching materials for use in memory cells are provided, that include depositing first dielectric material, patterning the first...
7970483 Methods and apparatus for improving operation of an electronic device manufacturing system  
In one aspect of the invention, a method for the improved operation of an electronic device manufacturing system is provided. The method includes providing information to an interface coupled to...
7965382 Methods and apparatus for multi-exposure patterning  
In some aspects, a reticle is provided for use in forming a patterned region on a substrate using a multi-pattern, multi-exposure process. The reticle includes (a) a first pattern for the...
7963826 Apparatus and methods for conditioning a polishing pad  
Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive...
7961932 Method and apparatus for manufacturing diamond shaped chips  
In a first aspect, an inventive apparatus for imaging a chip on a wafer includes a combined diamond chip image and kerf image having a plurality of sloped sides. The combined diamond chip image...
7960256 Use of CL2 and/or HCL during silicon epitaxial film formation  
In a first aspect, a method of forming an epitaxial film on a substrate is provided. The method includes (a) providing a substrate; (b) exposing the substrate to a silicon source and a carbon...
7955515 Method of plasma etching transition metal oxides  
A method of plasma etching transition metal oxide thin films using carbon monoxide as the primary source gas. This permits carbonyl chemistries to be used at ambient temperature, without heating.
7948084 Dielectric material with a reduced dielectric constant and methods of manufacturing the same  
In a first aspect, a first method of manufacturing a dielectric material with a reduced dielectric constant is provided. The first method includes the steps of (1) forming a dielectric material...
7930061 Methods and apparatus for loading and unloading substrate carriers on moving conveyors using feedback  
The present invention provides systems and methods for loading and unloading substrate carriers onto and off of a transport system. The invention includes a substrate carrier handler adapted to...
7929548 Weighted fair queue serving plural output ports  
A data communication apparatus includes a plurality of output ports and a scheduler for assigning priorities for outbound data frames. The scheduler includes one or more scheduling queues. Each...
7928007 Method for reducing dielectric overetch when making contact to conductive features  
In a first preferred embodiment of the present invention, conductive features are formed on a first dielectric etch stop layer, and a second dielectric material is deposited over and between the...
7927062 Methods and apparatus for transferring substrates during electronic device manufacturing  
In one aspect, a first apparatus is provided that is adapted to transfer a substrate between a transfer chamber and a processing chamber. The first apparatus includes a robot having a first blade,...
7924602 Method to program a memory cell comprising a carbon nanotube fabric element and a steering element  
A method of programming a carbon nanotube memory cell is provided, wherein the memory cell comprises a first conductor, a steering element, a carbon nanotube fabric, and a second conductor,...
7923057 Methods and apparatus for reducing irregularities in color filters  
Methods, apparatus and systems are disclosed for printing color filters for flat panel displays and avoiding mura effects by depositing a plurality of ink drops on a substrate within a column of...
7914248 Methods and apparatus for repositioning support for a substrate carrier  
In a first aspect, a first method is provided repositioning support provided by an end effector. The first method includes the steps of (1) employing the end effector to support a substrate...
7914246 Actuatable loadport system  
A system adapted to exchange wafer carriers between an overhead transport mechanism and a platform is provided. The system employs a wafer carrier having at least one handle extending therefrom,...
7913645 Methods and apparatus for incorporating nitrogen in oxide films  
In a first aspect, a first method is provided. The first method includes the steps of (1) preconditioning a process chamber with an aggressive plasma; (2) loading a substrate into the process...
7912576 Calibration of high speed loader to substrate transport system  
In one aspect, a system is disclosed having a substrate carrier loader adapted to load substrate carriers onto a moving conveyor; and a controller coupled to the substrate carrier loader, the...
7902537 Memory cell that employs a selectively grown reversible resistance-switching element and methods of forming the same  
In some aspects, a method of forming a memory cell is provided that includes (1) forming a first conductor above a substrate; (2) forming a reversible resistance-switching element above the first...
7902050 Methods and apparatus for incorporating nitrogen in oxide films  
In a first aspect, a first method is provided. The first method includes the steps of (1) preconditioning a process chamber with an aggressive plasma; (2) loading a substrate into the process...
7901953 Methods and apparatus for detecting defects in interconnect structures  
In some aspects, a method is provided for detecting a void in a test structure that comprises (a) measuring a resistance of the test structure; (b) applying a stress to the test structure at...
7900311 Wafer edge cleaning  
In a first aspect, an apparatus for cleaning a thin disk is provided. The apparatus includes a support roller for supporting a rotating wafer within a wafer cleaner. The support roller comprises a...
7899940 Servicing commands  
In a first aspect, a first method is provided for servicing commands. The first method includes the steps of (1) receiving a first command for servicing in a memory controller including a...
7894923 Methods and apparatus for sensing substrates in carriers  
In some aspects, a method is provided for mapping contents of a substrate carrier. The method includes (1) moving a carrier to a sensor; and (2) determining, with the sensor, a presence or an...


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