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7494765 Method for patterning photoresist pillars using a photomask having a plurality of chromeless nonprinting phase shifting windows  
A method for patterning a photoresist using a photomask to form an integrated circuit, the photomask including a first area transmitting light in a first phase surrounded by a second area, the...
7488625 Vertically stacked, field programmable, nonvolatile memory and method of fabrication  
A three-dimensional, field-programmable, non-volatile memory includes multiple layers of first and second crossing conductors. Pillars are self-aligned at the intersection of adjacent first and...
7484030 Storage controller and methods for using the same  
In a first aspect, a first method is provided for processing a request. The first method includes the steps of (1) receiving a request in first logic of a controller from a device master; (2)...
7480877 Methods and apparatus for Boolean equivalency checking in the presence of voting logic  
In a first aspect, a first method of designing a circuit is provided. The first method includes the steps of (1) providing a model of an original circuit design including a latch; (2) providing a...
7477956 Methods and apparatus for enhancing electronic device manufacturing throughput  
In some aspects, a method is provided for enhancing electronic device manufacturing throughput within an electronic device manufacturing tool. The method includes the steps of (1) for the...
7475159 High-speed scheduler  
In a first aspect, a method is provided for scheduling connections for a network processor. The method includes the steps of, in a cache, scheduling a plurality of connections to be serviced based...
7474934 Methods and apparatus for enhancing electronic device manufacturing throughput  
Methods, systems, and apparatus are provided that include determining a number of storage locations corresponding to busy chambers of an electronic device manufacturing tool; based on the number...
7474000 High density contact to relaxed geometry layers  
The present invention provides for a via and staggered routing level structure. Vertically overlapping vias connect to two or more routing levels formed at different heights. The routing levels...
7472227 Invalidating multiple address cache entries  
In a first aspect, a first method is provided for removing entries from an address cache. The first method includes the steps of (1) writing data to a register; and (2) removing a plurality of...
7469265 Methods and apparatus for performing multi-value range checks  
In a first aspect, a method is provided for determining in which of n intervals a sum of two or more numbers resides. The method includes determining the two or more numbers, and providing fewer...
7467919 Automatic door opener  
A wafer carrier opener is provided. The wafer carrier opener may eliminate the use of two separate actuators by using a four-bar linkage mechanism. The wafer carrier opener includes a wafer...
7459056 Pad conditioning head for CMP process  
In a first aspect, a first apparatus is provided for a chemical mechanical polishing (CMP) process. The first apparatus includes (1) a rotatable member; (2) an end effector adapted to receive and...
7455172 Break-away positioning conveyor mount for accommodating conveyor belt bends  
A break-away mounting system for a continuous-motion, high-speed position conveyor system is disclosed. A support cradle may be suspended from a conveyor belt such that the support cradle...
7453755 Memory cell with high-K antifuse for reverse bias programming  
An integrated circuit and associated method of programming are provided. Such integrated circuit includes a memory cell with a diode and an antifuse in communication with the diode. The antifuse...
7452475 Cleaning process and apparatus for silicate materials  
A method for treating a surface of a quartz substrate includes preparing a substrate to provide a working surface having an initial roughness; and then ultrasonically acid-etching the working...
7446588 Highly scalable methods and apparatus for multiplexing signals  
In a first aspect, a first method is provided that includes providing a plurality of select signals and a plurality of input signals for input by a multiplexer. Each select signal is adapted to...
7439108 Coplanar silicon-on-insulator (SOI) regions of different crystal orientations and methods of making the same  
In a first aspect, a first method is provided for semiconductor device manufacturing. The first method includes the steps of (1) providing a substrate; and (2) forming a first silicon-on-insulator...
7434676 Methods and apparatus for transferring a substrate carrier within an electronic device manufacturing facility  
In a first aspect, a first method is provided for electronic device manufacturing. The first method includes the steps of (1) receiving a request to transfer a carrier from a first substrate...
7434130 Using clock gating or signal gating to partition a device for fault isolation and diagnostic data collection  
In one aspect, an electronic device that has been partitioned into segments by using clock gating or signal gating is tested. One of the segments that is a source of a failure is identified....
7433756 Calibration of high speed loader to substrate transport system  
In a first aspect, a first method of calibrating a substrate carrier loader to a moving conveyor is provided. The first method includes the steps of (1) providing a substrate carrier loader...
7433356 Methods and apparatus for creating addresses  
In a first aspect, a first method is provided for creating a media access control (MAC) address for a device. The first method includes the steps of (1) obtaining one or more identifiers; (2)...
7423304 Optimization of critical dimensions and pitch of patterned features in and above a substrate  
A die is formed with different and optimized critical dimensions in different device levels and areas of those device levels using photolithography and etch techniques. One aspect of the invention...
7422985 Method for reducing dielectric overetch using a dielectric etch stop at a planar surface  
A substantially planar surface coexposes conductive or semiconductor features and a dielectric etch stop material. In a preferred embodiment, the conductive or semiconductor features are pillars...
7418978 Methods and apparatus for providing fluid to a semiconductor device processing apparatus  
In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a...
7418637 Methods and apparatus for testing integrated circuits  
In some aspects a method is provided for testing an integrated circuit (IC). The method includes the steps of selecting a bit from each of a plurality of memory arrays formed on an IC chip,...
7413945 Electrically isolated pillars in active devices  
A method of forming an active device is provided. The method includes performing a first patterning operation on a first plurality of layers. This first patterning operation defines a first...
7413272 Methods and apparatus for precision control of print head assemblies  
The present invention provides methods and apparatus for controlling the quantity of fluid output (e.g., drop size) by individual nozzles of a print head to a very high precision at a frequency...
7413069 Methods and apparatus for transferring a substrate carrier within an electronic device manufacturing facility  
In a first aspect, a first method is provided for electronic device manufacturing. The first method includes the steps of (1) receiving a request to transfer a carrier from a first substrate...
7411956 Methods and apparatus for routing packets  
In a first aspect, a first method is provided that includes the steps of (1) providing a pointer that includes a first keytype field and a second keytype field; and (2) assigning a value to the...
7409263 Methods and apparatus for repositioning support for a substrate carrier  
In a first aspect, a first method is provided repositioning support provided by an end effector. The first method includes the steps of (1) employing the end effector to support a substrate...
7407081 Methods and apparatus for transferring conductive pieces during semiconductor device fabrication  
In a first aspect, a programmable transfer device is provided for transferring conductive pieces to electrode pads of a target substrate. The programmable transfer device includes (1) a transfer...
7405465 Deposited semiconductor structure to minimize n-type dopant diffusion and method of making  
In deposited silicon, n-type dopants such as phosphorus and arsenic tend to seek the surface of the silicon, rising as the layer is deposited. When a second undoped or p-doped silicon layer is...
7393730 Coplanar silicon-on-insulator (SOI) regions of different crystal orientations and methods of making the same  
In a first aspect, a first method is provided for semiconductor device manufacturing. The first method includes the steps of (1) providing a substrate; and (2) forming a first silicon-on-insulator...
7377991 Ultrasonic assisted etch using corrosive liquids  
An ultrasonic etching apparatus for chemically-etching a workpiece is disclosed. The apparatus includes an outer tank at least partially filled with an aqueous solution, an inner tank at least...
7377002 Scrubber box  
A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the...
7372250 Methods and apparatus for determining a position of a substrate relative to a support stage  
A sensing system includes a plurality of probes arranged in a spaced relation around a stage that is adapted to support a substrate. Each probe includes a detection portion adapted to move from a...
7370133 Storage controller and methods for using the same  
In a first aspect, a first method is provided for processing a request. The first method includes the steps of (1) receiving a request in first logic of a controller from a device master; (2)...
7368787 Fin field effect transistors (FinFETs) and methods for making the same  
In a first aspect, a first method is provided for semiconductor device manufacturing. The first method includes the steps of (1) forming a first side of a fin of a fin field effect transistor...
7367446 Methods and apparatus for transporting substrate carriers  
According to a first aspect, a first conveyor system is provided that is adapted to deliver substrate carriers within a semiconductor device manufacturing facility. The first conveyor system...
7367342 Wound management systems and methods for using the same  
In one aspect, a wound management system is provided. The wound management system includes a multi-lumen cannula adapted to be disposed in a wound site. The multi-lumen cannula includes (1) a...
7364603 Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream  
An apparatus and process for abating at least one acid or hydride gas component or by-product thereof, from an effluent stream deriving from a semiconductor manufacturing process, comprising, a...
7364349 Chemical dilution system for semiconductor device processing system  
A dilution stage is adapted to supply a dilute chemistry to a semiconductor device processing apparatus. The dilution stage includes a first vessel adapted to store the chemistry after dilution...
7360981 Datum plate for use in installations of substrate handling systems  
A datum plate is provided for use in installations of substrate handling systems. The datum plate has a set of predetermined attachment locations adapted to couple the datum plate to a chamber; a...
7359767 Substrate carrier handler that unloads substrate carriers directly from a moving conveyor  
In a first aspect, a substrate loading station is served by a conveyor which continuously transports substrate carriers. A substrate carrier handler that is part of the substrate loading station...
7358823 Programmable capacitors and methods of using the same  
In a first aspect, a first method of adjusting capacitance of a semiconductor device is provided. The first method includes the steps of (1) providing a transistor including a dielectric material...
7346713 Methods and apparatus for servicing commands through a memory controller port  
In a first aspect, a first method is provided for servicing commands. The first method includes the steps of (1) receiving a first command for servicing in a memory controller including a...
7346431 Substrate carrier handler that unloads substrate carriers directly from a moving conveyer  
In a first aspect, a substrate loading station is served by a conveyor which continuously transports substrate carriers. A substrate carrier handler that is part of the substrate loading station...
7330479 Shared transmit buffer for network processor and methods for using same  
In a first aspect, a first method is provided for controlling the flow of data between a first and second clock domain. The first method includes the steps of (1) selecting one of a plurality of...
7328887 Self-indexing spacer for air spring assembly  
An air spring spacer for use in mounting an associated air spring in spaced relation to an associated vehicle component. The air spring spacer includes a spacer body, a first indexing feature, and...
7325794 Air spring assembly and method  
An air spring assembly including a first end member that includes a side wall, and a second end member spaced from the first end member. A flexible sleeve includes a sleeve wall and opposing open...


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