|
Match
|
Document |
Document Title |
|
|
7378354 |
Atomic layer deposition methods
The invention includes an atomic layer deposition method of forming a layer of a deposited composition on a substrate. The method includes positioning a semiconductor substrate within an atomic...
|
|
|
7368382 |
Atomic layer deposition methods
The invention includes an atomic layer deposition method of forming a layer of a deposited composition on a substrate. The method includes positioning a semiconductor substrate within an atomic...
|
|
|
7303991 |
Atomic layer deposition methods
The invention includes an atomic layer deposition method of forming a layer of a deposited composition on a substrate. The method includes positioning a semiconductor substrate within an atomic...
|
|
|
7271077 |
Deposition methods with time spaced and time abutting precursor pulses
An atomic layer deposition method includes positioning a semiconductor substrate within an atomic layer deposition chamber. A first precursor gas is flowed to the substrate within the atomic layer...
|
|
|
7150789 |
Atomic layer deposition methods
An atomic layer deposition method includes positioning a semiconductor substrate within an atomic layer deposition chamber. A first precursor gas is flowed to the substrate within the atomic layer...
|
|
|
7128787 |
Atomic layer deposition method
An atomic layer deposition method includes positioning a semiconductor substrate within an atomic layer deposition chamber. A first precursor gas is flowed to the substrate within the atomic layer...
|
|
|
7118779 |
Reactor surface passivation through chemical deactivation
Protective layers are formed on a surface of an atomic layer deposition (ALD) or chemical vapor deposition (CVD) reactor. Parts defining a reaction space for an ALD or CVD reactor can be treated,...
|
|
|
7087515 |
Method for forming flowable dielectric layer in semiconductor device
A method for forming a flowable dielectric layer using a barrier layer on sidewalls of patterned flowable dielectrics, thereby preventing a bridge phenomenon between adjacent contact plugs. The...
|
|
|
7071118 |
Method and apparatus for fabricating a conformal thin film on a substrate
A method and apparatus for fabricating a conformal thin film on a substrate are disclosed. The method includes introducing a gas from a gas inlet into an expansion volume associated with an atomic...
|
|
|
7037574 |
Atomic layer deposition for fabricating thin films
An atomic layer deposition (ALD) process deposits thin films for microelectronic structures, such as advanced gap and tunnel junction applications, by plasma annealing at varying film thicknesses...
|
|
|
6972254 |
Manufacturing a conformal atomic liner layer in an integrated circuit interconnect
A manufacturing method for an integrated circuit has a substrate with a semiconductor device thereon. A channel dielectric layer is deposited over the device and has an opening provided therein. A...
|
|
|
6890596 |
Deposition methods
A deposition method includes positioning a substrate within a deposition chamber defined at least in part by chamber walls. At least one of the chamber walls comprises a chamber surface having a...
|
|
|
6852635 |
Method for bottomless deposition of barrier layers in integrated circuit metallization schemes
Methods are disclosed for selective deposition on desired materials. In particular, barrier materials are selectively formed on insulating surfaces, as compared to conductive surfaces. In the...
|
|
|
6753271 |
Atomic layer deposition methods
The invention includes an atomic layer deposition method of forming a layer of a deposited composition on a substrate. The method includes positioning a semiconductor substrate within an atomic...
|