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7370306 |
Method and apparatus for designing a pattern on a semiconductor surface
A method of forming a pattern of elements is shown. In one embodiment, the method is used to create a reticle. In another embodiment, the method is used to further form a number of elements on a...
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7290242 |
Pattern generation on a semiconductor surface
A method of forming a pattern of elements is shown. In one embodiment, the method is used to create a reticle. In another embodiment, the method is used to further form a number of elements on a...
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7183022 |
Method for producing a mask set for lithography including at least one mask and methods for imaging structures of a predetermined layout into a common exposure plane
A method for producing a mask set for lithography including at least one mask, has a predetermined layout of structures which are provided for imaging into a common exposure plane and which are...
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7124396 |
Alternating phase-shift mask rule compliant IC design
A system, method and program product that implement a design object that automatically provides compliance to alternating phase shifted mask (altPSM) rules are disclosed. The invention implements a...
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7096452 |
Method and device for checking lithography data
Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of...
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7032201 |
Method and apparatus for decomposing a region of an integrated circuit layout
Some embodiments of the invention provide a method of decomposing a region of an intergrated circuit (“IC”) layout. The region contains several routable elements. Based on the routable...
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7020863 |
Method and apparatus for decomposing a region of an integrated circuit layout
Some embodiments of the invention provide a method of decomposing a region of an intergrated circuit (“IC”) layout. The method defines several nodes in the region. The method then specifies a...
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6981241 |
Method for eliminating phase conflict centers in alternating phase masks, and method for producing alternating phase masks
In order to eliminate phase conflicts in alternating phase masks, the layout is modified after the phase conflicts have been localized. During the modification, degenerate critical structures,...
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6957414 |
Method for determining the ability to project images of integrated semiconductor circuits onto alternating phase masks
A method is used to check the direct convertibility of integrated semiconductor circuits into alternating phase masks. This is done by explicitly localizing the phase conflicts occurring in the...
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6928635 |
Selectively applying resolution enhancement techniques to improve performance and manufacturing cost of integrated circuits
One embodiment of the present invention provides a system that applies resolution enhancement techniques (RETs) selectively to a layout of an integrated circuit. Upon receiving the layout of the...
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6818358 |
Method of extending the areas of clear field phase shift generation
An exemplary Full Phase patterning method involves patterning gates to increase process margins from conventional methods. This technique can define all poly patterns with a phase mask, using only...
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6815340 |
Method of forming an electroless nucleation layer on a via bottom
A method of fabricating an integrated circuit can include performing a reactive ion etch (RIE) to form a via aperture in a dielectric layer where the via aperture exposes a portion of a conductive...
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6797438 |
Method and enhancing clear field phase shift masks with border around edges of phase regions
A technique in which a first boundary region is added to the ends of phase zero (0) pattern defining polygons and a second boundary region is added to the ends of phase 180 pattern. This technique...
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6730463 |
Method for determining and removing phase conflicts on alternating phase masks
A photoresist layer on a substrate wafer is exposed in first sections with a first exposure radiation and in second sections with a second exposure radiation that is phase-shifted by 180°. The...
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6704921 |
Automated flow in PSM phase assignment
An automated phase assignment method is described that allows multiple rules for defining phase shifters to be used within a single cell. The rules for defining phase shifters can be sequenced....
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