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7378354 |
Atomic layer deposition methods
The invention includes an atomic layer deposition method of forming a layer of a deposited composition on a substrate. The method includes positioning a semiconductor substrate within an atomic...
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7371992 |
Method for non-contact cleaning of a surface
A flame torch can be used to clean the surface of a contact-sensitive object, such as a glass optic, extremely thin workpiece, or semiconductor wafer by providing a reactive precursor gas to the...
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7368382 |
Atomic layer deposition methods
The invention includes an atomic layer deposition method of forming a layer of a deposited composition on a substrate. The method includes positioning a semiconductor substrate within an atomic...
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7329608 |
Method of processing a substrate
The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the...
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7303991 |
Atomic layer deposition methods
The invention includes an atomic layer deposition method of forming a layer of a deposited composition on a substrate. The method includes positioning a semiconductor substrate within an atomic...
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7271077 |
Deposition methods with time spaced and time abutting precursor pulses
An atomic layer deposition method includes positioning a semiconductor substrate within an atomic layer deposition chamber. A first precursor gas is flowed to the substrate within the atomic layer...
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7150789 |
Atomic layer deposition methods
An atomic layer deposition method includes positioning a semiconductor substrate within an atomic layer deposition chamber. A first precursor gas is flowed to the substrate within the atomic layer...
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7128787 |
Atomic layer deposition method
An atomic layer deposition method includes positioning a semiconductor substrate within an atomic layer deposition chamber. A first precursor gas is flowed to the substrate within the atomic layer...
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7090723 |
Highly anisotropic ceramic thermal barrier coating materials and related composites
High temperature composites and thermal barrier coatings, and related methods, using anisotropic ceramic materials, such materials as can be modified to reduce substrate thermal mismatch.
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7030045 |
Method of fabricating oxides with low defect densities
A method and system for forming a low defect oxide in a plasma processing chamber. By pulsing at least one of an RF power source and a processing gas, the growth of the oxide can be regulated....
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6916678 |
Surface modification method
A method for modifying a surface of a substrate to be processed, by utilizing plasma includes the steps of adjusting a temperature of the substrate from 200° C. to 400° C., introducing gas...
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6904661 |
Method of fabricating surface coated spherical slip joint for forming a sealed interface
A surface coating for forming a sealed interface is formed on a substrate, without requiring subsequent finishing operations. The sealed confronting surfaces employ the same coating and can...
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6890596 |
Deposition methods
A deposition method includes positioning a substrate within a deposition chamber defined at least in part by chamber walls. At least one of the chamber walls comprises a chamber surface having a...
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6835045 |
Rotor blade protector
A protector for protecting aircraft, particularly helicopter rotor blades, from absorbing the sun's infrared rays and the accompanying heat build-up in order to keep adhesive material between spar...
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6703610 |
Skimmer for mass spectrometry
The present invention relates to a method and apparatus for a mass spectrometer. The skimmer of the present invention has a surface to reduce the overall interaction and deposition of unwanted...
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6680126 |
Highly anisotropic ceramic thermal barrier coating materials and related composites
High temperature composites and thermal barrier coatings, and related methods, using anisotropic ceramic materials, such materials as can be modified to reduce substrate thermal mismatch.
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