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7433237 |
Memory utilizing oxide nanolaminates
One transistor embodiment includes a first source/drain region, a second source/drain region, and a channel region therebetween. A gate is separated from the channel region by a gate insulator. The...
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7369435 |
Write once read only memory employing floating gates
Structures and methods for write once read only memory employing floating gates are provided. The write once read only memory cell includes a floating gate transistor formed in a modified dynamic...
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7348237 |
NOR flash memory cell with high storage density
Structures and methods for NOR flash memory cells, arrays and systems are provided. The NOR flash memory cell includes a vertical floating gate transistor extending outwardly from a substrate. The...
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7257022 |
Nanocrystal write once read only memory for archival storage
Structures and methods for write once read only memory employing charge trapping are provided. The write once read only memory cell includes a metal oxide semiconductor field effect transistor...
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7221586 |
Memory utilizing oxide nanolaminates
Structures, systems and methods for transistors utilizing oxide nanolaminates are provided. One transistor embodiment includes a first source/drain region, a second source/drain region, and a...
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7221017 |
Memory utilizing oxide-conductor nanolaminates
Structures, systems and methods for floating gate transistors utilizing oxide-conductor nanolaminates are provided. One floating gate transistor embodiment includes a first source/drain region, a...
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7193893 |
Write once read only memory employing floating gates
Structures and methods for write once read only memory employing floating gates are provided. The write once read only memory cell includes a floating gate transistor formed in a modified dynamic...
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7166509 |
Write once read only memory with large work function floating gates
Structures and methods for write once read only memory employing floating gates are provided. The write once read only memory cell includes a floating gate transistor formed in a modified dynamic...
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7154778 |
Nanocrystal write once read only memory for archival storage
Structures and methods for write once read only memory employing charge trapping are provided. The write once read only memory cell includes a metal oxide semiconductor field effect transistor...
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7133315 |
Write once read only memory employing charge trapping in insulators
Structures and methods for write once read only memory employing charge trapping in insulators are provided. The write once read only memory cell includes a metal oxide semiconductor field effect...
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7130220 |
Write once read only memory employing floating gates
Structures and methods for write once read only memory employing floating gates are provided. The write once read only memory cell includes a floating gate transistor formed in a modified dynamic...
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7113429 |
Nor flash memory cell with high storage density
Structures and methods for NOR flash memory cells, arrays and systems are provided. The NOR flash memory cell includes a vertical floating gate transistor extending outwardly from a substrate. The...
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7112494 |
Write once read only memory employing charge trapping in insulators
Structures and methods for write once read only memory employing charge trapping in insulators are provided. The write once read only memory cell includes a metal oxide semiconductor field effect...
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7110299 |
Transistor with nanocrystalline silicon gate structure
A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors...
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6996009 |
NOR flash memory cell with high storage density
Structures and methods for NOR flash memory cells, arrays and systems are provided. The NOR flash memory cell includes a vertical floating gate transistor extending outwardly from a substrate. The...
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6912158 |
Transistor with nanocrystalline silicon gate structure
A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors...
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6888739 |
Nanocrystal write once read only memory for archival storage
Structures and methods for write once read only memory employing charge trapping are provided. The write once read only memory cell includes a metal oxide semiconductor field effect transistor...
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6804136 |
Write once read only memory employing charge trapping in insulators
Structures and methods for write once read only memory employing charge trapping in insulators are provided. The write once read only memory cell includes a metal oxide semiconductor field effect...
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6661720 |
Leakage detection in programming algorithm for a flash memory device
Leakage detection in a programming algorithm for a flash memory device. According to one embodiment of the present invention a method includes programming a first flash cell in an array of flash...
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6650585 |
Leakage detection in programming algorithm for a flash memory device
Leakage detection in a programming algorithm for a flash memory device. According to one embodiment of the present invention a method includes programming a first flash cell in an array of flash...
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EP0842514B1 |
FLASH MEMORY SYSTEM HAVING REDUCED DISTURB AND METHOD
Abstract not available for EP0842514 Abstract of corresponding document: US5617350 A flash memory system having a reduced tendency to have its erased cells disturbed during read operations. An...
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6584019 |
Leakage detection in flash memory cell
Leakage detection for cells in a flash memory device. According to one embodiment of the present invention a method includes reading a flash cell in a read cycle in a flash memory device to...
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6574144 |
Flash memory with nanocrystalline silicon film coating gate
A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors...
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6545314 |
Memory using insulator traps
A memory cell provides point defect trap sites in an insulator for storing data charges. Single electrons are stored on respective point defect trap sites and a resulting parameter, such as...
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6493270 |
Leakage detection in programming algorithm for a flash memory device
Leakage detection in a programming algorithm for a flash memory device. According to one embodiment of the present invention a method includes programming a first flash cell in an array of flash...
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6407424 |
Flash memory with nanocrystalline silicon film floating gate
A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors...
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6351411 |
Memory using insulator traps
A memory cell provides point defect trap sites in an insulator for storing data charges. Single electrons are stored on respective point defect trap sites and a resulting parameter, such as...
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6300193 |
Flash memory with nanocrystalline silicon film floating gate
A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors...
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6282122 |
Evaluation of memory cell characteristics
Techniques are used to evaluate margin of programmable memory cells. In particular, techniques are used to measure negative erased threshold voltage levels. Techniques are used to increase the...
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6246606 |
Memory using insulator traps
A memory cell provides point defect trap sites in an insulator for storing data charges. Single electrons are stored on respective point defect trap sites and a resulting parameter, such as...
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6232643 |
Memory using insulator traps
A memory cell provides point defect trap sites in an insulator for storing data charges. Single electrons are stored on respective point defect trap sites and a resulting parameter, such as...
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6166401 |
Flash memory with microcrystalline silicon carbide film floating gate
A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors...
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6141256 |
Differential flash memory cell and method for programming same
A flash memory cell. The flash memory cell includes first and second transistors. The first transistor has a control gate coupled to a word line, a drain coupled to a data line and a floating gate....
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6140181 |
Memory using insulator traps
A memory cell provides point defect trap sites in an insulator for storing data charges. Single electrons are stored on respective point defect trap sites and a resulting parameter, such as...
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6108241 |
Leakage detection in flash memory cell
Leakage detection for cells in a flash memory device. According to one embodiment of the present invention a method includes reading a flash cell in a read cycle in a flash memory device to...
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6031763 |
Evaluation of memory cell characteristics
Techniques are used to evaluate margin of programmable memory cells. In particular, techniques are used to measure negative erased threshold voltage levels. Techniques are used to increase the...
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6009018 |
Differential flash memory cell and method for programming same
A flash memory cell. The flash memory cell includes first and second transistors. The first transistor has a control gate coupled to a word line, a drain coupled to a data line and a floating gate....
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5989958 |
Flash memory with microcrystalline silicon carbide film floating gate
A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors...
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5959896 |
Multi-state flash memory cell and method for programming single electron differences
A flash memory cell. The cell includes a transistor with a floating gate that is formed from a number of crystals of semiconductor material. The crystals are disposed in the gate oxide of the...
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5959891 |
Evaluation of memory cell characteristics
Techniques are used to evaluate margin of programmable memory cells. In particular, techniques are used to measure negative erased threshold voltage levels. Techniques are used to increase the...
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5852306 |
Flash memory with nanocrystalline silicon film floating gate
A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors...
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5801401 |
Flash memory with microcrystalline silicon carbide film floating gate
A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors...
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5754477 |
Differential flash memory cell and method for programming
A flash memory cell. The flash memory cell includes first and second transistors. The first transistor has a control gate coupled to a word line, a drain coupled to a data line and a floating gate....
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5740104 |
Multi-state flash memory cell and method for programming single electron differences
A flash memory cell. The cell includes a transistor with a floating gate that is formed from a number of crystals of semiconductor material. The crystals are disposed in the gate oxide of the...
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5617350 |
Flash memory system having reduced disturb and method
A flash memory system having a reduced tendency to have its erased cells disturbed during read operations. An array of flash memory cells are arranged into a multiplicity of rows and columns, with...
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