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Document Title |
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7402516 |
Method for making integrated circuits
Integrated circuits, the key components in thousands of electronic and computer products, include interconnected networks of electrical components. The components are typically wired, or...
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EP0989914B1 |
MULTILAYER METALIZED COMPOSITE ON POLYMER FILM PRODUCT AND PROCESS
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7394157 |
Integrated circuit and seed layers
Structures are provided which improve performance in integrated circuits. The structures include a diffusion barrier and a seed layer in an integrated circuit both formed using a low energy ion...
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7378737 |
Structures and methods to enhance copper metallization
Disclosed structures and methods inhibit atomic migration and related capacitive-resistive effects between a metallization layer and an insulator layer in a semiconductor structure. One exemplary...
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7368378 |
Methods for making integrated-circuit wiring from copper, silver, gold, and other metals
Integrated circuits, the key components in thousands of electronic and computer products, include interconnected networks of electrical components. The components are typically wired, or...
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7301190 |
Structures and methods to enhance copper metallization
Disclosed structures and methods inhibit atomic migration and related capacitive-resistive effects between a metallization layer and an insulator layer in a semiconductor structure. One exemplary...
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7285196 |
Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals
In recent years, copper wiring has emerged as a promising substitute for the aluminum wiring in integrated circuits, because copper offers lower electrical resistance and better reliability at...
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7262505 |
Selective electroless-plated copper metallization
Structures and methods are provided which include a selective electroless copper metallization. The present invention includes a novel methodology for forming copper vias on a substrate, including...
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7262130 |
Methods for making integrated-circuit wiring from copper, silver, gold, and other metals
Integrated circuits, the key components in thousands of electronic and computer products, include interconnected networks of electrical components. The components are typically wired, or...
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7253521 |
Methods for making integrated-circuit wiring from copper, silver, gold, and other metals
Integrated circuits include networks of electrical components that are typically wired, or interconnected, together with aluminum wires. In recent years, researchers have begun using copper in...
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7220665 |
H2 plasma treatment
Electronic devices are constructed by a method that includes forming a first conductive layer in an opening in a multilayer dielectric structure supported by a substrate, forming a core conductive...
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7211512 |
Selective electroless-plated copper metallization
Structures and methods are provided which include a selective electroless copper metallization. The present invention includes a novel methodology for forming copper vias on a substrate. This...
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7105914 |
Integrated circuit and seed layers
Structures are provided which improve performance in integrated circuits. The structures include a diffusion barrier and a seed layer in an integrated circuit both formed using a low energy ion...
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7091611 |
Multilevel copper interconnects with low-k dielectrics and air gaps
Structures and methods are provided for an improved multilevel wiring interconnect in an integrated circuit assembly. The present invention provides for a multilayer copper wiring structure by...
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7067421 |
Multilevel copper interconnect with double passivation
Structures and methods provide multilevel wiring interconnects in an integrated circuit assembly which alleviate problems associated with integrated circuit size and performance and include methods...
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6995470 |
Multilevel copper interconnects with low-k dielectrics and air gaps
Structures and methods are provided for an improved multilevel wiring interconnect in an integrated circuit assembly. The present invention provides for a multilayer copper wiring structure by...
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6849927 |
Forming submicron integrated-circuit wiring from gold, silver, copper, and other metals
A typical integrated circuit interconnects millions of microscopic transistors and resistors with aluminum wires buried in silicon-dioxide insulation. Yet, aluminum wires and silicon-dioxide...
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6756298 |
Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals
In recent years, copper wiring has emerged as a promising substitute for the aluminum wiring in integrated circuits, because copper offers lower electrical resistance and better reliability at...
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6743716 |
Structures and methods to enhance copper metallization
Disclosed structures and methods inhibit atomic migration and related capacitive-resistive effects between a metallization layer and an insulator layer in a semiconductor structure. One exemplary...
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6614099 |
Copper metallurgy in integrated circuits
A typical integrated circuit interconnects millions of microscopic transistors and resistors with aluminum wires buried in silicon-dioxide insulation. Yet, aluminum wires and silicon-dioxide...
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6559593 |
Sputter deposition
A method of sputter deposition onto an organic material, wherein the discharge gas of the sputtering operation is a gas having a spectrum of light emission of a lower energy than that of argon.
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6432822 |
Method of improving electromigration resistance of capped Cu
The electromigration resistance of capped Cu or Cu alloy interconnects is significantly improved by treating the exposed planarized surface of the Cu or Cu alloy with a plasma containing NH 3 and...
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6429128 |
Method of forming nitride capped Cu lines with reduced electromigration along the Cu/nitride interface
The electromigration resistance of nitride capped Cu lines is significantly improved by controlling the nitride deposition conditions to reduce the compressive stress of the deposited nitride...
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6429120 |
Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals
Integrated circuits, the key components in thousands of electronic and computer products, include interconnected networks of electrical components. The components are typically wired, or...
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6420262 |
Structures and methods to enhance copper metallization
Structures and methods are described that inhibit atomic migration which otherwise creates an undesired capacitive-resistive effect arising from a relationship between a metallization layer and an...
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6372284 |
Fluoropolymer coating of lithium niobate integrated optical devices
An integrated optical device is made starting with a substrate of lithium niobate. A fluoropolymer solution is applied to coat at least part of the substrate. The substrate having fluoropolymer...
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6153523 |
Method of forming high density capping layers for copper interconnects with improved adhesion
The adhesion of a barrier or capping layer to a Cu or Cu alloy interconnect member is significantly enhanced by treating the exposed surface of the Cu or Cu alloy interconnect member, after CMP,...
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6042929 |
Multilayer metalized composite on polymer film product and process
A composite substrate material useful for fabricating printed circuits is provided comprising a polymeric film having at least one surface modified by plasma etching, a first thin metal nitride...
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