Title:
Electrode cover for a plasma processing apparatus
United States Patent D827592


Inventors:
Ichino, Takamasa (Tokyo, JP)
Sato, Kohei (Tokyo, JP)
Nakamoto, Kazunori (Tokyo, JP)
Application Number:
29/610995
Publication Date:
09/04/2018
Filing Date:
07/18/2017
Assignee:
Hitachi High-Technologies Corporation (Minato-ku, Tokyo, JP)
Primary Class:
International Classes:
(IPC1-7): 1303
Field of Search:
D13/158-177, D13/182, D13/18, 204/286.1, 204/297.1, 205/118, 205/123, 200/1R, 200/5R, 200/52R, 200/315, 200/310, 200/6A, 200/302.1, 200/308, 200/314, 200/317, 200/11R, 200/16B
View Patent Images:
US Patent References:
D813181Cover of seal cap for reaction chamber of semiconductorMarch, 2018OkajimaD13/182
D810705Self-centering wafer carrier for chemical vapor depositionFebruary, 2018KrishnanD13/182
D804556Heat reflector for substrate processing apparatusDecember, 2017HaradaD15/144.1
D803917Heat reflector for substrate processing apparatusNovember, 2017HaradaD15/144.1
D797691Composite edge ringSeptember, 2017JoubertD13/182
D789888Electrode plate for semiconductor manufacturing apparatusJune, 2017JangD13/121
D783922Wafer support ringApril, 2017KirklandD34/29
D770992Electrode cover for a plasma processing apparatusNovember, 2016Tauchi et al.
20160002788CHEMICAL VAPOUR DEPOSITION DEVICEJanuary, 2016Nal118/724
D729730Power charging ringMay, 2015Gillespie-BrownD13/110
20150024330APPARATUS AND METHOD FOR CONTROLLING HEATING OF BASE WITHIN CHEMICAL VAPOUR DEPOSITION CHAMBERJanuary, 2015Tian432/9
D717746Lower chamber linerNovember, 2014LauD13/182
D709536Focusing ringJuly, 2014YoshimuraD15/138
D709537Focusing ringJuly, 2014KuwabaraD15/138
D709538Focusing ringJuly, 2014MizukamiD15/138
D709539Focusing ringJuly, 2014KuwabaraD15/138
D699199Electrode plate for a plasma processing apparatusFebruary, 2014KuwabaraD13/182
D699200Electrode member for a plasma processing apparatusFebruary, 2014NagakuboD13/182
20120263569SUBSTRATE HOLDERS AND METHODS OF SUBSTRATE MOUNTINGOctober, 2012Priddy414/800
20090050272DEPOSITION RING AND COVER RING TO EXTEND PROCESS COMPONENTS LIFE AND PERFORMANCE FOR PROCESS CHAMBERSFebruary, 2009Rosenberg156/345.51
D559993Cover ringJanuary, 2008NagakuboD24/232
D559994Cover ringJanuary, 2008Nagakubo et al.
D557226Electrode cover for a plasma processing apparatusDecember, 2007Uchino et al.
D557425Cover ring for a plasma processing apparatusDecember, 2007Nakamura et al.
D494551Exhaust ring for manufacturing semiconductorsAugust, 2004Doba
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Foreign References:
JPD1210213June, 2004
JPD1361441June, 2009
JPD1551512June, 2016
Other References:
Ichino et al., Design U.S. Appl. No. 29/610,996, filed Jul. 18, 2017.
Ichino et al., Design U.S. Appl. No. 29/610,998, filed Jul. 18, 2017.
Ichino et al., Design U.S. Appl. No. 29/610,999, filed Jul. 18, 2017.
Nunomura et al., Design U.S. Appl. No. 29/611,001, filed Jul. 18, 2017.
Primary Examiner:
Oswecki, Elizabeth J.
Attorney, Agent or Firm:
Crowell & Moring, LLP
Claims:
CLAIM

1. The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.

Description:

This application contains subject matter related to the following co-pending U.S. design patent applications:

Application Ser. No. 29/610,996, filed herewith and entitled “Electrode Cover for a Plasma Processing Apparatus”;

Application Ser. No. 29/610,998, filed herewith and entitled “Ring for a Plasma Processing Apparatus”;

Application Ser. No. 29/610,999, filed herewith and entitled “Cover Ring for a Plasma Processing Apparatus”; and

Application Ser. No. 29/611,001, filed herewith and entitled “Discharge Chamber for a Plasma Processing Apparatus”.

FIG. 1 is a front, top and right side perspective view of an electrode cover for a plasma processing apparatus, showing our new design;

FIG. 2 is a front, bottom and right side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 3; and,

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 9.

The box labeled FIG. 10 in FIG. 9 is shown in broken lines and forms no part of the claimed design.