Title:
Ceiling heater for substrate processing apparatus
United States Patent D826185


Inventors:
Kosugi, Tetsuya (Toyama, JP)
Yamaguchi, Takatomo (Toyama, JP)
Saido, Shuhei (Toyama, JP)
Application Number:
29/596974
Publication Date:
08/21/2018
Filing Date:
03/13/2017
Assignee:
Hitachi Kokusai Electric Inc. (Tokyo, JP)
Primary Class:
International Classes:
(IPC1-7): 1303
Field of Search:
D13/123-132, D13/154, D13/184, D13/199, D15/138, D15/140, D15/144.1
View Patent Images:
US Patent References:
D797690Heater for semiconductor manufacturing apparatusSeptember, 2017FurutaniD13/182
D798250HeaterSeptember, 2017FurutaniD13/182
9719629Supporting system for a heating element and heating systemAugust, 2017Boguslavskiy
20140021673PEDESTAL WITH MULTI-ZONE TEMPERATURE CONTROL AND MULTIPLE PURGE CAPABILITIESJanuary, 2014Chen269/289R
D649126Vacuum contact padNovember, 2011TakahashiD13/182
D601521Heater for manufacturing semiconductorOctober, 2009KomatsuD13/182
20070095289Heat treatment apparatusMay, 2007Arami118/725
20060130763Restricted radiated heating assembly for high temperature processingJune, 2006Emerson118/725
20050072716Processing systemApril, 2005Quiles206/710
20040149719Wafer heating apparatusAugust, 2004Nakamura219/444.1
6653603HeatersNovember, 2003Yamaguchi118/724
20030183614Heat treatment apparatus and method for processing substratesOctober, 2003Yamaguchi219/390
D176456N/ADecember, 1955GlynnD23/417



Foreign References:
JP2013004891January, 2013HEATER UNIT, FAN FILTER UNIT, AND SUBSTRATE PROCESSING APPARATUS
Other References:
EC21 Inc. Visited Feb. 28, 2018. Duplex Winding Infrared Coil/ Ceramic Cooker/ Heating Plate/Radiant Element/Hob.
Modello designs. Visited Feb. 28, 2018. Medallion Stencils.
Primary Examiner:
Johannes, Thomas
Assistant Examiner:
Mcvey, Lauren
Attorney, Agent or Firm:
Fitch, Even, Tabin & Flannery, LLP
Claims:
CLAIM

1. We claim the ornamental design for a ceiling heater for substrate processing apparatus, as shown and described.

Description:

FIG. 1 is a front, bottom and right side perspective view of a ceiling heater for substrate processing apparartus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof; and,

FIG. 7 is a rear elevational view thereof.