Title:
Target profile for a physical vapor deposition chamber target
United States Patent D825504


Inventors:
Zhang, Fuhong (San Jose, CA, US)
Johanson, William (Gilroy, CA, US)
Liu, Yu (Campbell, CA, US)
Allen, Adolph Miller (Oakland, CA, US)
Datta, Brij (Cupertino, CA, US)
Miller, Keith A. (Mountain View, CA, US)
Application Number:
29/610166
Publication Date:
08/14/2018
Filing Date:
07/10/2017
Assignee:
APPLIED MATERIALS, INC. (Santa Clara, CA, US)
Primary Class:
International Classes:
(IPC1-7): 1303
Field of Search:
D13/182, D15/144.1, D15/144.2, D15/199
View Patent Images:
US Patent References:
D810705Self-centering wafer carrier for chemical vapor depositionFebruary, 2018Krishnan et al.
D801942Target profile for a physical vapor deposition chamber targetNovember, 2017Riker et al.
D797067Target profile for a physical vapor deposition chamber targetSeptember, 2017ZhangD13/182
D797691Composite edge ringSeptember, 2017Joubert
D798248Target profile for a physical vapor deposition chamber targetSeptember, 2017Hanson et al.
D793572Electrode plate for plasma processing apparatusAugust, 2017KozukaD24/224
D795208Electrostatic chuck for semiconductor manufacturing equipmentAugust, 2017Sasaki et al.
D790041Gas dispersing plate for semiconductor manufacturing apparatusJune, 2017JangD23/259
D770992Electrode cover for a plasma processing apparatusNovember, 2016Tauchi
D769200Elastic membrane for semiconductor wafer polishing apparatusOctober, 2016Fukushima
D767234Wafer support ringSeptember, 2016Kirkland et al.
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Foreign References:
JPD1420846August, 2011
JPD1421157August, 2011
JPD1422692September, 2014
TWD146490April, 2012
Other References:
Search Report for Taiwan Design Application No. 106301373 dated Jun. 20, 2017.
Primary Examiner:
Oswecki, Elizabeth J.
Attorney, Agent or Firm:
Moser Taboada
Taboada, Alan
Claims:
CLAIM

1. The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

Description:

FIG. 1 is a perspective view of a target profile for a physical vapor deposition chamber target, showing my new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a left side elevation view thereof;

FIG. 5 is a right side elevation view thereof;

FIG. 6 is a back elevation view thereof;

FIG. 7 is a front elevation view thereof; and,

FIG. 8 is a cross sectional view taken along line 8-8 of FIG. 2.

The dashed lines in FIGS. 1-8 represent disclaimed matter that forms no part of the claimed design.