Heater for substrate processing apparatus
United States Patent D825502

Kosugi, Tetsuya (Toyama, JP)
Yamaguchi, Takatomo (Toyama, JP)
Saido, Shuhei (Toyama, JP)
Application Number:
Publication Date:
Filing Date:
Hitachi Kokusai Electric Inc. (Tokyo, JP)
Primary Class:
International Classes:
(IPC1-7): 1303
Field of Search:
D13/123-132, D13/154, D13/184, D13/199, D15/138, D15/140, D15/144.1
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Primary Examiner:
Johannes, Thomas
Assistant Examiner:
Mcvey, Lauren
Attorney, Agent or Firm:
Fitch, Even, Tabin & Flannery, LLP

1. We claim the ornamental design for a heater for substrate processing apparatus, as shown and described.


FIG. 1 is a front, bottom and right side perspective view of a heater for substrate processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof:

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross-sectional view thereof taken in the direction of line 8-8 in FIG. 6.

The dot-dash broken lines and evenly spaced broken lines immediately adjacent to the shaded areas represent the bounds of the claimed design, while all other evenly spaced broken lines are directed to environment; the broken lines form no part of the claimed design. In addition, the dot-dot-dash broken line arrows in the FIG. 6 view is used to identify the cross-section views, are for reference purposes only, and form no part of the claimed design.