Air flow controller for heater of substrate processing apparatus
United States Patent D825501

Yamaguchi, Takatomo (Toyama, JP)
Kosugi, Tetsuya (Toyama, JP)
Saido, Shuhei (Toyama, JP)
Application Number:
Publication Date:
Filing Date:
Hitachi Kokusai Electric Inc. (Tokyo, JP)
Primary Class:
International Classes:
(IPC1-7): 1303
Field of Search:
D13/123-132, D13/154, D13/184, D13/199, D15/138, D15/140, D15/144.1
View Patent Images:
US Patent References:
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D739353Module-mounting base for an industrial control systemSeptember, 2015MielnikD13/123
D706232Semiconductor deviceJune, 2014NakamuraD13/182
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D605120Power controller cover with terminal blockDecember, 2009PapeD13/123
20080006617THERMAL WAFER PROCESSORJanuary, 2008Harris219/390
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Primary Examiner:
Johannes, Thomas
Assistant Examiner:
Mcvey, Lauren
Attorney, Agent or Firm:
Fitch, Even, Tabin & Flannery, LLP

1. We claim the ornamental design for an air flow controller for heater of substrate processing apparatus, as shown and described.


FIG. 1 is a front, bottom and right side perspective view of an air flow ontroller for heater of substrate processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross-sectional view taken in the direction of line 8-8 in FIG. 2.

The broken lines immediately adjacent to the shaded areas represent the bounds of the claimed design while all other broken lines are directed to environment; the broken lines form no part of the claimed design.