Title:
Target profile for a physical vapor deposition chamber target
Document Type and Number:
United States Patent D801942

Inventors:
Riker, Martin Lee (Milpitas, CA, US)
Zhang, Fuhong (Cupertino, CA, US)
Liu, Yu (Campbell, CA, US)
Application Number:
29/524109
Publication Date:
11/07/2017
Filing Date:
04/16/2015
View Patent Images:
Assignee:
APPLIED MATERIALS, INC. (Santa Clara, CA, US)
Primary Class:
International Classes:
(IPC1-7): 1303
Field of Search:
D13/182, D15/144.1, D15/144.2, D15/199
Other References:
U.S. Appl. No. 29/524,557, filed Apr. 21, 2015, Zhang et al.
U.S. Appl. No. 29/530,683, filed Jun. 18, 2015, Hanson et al.
Primary Examiner:
Oswecki, Elizabeth J.
Attorney, Agent or Firm:
Moser Taboada
Taboada, Alan
Claims:
CLAIM

1. The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

Description:

FIG. 1 is a perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a right side elevation view thereof;

FIG. 5 is a left side elevation view thereof;

FIG. 6 is a front elevation view thereof;

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 2.

The broken lines in FIGS. 1-8 represent unclaimed environment and form no part of the claimed design.