Showerhead for a semiconductor processing chamber
United States Patent D794753

Miller, Aaron (Sunnyvale, CA, US)
Application Number:
Publication Date:
Filing Date:
Applied Materials, Inc. (Santa Clara, CA, US)
Primary Class:
International Classes:
(IPC1-7): 2301
Field of Search:
D23/213, D23/223, D23/226, D23/229, D23/230
View Patent Images:
US Patent References:
9484190Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large areaNovember, 2016Glukhoy
9464353Substrate processing apparatusOctober, 2016Park
9353439Cascade design showerhead for transient uniformityMay, 2016Kashyap
9343307Laser spike annealing using fiber lasersMay, 2016Anikitchev
D757893Jet nozzle insertMay, 2016WalkerD23/213
D751176Overhead showerMarch, 2016SchoenherrD23/213
D752708ShowerheadMarch, 2016ChungD23/213
D736348Spray head for a showerAugust, 2015TanD23/213
D733257Overhead showerJune, 2015SchoenherrD23/213
D707328ShowerheadJune, 2014SchoenherrD23/213
D694359Overhead showerNovember, 2013SchoenherrD23/213
D641829Plasma reactor showerhead face plate having concentric ridge patternJuly, 2011AngelovD23/213
D639385Shower headJune, 2011FlowersD23/213
7658800Gas distribution assembly for use in a semiconductor work piece processing reactorFebruary, 2010Chen118/715
20090179085HEATED SHOWERHEAD ASSEMBLYJuly, 2009Carducci et al.
D593640ShowerheadJune, 2009SchoenherrD23/213
D566228ShowerApril, 2008NeagoeD23/213
20060234514Gas distribution showerhead featuring exhaust aperturesOctober, 2006Gianoulakis et al.
20060021703Dual gas faceplate for a showerhead in a semiconductor wafer processing systemFebruary, 2006Umotoy et al.
20050173569Gas distribution showerhead for semiconductor processingAugust, 2005Noorbakhsh et al.
20030140851Gas distribution showerheadJuly, 2003Janakiraman et al.
6086677Dual gas faceplate for a showerhead in a semiconductor wafer processing systemJuly, 2000Umotoy et al.

Primary Examiner:
Webster, Robin V.
Attorney, Agent or Firm:
Patterson + Sheridan, LLP

1. The ornamental design for a showerhead for a semiconductor processing chamber, as shown and described.


FIG. 1 is an isometric top view of a showerhead for a semiconductor processing chamber showing my new design.

FIG. 2 is an isometric bottom view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a side elevational view thereof, the other side elevational views being identical.

FIG. 6 is a cross-sectional view thereof taken along lines 6-6 of FIG. 3.

FIG. 7 is an enlarged view of a portion of FIG. 6; and,

FIG. 8 is an enlarged view of a portion of FIG. 1.