Camouflage pattern
United States Patent D700441

Johnston, Nicholas Adrian (Baltimore, MD, US)
Application Number:
Publication Date:
Filing Date:
Under Armour, Inc. (Baltimore, MD, US)
Primary Class:
International Classes:
(IPC1-7): 0505
Field of Search:
D13/182, D25/138, D25/139, D25/140, D25/156, 117/95, 257/77, 257/255, 257/627, 257/628, 438/149, 438/150, 438/689, 438/690, 438/691, 438/692, 438/697, D5/32, D5/35, D5/43, D5/44, D5/47, D5/57, D5/62, D5/99, 428/17, 428/187, 428/904.4, 428/919
View Patent Images:
US Patent References:
D655256Semiconductor substrateMarch, 2012Nishiguchi et al.D13/182
D651991Semiconductor substrateJanuary, 2012Nishiguchi et al.D13/182
D651992Semiconductor substrateJanuary, 2012Nishiguchi et al.D13/182
D641557Camouflage fabricJuly, 2011Valente et al.D5/62
D640062Camouflage fabricJune, 2011Shevtsova et al.D5/26
D557902Camouflage fabricDecember, 2007ParrishD5/26
6737148Camouflaged perforated panel and method of formingMay, 2004Smith428/131
6127022Deception method and productOctober, 2000Pretorius428/195.1
D431370Camouflage fabricOctober, 2000BaikD5/35
D430403Camouflage fabricSeptember, 2000BaikD5/32
D430404Camouflage fabricSeptember, 2000BaikD5/32
D430405Camouflage fabricSeptember, 2000BaikD5/35
D430732Camouflage fabricSeptember, 2000BaikD5/32
6061828Camouflage items and camouflage material thereonMay, 2000Josephs2/69
D392105Camouflage fabricMarch, 1998GoforthD5/32
D319629Semiconductor substrate with conducting patternSeptember, 1991Hasegawa et al.D13/182
D319814Semi-conductor substrate with conducting patternSeptember, 1991Hasegawa et al.D13/182
D319045Semi-conductor substrate with conducting patternAugust, 1991Hasegawa et al.D13/182
D318461Semi-conductor mounting substrateJuly, 1991Hasegawa et al.D13/182
D299793Camouflage fabricFebruary, 1989YacovellaD5/62
D297786Camouflage fabricSeptember, 1988BraungardtD5/62
D297076Camouflage fabric or similar articleAugust, 1988Kolpin et al.D5/62

Primary Examiner:
Oswecki, Elizabeth J.
Attorney, Agent or Firm:
Under Armour, Inc. (2601 PORT COVINGTON DR Baltimore MD 21230)

1. The ornamental design for a camouflage pattern, as shown and described.


The file of this patent contains at least one drawing/photograph executed in color. Copies of this patent with color drawing(s)/photograph(s) will be provided by the Patent and Trademark Office upon request and payment of the necessary fee.

The sole FIGURE is a top plan view of a camouflage pattern showing my new design.