Combined face mask and shield
United States Patent D355715

Hubbard, Vance M. (Bedford, TX)
Brunson, Welton K. (Bedford, TX)
Application Number:
Publication Date:
Filing Date:
TCNL Technologies, Inc. (Wilmington, DE)
Primary Class:
Other Classes:
Field of Search:
D24/232, D24/110, D29/8, 128/206.11, 128/206.12, 128/206.13, 128/206.16, 128/206.19, 128/206.21, 128/206.23, 128/206.28, 128/857, 128/858, 128/201.17, 2/15, 2/427, 2/432, 2/428, 2/431, 2/DIG.7, 2/435, 2/436, 2/9
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US Patent References:
D327141Combined face mask and shieldJune, 1992Hubbard et al.D29/8
5107547Adjustable medical face mask fastenerApril, 1992Scheu2D/IG7
D319111Combined face mask and shieldAugust, 1991Sandel et al.D29/8
5020533Face mask with liquid and glare resistant visorJune, 1991Hubbard et al.128/206.19
4966140Protective facial maskOctober, 1990Herzberg128/206.12
4944294Face mask with integral anti-glare, anti-fog eye shieldJuly, 1990Borek, Jr.128/206.12
4867148Nonfiltering facial separation barrierSeptember, 1989GomezD29/8
4797956Eye shieldJanuary, 1989Boyce2/431
D270110Face maskAugust, 1983Moore et al.D29/8
2056753Protective maskOctober, 1936Wagner128/141

Primary Examiner:
Attorney, Agent or Firm:
KIMBERLY-CLARK WORLDWIDE, INC. (Patent Docketing 2300 Winchester Rd., NEENAH, WI, 54956, US)
1. The ornamental design for a combined face mask and shield, as shown anddescribed.


FIG. 1 is a perspective view of a combined face mask and shield, showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof; and,

FIG. 4 is a right side elevational view thereof, the left side elevational view being a mirror image thereof.