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8099792 |
Methods and apparatus for spatially resolved photocurrent mapping of operating photovoltaic devices using atomic force photovoltaic microscopy
Atomic force photovoltaic microscopy apparatus and related methodologies, as can be used to quantitatively measure spatial performance variations in functioning photovoltaic devices.
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8069491 |
Probe testing structure
A calibration structure for probing devices.
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7793356 |
Signal coupling system for scanning microwave microscope
A signal coupling system interposed between a scanning probe and a measurement instrument provides signal communication between the scanning probe and the measurement instrument. The signal...
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6978215 |
Method of determining of true nonlinearity of scan along a selected direction X or Y in scan microscope
This invention allows the scan nonlinearity of different type of scanning microscopes to be measured, including: optical, confocal, scanning electron and scanning probe microscopes. The scan...
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6972405 |
Nanoscale standard sample and its manufacturing method
An indicator indicating the direction of a diffraction grating pattern is provided on a chip so that the direction of the pattern can be accurately determined. The indicator includes an anisotropic...
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6911832 |
Focused ion beam endpoint detection using charge pulse detection electronics
A system and method for detecting a milling endpoint on a semiconductor sample by directing an ion beam from a focused ion beam (FIB) apparatus at the sample and using charge pulse detection...
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6909983 |
Calibration of an analogue probe
A method of calibrating a probe mounted on a machine in which the probe has a probe calibration matrix which relates the probe outputs in three orthogonal axes to the machine's X, Y and Z...
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6770868 |
Critical dimension scanning electron microscope
A system for determining an actual measurement of a structure on a sample using a measurement tool with a calibration standard having measurement sites. A previously measured site on the...
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6768113 |
WORKPIECE HOLDER, SEMICONDUCTOR FABRICATING APPARATUS, SEMICONDUCTOR INSPECTING APPARATUS, CIRCUIT PATTERN INSPECTING APPARATUS, CHARGED PARTICLE BEAM APPLICATION APPARATUS, CALIBRATING SUBSTRATE, WORKPIECE HOLDING METHOD, CIRCUIT PATTERN INSPECTING METHOD, AND CHARGED PARTICLE BEAM APPLICATION METHOD
Heights of a sample are calibrated by setting a calibrating substrate on a stage and then irradiating a charged particle beam onto standard marks provided on at least two kinds of surfaces having...
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6750447 |
Calibration standard for high resolution electron microscopy
A method and apparatus used to calibrate high-resolution electron microscopes where a single standard provides multiple samples, each having a different atomic structure, permits rapid accurate...
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6720553 |
Tip calibration standard and method for tip calibration
The present invention is directed to a tip calibration standard for characterizing the geometric and electrostatic properties of the probe tips of scanning probe microscopes comprising a carbon...
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6664532 |
Method of precision calibration of magnification of scanning microscopes with the use of test diffraction grating
A method of precision calibration of magnification of scanning microscopes with the use of a test diffraction grating has the steps of positioning an orientation of a test object on a stage of...
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6664546 |
In-situ probe for optimizing electron beam inspection and metrology based on surface potential
Disclosed is a method and apparatus for generating an image from a sample. The apparatus includes a charged particle beam generator arranged to generate and control a charged particle beam...
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6650129 |
Method of testing semiconductor device
A method of testing a semiconductor device is provided. In a SEM image comparison type testing apparatus, a comparison is made between the voltage contrast of a predetermined pattern to be tested...
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6627903 |
Methods and devices for calibrating a charged-particle-beam microlithography apparatus, and microelectronic-device fabrication methods comprising same
Methods are disclosed for performing a calibration of a charged-particle-beam (CPB) microlithography apparatus. In an embodiment, a specimen having a crystal-orientation plane is mounted on a...
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6593583 |
Ion beam processing position correction method
The present invention provides a focused ion beam method in which positional correction is performed with reference to reference points on a sample and for carrying out processing using an ion...
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6573497 |
Calibration of CD-SEM by e-beam induced current measurement
The present invention relates to a system and method for calibrating a scanning electron microscope (SEM). The method comprises measuring an electrical characteristic of a calibration standard...
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6545495 |
Method and apparatus for self-calibration of capacitive sensors
A method for determining operational characteristics of capacitive sensors adapted for self-calibration includes the steps of providing at least one capacitive sensor having a suspended element and...
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6358860 |
Line width calibration standard manufacturing and certifying method
A method of making and certifying submicron line width calibration standards includes steps of thermal growth of a silicon dioxide film layer on top and vertical side wall surfaces of silicon...
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6319643 |
Conductive photoresist pattern for long term calibration of scanning electron microscope
One aspect of the present invention relates to a method of calibrating a measurement instrument that uses an electron beam, involving the steps of providing a conductive photoresist on a...
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6274876 |
Inspection apparatus and method using particle beam and the particle-beam-applied apparatus
The inspection apparatus uses a particle beam and has a high throughput by obtaining a characteristic frequency corresponding to the characteristic quantity of focusing-shift from a Fourier...
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6232787 |
Microstructure defect detection
Methods of inspecting a microstructure comprise: applying charged particles to the wafer to negatively charge up the wafer over a region having contact or via holes, scanning a charged-particle...
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5920067 |
Monocrystalline test and reference structures, and use for calibrating instruments
An improved test structure for measurement of width of conductive lines formed on substrates as performed in semiconductor fabrication, and an improved reference grid for calibrating instruments...
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5804460 |
Linewidth metrology of integrated circuit structures
Illustratively, the present invention includes a method of integrated circuit manufacturing which includes forming a raised topological feature upon a first substrate. A portion of the raised...
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5744799 |
Apparatus for and method of real-time nanometer-scale position measurement of the sensor of a scanning tunneling microscope or other sensor scanning atomic or other undulating surfaces
A method of and apparatus for producing improved real-time continual nanometer scale positioning data of the location of sensing probe used with one of a scanning tunneling microscope, an atomic...
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5684301 |
Monocrystalline test structures, and use for calibrating instruments
An improved test structure for measurement of width of conductive lines formed on substrates as performed in semiconductor fabrication, and for calibrating instruments for such measurements, is...
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5624845 |
Assembly and a method suitable for identifying a code
An assembly suitable for identifying a code sequence of a biomolecule. The assembly includes means comprising a near-field probe for generating a super-resolution chemical analysis of the portion...
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5599464 |
Formation of atomic scale vertical features for topographic instrument calibration
A calibration target for topographic inspection instruments, operating at sub-micrometer resolution levels, having features on the order of 10 Angstroms in vertical height, an atomic scale...
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5585211 |
Fabrication and use of sub-micron dimensional standard
A sub-micron dimensional standard is embodied in a grating of equal-sized lines and spaces formed in an electron-sensitive material by means of E-beam lithography. Several gratings are generated in...
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5521377 |
Measurement of trace element concentration distribution, and evaluation of carriers, in semiconductors, and preparation of standard samples
A concentration distribution in a planar direction or in a depth-wise direction is measured by irradiating an ion containing an alkali metal element as an ion beam onto a solid surface, detecting a...
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5520769 |
Method for measuring concentration of dopant within a semiconductor substrate
A method is provided for measuring at resolutions which are in some instances less than 20 nanometers the concentration densities within one or more diffusion regions within a semiconductor...
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5428548 |
Method of and apparatus for scanning the surface of a workpiece
Apparatus for and a method of scanning a workpiece are in the form of a retrofit package which provides a scanning capability for a machine tool which would otherwise have none. The basic elements...
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5155359 |
Atomic scale calibration system
A scanning electron microscope is calibrated using an atomic scale microscope, such as a scanning tunneling microscope or atomic force microscope to permit accurate and precise deflection of the...
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4954711 |
Low-voltage source for narrow electron/ion beams
This source for charged particles comprises a sharply pointed tip (1) and an aperture (2) in a thin sheet of material. If the point of the tip (1) is made sharp enough, i.e., if it ends in a single...
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4877957 |
Scanning type tunnel microscope
A scanning type tunnel microscope comprises a sample holding member for supporting a sample and a scanning probe which is arranged to face the sample to be separated therefrom by a very small...
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4746571 |
X-ray detector efficiency standard for electron microscopes
An X-ray detector efficiency standard is formed of multiple spherical particles of various materials distributed over the surface of a substrate. The particles are preferably formed of pure...
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4335189 |
Resolution standard for scanning electron microscope comprising palladium spines on a metal substrate
A resolution standard for a scanning electron microscope has clusters of palladium in a sea urchin form. The clusters are widely scattered on a substrate so that a cluster can be acquired easily...
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4151418 |
Multiple crystal holder assembly for wavelength dispersive X-ray spectrometers
A novel crystal holder for the wavelength dispersive spectrometers of electron microprobes arranges four crystals as a cylinder segment which may be moved to a position in which it partially...
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