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7620932 |
Simulation of aerial images
A method for generating a simulated aerial image of a mask projected by an optical system includes determining a coherence characteristic of the optical system. A coherent decomposition of the...
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7620931 |
Method of adding fabrication monitors to integrated circuit chips
An integrated circuit, a method and a system for designing and a method fabricating the integrated circuit. The method including: (a) generating a photomask level design of an integrated circuit...
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7620930 |
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography
A method of generating a mask is provided that optimizes the placement and shape of optical proximity correction (OPC) features such as scattering bars. According to some aspects, the method...
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7619230 |
Charged particle beam writing method and apparatus and readable storage medium
A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a...
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7617478 |
Flash-based anti-aliasing techniques for high-accuracy high efficiency mask synthesis
One embodiment of the present invention provides a system that converts a non-bandlimited pattern layout into a band-limited pattern image to facilitate simulating an optical lithography process....
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7617477 |
Method for selecting and optimizing exposure tool using an individual mask error model
Methods are disclosed for selecting and optimizing an exposure tool using an individual mask error model. In one embodiment, a method includes selecting a model of a lithography process including...
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7617476 |
Method for performing pattern pitch-split decomposition utilizing anchoring features
A method for decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of: (a) determining a minimum critical dimension and...
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7617474 |
System and method for providing defect printability analysis of photolithographic masks with job-based automation
Serious defects on a mask can compromise the functionality of the integrated circuits formed on the wafer. Nuisance defects, which do not affect the functionality, waste expensive resources. A...
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7617473 |
Differential alternating phase shift mask optimization
A method of designing a mask for projecting an image of an integrated circuit design in lithographic processing, wherein the integrated circuit layout has a plurality of segments of critical width....
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7614034 |
Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology
A method of applying optical proximity correction features to a mask having a plurality of features to be imaged. The method includes the steps of defining a set of process parameters to be...
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7614033 |
Mask data preparation
The manufacturing of integrated circuits relies on the use of optical proximity correction (OPC) to correct the printing of the features on the wafer. The data is subsequently fractured to...
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7614032 |
Method for correcting a mask design layout
A method for performing a mask design layout resolution enhancement includes determining a level of correction for the design layout for a predetermined parametric yield with a minimum total...
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7614031 |
Drawing apparatus with drawing data correction function
A data correcting apparatus is for correcting drawing data representing a drawing pattern included in a quadrangular drawing area of a drawing subject. The correction process is based on an ideal...
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7614026 |
Pattern forming method, computer program thereof, and semiconductor device manufacturing method using the computer program
A pattern of a desired size is formed on a semiconductor substrate by the following procedure. A property, including at least one of an aberration of an exposure device, a property of an...
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7610574 |
Method and apparatus for designing fine pattern
Provided are a method and apparatus for designing a fine pattern that can be entirely transferred onto an object. The method includes reading the original data of a fine pattern for exposure. The...
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7603648 |
Mask design using library of corrections
Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a...
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7600213 |
Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product
A pattern data verification method includes preparing exposure data related to a circuit pattern to be formed on a substrate, calculating a characteristic of an image of an exposure pattern on a...
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7600212 |
Method of compensating photomask data for the effects of etch and lithography processes
A method for synthesizing a photomask data set from a given target layout, including the following steps: (a) providing a set of target polygons for the target layout; (b) fitting a smooth curve to...
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7598006 |
Method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer
A method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer is described. An in-situ interferometer is encoded, or augmented, with special or missing...
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7596776 |
Light intensity distribution simulation method and computer program product
A light intensity distribution simulation method for predicting an intensity distribution of light on a substrate when photomask including a pattern is irradiated with light in which a shape...
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7594216 |
Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask
A method of forming a mask pattern comprises the following steps. A second cell library is prepared by making process proximity effect correction with respect to cell patterns stored in a first...
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7594213 |
Method and apparatus for computing dummy feature density for chemical-mechanical polishing
One embodiment of the present invention provides a system that computes dummy feature density for a CMP (Chemical-Mechanical Polishing) process. Note that the dummy feature density is used to add...
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7594206 |
Fault detecting method and layout method for semiconductor integrated circuit
The present invention provides a fault detecting method and a layout method for a semiconductor integrated circuit. The fault detecting method performs detection for faults in a semiconductor...
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7594199 |
Method of optical proximity correction design for contact hole mask
Disclosed concepts include a method of optimizing an illumination profile of a pattern to be formed in a surface of a substrate. Illumination is optimized by defining a transmission cross...
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7590968 |
Methods for risk-informed chip layout generation
A chip layout is generated based on a quantified fabrication process capability. A minimum required value is selected for a fabrication process capability factor associated with a fabrication...
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7590967 |
Structured ASIC with configurable die size and selectable embedded functions
One embodiment of the present invention provides for a master or universal base and base tooling which addresses the general purpose Structured ASIC requirements. Another embodiment of the present...
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7589819 |
Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
Provided is a method and system for developing a lithographic mask layout. The lithographic mask layout is adapted for configuring an array of micro-mirrors in a maskless lithography system. The...
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7587704 |
System and method for mask verification using an individual mask error model
Methods and systems are disclosed to inspect a manufactured lithographic mask, to extract physical mask data from mask inspection data, to determine systematic mask error data based on differences...
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7587703 |
Layout determination method, method of manufacturing semiconductor devices, and computer readable program
A layout determination method determines a layout of semiconductor devices that are to be created on a substrate by carrying out an exposure process. The layout determination method determines a...
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7587702 |
Step-walk relaxation method for global optimization of masks
A set of candidate global optima is identified, one of which is a global solution for making a mask for printing a lithographic pattern. A solution space is formed from dominant joint eigenvectors...
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7587700 |
Process monitoring system and method for processing a large number of sub-micron measurement targets
The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing...
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7585600 |
Method and apparatus for performing target-image-based optical proximity correction
A system that performs target-image-based optical proximity correction on masks that are used to generate an integrated circuit is presented. The system operates by first receiving a plurality of...
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7584450 |
Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout
One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a...
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7581203 |
Method and apparatus for manufacturing multiple circuit patterns using a multiple project mask
A method and apparatus are disclosed for fabricating a substrate having a plurality of circuit patterns. The substrate is exposed to a primary mask having a plurality of the desired circuit...
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7579606 |
Method and system for logic design for cell projection particle beam lithography
A method for particle beam lithography, such as electron beam (EB) lithography, includes predefining a stencil design having a plurality of cell patterns with information from a cell library,...
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7572557 |
Non-collinear end-to-end structures with sub-resolution assist features
Sub-resolution assist features for non-collinear features are described for use in photolithography. A photolithography mask with elongated features is synthesized. An end-to-end gap between two...
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7571424 |
Diffused aerial image model semiconductor device fabrication
A lithography method has a simulation method for mathematically approximating a photoresist film pattern with a Diffused Aerial Image Model (“DAIM”) for semiconductor device fabrication. The...
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7571423 |
Optimized photomasks for photolithography
Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process,...
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7571421 |
System, method, and computer-readable medium for performing data preparation for a mask design
A method, computer-readable medium, and system for performing data preparation are provided. An integrated circuit design is received, and a plurality of pre-optical proximity correction processes...
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7571417 |
Method and system for correcting a mask pattern design
A pattern verification method includes preparing a desired pattern and a mask pattern forming the desired pattern on a substrate, defining at least one evaluation point on an edge of the desired...
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7571416 |
Automatic design device, method, and program for semiconductor integrated circuits
An automatic design device includes: a calculating section calculating additional geometries added to basic geometries including wiring lines and vias arranged on a chip region; a classifying...
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7569842 |
Method for correcting electron beam exposure data
First, electron beam exposure data identifiable for each type of pattern of a semiconductor device is inputted (S 601 ). Then, electron beam exposure data on a first type of pattern is not...
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7569310 |
Sub-resolution assist features for photolithography with trim ends
Sub-resolution assist features with trim ends are described for use in photolithography. A photolithography mask with elongated features is synthesized. A sub-resolution assist feature is applied...
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7568180 |
Generalization of the photo process window and its application to OPC test pattern design
A method comprises the steps of: (a) simulating on a processor a fabrication of a plurality of layout patterns by a lithographic process; (b) determining sensitivities of the layout patterns to a...
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7568174 |
Method for checking printability of a lithography target
A technique for determining, without having to perform optical proximity correction, when the result of optical proximity correction will fail to meet the design requirements for printability. A...
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7565639 |
Integrated assist features for epitaxial growth bulk tiles with compensation
A method for making a semiconductor device is provided which comprises (a) creating a first data set ( 301 ) which defines a first set of tiles ( 303 ) for a trench chemical mechanical polishing...
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7565633 |
Verifying mask layout printability using simulation with adjustable accuracy
A method, system and computer program product for verifying printability of a mask layout for a photolithographic process are disclosed. A simulation of the photolithographic process for the...
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7564535 |
Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations
A lithographic scanning apparatus includes a light projection device for seamlessly and uniformly projecting a scanning light onto a light exposing area. The light projecting device further...
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7562337 |
OPC verification using auto-windowed regions
A method is provided for performing optical proximity correction (“OPC”) verification in which features of concern of a photomask are identified using data relating to shapes of the photomask,...
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7562336 |
Contrast based resolution enhancement for photolithographic processing
A contrast-based resolution enhancing technology (RET) determines a distribution of contrast values for edge fragments in a design layout or portion thereof. Resolution enhancement is applied to...
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