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7523438 |
Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM
A method for optically transferring a lithographic pattern corresponding to an integrated circuit utilizing a high transmission attenuated phase-shift mask onto a semiconductor substrate by use of...
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7523027 |
Visual inspection and verification system
A method and apparatus for inspecting a photolithography mask for defects is provided. The inspection method comprises providing a defect area image to an image simulator wherein the defect area...
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7523437 |
Pattern-producing method for semiconductor device
Disclosed is a method of producing a pattern for a semiconductor device, comprising extracting part of a pattern layout, perturbing a pattern included in the part of the pattern layout to generate...
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7519940 |
Apparatus and method for compensating a lithography projection tool
An apparatus and method of compensating for lens imperfections in a projection lithography tool, includes extracting from a diffraction image created by the projection lithography tool a lens...
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7519941 |
Method of manufacturing integrated circuits using pre-made and pre-qualified exposure masks for selected blocks of circuitry
Disclosed are embodiments of a manufacturing method that establishes a library of pre-made and pre-qualified masks for patterning different blocks of circuitry that meet established performance and...
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7519943 |
Photomask fabrication method
The simulation method is for simulating a pattern to be transferred onto a photoresist film by exposure using a photomask with a main pattern 10 and an assist pattern 12 formed on. The...
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7519942 |
Pattern specification method and pattern specification apparatus
A pattern specification method for specifying a drawn microscopic pattern, comprising the step of creating a first pattern in which process shift information is reflected on a pattern expressed by...
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7512926 |
Phase-shifting masks with sub-wavelength diffractive optical elements
The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a...
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7510972 |
Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device
A method of processing a substrate which enables a surface damaged layer and polishing remnants on the surface of an insulating film to be removed, and enable the amount removed of the surface...
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7512928 |
Sub-resolution assist feature to improve symmetry for contact hole lithography
A method of making a mask design having optical proximity correction features is provided. The method can include obtaining a target pattern comprising a plurality of target pattern features...
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7512927 |
Printability verification by progressive modeling accuracy
A fast method of verifying a lithographic mask design is provided wherein catastrophic errors are identified by iteratively simulating and verifying images for the mask layout using progressively...
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7509621 |
Method and apparatus for placing assist features by identifying locations of constructive and destructive interference
One embodiment of the present invention provides a system that determines a location in a layout to place an assist feature. During operation, the system receives a layout of an integrated circuit....
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7509622 |
Dummy filling technique for improved planarization of chip surface topography
The use of smooth post-ECP topography (instead of final chip topography) as an objective during dummy filling enables a computationally efficient model-based dummy filling solution for copper while...
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7509623 |
Manufacturing method of semiconductor device
A pattern correction method executed by a computer includes a first correction and a second correction. The first correction is executed by calculating a correction value, in consideration for an...
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7509620 |
Dual phase shift photolithography masks for logic patterning
A pair of phase shift photolithography masks and a process for deriving them is described. In one embodiment, the invention includes deriving a complex electric field estimate for an intended...
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7509624 |
Method and apparatus for modifying a layout to improve manufacturing robustness
One embodiment of the present invention provides a system that modifies a layout to improve manufacturing robustness. During operation, the system receives a layout. The system then selects a...
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7506301 |
Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device
A computer implemented method for correcting a mask pattern includes: predicting a displacement of a device pattern by using a mask pattern to form the device pattern and a variation of a process...
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7506299 |
Feature optimization using interference mapping lithography
Disclosed concepts include a method of, and program product for, optimizing an illumination profile of a pattern to be formed in a surface of a substrate relative to a given mask. Steps include...
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7501212 |
Method for generating design rules for a lithographic mask design that includes long range flare effects
A method is described for computing distance based and pattern density based design rules for the mask layout design of a VLSI chip so that the design satisfying the above design rules when...
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7503028 |
Multilayer OPC for design aware manufacturing
A method is provided for designing a mask layout for an integrated circuit that ensures proper functional interaction among circuit features by including functional inter-layer and intra-layer...
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7503030 |
Correcting 3D effects in phase shifting masks using sub-resolution features
Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an...
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7500218 |
Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same
Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction...
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7500219 |
Exposure data generator and method thereof
A plurality of patterns placed within an target region are classified by their placement positions, a pattern adjacent to each side of each pattern is searched for by using the classification...
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7500217 |
Handling of flat data for phase processing including growing shapes within bins to identify clusters
Definition of a phase shifting layout from an original layout can be time consuming. If the original layout is divided into useful groups, i.e. clusters that can be independently processed, then...
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7494753 |
Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation
Improved calibration of a resist model used in critical dimension (CD) calculation is disclosed. A dose function is obtained based on optical tool to be used form the resist on a wafer. The dose...
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7496882 |
Optimization to avoid sidelobe printing
A method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus is presented. In an embodiment of the invention, the method includes calculating a...
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7496884 |
Distributed hierarchical partitioning framework for verifying a simulated wafer image
A system that verifies a simulated wafer image against an intended design. During operation, the system receives a design. Next, the system generates a skeleton from the design, wherein the...
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7494751 |
Method and apparatus for improving depth of focus during optical lithography
One embodiment of the present invention provides a system that improves the depth of focus during an optical lithography process. During operation, the system receives a mask layout. The system...
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7496880 |
Method and apparatus for assessing the quality of a process model
One embodiment of the present invention provides a system that assesses the quality of a process model. During operation, the system receives a mask layout and additionally receives a process model...
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7496885 |
Method of compensating for defective pattern generation data in a variable shaped electron beam system
The present invention comprises a system, software, and method for the treatment of mask data that produces defects in resultant images produced in the fabrication of a mask, following...
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7496883 |
Method and apparatus for identifying and correcting phase conflicts
One embodiment of the present invention provides a system that identifies a substantially minimal set of phase conflicts in a PSM-layout that when corrected renders the layout phase-assignable....
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7493590 |
Process window optical proximity correction
Optical proximity correction methods and apparatus are disclosed. A simulated geometry representing one or more printed features from a reticle is generated using an optical proximity correction...
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7493589 |
Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: (a)...
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7493588 |
Mixing and matching method and integration system for providing backup strategries for optical environments and method for operating the same
A mixing-and-matching method for an optical environment group is disclosed in this invention. The optical environment group has at least a primary optical environment having a first numerical...
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7493577 |
Automatic recognition of geometric points in a target IC design for OPC mask quality calculation
A method and system is provided for automatically recognizing geometric points of features in a target design for OPC mask quality calculation. For each feature in the target design, x, y points...
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7493587 |
Chromeless phase shifting mask for integrated circuits using interior region
A system for creating mask layout pattern data in order to create a number of desired features on a semiconductor wafer. Critical features and features that are adjacent to or abut critical...
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7488933 |
Method for lithography model calibration
A method for separately calibrating an optical model and a resist model of lithography process using information derived from in-situ aerial image measurements to improve the calibration of both...
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7488937 |
Method and apparatus for the improvement of material/voltage contrast
A method and system for registering a CAD layout to a Focused Ion Beam image for through-the substrate probing, without using an optical image and without requiring biasing, includes an improved...
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7487474 |
Designing an integrated circuit to improve yield using a variant design element
An integrated circuit is designed to improve yield when manufacturing the integrated circuit, by obtaining a design element from a set of design elements used in designing integrated circuits. A...
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7487489 |
Calculation system for inverse masks
A system for calculating mask data to create a desired layout pattern on a wafer reads all or a portion of a desired layout pattern. Mask data having pixels with transmission characteristics is...
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7487491 |
Pattern inspection system using image correction scheme with object-sensitive automatic mode switchability
An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The...
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7487490 |
System for simplifying layout processing
A system and method for integrated circuit design are disclosed to enhance manufacturability of circuit layouts by applying layout processing to handle imperfections such as jogs in integrated...
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7487492 |
Method for increasing manufacturability of a circuit layout
According to one exemplary embodiment, a method for increasing manufacturability of a circuit layer includes determining a threshold value for at least one image property from a repetitive section...
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7480892 |
Overlay mark
An overlay mark formed on a photomask, comprising a first rectangular region, a second rectangular region, a third rectangular region, and a fourth rectangular region, each rectangular region...
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7480891 |
Method and apparatus of model-based photomask synthesis
An apparatus and method for improving image quality in a photolithographic process includes calculating a figure-of-demerit for a photolithographic mask function and then adjusting said...
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7480890 |
Method for correcting and configuring optical mask pattern
A method of correcting a mask pattern is described. A testing mask including a plurality of original patterns configured according to an original drawing data is provided. The original patterns in...
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7478360 |
Approximating wafer intensity change to provide fast mask defect scoring
To provide fast mask defect scoring, approximated wafer simulations (e.g. using one convolution) are performed on the defect inspection image and its corresponding reference inspection image. Using...
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7476880 |
Writing a circuit design pattern with shaped particle beam flashes
A shaped particle beam writing strategy can be used to write a pattern with a particle beam onto a substrate. The pattern comprises a circuit design that is fractured into a plurality of arbitrary...
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7475380 |
Generating mask patterns for alternating phase-shift mask lithography
A system, method and recording medium are provided for generating patterns of a paired set of a block mask and a phase shift mask from a data set defining a circuit layout to be provided on a...
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7475379 |
Methods and systems for layout and routing using alternating aperture phase shift masks
Methods for performing phase-correct layout and routing of integrated circuits using alternating aperture phase shift masks (AltPSM), including bright field AltPSM and dark field AltPSM are...
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