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6901569 |
Corrected mask pattern verification apparatus and corrected mask pattern verification
A corrected mask pattern verification apparatus includes a graphic operation section for generating differential mask pattern data based on design mask pattern and corrected mask pattern; a graphic...
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6901576 |
Phase-width balanced alternating phase shift mask design
A method is provided for designing an altPSM mask including a substrate. The method includes the following steps. Provide a circuit layout. Identify critical elements of the circuit layout. Provide...
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6901574 |
Data management method for mask writing
A method of translating device layout data to a format for a mask writing tool includes the acts of reading a file defining a number of cells that represent structures on the device. One or more...
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6898781 |
Method for modifying a chip layout to minimize within-die CD variations caused by flare variations in EUV lithography
A method including determining a first flare convolution based on a feature density of projected structures on a substrate layout, determining a second flare convolution based on a mask for a given...
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6898780 |
Method and system for constructing a hierarchy-driven chip covering for optical proximity correction
A method and system for performing optical proximity correction (OPC) on an integrated circuit (IC) chip design is disclosed. The system and method of the present invention includes exploding calls...
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6895571 |
Nanometer scale devices
In a method of creating connections in nanometer scale devices, address lines and nanometer scale data wires are formed on a wafer. In addition, connections are patterned between the address lines...
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6892375 |
Data processing method and apparatus, reticle mask, exposing method and apparatus, and recording medium
Disclosed are data processing method, apparatus, and computer readable medium for generating data about mask, reticle, etc., for making exposure, and exposing method, apparatus and computer...
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6887630 |
Method and apparatus for fracturing polygons on masks used in an optical lithography process
A system for fracturing polygons on masks used in lithography processes for manufacturing an integrated circuit is described. The system fractures polygons that include cavities in either the...
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6887633 |
Resolution enhancing technology using phase assignment bridges
In one embodiment, a spacing is determined for each edge of a number of features in a photolithographic design. The edges have at least a partially predictable layout. Based on the spacing and the...
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6886153 |
Design driven inspection or measurement for semiconductor using recipe
Design driven inspection/metrology methods and apparatus are provided. A recipe is a set of instructions including wafer processing parameters, inspection parameters, or control parameters for...
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6886154 |
Multiple-exposure drawing apparatus and method thereof
A multi-exposure drawing apparatus for drawing a given pattern on a workpiece is provided. The apparatus uses an exposure unit with optical modulation elements arranged in a matrix. The apparatus...
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6883159 |
Patterning semiconductor layers using phase shifting and assist features
A photomask and method of patterning a photosensitive layer using a photomask, the photomask including a substrate and a film coupled to substrate. The film is etched with a phase shifted assist...
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6880135 |
Method of incorporating lens aberration information into various process flows
A method of evaluating a stepper process affected by lens aberration is provided. The method includes receiving, from a facilitator responding to a request, a set of optical models including lens...
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6871337 |
Illumination optimization for specific mask patterns
A method and apparatus for microlithography. The method and apparatus include optimizing illumination modes based on characteristics of a specific mask pattern. The illumination is optimized by...
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6869739 |
Integrated lithographic print and detection model for optical CD
A method of modeling dose and focus response in lithographic imaging to simulate an optical critical dimension (OCD) metrology system creates simulated aerial images of the object pattern to be...
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6871339 |
Method of manufacturing a device, device manufacturing apparatus, device, and electronic apparatus
In a method of manufacturing a device which includes processes in which a plurality of unit regions (first bits D 1 and second bits D 2 ) are established upon a substrate in the form of a lattice,...
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6868537 |
Method of generating an IC mask using a reduced database
For IC devices that have repeating structures, a method of generating a database for making a mask layer starts with a hierarchical database describing at least one repeating element in the layer,...
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6865727 |
Method for calculating the capacity of a layout of an integrated circuit with the aid of a computer, and application of the method to integrated circuit fabrication
A method for verifying a layout of an integrated circuit with the aid of a computer and the fabrication of the circuit applying the method includes the steps of inserting several floating...
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6862725 |
Method for manufacturing multi-kind and small quantity semiconductor products in a mass-production line and system thereof
A method for manufacturing multi-kind and small-quantity semiconductor products in a mass-production line and a system thereof are provided. One aspect of the present invention, there is provided...
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6862726 |
Light intensity simulation method, program product, and designing method of photomask
Light intensities at light intensity calculation points on the photomask are found approximately based on distances from barycenters of opening patterns, and areas and transmission factors of the...
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6858354 |
Method to prevent side lobe on seal ring
A new method is provided for the creation of a seal ring or fuse ring over the surface of a Phase Shift Mask. A seal ring pattern is created over the surface of a phase shift mask through a layer...
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6859918 |
Alleviating line end shortening by extending phase shifters
One embodiment of the invention provides a system and a method for reducing line end shortening during an optical lithography process for manufacturing an integrated circuit. The system operates by...
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6855467 |
Transfer mask, method of dividing pattern or transfer mask, and method of manufacturing transfer mask
A pattern of a transfer mask to transfer, by the use of energy beams, a transfer pattern to a substrate is disclosed, the transfer mask made by forming an aperture pattern in a thin film portion...
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6854105 |
Chip arrangement determining apparatus and method
A method for determining a chip arrangement on a wafer. The method includes steps of generating a grid array in which rectangles are arranged in a grid pattern, the rectangle corresponding to a...
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6854104 |
First approximation for OPC significant speed-up
An optical proximity correction system for local correction of an aerial image produced from a mask having transmissive portions and blocking portions collectively defining a target design includes...
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6848096 |
Apparatus for correcting data of layout pattern
An apparatus for correcting layout pattern data composed of a computer system includes eight sections. The first section holds the layout pattern data. The second section holds correcting...
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6838228 |
System to enable photolithography on severe structure topologies
A system and related process to enable control of photolithographic pattern features on a structure having one or more severe non-flat topologies. The system includes an analysis of the Depth of...
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6839890 |
Mask manufacturing method
A method for forming, on a mask, a mask pattern used for exposure. The mask pattern includes a first pattern that blends plural types of patterns, and second pattern that is smaller in size than...
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6838216 |
Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus
Auxiliary openings are assigned to openings on a mask to be transferred to a wafer. These auxiliary openings have a phase-shifting property, preferably between 160° and 200° with respect to the...
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6835942 |
Method for correcting a proximity effect, an exposure method, a manufacturing method of a semiconductor device and a proximity correction module
A method for correcting a proximity effect applied to a dose of an electron beam exposure, includes classifying an underlying pattern of a level underlying a thin film layer; dividing a processing...
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6832364 |
Integrated lithographic layout optimization
A method and computer system is described for designing a conflict-free altPSM layout by first constructing a planar interlock graph without predefining phase shift shapes. Feature nodes of the...
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6826743 |
Method for automatically correcting overlay alignment of a semiconductor wafer
A semiconductor wafer overlay correction method for an exposure process in a semiconductor fabricating stepper incorporates variations in equipment characteristics with time. The wafer overlay...
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6823503 |
Method and apparatus for creating a phase-shifting mask for a photolithographic process
One embodiment of the invention provides a system that creates a phase-shifting mask for a photolithographic process used in fabricating an integrated circuit. The system starts by receiving a...
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6813758 |
Optical proximity correction driven hierarchy
The present invention is directed to an optical proximity correction driven hierarchy. A method for constructing a hierarchy of optically independent structures for use in optical proximity...
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6813759 |
Hybrid optical proximity correction for alternating aperture phase shifting designs
One embodiment of the invention provides a system that facilitates optical proximity correction for alternating aperture phase shifting designs. During operation, the system receives a layout,...
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6810511 |
Method of designing active region pattern with shift dummy pattern
A method of designing an active region pattern with a shifted dummy pattern, wherein an integrated circuit having an original active region pattern thereon is provided. The original active region...
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6807662 |
Performance of integrated circuit components via a multiple exposure technique
An initial layout of an integrated circuit device is separated into a set of definitions for use in a multiple exposure fabrication process. The separation begins with reading a portion of the...
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6807663 |
Accelerated layout processing using OPC pre-processing
Performing optical proximity correction (OPC) is typically done during a critical time, wherein even small delays in finishing OPC can have significant adverse effects on product introduction...
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6807661 |
Correcting a mask pattern using a clip mask
Correcting a mask pattern includes partitioning the mask pattern to yield templates. The following is repeated for each template to generate correction data: a clip mask is generated for a template...
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6807654 |
Method of and device for detecting pattern, method of and device for checking pattern, method of and device for correcting and processing pattern, and computer product
From the region near the target pattern, patterns whose barycenter positions are not changed even if deformation is generated due to proximity effect or coarse-and-fine difference at the time of...
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6800401 |
Method for phase shift mask design, fabrication, and use
A system and method of strong phase-shifting a beam from an actinic light source in a lithographic process includes focusing a beam from the electromagnetic beam source onto a mask adapted to...
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6802051 |
Method and apparatus for reference distribution aerial image formation
A coherent laser beam is divided into an illumination beam and a reference beam. A portion of the illumination beam is passed through, or reflected off of, a subject to create a subject...
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6801825 |
Management system and management method of semiconductor exposure apparatuses
A management system including a plurality of semiconductor exposure apparatuses is provided for controlling various exposures in manufacturing a semiconductor device. When plural numbers of times...
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6801827 |
Overlay inspection apparatus for semiconductor substrate and method thereof
A system for manufacturing a semiconductor device which predicts a difference in registration error between a circuit pattern and an overlay mark from a pattern dimension, illumination conditions...
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6800428 |
Wavelength-independent exposure pattern generation method and exposure pattern generation system for lithography
A method of generating an exposure pattern for lithography to create a plurality of patterns arranged in a predetermined direction, comprises a step of counting the plurality of patterns along this...
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6799313 |
Space classification for resolution enhancement techniques
The present invention comprises a method and apparatus for classifying edges for implementing mask corrections. In one embodiment, classifications are based upon proximity ranges bounded on one...
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6799130 |
Inspection method and its apparatus, inspection system
The present invention relates to a tool for analyzing by priority a defect having a high possibility of causing an electrical failure when inspecting a particle and a pattern defect in a piece of...
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6799312 |
Dark line CD and XY-CD improvement method of the variable shaped beam lithography in mask or wafer making
This invention provides a method of using an electron beam exposure system having an electron beam with a variable shape to form patterns in a layer of resist on a substrate, a mask substrate or an...
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6795961 |
Priority coloring for VLSI designs
A method and computer program product is described for optimizing the design of a circuit layout that assigns binary properties to the design elements according to a hierarchy of rules. For...
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6795955 |
Method and apparatus for identifying an identical cell in an IC layout with an existing solution
One embodiment of the invention provides a system for speeding up processing of a layout of an integrated circuit that has been divided into cells. The system operates by determining if a target...
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