Matches 101 - 150 out of 354 < 1 2 3 4 5 6 7 8 >
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7260810 Method of extracting properties of back end of line (BEOL) chip architecture  
A method for analyzing circuit designs includes discretizing a design representation into pixel elements representative of a structure in the design and determining at least one property for each...
7260811 Method of calculating predictive shape of wiring structure, calculating apparatus, and computer-readable recording medium  
In a calculating apparatus for calculating a predictive shape of a wire structure using a finite element model, a predictive shape of the finite element model which is in a physically balanced...
7260812 Method and apparatus for expediting convergence in model-based OPC  
One embodiment of the invention provides a system that expedites or stabilizes convergence in a model-based optical proximity correction (OPC) process. During operation, the system receives a...
7251807 Method and apparatus for identifying a manufacturing problem area in a layout using a process-sensitivity model  
One embodiment of the present invention provides a system that identifies an area in a mask layout which is likely to cause manufacturing problems. During operation, the system creates an on-target...
7240314 Redundantly tied metal fill for IR-drop and layout density optimization  
An integrated circuit and a method for using metal fill geometries to reduce the voltage drop in power meshes. Metal fill geometries are connected to the power mesh using vias or wires at multiple...
7237221 Matrix optical process correction  
A method for performing a matrix-based verification technique such as optical process correction (OPC) that analyzes interactions between movement of a fragment on a mask and one or more edges to...
7234130 Long range corrections in integrated circuit layout designs  
A method and apparatus for compensating for flare intensity variations across an integrated circuit. A layout description for a physical layer of an integrated circuit or portion thereof is divided...
7231629 Feature optimization using enhanced interference mapping lithography  
Disclosed concepts include a method of, and program product for, optimizing an intensity profile of a pattern to be formed in a surface of a substrate relative to a given mask using an optical...
7228522 Edge-based proximity correction  
One embodiment of the present invention provides a system that calculates an edge-based proximity correction which is applied to a region in the proximity of an evaluation point. During operation...
7216331 Resolving phase-shift conflicts in layouts using weighted links between phase shifters  
A method of assigning phases to shifters on a layout is provided. The method includes creating a link between any two shifters within a predetermined distance from each other. In one embodiment,...
7211369 VLSI-based system for durable high-density information storage  
The invention relates to using VLSI techniques to store information on a substrate. One embodiment of a die with text deposited upon the die uses semiconductor processing techniques during...
7207030 Method for improving a simulation model of photolithographic projection  
A method is provided for improving a photolithographic simulation model of the photolithographic simulation of a pattern formed on a photomask. Proceeding from a two-dimensional simulation model...
7200834 Exposure pattern forming method and exposure pattern  
Disclosed is an exposure pattern forming method of forming an exposure pattern by correcting each pattern portion constituting a design pattern by a correction amount, which amount is previously...
7197439 Method for modeling semiconductor device process  
A method for using a computer to calculate a pileup state of an impurity in an interface between an Si layer in which a source and a drain are formed, and an SiO 2 layer brought in contact with...
7197722 Optimization of sample plan for overlay  
The present invention describes a method including: determining field-clustering scheme; selecting initial sample plan; establishing initial model of overlay, the initial model of overlay...
7194709 Automatic alignment of integrated circuit and design layout of integrated circuit to more accurately assess the impact of anomalies  
A method, computer program product and system for assessing the impact of anomalies in a physical device. An anomaly may be detected in an integrated circuit. Upon detecting an anomaly, an image of...
7188322 Circuit layout methodology using a shape processing application  
A circuit layout methology is provided for eliminating the extra processing time and file-space requirements associated with the optical proximity correction (OPC) of a VLSI design. The methodology...
7185312 Exposure method for correcting line width variation in a photomask  
A method for correcting line width variation occurring during a development process in fabricating a photomask and a recording medium in which the exposure method is recorded is provided, wherein...
7175940 Method of two dimensional feature model calibration and optimization  
A method for generating a photolithography mask for optically transferring a pattern formed in the mask onto a substrate utilizing an imaging system. The method includes the steps of: (a) defining...
7178128 Alternating phase shift mask design conflict resolution  
Methods and apparatuses for preparing layouts and masks that use phase shifting to enable production of subwavelength features on an integrated circuit in close (optical) proximity to other...
7174532 Method of making a semiconductor device by balancing shallow trench isolation stress and optical proximity effects  
The present invention provides a method for manufacturing a semiconductor device, comprising: determining an isolation structure stress effect of a first semiconductor device, determining an...
7155698 Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects  
Images such as mask layouts, signatures, and photographs are compared to identify similarities or dissimilarities in the images. Descriptions of the images use geometric shapes including lines,...
7152017 Numerical analysis system using hybrid grid adaptation method  
The numerical analysis system of the invention analyzes the dynamical state of the compressible fluid employing Hybrid Grid Adaptation Method by Finite Volume Method. The initial grid data are...
7131103 Conductor stack shifting  
A method for integrating a first integrated circuit design having first layers and a second integrated circuit design having second layers into a common reticle set. The second integrated circuit...
7131105 System and method for automatic mesh generation from a system-level MEMS design  
A mesh generation tool that is programmatically integrated with a system-level design and simulation environment, thereby enabling the direct generation of PDE solver input from a system-level...
7124379 Method for communicating a measuring position of a structural element that is to be formed on a mask  
A measuring position for finding a structural element for measuring a characteristic dimension, for instance, the critical dimension CD, which element is about to be formed on a mask, is inserted...
7124396 Alternating phase-shift mask rule compliant IC design  
A system, method and program product that implement a design object that automatically provides compliance to alternating phase shifted mask (altPSM) rules are disclosed. The invention implements a...
7124395 Automatic optical proximity correction (OPC) rule generation  
A method of automatically applying optical proximity correction techniques to a reticle design containing a plurality of features. The method comprises the steps of: (1) generating a first set of...
7124394 Method for time-evolving rectilinear contours representing photo masks  
Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process,...
7117476 Determining feasibility of IC edits  
A computer method of analyzing an integrated circuit (“IC”) masked design data, comprising grouping into a cluster areas of layers preceding a target metal layer that are suitable for milling,...
7114144 Mask pattern inspecting method, inspection apparatus, inspecting data used therein and inspecting data generating method  
A method of inspecting a photomask for a semiconductor integrated circuit formed based on drawing pattern data, includes the steps of classifying a drawing pattern of the semiconductor integrated...
7109751 Methods of implementing phase shift mask compliant static memory cell circuits  
Methods of implementing a static memory cell compliant with the requirements of phase shift masks. A phase shift compliant memory cell is generated by implementing a single bit line, two word...
7105841 Photolithographic techniques for producing angled lines  
The present subject matter allows non-orthogonal lines to be formed at the same thickness as the orthogonal lines so as to promote compact designs, to be formed with even line edges, and to be...
7107573 Method for setting mask pattern and illumination condition  
A method for setting a mask pattern and an illumination condition suitable for an exposure method for using plural kinds of light to illuminate a mask that arranges a predetermined pattern and an...
7103869 Method of verifying IC mask sets  
A method of fabricating an IC includes forming a test circuit in/on the wafer to electrically indicate that a correct mask set was used during a revision of the IC design during the manufacturing...
7099806 Sizing processing system and computer program for the same  
A sizing processing system according to the present invention generates an offset figure based on an offset point set obtained by offsetting the respective sides of a source figure by a distance...
7099805 Tetrahedralization of non-conformal three-dimensional mixed element meshes  
Undesirable Steiner points in tetrahedralized meshes may be minimized by tetrahedralization processes that order element subdivision based on degree of freedom data for elements in the mesh and/or...
7096451 Mesh plane generation and file storage  
A method, system and program product implementing storage of a (power or ground) mesh plane file using a multiple line shape, possibly with the storage of lines also, to reduce file size. In...
7093228 Method and system for classifying an integrated circuit for optical proximity correction  
A method and system for performing optical proximity correction (OPC) on an integrated circuit (IC) chip design is disclosed. The system and method of the present invention includes dividing the IC...
7089164 Control of overlay registration  
A system and method are disclosed for controlling a registration overlay. The method comprises estimating a state using moving horizon estimation and determining an input of the registration...
7089169 Method for coupling physical and geometrical calculation programs to a data processing system  
In the calculation or simulation of technical components for use in a technical system wherein calculation programs are provided for various physical variables which are taken into account on a...
7084413 Photolithographic techniques for producing angled lines  
The present subject matter allows non-orthogonal lines to be formed at the same thickness as the orthogonal lines so as to promote compact designs, to be formed with even line edges, and to be...
7080349 Method of developing optimized optical proximity correction (OPC) fragmentation script for photolithographic processing  
A method for developing an optimized layout fragmentation script for an optical proximity correction (OPC) simulation tool. A test pattern layout having at least one structure representing a...
7075532 Robust tetrahedralization and triangulation method with applications in VLSI layout design and manufacturability  
A tetrahedralization and triangulation method used with the proximity based rounding method to satisfy topological consistency of tetrahedralization with the bounded precision of a digital computer...
7073162 Site control for OPC  
A method for processing objects to be created via photolithography. Each object to be created is defined as a polygon that is fragmented into a number of edge segments that extend around the...
7069196 Experimental design for complex systems  
A method for a systematic approach to forming experimental designs for large, complex systems after an idea for a product is formed. Critical variables for the product are determined by experts in...
7069533 System, apparatus and method for automated tapeout support  
A system, apparatus and method for changing/modifying a customer specific reticle set design to a reticle set design that meets a user's process standard. An example embodiment of a method of...
7069534 Mask creation with hierarchy management using cover cells  
A method and apparatus for translating a hierarchical IC layout file into a format that can be used by a mask writer that accepts files having a limited hierarchy. Cover cells of the original IC...
7062346 Method for manufacturing multi-kind and small quantity semiconductor products in a mass-production line and system thereof  
A method for manufacturing multi-kind and small-quantity semiconductor products in a mass-production line and a system thereof are provided. In the method for manufacturing a semiconductor device...
7050951 Automatic detection of sweep-meshable volumes  
A method of and software for automatically determining whether a mesh can be generated by sweeping for a representation of a geometric solid comprising: classifying surface mesh schemes for...
Matches 101 - 150 out of 354 < 1 2 3 4 5 6 7 8 >