Matches 1 - 5 out of 5


Match Document Document Title
7853918 ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Reverse dummy insertion algorithm
 
A method of inserting dummy patterns includes providing a window area comprising a main pattern. The main pattern includes first patterns of a first type of features, and second patterns of a...
7818693 ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Methodology for improving device performance prediction from effects of active area corner rounding
 
A system and method for modeling a semiconductor transistor device structure having a conductive line feature of a designed length connected to a gate of a transistor device in a circuit to be...
7735054 ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Photomask manufacturing method and semiconductor device manufacturing method
 
This invention discloses a photomask manufacturing method. A pattern dimensional map is generated by preparing a photomask in which a mask pattern is formed on a transparent substrate, and...
7426041 ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus
 
Wavelength dispersion of intensity of light reflected from an evaluation object is measured. A complex refractive index of a substance forming the evaluation object and the environment are...
7039895 ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Adjustment of masks for integrated circuit fabrication
 
A pattern-dependent model is used to predict characteristics of an integrated circuit that is to be fabricated in accordance with a design by a process. The process includes (a) a fabrication...
Matches 1 - 5 out of 5