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6862726 |
Light intensity simulation method, program product, and designing method of photomask
Light intensities at light intensity calculation points on the photomask are found approximately based on distances from barycenters of opening patterns, and areas and transmission factors of the...
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6858354 |
Method to prevent side lobe on seal ring
A new method is provided for the creation of a seal ring or fuse ring over the surface of a Phase Shift Mask. A seal ring pattern is created over the surface of a phase shift mask through a layer...
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6859918 |
Alleviating line end shortening by extending phase shifters
One embodiment of the invention provides a system and a method for reducing line end shortening during an optical lithography process for manufacturing an integrated circuit. The system operates by...
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6855467 |
Transfer mask, method of dividing pattern or transfer mask, and method of manufacturing transfer mask
A pattern of a transfer mask to transfer, by the use of energy beams, a transfer pattern to a substrate is disclosed, the transfer mask made by forming an aperture pattern in a thin film portion...
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6853743 |
Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording medium
A mask pattern correction method includes the step of extracting a correction target edge from a design pattern, the step of calculating the distance from the correction target edge to the nearest...
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6854105 |
Chip arrangement determining apparatus and method
A method for determining a chip arrangement on a wafer. The method includes steps of generating a grid array in which rectangles are arranged in a grid pattern, the rectangle corresponding to a...
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6854104 |
First approximation for OPC significant speed-up
An optical proximity correction system for local correction of an aerial image produced from a mask having transmissive portions and blocking portions collectively defining a target design includes...
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6850050 |
Reticle inspection
An electric field is induced from a feature of a reticle, and the field is measured.
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6848096 |
Apparatus for correcting data of layout pattern
An apparatus for correcting layout pattern data composed of a computer system includes eight sections. The first section holds the layout pattern data. The second section holds correcting...
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6846596 |
Alternating phase shift masking for multiple levels of masking resolution
A method and system produce alternating phase shift masks using multiple phase shift mask resolution levels for multiple feature classes. In one method, a pattern for a photolithographic mask that...
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6845492 |
Signal via impedance adjustment tool
A computer-implemented method for adjusting signal via impedance includes identifying a signal via in a circuit design database. The signal via is flagged as having an impedance error. A window is...
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6842885 |
Computer program product for defining slits in a bus on a chip
A method for manufacturing a power bus on a chip, where the power bus has slits generated therein. The present invention relates to a method to manufacture a power bus in which the reference to a...
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6838228 |
System to enable photolithography on severe structure topologies
A system and related process to enable control of photolithographic pattern features on a structure having one or more severe non-flat topologies. The system includes an analysis of the Depth of...
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6839890 |
Mask manufacturing method
A method for forming, on a mask, a mask pattern used for exposure. The mask pattern includes a first pattern that blends plural types of patterns, and second pattern that is smaller in size than...
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6838212 |
Method for producing scatter lines in mask structures for fabricating integrated electrical circuits
In the method according to the invention, scatter lines ( 2, 3, 4, 5, 6, 7, 8 ) with a predetermined width are produced, which run at a predetermined distance from selected edges of mask structure...
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6832364 |
Integrated lithographic layout optimization
A method and computer system is described for designing a conflict-free altPSM layout by first constructing a planar interlock graph without predefining phase shift shapes. Feature nodes of the...
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6824931 |
Verification photomask
A verification photomask disclosed. The mask may be for process window verification purposes when switching between fabrication equipment, and/or for optical proximity correction (OPC) verification...
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6826735 |
Inspection data analysis program, defect inspection apparatus, defect inspection system and method for semiconductor device
Inspection data output from an inspection apparatus is read, the inspection data containing at least one information piece of coordinate value information and size information of a particle or a...
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6826730 |
System and method for controlling current in an integrated circuit
A circuit 10 is provided that comprises a source resistance transistor 12 connected to a common node 14 . A word line driver circuit 18 receives current if it is the word line driver...
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6823503 |
Method and apparatus for creating a phase-shifting mask for a photolithographic process
One embodiment of the invention provides a system that creates a phase-shifting mask for a photolithographic process used in fabricating an integrated circuit. The system starts by receiving a...
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6818389 |
Method of design and fabrication of integrated circuits using regular arrays and gratings
A circuit fabrication and lithography process utilizes a mask including dense repetitive structures of features that result in a wide array of fine densely populated features on the exposed...
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6818362 |
Photolithography reticle design
A method of generating a design of a reticle for a photolithography process. The reticle may include phase shift features, binary features, and mixed features. The method includes generating a...
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6818358 |
Method of extending the areas of clear field phase shift generation
An exemplary Full Phase patterning method involves patterning gates to increase process margins from conventional methods. This technique can define all poly patterns with a phase mask, using only...
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6812474 |
Pattern generation method and apparatus using cached cells of hierarchical data
A pattern generation method and system in which hierarchical image data (determining a pattern to be imaged on a target) is received at a graphics engine having a memory, at least one cell...
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6813757 |
Method for evaluating a mask pattern on a substrate
A method for evaluating a mask pattern for a product that is manufactured by a process that is described at least in part by a mathematical process model includes the steps of: (a) selecting a...
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6813758 |
Optical proximity correction driven hierarchy
The present invention is directed to an optical proximity correction driven hierarchy. A method for constructing a hierarchy of optically independent structures for use in optical proximity...
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6813756 |
Method of automatic layout design for LSI, mask set and semiconductor integrated circuit manufactured by automatic layout design method, and recording medium storing automatic layout design program
With an automatic layout method, a first line having a first line width is generated in a prescribed direction. A second line having a second line width and extending at an oblique angle with...
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6810505 |
Integrated circuit design flow with capacitive margin
A method of designing an integrated circuit includes receiving as input a representation of a circuit design and a margin factor and scaling a parameter value in the circuit design by the margin...
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6807662 |
Performance of integrated circuit components via a multiple exposure technique
An initial layout of an integrated circuit device is separated into a set of definitions for use in a multiple exposure fabrication process. The separation begins with reading a portion of the...
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6807661 |
Correcting a mask pattern using a clip mask
Correcting a mask pattern includes partitioning the mask pattern to yield templates. The following is repeated for each template to generate correction data: a clip mask is generated for a template...
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6807654 |
Method of and device for detecting pattern, method of and device for checking pattern, method of and device for correcting and processing pattern, and computer product
From the region near the target pattern, patterns whose barycenter positions are not changed even if deformation is generated due to proximity effect or coarse-and-fine difference at the time of...
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6800401 |
Method for phase shift mask design, fabrication, and use
A system and method of strong phase-shifting a beam from an actinic light source in a lithographic process includes focusing a beam from the electromagnetic beam source onto a mask adapted to...
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6801823 |
Photomask supply system with photomask production period shortened
Specification data including a method of measuring the dimension and mask design data for a photomask pattern is transmitted from an order-sender computer via a communication line. An element...
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6802051 |
Method and apparatus for reference distribution aerial image formation
A coherent laser beam is divided into an illumination beam and a reference beam. A portion of the illumination beam is passed through, or reflected off of, a subject to create a subject...
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6800428 |
Wavelength-independent exposure pattern generation method and exposure pattern generation system for lithography
A method of generating an exposure pattern for lithography to create a plurality of patterns arranged in a predetermined direction, comprises a step of counting the plurality of patterns along this...
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6799313 |
Space classification for resolution enhancement techniques
The present invention comprises a method and apparatus for classifying edges for implementing mask corrections. In one embodiment, classifications are based upon proximity ranges bounded on one...
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6799130 |
Inspection method and its apparatus, inspection system
The present invention relates to a tool for analyzing by priority a defect having a high possibility of causing an electrical failure when inspecting a particle and a pattern defect in a piece of...
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6799312 |
Dark line CD and XY-CD improvement method of the variable shaped beam lithography in mask or wafer making
This invention provides a method of using an electron beam exposure system having an electron beam with a variable shape to form patterns in a layer of resist on a substrate, a mask substrate or an...
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6799311 |
Batch/lot organization based on quality characteristics
A method and an apparatus for performing a batch organization of semiconductor wafers. Data relating to metrology data associated with a processed semiconductor wafer in a lot is acquired. A...
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6794096 |
Phase shifting mask topography effect correction based on near-field image properties
Image intensity imbalance created by a phase shifting mask (PSM) layout can be corrected using a near-field image. Because an aerial image is not used, various parameters associated with the...
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6795961 |
Priority coloring for VLSI designs
A method and computer program product is described for optimizing the design of a circuit layout that assigns binary properties to the design elements according to a hierarchy of rules. For...
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6792592 |
Considering mask writer properties during the optical proximity correction process
One embodiment of the invention provides a system that performs optical proximity correction in a manner that accounts for properties of a mask writer that generates a mask used in printing an...
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6792591 |
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
Optical proximity effects (OPEs) are a well-known phenomenon in photolithography. OPEs result from the structural interaction between the main feature and neighboring features. It has been...
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6789238 |
System and method to improve IC fabrication through selective fusing
A system and methodology for fabricating integrated circuits (ICs) on wafer die monitors at a subset of die one or more parameters that can affect the performance capabilities of associated ICs....
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6787459 |
Method for fabricating a semiconductor device
There is provided a method of fabricating a semiconductor device whereby fine patterns are formed with high dimensional accuracy by means of multiple exposures, using a phase shift mask and a trim...
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6787271 |
Design and layout of phase shifting photolithographic masks
A method for defining a full phase layout for defining a layer of material in an integrated circuit is described. The method can be used to define, arrange, and refine phase shifters to...
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6787272 |
Assist feature for random, isolated, semi-dense, and other non-dense contacts
An assist feature for isolated, and semi-dense random contacts, as may be present on a photomask used in photolithographic processes for semiconductor device fabrication, is disclosed. The assist...
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6789250 |
Pattern data generation system, method and program for pattern data generation, reticle fabricating method, and semiconductor device manufacturing method using the pattern data
A chip division information storage unit configured to register chip division information; a chip layout generation unit configured to generate master mask chip layout information by sequentially...
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6785872 |
Algorithm-to-hardware system and method for creating a digital circuit
A system and method is provided for creating a digital circuit, such as a configured FPGA or a VLSI chip. User code includes algorithm specifications having precisely defined operators and...
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6785871 |
Automatic recognition of an optically periodic structure in an integrated circuit design
A method of finding an optically periodic structure in a cell layer of an integrated circuit design includes receiving as input a physical representation of a cell layer of an integrated circuit...
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