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7595414 Metal complex compound comprising β-diketonato ligand  
To provide a metal complex compound capable of being suitably used for manufacturing a metal-containing thin film by the CVD method and a method for preparing a metal-containing thin film. A metal...
7523563 Process for preparing certain hydrohalide metal complex compounds having a specific coarse structure  
The present invention relates to a process for preparing a granular hydrohalide salt of a particular metal complex compound which is composed of a divalent metal cation as central ion and of an...
7518008 Processes for producing hafnium complexes  
Disclosed are first to sixth processes for respectively producing hafnium tetra-tertiary-butoxide, tetrakis(acetylacetonato)hafnium, tetrakis(1-methoxy-2-methyl-2-propanolato)hafnium, hafnium...
7335783 Thin film-forming material and method for producing thin film  
The thin film-forming material of the present invention comprises a bis(β-diketonato)zinc compound that is liquid at 25° C. and is suitable for forming a zinc-containing thin film. By using the...
7270770 Triboluminescent materials and devices  
This invention relates to various phosphine oxides and their use in applications which exploit the triboluminescent effect.
7238820 Fluorine-free metallic complexes for gas-phase chemical metal deposition  
The invention concerns novel copper or silver complexes and their use for gas-phase chemical deposition of metal copper or silver almost free of impurities.
7232616 Organic electroluminescent materials and devices made from such materials  
A class of organic metal complexes with mixed ligands for organic light emitting diodes are designed and characterized as the formula:(L 2 L 3 M)n. In this formula: L 2 is a bidentate ligand which...
7230127 Photoluminescent compounds  
Triboluminescent materials comprising M wherein M is chosen from Tb, Eu, Sm, Dy and from 75% to 99.99% of M is replaced by Y, Gd, La or Lu.
7169875 Organometallic compositions  
A composition suitable for use as a catalyst for the reaction of an isocyanate compound or prepolymer thereof with an alcohol to form a polyurethane comprises a mixture of (a)an organometallic...
7112690 Volatile noble metal organometallic complexes  
A series of noble metal organometallic complexes of the general formula (I): ML a X b (FBC) c , wherein M is a noble metal such as iridium, ruthenium or osmium, and L is a neutral ligand such as...
7109365 Processes for solubilizing organometallic compounds in fluorinated solvents by addition of a partly fluorinated non-catalytic co-solubilizer  
A process for solubilizing an organometallic compound in a fluorinated solvent to form an organometallic solution by adding and reacting a co-solubilizer having a partly fluorinated polymer, an...
7094284 Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same  
Chemical vapor deposition (CVD) precursor compositions for forming metal oxide high dielectric constant (κ) thin films. The precursor composition in one embodiment comprises a metal precursor...
6992200 Copper complexes and process for formation of copper-containing thin films by using the same  
Copper-containing thin films can be industrially advantageously formed by chemical vapor deposition using as the copper source a divalent copper complex bearing β-diketonato ligands having silyl...
6987197 Organozirconium composite and method of synthesizing the same, raw material solution containing the same, and method of forming lead zirconate titanate thin film  
The organozirconium composite of the present invention has a decomposition temperature which is near the respective decomposition temperatures of an organolead compound and an organotitanium...
6849752 Process for synthesizing ionic metal complex  
The invention relates to a process for synthesizing an ionic metal complex represented by the general formula (1) or (5). This process includes reacting in an organic solvent a compound...
6838573 Copper CVD precursors with enhanced adhesion properties  
This invention relates to copper(+1)(β-diketonate)(L) and related copper complexes such as copper (+1)(β-ketoiminate)(L) represented by the formula: wherein X represents O or NR 9 , R 1 and...
6790381 Drying agent  
An organic EL device is disclosed in which is placed a transparent water-capturing film comprising an easy-to-use organometallic compound illustrated by the chemical formula (1): wherein, R 1 ,...
6762314 Organometallic compositions  
An organometallic composition is described which comprises a complex of at least one orthoester of a metal having a formula M(ROAcAc) x (OR′) y in which M is selected from the group consisting...
6753437 CVD material compound and method for manufacturing the same, and CVD method of iridium or iridium compound thin film  
The present invention relates to a raw material for CVD comprising an organic iridium compound as a main component, said organic iridium compound being tris(2,4-octanedionato)iridium represented by...
6743934 Raw material compounds for use in CVD, and chemical vapor deposition of ruthenium compound thin films  
This invention provides raw material compounds for use in CVD which contain organic ruthenium compounds as a main ingredient, the organic ruthenium compounds having two β-diketones plus one diene,...
6743933 Process of forming thin film and precursor for chemical vapor deposition  
A process of producing a strontium titanate, barium titanate or barium strontium titanate thin film by chemical vapor deposition which comprises using a titanium compound represented by formula...
6682602 Chemical vapor deposition systems including metal complexes with chelating O- and/or N-donor ligands  
A method of forming a film on a substrate using one or more complexes containing one or more chelating O- and/or N-donor ligands. The complexes and methods are particularly suitable for the...
6603033 Organotitanium precursors for chemical vapor deposition and manufacturing method thereof  
The invention comprises an organotitanium precursor formed from a β-ketoester and a titanium glycolate, and dimer precursors formed from a reaction of the above organotitanium precursor with...
6562990 Titanium chelates and processes therefor  
A composition and processes for producing the composition are provided. The composition comprises titanium chelates having the formulae of TiX m (OR) 4−m , TiX m (OR) (4−m)/2 (OR 1 ) (4−m)/2...
6559328 Indium source reagent compositions, and use thereof for deposition of indium-containing films on substrates and ion implantation of indium-doped shallow junction microelectronic structures  
An indium precursor composition having utility for incorporation of indium in a microelectronic device structure, e.g., as an indium-containing film on a device substrate by bubbler or liquid...
6555701 CVD material compound and method for manufacturing the same and CVD method of ruthenium or ruthenium compound thin film  
The present invention provides a CVD material compound based on an organic ruthenium compound, the organic ruthenium compound consisting of one of cis and trans isomers of tris (2,4-octa-dionato)...
6547863 Metal compound solution and thin film formation using the same  
A metal compound solution of a metal compound represented by formula (I): wherein R 1 , R 2 , and R 3 are each a halogen-substituted or unsubstituted alkyl group having 1 to 8 carbon atoms...
6534666 Use of water and acidic water to purify liquid MOCVD precursors  
This invention relates to an improvement in a purification process for producing those liquid copper based complexes of β-diketones and, particularly the monovalent copper complexes of...
6534657 Chiral ferrocene phosphines and their use in asymmetric catalytic reactions  
Ferrocene anchored chiral ligands and metal complexes based on such chiral ligands useful in asymmetric catalysis are disclosed. The metal complexes according to the present invention are useful as...
6521770 Organozirconium compound, organic solution comprising same, and zirconium-containing thin film therefrom  
An organozirconium compound comprises zirconium complexed with a β-diketone compound and an alkoxy group having a branched alkyl group, and which has formula (1): wherein R is a branched alkyl...
6455717 Metal complexes with chelating O-and/or N-donor ligands  
A method of forming a film on a substrate using one or more complexes containing one or more chelating O- and/or N-donor ligands. The complexes and methods are particularly suitable for the...
6448314 Use of monohydrate zinc acetylacetonate as halogenated polymer stabilizer and preparation method  
The subject of the present invention is the use of zinc ateylacetonate comprising at least 4.4% by weight of water as halogenated polymer stabilizer. Its subject is likewise a process for the...
6429325 Copper material for chemical vapor deposition and process for forming thin film using the same  
A material for chemical vapor deposition comprising a β-diketonatocopper (II) complex which is liquid at room temperature.
6392076 Weakly coordinating anions containing polyfluoroalkoxide ligands  
A compound comprising a polyfluorinated anion and the use thereof is provided. Specifically, the present invention provides a compound comprising an anion which comprises a polyfluorinated alkoxide...
6383669 Chemical vapor deposition precursors  
Zirconium precursors for use in depositing thin films of or containing zirconium oxide using an MOCVD technique have the following general formula: Zr x (OR) y L, wherein R is an alkyl group; L is...
6376692 Zirconium alkoxytris (β-Diketonate), process for manufacturing the same, and liquid composition for formation of PZT film  
There is provided a compound for the formation of a PZT film using Pb(dpm) 2 where the compound has a low reactivity with Pb(dpm) 2 , has a thermal decomposition temperature which is lower than...
6369257 Hydroformylation of olefins using supported bis(phosphorus) ligands  
Supported bis(phosphorus) ligands are disclosed for use in hydroformylation reactions, including the hydroformylation of olefins. Catalysts are formed when the ligands are complexed with a...
6258157 Liquid precursors for formation of metal oxides  
A liquid precursor is provided for the formation of metal oxide films comprising a mixture of two or more types of beta-diketonate ligands bound to one or more metals. A metal beta-diketonate...
6214105 Alkane and polyamine solvent compositions for liquid delivery chemical vapor deposition  
A solvent composition for liquid delivery chemical vapor deposition of metal organic precursors, to form metal-containing films such as SrBi 2 Ta 2 O 9 (SBT) films for memory devices. An SBT...
6126996 Metal complex source reagents for chemical vapor deposition  
A metalorganic complex of the formula: MA Y X wherein: M is a y-valent metal; A is a monodentate or multidentate organic ligand coordinated to M which allows complexing of MAY with X; y is an...
6066196 Method for the chemical vapor deposition of copper-based films and copper source precursors for the same  
A method for depositing copper-based films and a copper source precursor for use in the chemical vapor deposition of copper-based films are provided. The precursor includes a mixture of at least...
5817292 MR imaging compositions and methods  
This invention provides compositions useful in MR imaging comprising a polymer comprising units comprising the residue of a chelating agent linked to a poly(alkylene oxide) moiety, the polymer...
5756610 Titanium (III) bases and β-diketonate coordinated catalyst composition for preparing high-syndiotacticity polystyrene and processes using the same  
A novel titanium (III)-based β-diketonate-coordinated compound is disclosed for catalyzing the polymerization reaction of syndiotactic polystyrenes. The titanium (III)-based compound is...
5514642 Cyclohexenone oxime ethers, their preparation and their use  
Cyclohexenone oxime ethers of the formula I ##STR1##
5424057 Polyethylene glycol carbamates  
Compounds of the formula ##STR1## in which R is alkyl having up to 4 carbon atoms, n has an average value of at least 9, X is a radical of the formula --C(O)--(NH--SO 2 ) m -- in which m is 0...
5412129 Stabilization of precursors for thin film deposition  
A precursor used in an MOCVD reactor for production of thin films of certain metal oxides is stabilized by introducing a ligand into the precursor during the precursor synthesis and thereby...
5348631 Method and apparatus for synthesizing lead β-diketonates  
A method and apparatus for the synthesis of β-diketonates such as Pb(fod) 2 and Pb(thd) 2 for use as precursors in metalorganic chemical vapor deposition processes. Lead oxide and a medium of...
5286774 Aqueous compositions  
An aqueous composition suitable for use as a printing ink is provided which comprises an aqueous solution or emulsion of a film-forming polymer containing a titanium compound which is the reaction...
5220044 Ligand stabilized +1 metal beta-diketonate coordination complexes and their use in chemical vapor deposition of metal thin films  
Chemical vapor deposition precursors for depositing copper, silver, rhodium and iridium metals on substrates comprise ligand stabilized +1 metal beta-diketonate coordination complexes of said...
5132409 Macrocyclic chelating agents and chelates thereof  
Macrocyclic derivatives of 1,4,7,10-tetraazacyclododecane of general formula (I) hereinbelow, wherein A is a group of formula (II) hereinbelow, in which R is H or alkyl or optionally substituted...
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