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7562662 |
Cleaning solution and cleaning method of a semiconductor device
A cleaning method for removing foreign bodies during the fabrication of semiconductor devices including treating a substrate with a cleaning solution including an oxidizer to form a chemical oxide...
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7521249 |
Method and composition for the preparation of a sample for analysis
The present invention relates to the preparation of a sample. Preferably, the sample is a sample to be analyzed, for example for ingredient content, etc. Preferred samples include foods, cosmetics,...
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7405189 |
Surface treatment composition and method for removing Si component and reduced metal salt produced on the aluminum die cast material in etching process
A surface treatment composition and method for removing Si and reduced metal salt produced during etching of an aluminum die cast material (“ALDC material”) without generation of nitrogen oxide...
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7253111 |
Barrier polishing solution
The polishing solution is useful for preferentially removing barrier materials in the presence of nonferrous interconnect metals with limited erosion of dielectrics. The polishing solution...
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7199091 |
Photoresist stripper
Recently, use is made of copper wiring as the wiring material for semiconductor devices, and of low dielectric constant films as the insulating film between the lines of wiring. In this connection,...
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7166419 |
Compositions substrate for removing etching residue and use thereof
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.
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7160847 |
Water solution using in metal surface treating process and process for removing oxidized film and burred edge using the same
A method for chemical etching is disclosed for taking away oxidized film and removing cut as well as punched edge burs of harden-treated carbon steel (SK3, SK4 and SK5). Thereby, the fillet edge of...
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7129029 |
Compositions substrate for removing etching residue and use thereof
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.
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7105475 |
Cleaning solution and cleaning method of a semiconductor device
A cleaning method for removing foreign bodies during the fabrication of semiconductor devices including treating a substrate with a cleaning solution including an oxidizer to form a chemical oxide...
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7041629 |
Stripper for special steel
The inventive aqueous pickling agent on the basis of sulfuric acid or phosphoric acid and hydrogen fluoride for stainless steels, which pickling agent is free of wetting and emulsifying agents,...
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7033978 |
Post-planarization clean-up
Cleaning solutions for removing residuals from the surface of an integrated circuit device. Such cleaning solutions find particular application in the fabrication of a dual damascene structure...
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7018560 |
Composition for polishing semiconductor layers
An aqueous polishing composition comprises a corrosion inhibitor for limiting removal of an interconnect metal with an acidic pH. The composition includes an organic-containing ammonium salt formed...
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6927198 |
Methods and apparatus for cleaning semiconductor substrates after polishing of copper film
A cleaning solution, method, and apparatus for cleaning semiconductor substrates after chemical mechanical polishing of copper films is described. The present invention includes a cleaning solution...
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6851432 |
Cleaning compositions
An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in...
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6821351 |
Hydrofluoric acid generating composition and method of treating surfaces
The present invention relates to compositions, kits and processes for the brightening of metal surfaces by the application of the chemical compositions. These compositions act to release...
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6787293 |
Photoresist residue remover composition
A photoresist residue remover composition is provided that includes one type or two or more types of fluoride compound and one type or two or more types chosen from the group consisting of...
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6773873 |
pH buffered compositions useful for cleaning residue from semiconductor substrates
A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation...
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6645926 |
Fluoride cleaning masking system
The present invention relates to a maskant system for use with a fluoride cleaning system. The maskant system comprises a parting compound applied to a surface which requires protection and a...
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6593282 |
Cleaning solutions for semiconductor substrates after polishing of copper film
A cleaning solution, method, and apparatus for cleaning semiconductor substrates after chemical mechanical polishing of copper films is described. The present invention includes a cleaning solution...
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6565664 |
Method for stripping copper in damascene interconnects
An inexpensive and safe copper removal method in the fabrication of integrated circuits is described. Copper is stripped or removed by a chemical mixture comprising an ammonium salt, an amine, and...
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6554912 |
Polymer remover
Compositions for the removal of polymeric material from a substrate are provided where the compositions include a polyol compound selected from (C 3 -C 20 )alkanediols, substituted (C 3 —C 20...
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6521575 |
Method and unit for regeneration of solution for cleaning glass, method and unit for cleaning silicate glass, and cathode-ray tube
A treatment solution ( 2 ) containing fluoride is added to a cleaning solution ( 1 ) drained from a cleaning tank ( 11 ). Fluoride is allowed to react with fluorosilicic acid in the cleaning...
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6465404 |
Aqueous cleaning composition with controlled PH
Aqueous cleaning compositions in which the pH is controlled comprise an acidic metal cleaning compound; at least one nitrogen containing compound to provide a stabilized pH; an emulsifier, a...
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6462005 |
Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device
A cleaning agent for use in the manufacture of a semiconductor device comprising an aqueous solution containing a quarternary ammonium salt and a fluoro compound, or an aqueous solution containing...
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6407047 |
Composition for desmutting aluminum
This invention provides an improved composition and process for pretreatment of aluminum prior to electroplating. The invention is an aqueous composition comprised of an acid, an oxidizing agent,...
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6387859 |
Method and cleaner composition for stripping copper containing residue layers
A cleaner composition for removing from within a microelectronic fabrication a copper containing residue layer in the presence of a copper containing conductor layer, and a method for stripping...
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6355605 |
Composition and method for removing iron stain and scale
A cleaning composition and method are provided for removing iron stains and scale from the external surfaces of duck decoys. An illustrative composition contains hydrochloric acid, stannous...
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6346505 |
Cleaning solution for electromaterials and method for using same
A cleaning solution for electromaterials including hydrogen fluoride and either oxygen or hydrogen gas dissolved in water. The cleaning solution may alternatively include hydrogen fluoride,...
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6323169 |
Resist stripping composition and process for stripping resist
An aqueous resist stripping composition contains (a) an oxidizing agent, (b) a chelating agent, (c) a water-soluble fluorine compound, and optionally (d) an organic solvent. Also provided is a...
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6316115 |
Non-chromate chemical treatments used on magnesium alloys
Formulations and a process are disclosed for chemically treating a surface of a product made from magnesium alloys. One formulation comprises an acid pickle comprising hydrofluoric acid and a...
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6245155 |
Method for removing photoresist and plasma etch residues
A method for the removing of plasma etch residues on a substrate comprising the steps of: (i) contacting the substrate with a cleaning composition, and (ii) contacting the substrate with ozonated...
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6235693 |
Lactam compositions for cleaning organic and plasma etched residues for semiconductor devices
A composition for the cleaning of residues from substrates from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 20 percent by weight to...
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6194369 |
Pickling/activation solution for the pretreatment of aluminum-steel composites prior to dip tinning
The invention relates to an aqueous preparation for the pickling and activation of aluminum-steel composites prior to electroless dip tinning. Specifically, the invention provides...
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6191086 |
Cleaning composition and method for removing residues
Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a...
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6124252 |
Multipurpose scale removing chemical compound
A multipurpose scale removal compound having a nonyl phenol ethoxylate with 10 moles of ethylene oxide at 0.85% of a total weight of the compound, hydrofluoric acid at 0.85% of the total weight of...
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5962385 |
Cleaning liquid for semiconductor devices
A cleaning liquid for semiconductor devices comprising 1.0 to 5% by weight of a fluorine compound of the formula R 4 NF, wherein R is a hydrogen atom or a C 1 -C 4 alkyl group, 72 to 80% by...
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5883060 |
Cleaning compositions for wafers used in semiconductor devices
An aqueous cleaning composition comprises from about 0.1 to about 2 percent of hydrogen fluoride based on the volume of the composition, from about 9 to about 15 percent of hydrogen peroxide based...
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5876509 |
Cleaning solution for cleaning semiconductor device and cleaning method using the same
A cleaning solution of a semiconductor device is composed of aqueous ammonia (NH 4 OH), methanol (CH 3 OH), hydrofluoric acid (HF) and deionized water (DI--H 2 O), the volume ratio of NH 4 OH...
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5858940 |
Printing plate image deletion composition
A hardened image is removed from printing plates by a solution of formic acid and hydrofluoric acid. In one embodiment, the solution further includes a buffer solution to maintain the oleophilic...
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5759618 |
Glass coating cmposition and method of application
A coating composition of an alkoxy silane reacted with the surface of a glass substrate and a cleaning composition and method for cleaning said glass area is disclosed. The coating provides water...
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5698503 |
Stripping and cleaning composition
An aqueous and acidic stripping and cleaning composition is provided which contains a polyhydric alcohol, ammonium fluoride, dimethylsulfoxide and water. The pH of the composition is greater than...
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5681398 |
Silicone wafer cleaning method
The present invention provides a method for cleaning a silicon wafer with a cleaning fluid, comprising 35 to 65% by weight of HNO 3 , 0.05 to 0.5% by weight of HF, 0.05 to 0.5% by weight of HCl,...
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5669980 |
Aluminum desmut composition and process
A composition of matter is disclosed for cleaning an aluminum surface comprising: a hydroxy organic acid; an organic complexing agent; a phosphorous oxide acid; a nitrogen oxide acid; ...
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5575863 |
Process for the chemical cleaning of metal components
A process for chemical cleaning of metal components having an iron oxide deposit upon a layer of compounds having a high silica content. The process includes the step of preparing an aqueous...
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5556833 |
Wheel cleaning composition containing acid fluoride salts
An aqueous cleaning composition is disclosed that is useful for cleaning wheel soils from surfaces of painted steel, painted aluminum, chrome, stainless steel, clear coated aluminum and plastic....
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5417819 |
Method for desmutting aluminum alloys having a highly reflective surface
A method of forming a highly reflective surface on aluminum alloys, the composition comprising (a) brightening the surface of a body formed from an aluminum alloy; and (b) desmutting the freshly...
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5221358 |
Descaling/deglassing salt composition and method
An improved salt and method for descaling and deglassing metals, especially metal forgings and even more specifically, titanium forgings wherein glass has been utilized as a forging lubricant, is...
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5100571 |
Additive for engine cooling system
The additive of the invention can be used as an additive to a liquid cooling system or as a metal cleaning compound. The additive removes rust and other oxidized materials from the cooling system...
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5051134 |
Process for the wet-chemical treatment of semiconductor surfaces
In the treatment of semiconductor slices, in particular silicon slices, w aqueous solutions containing hydrofluoric acid, a contamination of the slice surface with particles which interfere with...
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4971631 |
Compositions and methods for cleaning hard surfaces
This disclosure relates to a process for the removal of mineral deposits, water stains, rust, algae and other marine residue from hard surfaces, both porous and nonporous, such as ceramics,...
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