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7598216 |
Three-phase liquid polishing and cleaning composition
A three-phase liquid polishing and cleaning composition of the invention is suitable for polishing and cleaning a painted exterior surface, and includes an organic phase, an aqueous phase, and a...
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7521249 |
Method and composition for the preparation of a sample for analysis
The present invention relates to the preparation of a sample. Preferably, the sample is a sample to be analyzed, for example for ingredient content, etc. Preferred samples include foods, cosmetics,...
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7498295 |
Alkaline chemistry for post-CMP cleaning comprising tetra alkyl ammonium hydroxide
This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an alkaline...
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7473308 |
Gel containing phosphate salts for passivation
Disclosed herein is a phosphate gel for passivation, which is used for the acid washing and phosphate coating of a corroded metal surface. The phosphate gel contains phosphate and gum.
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7462249 |
Surface treatment process for metal articles
A surface treatment process for a metal article includes the following steps. Firstly, a metal article, made of at least one of copper and an alloy thereof, is provided. Secondly, a surface of the...
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7435712 |
Alkaline chemistry for post-CMP cleaning
This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an alkaline...
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RE40495 |
Substrate treated with a binder comprising positive ions
An article for sanitizing a surface with a sanitizing solution while maintaining the concentration level of a sanitizer in the sanitizing solution at an effective concentration level. A substrate...
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7405189 |
Surface treatment composition and method for removing Si component and reduced metal salt produced on the aluminum die cast material in etching process
A surface treatment composition and method for removing Si and reduced metal salt produced during etching of an aluminum die cast material (“ALDC material”) without generation of nitrogen oxide...
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7390773 |
Tire wheel cleaner comprising a dialkyl sulfosuccinate and ethoxylated phosphate ester surfactant mixture
An aqueous tire wheel cleaner composition useful for cleaning automobile tires are provided. The aqueous tire wheel cleaner composition contains an alkylene glycol, a salt of dialkyl...
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7384901 |
Process for cleaning aluminum and aluminum alloy surfaces with nitric acid and chromic acid-free compositions
A process for cleaning (e.g., desmutting) an aluminum surface, using compositions free of nitric acid and chromic acid and comprising, in one embodiment, an oxidant and at least one mineral acid...
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7381695 |
Tire wheel cleaner comprising an ethoxylated phosphate ester surfactant
An aqueous tire wheel cleaner composition useful for cleaning automobile tires are provided. The aqueous tire wheel cleaner composition contains an alkali and/or alkaline earth metal...
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7348301 |
Lysozyme-based method and composition to control the growth of microorganisms in aqueous systems
A method for killing, preventing, or inhibiting the growth of microorganisms in an aqueous system or on a substrate capable of supporting a growth of microorganisms is provided by providing...
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7348302 |
Foam cleaning and brightening composition comprising a sulfate/bisulfate salt mixture
A cleaning composition including a metal bisulfate and metal inorganic salt acid package, and at least one surfactant. The cleaning composition can be a one-step wheel cleaner/brightener. The...
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7326673 |
Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates
Chemical formulations and methods for removing unwanted material, such as unexposed photoresist, metal oxides, CMP residue, and the like, from semiconductor wafers or other substrates. The...
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7279452 |
Sanitizing applicator having a positively charged fabric cover
A sanitizing applicator for applying a liquid sanitizer to a surface. The sanitizer may be a quaternary ammonium compound (QAC)-based or chlorine-based sanitizer containing positively charged ions...
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7256165 |
Cleaning compositions
The present invention relates to cleaning composition comprising a surface substantive polymer for cleaning surfaces, particularly the exterior surfaces of a vehicle.
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7253111 |
Barrier polishing solution
The polishing solution is useful for preferentially removing barrier materials in the presence of nonferrous interconnect metals with limited erosion of dielectrics. The polishing solution...
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7235517 |
Degreasing compositions
Degreasing compositions that may be used, for example, to degrease substrates such as contaminated surfaces of automobile engines are disclosed. The degreasing compositions comprise a builder, an...
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7186675 |
Quick drying washing and cleaning agent, comprising an anionic/cationic/amphoteric surfactant mixture
Surfactant combinations containing:
(a) one or more alkyl ether sulfates; (b) at least one quaternary ammonium compound corresponding to formula I:
in which EO is ethylene oxide, R and R′...
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7183246 |
Cleaning/disinfectant composition to clean surfaces
A composition and method for cleaning surfaces having deposits, such as drink water tanks, supply water wells, water filter systems, and distributor water lines. The composition contains in...
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7166419 |
Compositions substrate for removing etching residue and use thereof
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.
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7160847 |
Water solution using in metal surface treating process and process for removing oxidized film and burred edge using the same
A method for chemical etching is disclosed for taking away oxidized film and removing cut as well as punched edge burs of harden-treated carbon steel (SK3, SK4 and SK5). Thereby, the fillet edge of...
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7129029 |
Compositions substrate for removing etching residue and use thereof
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.
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7122510 |
One-bath particle-free chemical cleaning
The invention relates to a method for one-bath chemical cleaning and preservation of interior surfaces of hollow steel bodies, without any organic solvents, comprising controlled change of the...
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7073519 |
Facility parts cleaning solution for processing of (meth)acrylic acid and/or (meth)acrylic esters and cleaning method using said cleaning solution
The present invention relates to a facility parts cleaning solution for the processing of (meth)acrylic acid and/or (meth)acrylic esters and a cleaning method using the cleaning solution. An...
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7064098 |
Composition for removing scale deposited on titanium materials
A descaling composition for use in removing scale deposited on a member made of titanium or a titanium alloy, the descaling composition containing a hydroxycarboxylic acid, a sulfamic acid and...
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7056872 |
Solution composition for removing a remaining photoresist resin
Cleaning solutions for removing photoresist resins remaining on the underlying layer patterns formed by photolithography process using the photoresist patterns as etching mask. The cleaning...
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7053031 |
Cleaning agents for the outer surfaces of means of transport
The invention relates to the use of a composition for cleaning the outside of a means of transport. The composition contains component a) at least one tertiary amino oxide of formula R 1 R 2 R 3 ...
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7045492 |
Cleaning composition comprising cationic surfactants, chelant, and an alcohol solvent mixture
A cleaning composition for treating and removing residue containing hydrocarbons and other flammable substances uses a mixture of one or more cleaning members containing quaternary salts, a...
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7018560 |
Composition for polishing semiconductor layers
An aqueous polishing composition comprises a corrosion inhibitor for limiting removal of an interconnect metal with an acidic pH. The composition includes an organic-containing ammonium salt formed...
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7012051 |
Inhibition of titanium corrosion
A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative...
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7005409 |
Dissolving gel for cured polysulfide resins
A cured resin dissolving composition comprising a cellulosic gelling agent prepared in n,n-dimethylacetamide, known for its high penetration and solvency to polar resins, with a glycol-ether...
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6982241 |
Cleaning composition comprising an inorganic acid mixture and a cationic surfactant
A cleaning composition is provided according to the invention. The cleaning composition includes a product of mixing an acid component, a source of phosphoric acid component, and an oxidant...
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6972277 |
Foaming clean and polish emulsions comprising bisquaternary organomodified silicone
This invention provides for, inter alia, a cleaning and polishing oil-in-water emulsion which comprises:
A. about 0.1 to about 25% of at least one silicone oil with a viscosity ranging...
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6946037 |
Silicone remover
The invention relates to the use of a surface-active agent and to the use of cleaning agents obtained by dilution of said surface-active agent for removing silicone-containing deposits from surfaces.
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6916776 |
Article for sanitizing a surface comprising a wipe containing an adhesive, positively charged, binder
A restaurant cleaning towel made from a substrate such as a woven, nonwoven, or knit fabric. A sanitizer release polymer composition comprising at least one cationic (or alternatively, nonionic)...
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6896739 |
Anti-tarnish aqueous treatment
An aqueous solution that has the capacity for removing tarnish and other soil from copper, silver, gold and other noble metals and alloys thereof comprises an acid, thiourea and a transition metal...
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6851432 |
Cleaning compositions
An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in...
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6833109 |
Method and apparatus for storing a semiconductor wafer after its CMP polishing
In an apparatus, after completion of a CMP (i.e., chemical mechanical polishing) operation of a semiconductor wafer, the thus polished wafer is temporarily stored in a water tank before it is...
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6830629 |
Method for treating brass
Brass articles having leachable lead are contacted with an aqueous caustic solution that contains a chelating agent. A brass article can optionally be post-treated by contacting it with an aqueous...
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6827090 |
Process for removing deposits from water-carrying systems and devices for water supply
Process for removing deposits from water-carrying systems and devices for water supply, or from their individual parts, in which the deposits are dissolved by means of an aqueous treatment solution...
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6821351 |
Hydrofluoric acid generating composition and method of treating surfaces
The present invention relates to compositions, kits and processes for the brightening of metal surfaces by the application of the chemical compositions. These compositions act to release...
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6805135 |
Cleaning fluid and cleaning method for component of semiconductor-treating apparatus
A cleaning solution is used to remove a byproduct derived from a decomposed substance of a process gas containing C and F. The cleaning solution contains 75 wt % N-methyl-2-pyrrolidone, 15 wt %...
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6803354 |
Stabilization of hydrogen peroxide in acidic baths for cleaning metals
Aqueous acidic solutions of hydrogen peroxide used for metal surface treatments may be stabilized to decrease the rate of hydrogen peroxide decomposition by the use of an aryl sulfonic acid such as...
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6794352 |
Cleaning towel having a color identifying label and sanitizer release polymer composition
A restaurant cleaning towel made from a substrate such as a woven, nonwoven, or knit fabric. A sanitizer release polymer composition comprising at least one cationic (or alternatively, nonionic)...
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6783919 |
Stripper composition for photoresist
The invention relates to a TFT-LCD high-performance stripper composition for a photoresist, and more particularly to a stripper composition for a photoresist comprising: 20-60 wt % of...
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6780228 |
Polish compositions and method of use
An improved self-cleaning polish is obtained by adding a wax to an oil either pre-heated, or then subsequently heated, with stirring. Subsequently, and optionally, water and/or an acetic acid...
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6776853 |
Cleaning method and method for manufacturing liquid crystal device
In a cleaning apparatus 500 , as a pre-cleaning step, cleaning is performed in a first and a second backup cleaning bath 602 and 603 using a hydrocarbon-based cleaning liquid composed of a...
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6740629 |
Composition for washing a polishing pad and method for washing a polishing pad
An object of the present invention is to provide a composition for washing a polishing pad which removes a water-insoluble compound which was separated from a surface to be polished during...
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6723691 |
Post chemical-mechanical planarization (CMP) cleaning composition
A cleaning solution for cleaning microelectronic substrates, particularly for post-CMP or via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine,...
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