|
Match
|
Document |
Document Title |
|
|
7618723 |
Glass substrate for magnetic disk, its production method and magnetic disk
A method for producing a glass substrate for a magnetic disk by polishing a circular glass plate, which comprises a step of polishing the principal plane of the circular glass plate by using a...
|
|
|
7365045 |
Aqueous cleaner with low metal etch rate comprising alkanolamine and tetraalkylammonium hydroxide
A cleaning solution is provided for cleaning metal-containing microelectronic substrates, particularly for post etch, via formation and post CMP cleaning. The cleaning solution consists of a...
|
|
|
7235516 |
Semiconductor cleaning composition comprising an ethoxylated surfactant
A substrate surface cleaning liquid medium and a cleaning method using the cleaning liquid medium are capable of removing finely particulate contaminants more efficiently than conventional...
|
|
|
7087564 |
Acidic chemistry for post-CMP cleaning
This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an acidic...
|
|
|
7026275 |
Method of reducing photoelectric device leakage current in conjugated polymer and conjugated polymer composition
A method of reducing the photoelectric device leakage current caused by residual metal ions in conjugated polymer. A chelating agent is added to a conjugated polymer material, thereby the...
|
|
|
7012051 |
Inhibition of titanium corrosion
A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative...
|
|
|
6908892 |
Photoresist remover composition
The present invention is a photoresist remover composition used in order to remove photoresist during the manufacturing process of semiconductor devices, such as large-scale integrated circuits and...
|
|
|
6875288 |
Cleaning agent and cleaning method
The cleaning agent described above comprises a surfactant and an organic solvent, and the cleaning method described above is characterized by allowing the cleaning agent described above to flow on...
|
|
|
6875733 |
Ammonium borate containing compositions for stripping residues from semiconductor substrates
The present invention comprises formulations for stripping wafer residues which originate from a halogen based plasma metal etching followed by oxygen plasma ashing. The formulations contain the...
|
|
|
6852682 |
Composition for cleaning chemical mechanical planarization apparatus
The present invention relates to chemical compositions and methods of use for cleaning CMP equipment, including the interiors of delivery conduits caring CMP slurry to the necessary sites. The...
|
|
|
6818604 |
System and method for cleaning workpieces
The invention relates generally to a system and method for improved cleaning of workpieces and workpiece cleaning tools. More specifically, the invention provides systems and methods for cleaning...
|
|
|
6773873 |
pH buffered compositions useful for cleaning residue from semiconductor substrates
A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation...
|
|
|
6660700 |
Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures
A semiconductor wafer cleaning formulation, including 2-98% wt. organic amine, 0-50% wt. water, 0.1-60% wt. 1,3-dicarbonyl compound chelating agent, 0-25% wt. of additional different chelating...
|
|
|
6660701 |
Stabilized solvent system for cleaning and drying
This invention relates to improved stabilizing compositions for n-propyl bromide. More particularly, the cleaning composition includes about 0.1 to 5% Butylene oxide, about 0.1 to 5.0% t-butanol,...
|
|
|
6656895 |
Remover composition
A remover composition comprising (a) 100 parts by weight of a composition obtained by adding a cyclic urea compound to water, water-soluble organic solvent, or a mixture of water and water-soluble...
|
|
|
6635118 |
Aqueous cleaning of polymer apply equipment
This invention relates to water-based alkaline cleaning solutions and their use as an environmentally safer replacement of organic solvents to remove photoresist, polyimide residue and other...
|
|
|
6599870 |
Boric acid containing compositions for stripping residues from semiconductor substrates
The present invention comprises formulations for stripping wafer residues which originate from a halogen based plasma metal etching followed by oxygen plasma ashing. The formulations contain the...
|
|
|
6564812 |
Alkanolamine semiconductor process residue removal composition and process
A two carbon atom linkage alkanolamine compound composition comprises the two carbon atom linkage alkanolamine compound, gallic acid or catechol, and optionally, an aqueous hydroxylamine solution....
|
|
|
6551972 |
Solutions for cleaning silicon semiconductors or silicon oxides
A solution for cleaning silicon semiconductors or silicon oxides comprising H 2 O 2 , NH 4 OH and at least one component A selected from the group consisting of fluoro-containing compounds and...
|
|
|
6546939 |
Post clean treatment
A composition for removal of chemical residues from metal or dielectric surfaces or for chemical mechanical polishing of a copper or aluminum surface is an aqueous solution with a pH between about...
|
|
|
6541434 |
Cleaning solution for semiconductor surfaces following chemical-mechanical polishing
A composition and method are provided for cleaning contaminants from the surface of a semiconductor wafer after the wafer has been chemically-mechanically polished. The cleaning composition...
|
|
|
6530995 |
Processing compositions and methods of using same
Compositions and methods for processing (e.g., cleaning) substrates, such as semiconductor-based substrates, as well as processing equipment, include one or more compounds of Formula (I): ...
|
|
|
6498132 |
Method for treating surface of substrate and surface treatment composition used for the same
A method for treating the surface of a substrate with a surface treatment composition, wherein the surface treatment composition comprises a liquid medium containing a complexing agent as a metal...
|
|
|
6475966 |
Plasma etching residue removal
Disclosed are compositions useful for the removal of plasma etching polymeric residue from substrates, such as electronic devices. Also disclosed are methods of removing such plasma etching...
|
|
|
6465403 |
Silicate-containing alkaline compositions for cleaning microelectronic substrates
The invention provides aqueous alkaline compositions useful in the microelectronics industry for stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other...
|
|
|
6383414 |
Use of corrosion inhibiting compounds to inhibit corrosion of metal plugs in chemical-mechanical polishing
A process of inhibiting a corrosion of metal plugs formed in integrated circuits is described. The corrosion inhibiting process includes providing a partially fabricated integrated circuit surface...
|
|
|
6319884 |
Method for removal of cured polyimide and other polymers
Non-aqueous cleaning compositions capable of removing cured polyimides and other polymers from a metal circuitry containing substrate such as a semiconductor device for rework and other purposes...
|
|
|
6291410 |
Compositions for the stripping of photoresists in the fabrication of integrated circuits
For the stripping of photoresists, the invention proposes to use a mixture of dimethyl sulphoxide DMSO) or N-methylpyrrolidone (NMP) and 3-methoxypropylamine (MOPA). Advantageously, a little water...
|
|
|
6239089 |
Aqueous cleaning solutions containing elevated levels of N-alkyl-2-pyrrolidone
Aqueous cleaning solution concentrates with elevated levels of N-alkyl-2-pyrrolidone solubilized therein, comprising a surfactant formulation incorporating at least one N-alkyl-2-pyrrolidone, the...
|
|
|
6191086 |
Cleaning composition and method for removing residues
Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a...
|
|
|
6187729 |
Cleaning composition comprising solvating agent and rinsing agent
A liquid cleaning composition comprising a solvating agent and a rinsing agent, the ratio of the vapor pressure of said rinsing agent to the vapor pressure of said solvating agent being at least...
|
|
|
6171405 |
Methods of removing contaminants from integrated circuit substrates using cleaning solutions
Cleaning solutions for removing contaminants from integrated circuit substrates comprise fluoroboronic acid and phosphoric acid. Methods of removing contaminants from integrated circuit substrates...
|
|
|
6147042 |
Detergent for processes for producing semiconductor devices or producing liquid crystal devices
The cleaner of the present invention contains, as an active ingredient, a polyphosphoric-acid-urea condensate or phosphoric-acid-urea polymer which is a reaction product from orthophosphoric acid...
|
|
|
6140287 |
Cleaning compositions for removing etching residue and method of using
An etching residue remover for cleaning etching residue from a substrate, derived from a mixture of at least hydroxylamine, an alkanolamine which is miscible with said hydroxylamine, water, and,...
|
|
|
6136766 |
Cleaning compositions
A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula:...
|
|
|
6103680 |
Non-corrosive cleaning composition and method for removing photoresist and/or plasma etching residues
Non-corrosive cleaning compositions that are useful for removing photoresist and/or plasma etch residues from a substrate. The cleaning composition comprises: (i) a hydroxy-(lower alkyl)-hydrazine,...
|
|
|
6074999 |
Cleaning agents for paint piping and process for cleaning paint piping
Disclosed is a cleaning agent for cleaning paint piping without disassembling it in reduced number of steps and a process for cleaning the paint piping using the same. A cleaning agent based on...
|
|
|
6057240 |
Aqueous surfactant solution method for stripping metal plasma etch deposited oxidized metal impregnated polymer residue layers from patterned metal layers
A method for forming a patterned metal layer within a microelectronics fabrication. There is first provided a substrate employed within a microelectronics fabrication. There is then formed over the...
|
|
|
6043206 |
Solutions for cleaning integrated circuit substrates
Cleaning solutions for removing contaminants from integrated circuit substrates comprise fluoroboric acid and phosphoric acid. Methods of removing contaminants from integrated circuit substrates...
|
|
|
5972862 |
Cleaning liquid for semiconductor devices
There is disclosed a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound; (B) water-soluble or water-miscible organic solvent; and (C) inorganic...
|
|
|
5958144 |
Flux-removing aqueous cleaning composition and method of use
A flux-removing, aqueous cleaning composition contains: (A) a solvent phase consisting essentially of water; and (B) a flux-removing phase containing an alkaline salt component and a surfactant...
|
|
|
5877133 |
Ester-based cleaning compositions
Compositions are provided for removing grease or for cleaning substrates. The compositions include a lower (C 1 -C 4 ) alkyl ester of a C 11 -C 13 fatty acid, a non-cationic surfactant, and...
|
|
|
5792277 |
N-propyl bromide based cleaning solvent and ionic residue removal process
Stabilized, n-propyl bromide containing cleaning solvent compositions and a cleaning process are provided. The cleaning solvent compositions include an alcohol selected from 1-propanol and...
|
|
|
5767048 |
Cleaning process
A cleaning process which comprises contacting a printed circuit board to which a residue of a flux is attached with a cleaning composition containing a first solvent and an organic compound, and...
|
|
|
5755893 |
Flux removing compositions
An aqueous flux removing composition is provided comprising alkali metal carbonate salts, an alkali metal silicate corrosion inhibitor and a surfactant formulation which comprises an...
|
|
|
5747437 |
Cleaning compositions based on 1,1,1,2,2,4,4-heptafluorobutane and C.sub.1 -C.sub.3 alcohols
To replace compositions based on CFC or CFHC in applications for cleaning solid surfaces (in particular defluxing), the invention proposes azeotropic or quasi-azeotropic compositions based on...
|
|
|
5744436 |
Azeotropic compositions containing perfluorinated cycloaminoether
An azeotropic composition includes a perfluorinated cycloaminoether and an organic solvent.
|
|
|
5691288 |
Finisher-preserver-cleaner composition for lithographic printing plates
A composition for finishing, preserving and cleaning lithographic printing plates which is composed of a polyol having a molecular weight in the range of from about 50 to about 3,000; a starch or...
|
|
|
5665688 |
Photoresist stripping composition
A photoresist stripping composition containing: (a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) 70-20% by weight of alkanolamine compounds; and (c)...
|
|
|
5561105 |
Chelating reagent containing photoresist stripper composition
A non-corrosive photoresist composition containing: (a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) 70-20% by weight of selected amine compounds;...
|