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6770107 |
Abrasive-filled thermoset composition and its preparation, and abrasive-filled articles and their preparation
A curable resin composition comprises a poly(arylene ether), an acryloyl monomer, an allylic monomer, and an abrasive filler. The composition tolerates high filler contents, cures rapidly, and...
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6767658 |
Hard wear resistant film, process for forming hard film, and target used to form hard film
Disclosed is a hard film exhibiting high wear resistance, with composition of (Al b ,[Cr 1−α V α ] c (C 1−d N d ), satisfying the condition of 0.5≦b≦0.8, 0.2≦c≦0.5, b+c=1,...
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6761747 |
Dispersion containing pyrogenically manufactured abrasive particles with superparamagnetic domains
An aqueous dispersion containing abrasive particles comprises abrasive particles having superparamagnetic metal oxide domains in a non-magnetic metal oxide or non-metal oxide matrix. The abrasive...
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6761746 |
Sanding disc
A sanding disc particularly useful for smoothing drywall. The sanding disc includes a circular abrasive disc having an abrasive surface, and a circular foam disc smaller in diameter than the...
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6755878 |
Abrasive articles and methods of making and using the same
Abrasive articles have an adhesive layer in contact with a liner having protrusions that contact the adhesive layer.
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6756110 |
Cutting tool
A cutting tool of the invention comprises a cemented carbide main body and a coating layer formed on the surface of the main body, wherein a region where a reduction ratio of Zr to the inside of...
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6752844 |
Ceric-ion slurry for use in chemical-mechanical polishing
The invention provides a chemical-mechanical polishing slurry comprising a liquid, cerium ions as an oxidizer, an abrasive, and a pH increasing substance. The cerium ions are in the liquid in a...
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6749485 |
Hydrolytically stable grooved polishing pads for chemical mechanical planarization
An improved pad and process for polishing metal damascene structures on a semiconductor wafer. The process includes the steps of pressing the wafer against the surface of a polymer sheet in...
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6749653 |
Abrasive particles containing sintered, polycrystalline zirconia
Abrasive particles and methods of making abrasive particles are disclosed. The abrasive particles may be incorporated into a variety of abrasive articles, including bonded abrasives, coated...
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6743267 |
Gel-free colloidal abrasive polishing compositions and associated methods
Gel-free colloidal abrasive polishing compositions and associated methods for polishing (e.g., chemical mechanical polishing) are described. These abrasive polishing compositions are comprised of a...
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6743269 |
Granules based on pyrogenically produced aluminium oxide, process for the production thereof and use thereof
Granules based on aluminium oxide having the characteristics: Average grain diameter: 5.0 to 150 μm Tamped density: 300 to 1200 g/l The granules are produced by dispersing aluminium oxide in...
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6743268 |
Chemical-mechanical planarization of barriers or liners for copper metallurgy
A tantalum-based liner for copper metallurgy is selectively removed by chemical-mechanical planarization (CMP) in an acidic slurry of an oxidizer such as hydrogen peroxide, deionized water, a...
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6740590 |
AQUEOUS DISPERSION, AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING USED FOR MANUFACTURE OF SEMICONDUCTOR DEVICES, METHOD FOR MANUFACTURE OF SEMICONDUCTOR DEVICES, AND METHOD FOR FORMATION OF EMBEDDED WRITING
The object of the present invention is to provide an aqueous dispersion that can give the required properties for a wide range of uses including electronic materials, magnetic materials, optical...
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6740169 |
Method of reworking a conditioning disk
A conditioning disk and a conditioner for a chemical mechanical polishing (CMP) pad, and a method of fabricating, reworking, and cleaning the conditioning disk, are utilized to improve conditioning...
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6736869 |
Method for forming a planarizing pad for planarization of microelectronic substrates
A planarizing pad for planarizing a microelectronic substrate, and a method and apparatus for forming the planarizing pad. In one embodiment, planarizing pad material is mixed with compressed gas...
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6733553 |
Abrasive composition for polishing semiconductor device and method for producing semiconductor device using the same
The present invention can provide an abrasive composition for polishing a semiconductor device which composition contains water, microparticles of an abrasive, and a chelating agent, wherein the...
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6726534 |
Preequilibrium polishing method and system
The invention provides a polishing system that comprises a liquid carrier, an alkali metal ion, hydroxide ions, and a polishing pad and/or an abrasive. The abrasive can be dispersed in the liquid...
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6726990 |
Silicon oxide particles
A collection of silicon oxide nanoparticles have an average diameter from about 5 nm to about 100 nm. The collection of silicon oxide nanoparticles effectively include no particles with a diameter...
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6723143 |
Reactive aqueous metal oxide sols as polishing slurries for low dielectric constant materials
An aqueous metal oxide sol slurry has been developed for removal of low dielectric constant materials. The slurry is formed directly in solution utilizing non-dehydrated chemically active metal...
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6709317 |
Method and apparatus for uniformly planarizing a microelectronic substrate
A method and apparatus for planarizing a microelectronic substrate. The apparatus can include a planarizing medium having a relatively hard polishing pad and a planarizing liquid disposed on a...
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6706082 |
Crystalline ceric oxide sol and process for producing the same
Substantially monodisperse crystalline ceric oxide sols and processes for producing such sols are provided. Sols include crystalline ceric oxide particles having a particle size I (particle size...
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6706083 |
Fused—Al2O3-MgO-Y2O3 eutectic abrasive particles, abrasive articles, and methods of making and using the same
Fused abrasive particles comprising eutectic material comprising Al 2 O 3 —MgO—Y 2 O 3 eutectic. The fused abrasive particles can be incorporated into abrasive products such as coated...
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6705935 |
Abrasive molding and abrasive disc provided with same
An abrasive molding composed of a mass of inorganic particles, said mass having pores intervening among the inorganic particles, which molding has abrasive area to be placed in frictional contact...
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6702650 |
Porous abrasive article having ceramic abrasive composites, methods of making, and methods of use
An abrasive article made from a plurality of abrasive composites bonded to form a three dimensional abrasive article. Each abrasive composite includes a plurality of primary abrasive particles...
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6702867 |
Vitrified bonded abrasive tools
The present invention provides a vitrified-bonded abrasive tool wherein the abrasive grit portion comprises a thermally sensitive abrasive grain, such as sintered sol gel microcrystalline alpha...
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6702866 |
Homogeneous fixed abrasive polishing pad
A homogeneous fixed abrasive polishing article, or pad, including a matrix of a cured resin coated soft filler material having at least one working surface and an abrasive uniformly distributed...
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6692547 |
Method for preparing abrasive articles
A method for preparing an abrasive article of the present invention comprises coating a conductive binder resin on one surface of a cylinder paper or greige cloth, coating abrasive particles on one...
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6692822 |
Coated cemented carbide cutting tool insert
A cemented carbide has a <70 μm, preferably 10-40 μm, thick binder phase enriched surface zone containing W and Mo but depleted in cubic carbide. The overall content of Mo in the surface zone...
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6689450 |
Enhanced Al2O3-Ti(C,N) multi-coating deposited at low temperature
A coated body having a multi-layer of κ-Al 2 O 3 and or γ-Al 2 O 3 or TiN applied by MTCVD (Medium Temperature Chemical Vapor Deposition) is disclosed. The multi-layers can be interspersed with...
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6689692 |
Composition for oxide CMP
A chemical mechanical polishing composition comprising a soluble cerium compound at a pH above 3 and a method to selectively polish a silicon oxide overfill in preference to a silicon nitride film...
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6685918 |
Oral cleansing product
There is disclosed an oral cleansing product comprising as an abrasive an alumnina in the form of particles having d 10 below 3.5 μm, d 50 below 1.0 μm, and a specific surface area below 6 m 2 /g.
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6685756 |
Coated abrasives
A coated abrasive having an abrasive surface comprising a plurality of individual abrasive structures wherein the structures comprise a cured binder resin in an amount that is from 58 to 75% by...
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6682574 |
Binder for abrasive articles, abrasive articles including the same and method of making same
A binder for abrasive products, coated abrasive articles and a method of making the same comprising a urea formaldehyde resin precursor cured in the presence of a sole catalyst which consists...
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6679928 |
Polishing composition having a surfactant
A polishing composition for polishing a semiconductor substrate has a pH of under 5.0 and comprises (a) a carboxylic acid polymer comprising polymerized unsaturated carboxylic acid monomers having...
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6679929 |
Polishing composition and polishing method employing it
A polishing composition comprising the following components (a) to (g): (a) at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium...
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6676718 |
Polishing of semiconductor substrates
According to the invention, an aqueous polishing composition comprises, abrasive particles and water of basic pH to remove a barrier layer by CMP using a polishing pad, the aqueous polishing...
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6673430 |
PVD Al2O3 coated cutting tool
The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of refractory compounds of which at least one layer of fine-grained,...
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6673132 |
SiO2/Al2O3 composite abrasive and method for producing the same
An SiO 2 /Al 2 O 3 composite abrasive is disclosed, which has positive surface charges when dispersed in an alkaline water solution. This SiO 2 /Al 2 O 3 composite abrasive includes an Al 2 O 3 ...
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6669749 |
Fused abrasive particles, abrasive articles, and methods of making and using the same
Fused abrasive particles comprising eutectic colonies. The fused abrasive particles can be incorporated into abrasive products such as coated abrasives, bonded abrasives, non-woven abrasives, and...
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6669745 |
Abrasive article with optimally oriented abrasive particles and method of making the same
The invention provides abrasive articles with optimally oriented abrasive particles and a method of making the same. The method involves contacting a substrate with the contact and mating surfaces...
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6669746 |
Filamentary brush bristle material
Brush bristles include filaments of synthetic resin material containing two or more types of abrasive particles selected from among diamond powder, stainless-steel powder, titanium powder, silicon...
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6666750 |
Fused AL2O3-rare earth oxide-ZrO2 eutectic abrasive particles, abrasive articles, and methods of making and using the same
Fused abrasive particles comprising eutectic material. The fused abrasive particles can be incorporated into abrasive products such as coated abrasives, bonded abrasives, non-woven abrasives, and...
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6663683 |
Aqueous dispersions, process for their production, and their use
An aqueous dispersion containing a cerium oxide-doped, pyrogenically produced silicon dioxide, wherein the cerium oxide is introduced through an aerosol of a cerium salt solution or suspension and...
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6656240 |
Non-asbestos friction material
A non-asbestos friction material is made by molding and curing a composition which includes a fibrous base other than asbestos, a binder, an organic filler, an inorganic filler and an abrasive. The...
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6655478 |
Fracture and wear resistant rock bits
A fracture and wear resistant rock bit is disclosed, which includes a bit body, and at least one roller cone disposed on the bit body adapted such that at least one row of cutting elements disposed...
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6652888 |
Method for skin rejuvenation with buffing cream
A cream moisturizer for resurfacing human skin is provided with a suspension of microcrystals of alumina (Al 2 O 3 ) in a ratio of approximately 14 grams per ounce of moisturizer cream. The cream...
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6648933 |
Powder composition and method for polishing stone
Powder composition and method for polishing stone. The present invention relates to a powder composition and to a method for polishing stone, in particular granite, said method making use of said...
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6645265 |
Polishing formulations for SiO2-based substrates
Powders of particles comprising a ceramic core and a coating of ceria deposited thereon provide an economical and effective abrasive for glass polishing formulations.
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6645624 |
Composite abrasive particles and method of manufacture
The present application discloses an agglomerate. The agglomerate comprises a crystalline matrix. The agglomerate may additionally comprise abrasive particles. The agglomerate has a normalized bulk...
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6645263 |
Cellular abrasive article
Abrasive articles abrasive articles (e.g., abrasive wheels) comprised of abrasive agglomerate particles dispersed within cellular polymeric material, and methods of making and using the abrasive...
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