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6428392 |
Abrasive
An abrasive comprising at least the following components (A) and (B): (A) cerium-containing abrasive grains having an average particle size of from 0.5 to 5.0 μm; and (B) particles having an...
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6425929 |
Metal cleaner-polish
A metal cleaner-polish in the form of a substantially homogeneous liquid slurry containing aliphatic hydrocarbons, finely divided abrasive, and isopropanol as a stabilizer/solvent.
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6423125 |
Polishing composition
A polishing composition for magnetic disk substrates to be used for memory hard disks, which comprises: (a) water; (b) at least one phosphate. compound selected from the group consisting of a...
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6416560 |
Fused abrasive bodies comprising an oxygen scavenger metal
A fused metal matrix abrasive body and method of preparing a fused metal matrix abrasive body is provided. The fused metal matrix abrasive body comprises a plurality of metal coated abrasive...
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6413287 |
Method for making an abrasive article and abrasive articles thereof
Reaction injection molding is utilized as a method for making an abrasive article that includes supplying an effective amount of abrasive particles to at least a portion of an abrasive article mold...
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6413441 |
Magnetic polishing fluids
Magnetic polishing fluid compositions comprising various size colloidal and/or non-colloidal magnetic particle and colloidal size polishing particle compositions suitable for polishing ceramic and...
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6409780 |
Water-laden solid matter of vapor-phase processed inorganic oxide particles and slurry for polishing and manufacturing method of semiconductor devices
Water-laden solid matter is provided which is obtained by adding 40 to 300 weight parts of water to 100 weight parts of inorganic oxide particles synthesized by fumed process or metal evaporation...
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6410121 |
Cermet tool and method for manufacturing the same
A cermet tool 1 having a hard layer 11 which is very hard and which covers the surface of the tool 1 , and an interior portion 13 which is covered with and softer than the hard layer 11 . A...
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6406504 |
Resilient abrasive article with hard anti-loading size coating
A resilient abrasive article includes a resilient elongatable substrate, abrasive particles adhesively bonded to the substrate with a flexible make coat, and a hard size coat applied over the...
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6402978 |
Magnetic polishing fluids for polishing metal substrates
Magnetic polishing fluid compositions for polishing metal substrates containing colloidal and/or non-colloidal magnetic particles are described. The compositions contain oxidizers and, for example,...
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6395044 |
Scented engineered abrasives
The invention provides coated abrasives with an engineered surface that releases a pleasing fragrance when used.
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6395379 |
Workpiece with wear-protective coating
Disclosed are workpieces, especially those made of steel or hard metals, provided with at least two coatings of a wear-protective system, which qualities are improved even with high system...
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6395045 |
Hard material titanium carbide based alloy, method for the production and use thereof
The present invention relates to a method for producing an abrasive grain from a hard-material alloy based on titanium carbide, with alloying contributions from the group of carbides, nitrides,...
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6394888 |
Abrasive tools for grinding electronic components
Abrasive tools containing high concentrations of hollow filler materials in a resin bond are suitable for polishing and backgrinding of hard materials, such as ceramic wafers and components...
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6391072 |
Abrasive grain
Alpha alumina abrasive grits which are particularly well-suited to medium to low pressure grinding applications wherein the grits comprise uniformly dispersed microvoids.
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6387139 |
Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry
A cerium oxide slurry for polishing comprising cerium oxide dispersed in water, wherein the slurry has a conductivity of about 30c μS/cm or less when the cerium oxide concentration in the slurry...
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6387502 |
Diamond-coated hard metal member
A diamond-coated hard metal member comprising a WC-based hard metal substrate having a roughened surface formed by electrolytic etching and a diamond coat layer coating the roughened surface with...
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6382951 |
Al2O3 coated cutting tool
The present invention describes a coated CBN cutting tool for metal machining. The tool is composed of one or more CBN bodies with or without a cemented carbide backing. The coating comprises one...
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6383238 |
Resin bonded abrasive tool
The abrasive particle layer of resin bonded abrasive tool is constructed by resin binder phase consisting of heat hardening resin, for example, phenol resin etc. and super abrasive particle of...
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6383239 |
Free abrasive slurry composition and a grinding method using the same
The present invention relates to a free abrasive slurry composition which is advantageously used in uniform grinding of a composite material composed of a plurality of materials each having...
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6383624 |
PVD Al2O3 coated cutting tool
The present invention describes a coated CBN cutting tool for metal machining. The tool consists of one or more CBN substrate bodies with or without carbide backing. The coating is composed of one...
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6379406 |
Polishing compositions for semiconductor substrates
This invention provides a polishing composition with a stable pH for use in CMP of semiconductor substrates comprising: high-purity submicron particles of a metal oxide and a soluble metal salt of...
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6375692 |
Method for making microabrasive tools
A microabrasive tool is formed from a slurry including liquid, abrasive grains, a bonding material, and a polymer—for example, gellan gum. The slurry is cast in a mold, and the polymer is...
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6375694 |
Polishing slurry compositions capable of providing multi-modal particle packing
Water based polishing slurries, comprising oxide polishing particles. The polishing slurries comprise an innovative (multi-modal) particle distribution for improved polishing performance.
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6375552 |
Slurries for chemical mechanical polishing
Novel slurries for the chemical mechanical polishing of thin films used in integrated circuit manufacturing. A tungsten slurry of the present invention comprises an oxidizing agent, such as...
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6372001 |
Abrasive articles and their preparations
An abrasive article comprising an abrasive fabric comprising a fabric having discrete areas of electro-deposited metal extending on or therethrough and having abrasive material embedded in the...
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6372002 |
Functionalized diamond, methods for producing same, abrasive composites and abrasive tools comprising functionalized diamonds
A functionalized diamond comprises an organic functionalized moiety. The organic functionalized moiety being selected from: vinyl, amide, alcohol, acidics, phenolics, hydroxyls, carboxyl, aldehyde,...
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6372336 |
Coated abrasive article
A coated abrasive article comprises a backing, a first binder on the backing, and a plurality of abrasive particles in the first binder. The first binder precursor is an energy-curable preferably,...
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6372003 |
Polishing abrasive of crystalline ceric oxide particles having surfaces modified with hydroxyl groups
According to the present invention, a process is provided for producing crystalline ceric oxide particles having a particle diameter of 0.005 to 5 μm, which comprises the steps of reacting a...
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6364920 |
CMP formulations
CMP formulations comprising alumina particles and an iodate oxidizer can be stabilized against pH drift during use by acidification using an organic acid. Formulation pH stability can be further...
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6364919 |
Process for preparing metal oxide slurries suitable for the chemical mechanical polishing of semiconductors
Disclosed is a process for preparing metal oxide slurries suitable for the chemical mechanical polishing (CMP) of semiconductor devices. A suspension of metal oxide in water is dispersed at a...
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6358624 |
Polycrystal diamond tool
The present invention provides a diamond sintered compact tool. Which is excellent in economy as well as cutting edge strength. A diamond sintered compact cutting tool comprising a diamond...
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6352567 |
Nonwoven abrasive articles and methods
Described are abrasive articles comprising a nonwoven; a binder layer contacting the nonwoven and at least partially filling spaces between fibers of the nonwoven; first abrasive particles adhered...
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6348076 |
Slurry for mechanical polishing (CMP) of metals and use thereof
Slurry compositions comprising an oxidizing agent, copper corrosion inhibitor, abrasive particles; surface active agent and polyelectrolyte are useful for polishing or planarizing chip...
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6343976 |
Abrasive, method of polishing wafer, and method of producing semiconductor device
To polish polishing target surfaces of SiO 2 insulating films or the like at a high rate without scratching the surface, the present invention provides an abrasive comprising a slurry comprising a...
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6338743 |
Buffer solutions for suspensions used in chemical-mechanical polishing
The present invention relates to buffer systems in the form of solutions or salts for preparing suspensions which can be used for chemomechanical polishing. In particular, these buffer systems can...
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6336945 |
Abrasive composition for the base of magnetic recording medium and process for producing the base by using the same
The present invention relates to an abrasive composition for substrates of magnetic recording media, containing at least an abrasive, an abrasive auxiliary and water. The abrasive auxiliary...
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6337152 |
Cutting tool made of A12O3-coated cBN-based sintered material
A cutting tool according to the present invention is coated with one or more Al 2 O 3 layers on at least a part of the surface of a cBN-based sintered material substrate taking part in cutting....
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6332831 |
Polishing composition and method for producing a memory hard disk
A polishing composition for a memory hard disk, which comprises at least the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of...
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6333099 |
Multilayered PVD coated cutting tool
There is disclosed a cutting tool comprising a body of a sintered cemented carbide or cermet, ceramic or high speed steel on which at least on the functioning parts of the surface of the body, a...
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6333098 |
Coated cutting insert
The present invention discloses a coated cutting insert particularly useful for dry milling of grey cast iron. The insert is characterized by a WC--Co cemented carbide substrate and a coating...
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6333103 |
Aluminum oxide-coated article
An aluminum oxde-coated article has a first coating layer and a second coating layer formed in this order on a substrate, the first coating layer having a single- or multi-layer structure and being...
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6325705 |
Chemical-mechanical polishing slurry that reduces wafer defects and polishing system
A chemical-mechanical polishing slurry made by mixing a ferric salt oxidizer with a solution to produce a mixture with a dissolved ferric salt oxidizer, filtering the mixture to remove most...
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6322425 |
Colloidal polishing of fused silica
A polishing application uses alkali, colloidal silica for polishing silicate-based glasses. Preferably, the silica solutions are adjusted to a pH of or above 10. The polished silicate-based glass...
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6319096 |
Composition and method for planarizing surfaces
A composition and a method for planarizing or polishing a surface with the composition are provided. The composition comprises about 5-90 wt. % of fumed metal oxide and about 10-95 wt. % of...
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6319608 |
Titanium chromium alloy coated diamond crystals for use in saw blade segments and method for their production
Diamond particles are coated with a Ti metal to form Ti metal coated diamond particles product by contacting the diamond particles with an alloy of the following composition, Ti (1-x) Cr x , where...
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6315803 |
Polishing composition and polishing process
Object: To provide a polishing composition which is capable of polishing a tantalum-containing compound at a high stock removal rate and whereby the copper surface after polishing is scarcely...
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6315502 |
Cutting tool with means for controlling the formation of chips
A cutting tool has a chip breaker, disposed in the region of the chip face, for preventing uncontrolled chip formation. The chip breaker is disposed at a certain spacing from the cutting edge of a...
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6312486 |
Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto
A slurry composition enhances the removal of polish-resistant surface moieties from the surface of a semiconductor wafer during chemical-mechanical polishing. The slurry composition is a mixture...
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6312484 |
Nonwoven abrasive articles and method of preparing same
An abrasive article is provided having a rebulkable nonwoven web and a continuous sheet-like abrasive coating bonded to the first major surface of the nonwoven web. The abrasive coating comprising...
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