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7591865 |
Method of forming structured abrasive article
The disclosure is directed to a method of forming a structured abrasive article. The method includes coating a backing with an abrasive slurry comprising binder and abrasive grains, partially...
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7585340 |
Polishing composition containing polyether amine
The inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, and a polyether amine. The inventive method comprises chemically-mechanically polishing a...
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7556555 |
Polishing pad, use thereof and method for manufacturing the same
The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an...
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7553346 |
Abrasive product
The invention provides a method and apparatus for making an abrasive product comprising providing a substantially horizontally deployed flexible backing having a first surface bearing an at least...
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7553344 |
Shaped thermally stable polycrystalline material and associated methods of manufacture
A new industrial thermally stable polycrystalline diamond (TSP) is disclosed and described as a replacement of natural as well as synthetic diamond grit in concrete cutting, grinding, polishing,...
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7550020 |
Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method
A chemical mechanical polishing aqueous dispersion comprises abrasives in a concentration of not more than 1.5% by mass, wherein the abrasives comprise ceria and have an average dispersed particle...
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7527662 |
Abrasive body and method of manufacturing the same
An abrasive body for polishing includes a resin structure made of resin and a plurality of abrasive grains wherein a critical surface tension of the resin ranges from 1.6×10 −2 to 4.0×10 −2 ...
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7524345 |
Rapid tooling system and methods for manufacturing abrasive articles
A coated abrasive article includes a substrate and a patterned set of abrasive structures. Each abrasive structure of the patterned set of abrasive structures has an engineered microfeature.
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7503949 |
Abrasive article and method
Provided are abrasive articles comprising a plurality of abrasive particles and a binder wherein the binder comprises a polymer formed by a reaction between a polyisocyanate and a polyoxirane,...
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7497884 |
Fine abrasive paper backing material and method of making thereof
In one embodiment is provided a method of making an abrasive backing having a smooth surface comprising the steps of providing a paper having a first paper surface and a second paper surface;...
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7494519 |
Abrasive agglomerate polishing method
Provided is a method of polishing comprising providing a workpiece, providing a fixed abrasive article, providing conditioning particles, and relatively moving the workpiece and the fixed abrasive...
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7491251 |
Method of making a structured abrasive article
A method of making an abrasive product includes compacting a cohesive layer of abrasive particles and particulate curable binder precursor prior to forming curable shaped structures, and then at...
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7485364 |
Polyurethane elastic fiber and process for producing same
A polyurethane elastic fiber, containing inorganic compound particles that have an average particle size of 0.5 to 5 mm and that show a refractive index of 1.4 to 1.6, having at least one protruded...
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7467988 |
Slurry composition and method for polishing organic polymer-based ophthalmic substrates
The present invention provides a slurry composition and method for polishing organic polymer-based ophthalmic substrates. The slurry composition according to the invention includes an aqueous...
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7410413 |
Structured abrasive article and method of making and using the same
A structured abrasive article comprises a backing, a structured abrasive layer affixed to the backing, the structured abrasive layer comprising: a plurality of raised abrasive regions, each raised...
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7404831 |
Abrasive composite, method for making the same, and polishing apparatus using the same
An abrasive composite, a method for making the abrasive composite, and a polishing apparatus using the abrasive composite are disclosed. The abrasive composite includes a matrix and a plurality of...
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7393371 |
Nonwoven abrasive articles and methods
Nonwoven abrasive articles, particularly lofty nonwoven abrasive articles, with a textured, non-planar surface and an abrasive coating thereon. The coating may cover the entire surface or only...
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7384436 |
Polycrystalline grits and associated methods
Polycrystalline grits and methods of making grits which allow for a high degree of shape and size distribution control, as well as improved abrasive performance are described and disclosed. In one...
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7344988 |
Alumina abrasive for chemical mechanical polishing
Methods of manufacturing alumina abrasive for use in chemical mechanical polishing are described, wherein the abrasive is in a slurry having gamma alumina formed in a low temperature fuming...
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7344575 |
Composition, treated backing, and abrasive articles containing the same
A curable composition comprises epoxy resin preparable by reaction of epichlorohydrin with at least one of bisphenol A or bisphenol F, polyfunctional urethane(meth)acrylate, dicyandiamide and...
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7344574 |
Coated abrasive article, and method of making and using the same
A coated abrasive article has a backing treatment preparable by at least partially polymerizing an isotropic backing treatment precursor comprising polyepoxide, polyfunctional urethane...
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7344573 |
Impregnation of grinding wheels using supercritical fluids
An additive impregnated abrasive article and method for fabricating the same is provided. The method includes providing an abrasive article having a pore structure, dissolving an additive in a...
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7335239 |
Chemical mechanical planarization pad
A Chemical Mechanical Planarization (CMP) Pad. The CMP pad may be hydrophobic due to the incorporation of metal complexing agents. The CMP pad substantially retaining planarazation characteristics...
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7300874 |
Chemical mechanical polishing compositions and methods relating thereto
A method for chemical mechanical polishing of semiconductor substrates containing a metal layer requiring removal and metal interconnects utilizing a composition containing engineered copolymer...
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7300479 |
Compositions for abrasive articles
A structured abrasive article, methods of making an abrasive article, and methods of using an abrasive article. The abrasive composites forming the abrasive article have a height of at least 500...
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7300478 |
Slurry composition and method of use
The present invention provides an aqueous slurry composition that comprises cerium oxide and/or cerium oxide-containing mixed rare earth oxide abrasive particles, a polyacrylate, and an agent that...
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7297171 |
Methods of making ceramics comprising Al2O3, REO, ZrO2 and/or HfO2 and Nb205 and/or Ta2O5
Methods for making glass-ceramics comprising Al 2 O 3 , REO, at least one of ZrO 2 or HfO 2 and at least one of Nb 2 O 5 or Ta 2 O 5 . Glass-ceramics according to the present invention can be...
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7297170 |
Method of using abrasive product
The invention provides a method and apparatus for making an abrasive product comprising providing a substantially horizontally deployed flexible backing having a first surface bearing an at least...
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7294158 |
Abrasive product, method of making and using the same, and apparatus for making the same
The invention provides a method and apparatus for making an abrasive product comprising providing a substantially horizontally deployed flexible backing having a first surface bearing an at least...
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7294048 |
Abrasive article
An abrasive article includes a substrate having opposed first and second surfaces, a make coat on at least a portion of the first surface, abrasive mineral particles on at least a portion of the...
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7291188 |
Polishing cloth and method of manufacturing semiconductor device
A polishing cloth used in the chemical mechanical polishing treatment comprises a molded body of (meth)acrylic copolymer having an acid value of 10 to 100 mg KOH/g and a hydroxyl group value of 50...
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7285146 |
Resilient abrasive article
A resilient hand-held abrasive article includes a flexible conformable backing layer having opposed first and second major surfaces, a flexible reinforcing layer affixed to at least one of the...
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7270878 |
Ionic toothbrush bristles and method of fabricating a toothbrush
A toothbrush with bristles containing a far-infrared emitting material and multi-element minerals is disclosed. The negative ions and radiation emitted from the bristles stimulate the cells of the...
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7267700 |
Structured abrasive with parabolic sides
An abrasive article and methods of making and using the same are disclosed. The abrasive article includes a plurality of features on a backing. The features have a base and a body. The body is...
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7264641 |
Polishing pad comprising biodegradable polymer
The invention is directed to a polishing pad for use in chemical-mechanical polishing comprising a biodegradable polymer. The biodegradable polymer comprises a repeat unit selected from the group...
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7258708 |
Chemical mechanical polishing pad dresser
CMP pad dressers and their methods of manufacture are disclosed. One aspect of the present invention provides a CMP pad dresser having improved superabrasive grit retention in a resin layer. The...
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7258707 |
AI2O3-La2O3-Y2O3-MgO ceramics, and methods of making the same
Al 2 O 3 —La 2 O 3 —Y 2 O 3 —MgO ceramics (including glasses, crystalline ceramics, and glass-ceramics) and methods of making the same. Ceramics according to the present invention can be...
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7247179 |
Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal
A composition and associated methods for chemical mechanical planarization (or other polishing) are described. The composition may comprise an abrasive and a dispersed hybrid organic/inorganic...
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7241324 |
Method of producing abrasive tools
A method of producing abrasive tools with abrasive particles consisting of Al 2 O 3 has the steps of producing a mixture of initial components with particles of Al(OH) 3 , forming blanks of an...
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7241204 |
Polishing pad, method of producing same and method of polishing
A polishing pad has a resin sheet having a flat surface and abrading particles fixed inside and on the surface of this resin sheet. Its tensile strength is in the range of 30 MPa or greater and 70...
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7235296 |
Formulations for coated diamond abrasive slurries
The present invention is directed to an abrasive article and methods of making the abrasive article. An abrasive coating on the abrasive article comprises at least 20% by weight of a superabrasive...
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7235114 |
Flexible abrasive article
A resilient flexible abrasive article includes a continuous backing layer including a support layer coated with foam, the continuous backing layer having opposed major surfaces, at least one of the...
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7223297 |
Planarizing solutions including abrasive elements, and methods for manufacturing and using such planarizing solutions
A planarizing slurry for mechanical and/or chemical-mechanical polishing of microfeature workpieces. In one embodiment, the planarizing slurry comprises a liquid solution and a plurality of...
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7217305 |
Polishing body
An object of the present invention is to provide a polishing body, wherein the abrasive in the polishing body are extremely dispersed well, which provides stable polishing performance in the...
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7217179 |
Polishing pad
A polishing pad having a polishing layer which has specific composition and a ratio of the storage elastic modulus at 30° C. to the storage elastic modulus at 60° C. of 2 to 15 and a ratio of the...
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7195658 |
Antiloading compositions and methods of selecting same
An antiloading composition includes a first organic compound. The compound has a water contact angle criterion that is less than a water contact angle for zinc stearate. The first compound also...
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7192336 |
Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
Methods and apparatuses for planarizing a microelectronic substrate. In one aspect of the invention, a first portion of an energy-sensitive, non-sacrificial planarizing pad material is exposed to a...
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7186654 |
Chemical mechanical polishing slurry and method of manufacturing semiconductor device by using the same
A chemical mechanical polishing slurry contains an alumina powder including α-alumina particles and at least one other alumina particles having a crystal structure different from that of...
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7182798 |
Polymer-coated particles for chemical mechanical polishing
The polishing composition is suitable for chemical mechanical polishing magnetic, optical, semiconductor or silicon substrates. The polishing composition includes abrasive particles in a liquid...
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7169199 |
Curable emulsions and abrasive articles therefrom
A curable emulsion comprises: an oil phase comprising blocked polyisocyanate and curative; and an aqueous phase comprising at least partially neutralized crosslinked copolymer of monomers...
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