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8148266 |
Method and apparatus for conformable polishing
A multi-station polish system and process for polishing thin, flat (planar) and rigid workpieces. Workpieces are conveyed through multiple polishing stations that include a bulk material removal...
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8137157 |
Lapping carrier and method
Provided is a double-sided lapping carrier comprising a base carrier having a first major surface, a second major surface and at least one aperture for holding a workpiece, said aperture extending...
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8137162 |
Semiconductor wafer polishing machine
Embodiments of the invention comprise a machine adapted for polishing work pieces such as large silicon wafers. A wafer polishing machine in accord with the invention comprises a rotatable platen...
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8118646 |
Carrier for double-side polishing apparatus, double-side polishing apparatus using the same, and double-side polishing method
A carrier for a double-side polishing apparatus, including at least: a carrier base placed between upper and lower turn tables, the carrier base having a holding hole therein, the holding hole...
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8100743 |
Polishing apparatus
A polishing apparatus is used for polishing a substrate such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes a polishing table having a polishing surface, a top...
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8100739 |
Substrate holding apparatus, polishing apparatus, and polishing method
A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a...
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8070560 |
Polishing apparatus and method
A polishing apparatus is used for polishing a substrate such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes a polishing table having a polishing surface, a...
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8066551 |
Retaining ring with shaped surface
A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat,...
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8052505 |
Wafer processing method for processing wafer having bumps formed thereon
A wafer processing method for processing a wafer (20) having bumps (B) formed on a front surface (21) comprises the steps of: holding on a table (51), a bump region-conforming member (40) that has...
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8033895 |
Retaining ring with shaped profile
Retaining rings with curved surfaces are described. The curved surfaces prevent damage to a fixed abrasive polishing pad when the retaining ring is used in a polishing process. The curved surfaces...
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8021215 |
Carrier head with retaining ring and carrier ring
A carrier head that has a housing, a base assembly, a retaining ring, a carrier ring, and a flexible membrane is described. The base assembly is vertically movable relative to the housing. The...
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8002610 |
Double side polishing method and apparatus
To provide a technique for rotating a plurality of carriers 500 between an upper and a lower rotary surface plates to simultaneously polish both surfaces of a plurality of works 400. The work 400...
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7976362 |
Substrate polishing apparatus and method
A substrate polishing apparatus includes a substrate holding mechanism having a head for holding a substrate to be polished, and a polishing mechanism including a polishing table with a polishing...
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7967665 |
Substrate holding apparatus, polishing apparatus, and polishing method
A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a...
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7959496 |
Flexible membrane assembly for a CMP system and method of using
A flexible membrane assembly for a wafer carrier in a CMP system. The flexible membrane assemble has a flat, flexible membrane joined to a rigid cylindrical sidewall.
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7950985 |
Flexible membrane for carrier head
A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. The flexible membrane has a main portion and an outer annular portion,...
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7946325 |
Device and method for blocking optical lens
A centering device (13) is arranged to surround a loading table (11) on which a lens blank (1) is to be set, to set the geometric center of the lens blank (1) to coincide with the center of the...
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7942725 |
Polishing apparatus
A polishing apparatus has a top ring configured to hold a semiconductor wafer on a substrate holding surface, and a pushser configured to deliver the semiconductor wafer to the top ring and receive...
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7934979 |
Retaining ring with tapered inner surface
A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly...
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7927190 |
Retaining ring with shaped surface
A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat,...
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7901273 |
Carrier ring for carrier head
A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A carrier ring has an annular upper portion and an annular lower portion...
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7887394 |
Double-disc grinding machine, static pressure pad, and double-disc grinding method using the same for semiconductor wafer
The present invention is a static pressure pad for supporting both sides of a raw wafer without contact by a static pressure of a fluid supplied to the both sides of the raw wafer in a double-disc...
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7883397 |
Substrate retainer
A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with...
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7867063 |
Substrate holding apparatus and polishing apparatus
A substrate holding apparatus is for holding a substrate such as a semiconductor wafer in a polishing apparatus for polishing the substrate to a flat finish. The substrate holding apparatus...
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7857683 |
CMP retaining ring
An improved chemical mechanical polishing retaining ring. A representative embodiment comprises a base portion made from a wear-resistant plastic material, and an upper portion, or backbone...
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7842158 |
Multiple zone carrier head with flexible membrane
A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer...
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7819723 |
Retainer ring and polishing machine
To provide a retainer ring by which an object to be polished can be uniformly polished, and deterioration thereof can be suppressed, and it does not take time to recycle, and a polishing machine...
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7789736 |
Stepped retaining ring
A two part retaining ring is described. An rigid upper portion has an annular recess along its inner diameter. An annular wearable lower portion has an inner diameter, an annular extension defined...
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7780505 |
Semiconductor manufacturing apparatus and semiconductor manufacturing method
A semiconductor manufacturing apparatus includes a supporting unit for supporting a semiconductor wafer received from a CMP apparatus and a vacuuming system for holding the wafer on the supporting...
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7749052 |
Carrier head using flexure restraints for retaining ring alignment
One embodiment provides a retaining ring assembly. The retaining ring assembly comprises a retaining ring configured to circumferentially surround and retain the substrate within an inner surface...
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7740521 |
Polishing head, polishing apparatus and polishing method for semiconductor wafer
The present invention provides a polishing head 1 comprising a carrier 3, a guide ring 4, a dress ring 5, and a head body 2, wherein the head body 2 is rotatable, and holds the carrier 3, the guide...
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7731572 |
CMP head
A CMP head includes a membrane support and a membrane. The membrane support is disk-shaped, having an origin and a radius R. The membrane support has at least a ventilator disposed in a central...
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7727055 |
Flexible membrane for carrier head
A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. The flexible membrane has a main portion and an outer annular portion,...
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7722439 |
Semiconductor device manufacturing apparatus and method
A semiconductor device manufacturing apparatus according to the present invention comprises a head for holding a semiconductor wafer, a retainer ring for surrounding the outer periphery of the...
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7699688 |
Carrier ring for carrier head
A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A carrier ring has an annular upper portion and an annular lower portion...
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7677958 |
Retaining ring with flange for chemical mechanical polishing
A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly...
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7666068 |
Retainer ring
A retainer ring and a method of using the retainer ring are provided. The retainer ring has openings along a bottom surface. Grooves encompass the openings and extend to an interior portion of the...
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7662025 |
Polishing apparatus including separate retainer rings
A polishing apparatus includes a polishing pad for polishing a wafer and a polishing head for holding the wafer. The polishing head includes a retainer ring, a membrane sheet, and a head body. The...
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7654887 |
Vacuum chuck and suction board
The vacuum chuck according to the present invention is provided with a sucking plate for sucking and holding an object to be sucked, in which a sucking layer made of a porous ceramic and a dense...
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7654888 |
Carrier head with retaining ring and carrier ring
A carrier head that has a housing, a base assembly, a retaining ring, a carrier ring, and a flexible membrane is described. The base assembly is vertically movable relative to the housing. The...
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7635292 |
Substrate holding device and polishing apparatus
A substrate holding device according to the present invention includes an elastic membrane to be brought into contact with a rear surface of a substrate, an attachment member for securing at least...
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7632173 |
Substrate holding apparatus and polishing apparatus
The present invention relates to a substrate holding apparatus for holding a substrate such as a semiconductor wafer in a polishing apparatus for polishing the substrate to a flat finish. The...
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7607967 |
Substrate processing method and substrate processing apparatus
A holding mode is selectively switched, in accordance with the content of processing of a substrate, among three holding modes: (a) a first holding mode in which while first support pins F1 through...
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7597609 |
Substrate retaining ring for CMP
The edge effect or variation in polishing edge profile on a substrate undergoing CMP is reduced by structuring a retaining ring, housed in a carrier head for retaining the substrate, such that the...
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7591714 |
Wafer grinding and tape attaching apparatus and method
A wafer grinding and tape attaching apparatus and method, the method includes providing a wafer to a chuck table, grinding a back side of the wafer, providing a wafer ring having dicing tape and...
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7575504 |
Retaining ring, flexible membrane for applying load to a retaining ring, and retaining ring assembly
A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A retaining ring assembly has a flexible membrane shaped to provide an...
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7537512 |
Multiple fluid supplying apparatus for carrier of semiconductor wafer polishing system
The present invention related to a multiple fluid supplying apparatus for carrier of semiconductor wafer polishing system which comprises a rotary union at a driving side and a rotary union at a...
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7520795 |
Grooved retaining ring
A retaining ring for chemical mechanical polishing is described. The ring has a bottom surface with non-intersecting grooves. Alternating grooves are at opposing angles to one another.
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7503837 |
Composite retaining ring
A two part retaining ring is described that has a lower ring and an upper ring. The lower ring contacts a polishing surface during chemical mechanical polishing. The upper surface and the lower...
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7500908 |
Pneumatic blocking support for an optical lens
The pneumatic blocking support which is used to block an optical lens (200) on a machine or device has means (3) for fixing it on a corresponding element of the machine or device. The blocking...
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