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8183496 Method of forming a pattern on a work piece, method of shaping a beam of electromagnetic radiation for use in said method, and aperture for shaping a beam of electromagnetic radiation  
A method of forming a pattern (700) on a work piece (1260) includes placing a pattern mask (1210) over the work piece, placing an aperture (100, 500, 600, 1220) over the pattern mask, and placing...
8163469 Coating and developing apparatus, coating and developing method, and storage medium  
A coating and developing apparatus has: a treatment block-including a water repellent module performing water repellent treatment on a substrate, a coating module, and a developing module; a...
8133823 Method for picking up semiconductor chips from a wafer table and method for mounting semiconductor chips on a substrate  
The invention relates to a method for picking up semiconductor chips from a wafer table and, optionally, their mounting on a substrate by means of a pick-and-place system. The position and...
8119547 Method of manufacturing a semiconductor integrated circuit device including elimination of static charge of a treated wafer  
A sealed type container accommodating a semiconductor substrate is positioned to a load port of a semiconductor manufacturing apparatus. The semiconductor substrate is taken out of the container....
8110510 Low temperature synthesis of nanowires in solution  
Methods synthesizing nanowires in solution at low temperatures (e.g., about 400° C. or lower) are provided. In the present methods, the nanowires are synthesized by exposing nanowire precursors to ...
8110511 Methods and systems of transferring a substrate to minimize heat loss  
A method of transferring one or more substrates between process modules or load lock stations while minimizing heat loss is provided. In some embodiments the method comprising the steps of:...
8093103 Multiple chip module and package stacking method for storage devices  
Stacking techniques are illustrated in example embodiments of the present invention wherein semiconductor dies are mounted in a module to become a MCM which serves as the basic building block. A...
8084375 Hot edge ring with sloped upper surface  
A hot edge ring with extended lifetime comprises an annular body having a sloped upper surface. The hot edge ring includes a step underlying an outer edge of a semiconductor substrate supported in...
8080481 Method of manufacturing a nanowire device  
The present invention provides a method for manufacturing a semiconductor nanowire device in mass production at a low cost without an additional complex nanowire alignment process or SOI substrate...
8027528 Method for calculating height of chuck top and program storage medium for storing same method  
A method is for calculating a height of a chuck top. A height of the top surface of the chuck top which corresponds to an arbitrary position specified on the XY coordinate plane by a computer is...
8017430 Structured silicon anode  
A battery can be fabricated from a substrate including silicon. This allows the battery to be produced as an integrated unit. The battery includes an anode formed from an array of spaced elongated...
8004018 Fabrication method of electronic devices based on aligned high aspect ratio nanoparticle networks  
A layer of high aspect ratio nanoparticles is disposed on a surface of a substrate under the influence of an electrical field applied on the substrate. To create the electrical field, a voltage is...
7989797 Connectible nanotube circuit  
Carbon nanotube template arrays may be edited to form connections between proximate nanotubes and/or to delete undesired nanotubes or nanotube junctions.
7968474 Methods for nanowire alignment and deposition  
The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with...
7960297 Load lock design for rapid wafer heating  
A semiconductor processing tool heats wafers using radiant heat and resistive heat in chamber or in a load lock where pressure changes. The wafers are heated in greater part with a resistive heat...
7955946 Methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices  
The invention includes methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an...
7948096 Semiconductor using specific contact angle for immersion lithography  
A semiconductor device having a specific contact angle for immersion lithography is disclosed. The semiconductor device includes a substrate and a top layer disposed on the substrate. The top layer...
7939365 Phase change memory device, manufacturing method thereof and operating method thereof  
A phase change memory (PCM) device, a manufacturing technique of making the PCM device, and a way of operating the PCM device is presented. The PCM device is structured to have a silicon on...
7932190 Flow control of photo-polymerizable resin  
This invention provides methods and systems, e.g., to control the flow of photo-polymerizable resins. In the method, e.g., flow of a photo-polymerizable resin is restricted from illuminated resin...
7910904 Multi-level phase change memory  
A phase change memory may be formed which is amenable to multilevel programming. The phase change material may be formed with a lateral extent which does not exceed the lateral extent of an...
7897525 Methods and systems of transferring, docking and processing substrates  
In accordance with some embodiments described herein, a method for transferring a substrate to two or more process modules is provided, comprising loading at least one substrate into one or more...
7890202 Method for creating wafer batches in an automated batch process tool  
A method of batching substrates in an automated processing tool, the automated process tool and a system for batching substrates in the automated process tool. The method includes selecting a first...
7883995 Method of forming stable functionalized nanoparticles  
A novel top-down procedure for synthesis of stable passivated nanoparticles uses a one-step mechanochemical process to form and passivate the nanoparticles. High-energy ball milling (HEBM) can...
7880318 Sensing system and method of making the same  
A sensing system includes a nanowire, a passivation layer established on at least a portion of the nanowire, and a barrier layer established on the passivation layer.
7875469 Method of operating and process for fabricating an electron source  
A method of operating and process for fabricating an electron source. A conductive rod is covered by an insulating layer, by dipping the rod in an insulation solution, for example. The rod is then...
7867814 Resistance memory element and method of manufacturing the same  
A resistance memory element having a pair of electrodes and an insulating film sandwiched between a pair of electrodes includes a plurality of cylindrical electrodes of a cylindrical structure of...
7867921 Reduction of etch-rate drift in HDP processes  
A processing chamber is seasoned by providing a flow of season precursors to the processing chamber. A high-density plasma is formed from the season precursors by applying at least 7500 W of source...
7855156 Method of and apparatus for inline deposition of materials on a non-planar surface  
In manufacturing a semiconductor device, a first chamber is provided. An opening couples the first chamber to a first environment through which at least one substrate can pass. A first seal...
7846781 Deletable nanotube circuit  
Carbon nanotube template arrays may be edited to form connections between proximate nanotubes and/or to delete undesired nanotubes or nanotube junctions.
RE41989 Method and apparatus for electronic device manufacture using shadow masks  
Electronic devices are formed on a substrate that is advanced stepwise through a plurality of deposition vessels. Each deposition vessel includes a source of deposition material and has at least...
7842535 Structured silicon anode  
A silicon/lithium battery can be fabricated from a silicon substrate. This allows the battery to be produced as an integrated unit on a chip. The battery includes a silicon anode formed from...
7842623 Composition for removing an insulation material and related methods  
A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent...
7838308 Method of controlling embedded material/gate proximity  
A method that includes forming a gate of a semiconductor device on a substrate and forming a recess for an embedded silicon-straining material in source and drain regions for the gate. In this...
7825037 Fabrication of enclosed nanochannels using silica nanoparticles  
In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using...
7807587 Substrate processing apparatus and substrate processing method  
The present invention is a substrate processing apparatus including: a holder that holds substrates in a tier-like manner; a processing container that contains the holder and that conducts a...
7803661 Flip chip laser bonding process  
An apparatus for heating a chip includes: a laser generator for emitting a laser beam to a semiconductor chip to heat the semiconductor chip; and a beam intensity adjuster disposed on a laser...
7799663 Fabrication of semiconductor metamaterials  
A method of fabricating a semiconductor metamaterial is provided, comprising providing a sample of engineered microstructured material that is transparent to electromagnetic radiation and comprises...
7795061 Method of creating MEMS device cavities by a non-etching process  
MEMS devices (such as interferometric modulators) may be fabricated using a sacrificial layer that contains a heat vaporizable polymer to form a gap between a moveable layer and a substrate. One...
7794611 Micropump for integrated device for biological analyses  
A micropump includes a body (10) of semiconductor material, accommodating fluid-tight chambers (32), having an internal preset pressure, lower than atmospheric pressure. The fluid-tight chambers...
7790479 Method and device for monitoring the contamination of substrate wafers  
A device is used to measure contamination directly in transport enclosures of FOUP or SMIF type, for example. The transport enclosure is placed on an adapter that sets up direct communication...
7786465 Deletable nanotube circuit  
Carbon nanotube template arrays may be edited to form connections between proximate nanotubes and/or to delete undesired nanotubes or nanotube junctions.
7755111 Programmable power management using a nanotube structure  
Programmable power management using a nanotube structure is disclosed. In one embodiment, a method includes coupling a nanotube structure of an integrated circuit to a conductive surface when a...
7754623 Apparatus for forming film hole  
An exemplary film hole forming apparatus (400) includes a chemical etching system (410) and a driving system (420). The driving system includes a transmission belt, which passes through the...
7745330 Method of carbon nanotube modification  
Carbon nanotube apparatus, and methods of carbon nanotube modification, include carbon nanotubes having locally modified properties with the positioning of the modifications being controlled. More...
7737055 Systems and methods for manipulating liquid films on semiconductor substrates  
A semiconductor substrate undergoing processing to fabricate integrated circuit devices thereon is spun about a rotational axis while introducing liquid onto a surface of the substrate. An...
7732867 Method for manufacturing SOQ substrate  
Hydrogen ions are implanted to a surface (main surface) of the single crystal Si substrate 10 to form the hydrogen ion implanted layer (ion-implanted damage layer) 11. As a result of the hydrogen...
7713889 Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method  
A device linewidth characteristic is predicted based on a sharp-edged feature of a projected image of a predetermined pattern (steps 104 to 110), and an exposure condition of the pattern is...
7713888 Magnetic processing of electronic materials  
The electronic properties (such as electron mobility, resistivity, etc.) of an electronic material can be modified/enhanced when subjected to dynamic or stationary magnetic fields in conjunction...
7709300 Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks  
A method and system for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks, or with other two-mask lithographic processes employing a trim mask. The method and...
7696505 Connectible nanotube circuit  
Carbon nanotube template arrays may be edited to form connections between proximate nanotubes and/or to delete undesired nanotubes or nanotube junctions.
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