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7399682 |
Wafer processing method
A wafer processing method for carrying out processing by applying a laser beam along streets formed on a wafer, comprising a step of applying a laser beam at an incident angle of a predetermined...
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7396774 |
Methods for forming an enriched metal oxide surface
Methods of forming a metal oxide surface that is enriched with metal oxide in its higher oxidation state are provided. A metal oxide surface that is enriched with metal oxide in its higher...
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7394067 |
Systems and methods for reducing alteration of a specimen during analysis for charged particle based and other measurement systems
Systems and methods for reducing alteration of a specimen during by charged particle based and other measurements systems are provided. One system configured to reduce alteration of a specimen...
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7390758 |
Method of manufacturing a semiconductor integrated circuit device with elimination of static charge
A sealed type container accommodating a semiconductor substrate is positioned to a load port of a semiconductor manufacturing apparatus. The semiconductor substrate is taken out of the container....
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7387866 |
Photolithography process using multiple anti-reflective coatings
A method for fabricating an integrated circuit using a photo-lithographic process includes the steps of placing at least two anti-reflective coating layers between a reflective surface and another...
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7384878 |
Method for applying a layer to a hydrophobic surface
A method of forming a coating. The method includes: providing a substrate having a surface; forming a layer of water on the surface; and forming a layer of a material on the layer of water.
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7384595 |
Heat-treating apparatus and heat-treating method
A heat-treating apparatus comprises a table having a heating element buried therein, a plate-like target object to be processed being disposed on the table so as to be heated to a prescribed...
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7384879 |
Selection and deposition of nanoparticles using CO2-expanded liquids
A method for size selection of nanostructures comprising utilizing a gas-expanded liquids (GEL) and controlled pressure to precipitate desired size populations of nanostructures, e.g.,...
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7381656 |
Method of manufacturing a semiconductor device and semiconductor device obtained by means of said method
The invention relates to a method of manufacturing a semiconductor device comprising a substrate ( 1 ) and a semiconductor body ( 2 ) in which at least one semiconductor element is formed, wherein,...
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7381658 |
Encapsulation of nano-dimensional structures by oxidation
This invention relates to a method of encapsulating nano-dimensional structures, comprising: depositing at least one material upon a substrate such that the material includes at least one portion;...
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7375039 |
Local plasma processing
A method and an apparatus for performing the method. The method includes: (a) providing an apparatus, wherein the apparatus comprises (i) a chamber, (ii) a plasma device being in and coupled to the...
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7371696 |
Carbon nanotube structure and method of vertically aligning carbon nanotubes
A Carbon NanoTube (CNT) structure includes a substrate, a CNT support layer, and a plurality of CNTs. The CNT support layer is stacked on the substrate and has pores therein. One end of each of the...
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7368369 |
Method for activating P-type semiconductor layer
A method for activating the P-type semiconductor layer of a semiconductor device is disclosed in this present invention. The above-mentioned method can activate the impurities in the P-type...
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7368399 |
Methods of forming patterned photoresist layers over semiconductor substrates
This invention includes methods of forming patterned photoresist layers over semiconductor substrates. In one implementation, a porous antireflective coating is formed over a semiconductor...
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7368384 |
Film formation apparatus and method of using the same
A method of using a film formation apparatus for a semiconductor process includes a step of removing a by-product film deposited on an inner surface of a reaction chamber of the film formation...
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7368398 |
Substrate processing apparatus and substrate processing method
A substrate processing apparatus includes a reaction chamber with a structure allowing pressure reduction, a shower head for supplying a processing gas into the reaction chamber including a gas...
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7365022 |
Additive printed mask process and structures produced thereby
A digital lithographic process first deposits a mask layer comprised of print patterned mask features. The print patterned mask features define gaps into which a target material may be deposited,...
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7364987 |
Method for manufacturing semiconductor device
In a method of forming a semiconductor device, a copper diffusion-prevention layer is formed underneath a substrate. Impurity regions are formed on the surface of the substrate. A copper wiring is...
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7364805 |
Crystal film, crystal substrate, and semiconductor device
A crystal foundation having dislocations is used to obtain a crystal film of low dislocation density, a crystal substrate, and a semiconductor device. One side of a growth substrate ( 11 ) is...
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7365024 |
Chemical solution coating method and chemical solution coating apparatus
A chemical solution coating method includes: a first step of disposing a semiconductor substrate on a substrate supporting unit with a first face to be coated with a chemical solution facing...
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7365023 |
Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating
There is provided an underlayer coating causing no intermixing with photoresist layer and having a high dry etching rate compared with photoresist, which is used in lithography process of...
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7354871 |
Nanowires comprising metal nanodots and method for producing the same
Nanowires methods for producing the nanowires are provided. The nanowires include a plurality of metal nanodots uniformly disposed therein, and a core portion, wherein each of the plurality of...
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7351668 |
Film formation method and apparatus for semiconductor process
An insulating film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas containing a silane family gas, a second process gas containing a...
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7348186 |
Method for improving a semiconductor substrate having SiGe film and semiconductor device manufactured by using this method
A method of improving a semiconductor substrate including a SiGe film on a Si or SOI substrate is provided. The method includes determining a relationship between a film condition of the SiGe film...
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7345000 |
Method and system for treating a dielectric film
A method and system for treating a dielectric film includes exposing at least one surface of the dielectric film to an alkyl silane, an alkoxysilane, an alkyl siloxane, an alkoxysiloxane, an aryl...
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7335603 |
System and method for fabricating logic devices comprising carbon nanotube transistors
Carbon nanotube devices and methods for fabricating these devices, wherein in one embodiment, the fabrication process consists of the following process steps: (1) generation of a template, (2)...
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7335604 |
Thin-film coating apparatus
To provide a thin-film forming device and a thin-film forming method, a liquid crystal display and a device and method for manufacturing the same, and a thin-film structure and a device and method...
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7332442 |
Systems and methods for forming metal oxide layers
A method of forming (and apparatus for forming) a metal oxide layer, preferably a dielectric layer, on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor...
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7329617 |
Coating for enhancing adhesion of molding compound to semiconductor devices
A method is provided for enhancing adhesion between a molding compound and a semiconductor device comprising a semiconductor chip attached on a carrier, such as a lead frame, by coating the...
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7329612 |
Semiconductor device and process for producing the same
A semiconductor device is manufactured by the steps of generating a film forming gas by setting a flow rate ratio of H 2 O to any one of a silicon-contained organic compound having a siloxane bond...
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7326437 |
Method and system for coating polymer solution on a substrate in a solvent saturated chamber
A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be...
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7326635 |
Method and apparatus for stripping photo-resist
A method for stripping a photo-resist includes the steps of: (a) wet stripping a photo-resist off from a substrate; and (b) rinsing the substrate under high-speed conveyance using an aqua knife. A...
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7323422 |
Dielectric layers and methods of forming the same
High dielectric constant (high-k) materials are formed directly over oxidation-susceptible conductors such as silicon. A discontinuous layer is formed, with gaps between grains of the high-k...
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7316966 |
Method for transferring substrates in a load lock chamber
Provided herein is a substrate processing system, which comprises a cassette load station; a load lock chamber; a centrally located transfer chamber; and one or more process chambers located about...
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7316982 |
Controlling carbon nanotubes using optical traps
An embodiment of the present invention is a technique to control carbon nanotubes (CNTs). A laser beam is focused to a carbon nanotube (CNT) in a fluid. The CNT is responsive to a trapping...
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7314835 |
Plasma enhanced atomic layer deposition system and method
A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the...
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7312162 |
Low temperature plasma deposition process for carbon layer deposition
A method of depositing a carbon layer on a workpiece includes placing the workpiece in a reactor chamber, introducing a carbon-containing process gas into the chamber, generating a reentrant...
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7304001 |
Fabrication methods of semiconductor integrated circuit device and photomask
Under the condition that a semiconductor maker and a photomask maker are separated but these are mutually connected with a communication line, the semiconductor maker gives a photomask fabrication...
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7304002 |
Method of oxidizing member to be treated
A method for oxidation of an object to be processed is provided wherein an oxide film can provide favorable film quality and a laminate structure of nitride film and oxide film can be obtained by a...
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7300885 |
Film formation apparatus and method for semiconductor process
A film formation method for a semiconductor process is arranged to form a thin film on a target substrate by CVD, while supplying a first process gas for film formation and a second process gas for...
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7297557 |
Method for chemically bonding Langmuir-Blodgett films to substrates
A method of attaching a molecular layer to a substrate includes attaching a temporary protecting group(s) to a molecule having a molecular switching moiety with first and second connecting groups...
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7294581 |
Method for fabricating silicon nitride spacer structures
Embodiments of methods for fabricating a spacer structure on a semiconductor substrate are provided herein. In one embodiment, a method for fabricating a spacer structure on a semiconductor...
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7294553 |
Plasma-enhanced chemical vapour deposition process for depositing silicon nitride or silicon oxynitride, process for producing one such layer arrangement, and layer arrangement
A plasma-enhanced chemical vapor deposition process for depositing relatively high dielectric constant silicon nitride or oxynitride to form an MIM capacitor is described. The flow rate ratios for...
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7291566 |
Barrier layer for a processing element and a method of forming the same
In order to mitigate erosion of exposed processing elements in a processing system by the process and any subsequent contamination of the substrate in the processing system, processing elements...
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7291517 |
Method for removing resin mask layer and method for manufacturing solder bumped substrate
Using a dry film resist that is a photosensitive resin, a resin mask layer is formed around electrodes on a substrate. A solder precipitating composition is applied on the substrate, and this...
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7288490 |
Increased alignment in carbon nanotube growth
Method and system for fabricating an array of two or more carbon nanotube (CNT) structures on a coated substrate surface, the structures having substantially the same orientation with respect to a...
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7288463 |
Pulsed deposition layer gap fill with expansion material
Conformal dielectric deposition processes supplemented with a deposited expansion material can fill high aspect ratio narrow width gaps with significantly reduced incidence of voids or weak spots....
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7285500 |
Thin films and methods of making them
Thin, smooth silicon-containing films are prepared by deposition methods that utilize a silicon containing precursor. In preferred embodiments, the methods result in Si-containing films that are...
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7282459 |
Ejection method and optical device manufacturing method for arranging nozzles in agreement with sections subject to ejection
Aspects of the invention can provide an ejection method to form a micro lens efficiently on each of a plurality of semiconductor lasers in a wafer state. So that a distance in an x-axis direction...
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7273824 |
Semiconductor structure and fabrication therefor
A semiconductor structure and a method of fabrication there-for are provided. The semiconductor structure comprises a substrate, a dielectric layer disposed over the substrate, a hydrophilic...
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