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7617601 |
Manufacturing process for smaller active areas in flat panel X-ray detectors
The present invention generally relates to a method for forming a flat panel for an X-ray detector device. The method comprises forming an active area of a first size on a substrate of a second...
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7611918 |
CMOS image sensor and method for fabricating the same
A CMOS image sensor and a method of fabricating the same are provided. The CMOS image sensor includes: an epitaxial layer of a first conductivity type, formed in a semiconductor substrate of the...
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7605016 |
CMOS image sensor and method of manufacturing the same
Disclosed are a CMOS sensor and a method of fabricating the CMOS sensor. The method includes the steps of: forming a first USG layer on an entire surface of a semiconductor substrate including a...
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7598553 |
CMOS image sensor and method of manufacturing thereof
A CMOS image sensor comprising an epitaxial layer formed on a semiconductor layer, a device isolating layer formed on the epitaxial layer in order to divide the isolating layer into an active...
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7592200 |
Solid-state imaging device and method of manufacturing the same
There are provided a semiconductor substrate 101 on which solid-state imaging devices are formed, and a translucent member 201 provided onto a surface of the semiconductor substrate such that...
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7592199 |
Method for forming pinned photodiode resistant to electrical leakage
A method is provided for reducing or eliminating leakage between a pinned photodiode and shallow trench isolation structure fabricated therewith while optimizing the sensitivity of the photodiode....
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7586169 |
Image sensor and method for manufacturing the same
An image sensor that can include a photodiode formed on one side of a substrate to receive light and then generate signal charges based on the light; and a transistor converting the signal charges...
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7582505 |
Solid-state imaging device and method of manufacturing said solid-state imaging device
It is an object to provide solid-state imaging device, which can easily be manufactured and has a high reliability, and a method of manufacturing the solid-state imaging device. In the present...
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7582499 |
Photo sensor and a method for manufacturing thereof
A photo sensor has an insulator layer for covering a diode stack, and the insulator layer is made of photoresist to reduce a side leakage current.
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7569414 |
CMOS imager with integrated non-volatile memory
A CMOS imager and non-volatile memory are integrated on a single substrate along with logic and support circuitry for decoding and processing optical information received by the CMOS imager. A...
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7557024 |
Single poly CMOS imager
More complete charge transfer is achieved in a CMOS or CCD imager by reducing the spacing in the gaps between gates in each pixel cell, and/or by providing a lightly doped region between adjacent...
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7547573 |
Image sensor and method of manufacturing the same
An image sensor and a method of manufacturing the same, in which, a planarized layer is formed on a semiconductor substrate including a pixel array region, an optical black region, and a logic...
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7537956 |
Silicon optoelectronic device manufacturing method and silicon optoelectronic device manufactured by thereof and image input and/or output apparatus having the same
A method of manufacturing a silicon optoelectronic device, a silicon optoelectronic device manufactured by the method and an image input and/or output apparatus having the silicon optoelectronic...
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7535043 |
Solid-state image sensor, method of manufacturing the same, and camera
A solid-state image sensor of the present invention is a solid-state image sensor in which pixel cells are arranged on a semiconductor substrate, wherein each of the pixel cells includes: a...
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7531371 |
Multisurfaced microdevice system array and a method of producing the array
A multisurfaced microdevice system array is produced from a wafer formed of semiconductor substrate material. Sensing, controlling and actuating microdevices are fabricated at specific location on...
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7524695 |
Image sensor and pixel having an optimized floating diffusion
An active pixel includes a a photosensitive element formed in a semiconductor substrate. A transfer transistor is formed between the photosensitive element and a floating diffusion and selectively...
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7521278 |
Isolation method for low dark current imager
A method for forming the passivation layer for silicon-isolation interface between photosensitive regions of an image sensor, the method includes providing a substrate having a plurality of spaced...
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7517783 |
Molybdenum-doped indium oxide structures and methods
Methods of forming transparent conducting oxides and devices formed by these methods are shown. Monolayers that contain indium and monolayers that contain molybdenum are deposited onto a substrate...
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7510896 |
CMOS image sensor and method for manufacturing the same
Disclosed are a CMOS image sensor and a method for manufacturing the same, capable of improving the characteristics of the image sensor by increasing junction capacitance of a floating diffusion...
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7504278 |
Image sensor and method for manufacturing the same
An image sensor is disclosed where individual photo diodes of the respective unit cells separated by an element isolating layer are physically integrated into a single large scale pixel formed...
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7498189 |
Method of producing a radiation detector with a polysilicon converting layer
In a method of producing a radiation detector, an active matrix board is formed to include gate lines and data lines arranged in a two-dimensional lattice shape, a plurality of high-speed switching...
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7494840 |
Optical device with IrOx nanostructure electrode neural interface
An optical device with an iridium oxide (IrOx) electrode neural interface, and a corresponding fabrication method are provided. The method provides a substrate and forms a first conductive...
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7470560 |
Image sensor having a charge storage region provided within an implant region
A deep implanted region of a first conductivity type located below a transistor array of a pixel sensor cell and adjacent a doped region of a second conductivity type of a photodiode of the pixel...
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7459335 |
Solid-state imaging apparatus and method for producing the same
A solid-state imaging apparatus includes a plurality of photosensitive cells, and a driving unit provided for driving the plurality of photosensitive cells. Each photosensitive cell includes a...
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7452743 |
Microelectronic imaging units and methods of manufacturing microelectronic imaging units at the wafer level
Microelectronic imaging units and methods for manufacturing a plurality of imaging units at the wafer level are disclosed herein. In one embodiment, a method for manufacturing a plurality of...
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7449347 |
Repairing method of a thin film transistor array
A repairing method of thin film transistor array is provided. The repairing method of thin film transistor array can remove a residue between pixel electrodes so as to prevent the residue from...
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7442572 |
CMOS image sensor and method for manufacturing the same
A CMOS image sensor and a method for manufacturing the same improves photosensitivity and prevent loss of light by forming a photo-sensing unit under a color filter. The CMOS image sensor may...
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7432125 |
CMOS image sensor and manufacturing method thereof
A CMOS image sensor-manufacturing method includes forming a photodiode on a substrate, forming an insulating layer over the substrate, forming a contact hole in the insulating layer, and forming a...
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7427530 |
Method of manufacturing photo diodes having a conductive plug contact to a buried layer
Methods of manufacturing a photo diode include sequentially forming a buried layer of a first conductivity type, a first epitaxial layer of the first conductivity type, and a second epitaxial layer...
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7425456 |
Antiferromagnetic stabilized storage layers in GMRAM storage devices
A giant magnetoresistive memory device includes a magnetic sense layer, a magnetic storage layer, a non-magnetic spacer layer between the magnetic sense layer and the magnetic storage layer, and an...
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7422925 |
Solid-state imaging apparatus and manufacturing method thereof
The present invention aims to provide a solid-state apparatus and a manufacturing method thereof, the solid-state apparatus having both high transfer efficiency in a horizontal transfer CCD and...
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7410897 |
Contact plug processing and a contact plug
A semiconductor device has anisotropically formed via holes through a PMD layer. The anisotropic geometry of the via holes results in the diameter of a via hole over a gate structure being equal to...
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7402451 |
Optimized transistor for imager device
An imager device that has mitigated dark current leakage and punch-through protection. The transistor associated with the photoconversion device is formed with a single (i.e, one-sided) active area...
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7387908 |
CMOS imager with enhanced transfer of charge and low voltage operation and method of formation
A dopant gradient region of a first conductivity type and a corresponding channel impurity gradient below a transfer gate and adjacent a charge collection region of a CMOS imager photodiode are...
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7364936 |
CMOS image sensor and method for fabricating the same
A CMOS image sensor and a method for fabricating the same improve photosensitivity by imparting a color filter layer with the function of a microlens layer. The CMOS image sensor includes a...
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7354791 |
Solid-state imaging device, method for manufacturing the same, and method for driving the same
In a solid-state imaging device in which a N-type photoelectric conversion region is formed in a P − -type well region, a light-blocking film and a transparent conductive film are formed on the...
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7326588 |
Image sensor with light guides
An image sensor device and fabrication method thereof. An image sensing array is formed in a substrate, wherein the image sensing array comprises a plurality of photosensors with spaces...
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7312097 |
Method of fabricating an optical concentrator for a photovoltaic solar cell
A method of fabricating a photovoltaic solar cell is provided. A plurality of generally spherical semiconductor elements are provided. Each of the semiconductor elements has a core and an outer...
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7300817 |
Method of manufacturing a semiconductor imaging device having a refractive index matching layer
A semiconductor device includes a plurality of photoelectric conversion photodiodes provided on a silicon substrate, and a refractive index matching film provided on each of the photodiodes. The...
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7297569 |
Semiconductor devices with reduced active region defects and unique contacting schemes
A method of making a semiconductor device having a predetermined epitaxial region, such as an active region, with reduced defect density includes the steps of: (a) forming a dielectric cladding...
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7294525 |
High performance integrated inductor
Some embodiments of the present invention include providing high performance integrated inductors.
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7279762 |
Magnetoresistive memory device assemblies, and methods of forming magnetoresistive memory device assemblies
The invention includes a construction comprising an MRAM device between a pair of conductive lines. Each of the conductive lines can generate a magnetic field encompassing at least a portion of the...
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7265892 |
Micromirror array devices with light blocking areas
Disclosed herein is a micromirror array device package having a light blocking area for reducing unexpected light scattering from the surfaces of the posts.
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7264985 |
Passive elements in MRAM embedded integrated circuits
An integrated circuit device ( 300 ) comprises a substrate ( 301 ) and MRAM architecture ( 314 ) formed on the substrate ( 308 ). The MRAM architecture ( 314 ) includes a MRAM circuit ( 318 )...
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7264976 |
Advance ridge structure for microlens gapless approach
A method of manufacturing a plurality of microlenses on a substrate comprises forming a grid having raised ridges defining a plurality of openings on the substrate and forming a plurality of...
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7253461 |
Snapshot CMOS image sensor with high shutter rejection ratio
A pixel image sensor has an isolation barrier and diffusion well connected to a biasing voltage to prevent substrate charge leakage caused by photoelectrons generated in the substrate beneath a...
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7253020 |
Deuterium alloy process for image sensors
A method of alloying an image sensor is disclosed. The method comprises forming various semiconductor devices in a semiconductor substrate. Then, an insulator layer is formed over the semiconductor...
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7247510 |
Magnetic recording medium and magnetic memory apparatus
Disclosed is a magnetic memory apparatus which comprises a patterned magnetic recording medium in which multilayered films each having a first magnetic layer, a nonmagnetic metal layer or a...
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7244632 |
Complementary metal oxide semiconductor image sensor and method for fabricating the same
A complementary metal oxide semiconductor image sensor and a method for fabricating the same are disclosed, wherein a width of a depletion area of a photodiode is varied by variably applying a back...
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7238878 |
Photovoltaic module with light reflecting backskin
A photovoltaic module comprises electrically interconnected and mutually spaced photovoltaic cells that are encapsulated by a light-transmitting encapsulant between a light-transparent front cover...
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