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7617601 Manufacturing process for smaller active areas in flat panel X-ray detectors  
The present invention generally relates to a method for forming a flat panel for an X-ray detector device. The method comprises forming an active area of a first size on a substrate of a second...
7611918 CMOS image sensor and method for fabricating the same  
A CMOS image sensor and a method of fabricating the same are provided. The CMOS image sensor includes: an epitaxial layer of a first conductivity type, formed in a semiconductor substrate of the...
7605016 CMOS image sensor and method of manufacturing the same  
Disclosed are a CMOS sensor and a method of fabricating the CMOS sensor. The method includes the steps of: forming a first USG layer on an entire surface of a semiconductor substrate including a...
7598553 CMOS image sensor and method of manufacturing thereof  
A CMOS image sensor comprising an epitaxial layer formed on a semiconductor layer, a device isolating layer formed on the epitaxial layer in order to divide the isolating layer into an active...
7592200 Solid-state imaging device and method of manufacturing the same  
There are provided a semiconductor substrate 101 on which solid-state imaging devices are formed, and a translucent member 201 provided onto a surface of the semiconductor substrate such that...
7592199 Method for forming pinned photodiode resistant to electrical leakage  
A method is provided for reducing or eliminating leakage between a pinned photodiode and shallow trench isolation structure fabricated therewith while optimizing the sensitivity of the photodiode....
7586169 Image sensor and method for manufacturing the same  
An image sensor that can include a photodiode formed on one side of a substrate to receive light and then generate signal charges based on the light; and a transistor converting the signal charges...
7582505 Solid-state imaging device and method of manufacturing said solid-state imaging device  
It is an object to provide solid-state imaging device, which can easily be manufactured and has a high reliability, and a method of manufacturing the solid-state imaging device. In the present...
7582499 Photo sensor and a method for manufacturing thereof  
A photo sensor has an insulator layer for covering a diode stack, and the insulator layer is made of photoresist to reduce a side leakage current.
7569414 CMOS imager with integrated non-volatile memory  
A CMOS imager and non-volatile memory are integrated on a single substrate along with logic and support circuitry for decoding and processing optical information received by the CMOS imager. A...
7557024 Single poly CMOS imager  
More complete charge transfer is achieved in a CMOS or CCD imager by reducing the spacing in the gaps between gates in each pixel cell, and/or by providing a lightly doped region between adjacent...
7547573 Image sensor and method of manufacturing the same  
An image sensor and a method of manufacturing the same, in which, a planarized layer is formed on a semiconductor substrate including a pixel array region, an optical black region, and a logic...
7537956 Silicon optoelectronic device manufacturing method and silicon optoelectronic device manufactured by thereof and image input and/or output apparatus having the same  
A method of manufacturing a silicon optoelectronic device, a silicon optoelectronic device manufactured by the method and an image input and/or output apparatus having the silicon optoelectronic...
7535043 Solid-state image sensor, method of manufacturing the same, and camera  
A solid-state image sensor of the present invention is a solid-state image sensor in which pixel cells are arranged on a semiconductor substrate, wherein each of the pixel cells includes: a...
7531371 Multisurfaced microdevice system array and a method of producing the array  
A multisurfaced microdevice system array is produced from a wafer formed of semiconductor substrate material. Sensing, controlling and actuating microdevices are fabricated at specific location on...
7524695 Image sensor and pixel having an optimized floating diffusion  
An active pixel includes a a photosensitive element formed in a semiconductor substrate. A transfer transistor is formed between the photosensitive element and a floating diffusion and selectively...
7521278 Isolation method for low dark current imager  
A method for forming the passivation layer for silicon-isolation interface between photosensitive regions of an image sensor, the method includes providing a substrate having a plurality of spaced...
7517783 Molybdenum-doped indium oxide structures and methods  
Methods of forming transparent conducting oxides and devices formed by these methods are shown. Monolayers that contain indium and monolayers that contain molybdenum are deposited onto a substrate...
7510896 CMOS image sensor and method for manufacturing the same  
Disclosed are a CMOS image sensor and a method for manufacturing the same, capable of improving the characteristics of the image sensor by increasing junction capacitance of a floating diffusion...
7504278 Image sensor and method for manufacturing the same  
An image sensor is disclosed where individual photo diodes of the respective unit cells separated by an element isolating layer are physically integrated into a single large scale pixel formed...
7498189 Method of producing a radiation detector with a polysilicon converting layer  
In a method of producing a radiation detector, an active matrix board is formed to include gate lines and data lines arranged in a two-dimensional lattice shape, a plurality of high-speed switching...
7494840 Optical device with IrOx nanostructure electrode neural interface  
An optical device with an iridium oxide (IrOx) electrode neural interface, and a corresponding fabrication method are provided. The method provides a substrate and forms a first conductive...
7470560 Image sensor having a charge storage region provided within an implant region  
A deep implanted region of a first conductivity type located below a transistor array of a pixel sensor cell and adjacent a doped region of a second conductivity type of a photodiode of the pixel...
7459335 Solid-state imaging apparatus and method for producing the same  
A solid-state imaging apparatus includes a plurality of photosensitive cells, and a driving unit provided for driving the plurality of photosensitive cells. Each photosensitive cell includes a...
7452743 Microelectronic imaging units and methods of manufacturing microelectronic imaging units at the wafer level  
Microelectronic imaging units and methods for manufacturing a plurality of imaging units at the wafer level are disclosed herein. In one embodiment, a method for manufacturing a plurality of...
7449347 Repairing method of a thin film transistor array  
A repairing method of thin film transistor array is provided. The repairing method of thin film transistor array can remove a residue between pixel electrodes so as to prevent the residue from...
7442572 CMOS image sensor and method for manufacturing the same  
A CMOS image sensor and a method for manufacturing the same improves photosensitivity and prevent loss of light by forming a photo-sensing unit under a color filter. The CMOS image sensor may...
7432125 CMOS image sensor and manufacturing method thereof  
A CMOS image sensor-manufacturing method includes forming a photodiode on a substrate, forming an insulating layer over the substrate, forming a contact hole in the insulating layer, and forming a...
7427530 Method of manufacturing photo diodes having a conductive plug contact to a buried layer  
Methods of manufacturing a photo diode include sequentially forming a buried layer of a first conductivity type, a first epitaxial layer of the first conductivity type, and a second epitaxial layer...
7425456 Antiferromagnetic stabilized storage layers in GMRAM storage devices  
A giant magnetoresistive memory device includes a magnetic sense layer, a magnetic storage layer, a non-magnetic spacer layer between the magnetic sense layer and the magnetic storage layer, and an...
7422925 Solid-state imaging apparatus and manufacturing method thereof  
The present invention aims to provide a solid-state apparatus and a manufacturing method thereof, the solid-state apparatus having both high transfer efficiency in a horizontal transfer CCD and...
7410897 Contact plug processing and a contact plug  
A semiconductor device has anisotropically formed via holes through a PMD layer. The anisotropic geometry of the via holes results in the diameter of a via hole over a gate structure being equal to...
7402451 Optimized transistor for imager device  
An imager device that has mitigated dark current leakage and punch-through protection. The transistor associated with the photoconversion device is formed with a single (i.e, one-sided) active area...
7387908 CMOS imager with enhanced transfer of charge and low voltage operation and method of formation  
A dopant gradient region of a first conductivity type and a corresponding channel impurity gradient below a transfer gate and adjacent a charge collection region of a CMOS imager photodiode are...
7364936 CMOS image sensor and method for fabricating the same  
A CMOS image sensor and a method for fabricating the same improve photosensitivity by imparting a color filter layer with the function of a microlens layer. The CMOS image sensor includes a...
7354791 Solid-state imaging device, method for manufacturing the same, and method for driving the same  
In a solid-state imaging device in which a N-type photoelectric conversion region is formed in a P − -type well region, a light-blocking film and a transparent conductive film are formed on the...
7326588 Image sensor with light guides  
An image sensor device and fabrication method thereof. An image sensing array is formed in a substrate, wherein the image sensing array comprises a plurality of photosensors with spaces...
7312097 Method of fabricating an optical concentrator for a photovoltaic solar cell  
A method of fabricating a photovoltaic solar cell is provided. A plurality of generally spherical semiconductor elements are provided. Each of the semiconductor elements has a core and an outer...
7300817 Method of manufacturing a semiconductor imaging device having a refractive index matching layer  
A semiconductor device includes a plurality of photoelectric conversion photodiodes provided on a silicon substrate, and a refractive index matching film provided on each of the photodiodes. The...
7297569 Semiconductor devices with reduced active region defects and unique contacting schemes  
A method of making a semiconductor device having a predetermined epitaxial region, such as an active region, with reduced defect density includes the steps of: (a) forming a dielectric cladding...
7294525 High performance integrated inductor  
Some embodiments of the present invention include providing high performance integrated inductors.
7279762 Magnetoresistive memory device assemblies, and methods of forming magnetoresistive memory device assemblies  
The invention includes a construction comprising an MRAM device between a pair of conductive lines. Each of the conductive lines can generate a magnetic field encompassing at least a portion of the...
7265892 Micromirror array devices with light blocking areas  
Disclosed herein is a micromirror array device package having a light blocking area for reducing unexpected light scattering from the surfaces of the posts.
7264985 Passive elements in MRAM embedded integrated circuits  
An integrated circuit device ( 300 ) comprises a substrate ( 301 ) and MRAM architecture ( 314 ) formed on the substrate ( 308 ). The MRAM architecture ( 314 ) includes a MRAM circuit ( 318 )...
7264976 Advance ridge structure for microlens gapless approach  
A method of manufacturing a plurality of microlenses on a substrate comprises forming a grid having raised ridges defining a plurality of openings on the substrate and forming a plurality of...
7253461 Snapshot CMOS image sensor with high shutter rejection ratio  
A pixel image sensor has an isolation barrier and diffusion well connected to a biasing voltage to prevent substrate charge leakage caused by photoelectrons generated in the substrate beneath a...
7253020 Deuterium alloy process for image sensors  
A method of alloying an image sensor is disclosed. The method comprises forming various semiconductor devices in a semiconductor substrate. Then, an insulator layer is formed over the semiconductor...
7247510 Magnetic recording medium and magnetic memory apparatus  
Disclosed is a magnetic memory apparatus which comprises a patterned magnetic recording medium in which multilayered films each having a first magnetic layer, a nonmagnetic metal layer or a...
7244632 Complementary metal oxide semiconductor image sensor and method for fabricating the same  
A complementary metal oxide semiconductor image sensor and a method for fabricating the same are disclosed, wherein a width of a depletion area of a photodiode is varied by variably applying a back...
7238878 Photovoltaic module with light reflecting backskin  
A photovoltaic module comprises electrically interconnected and mutually spaced photovoltaic cells that are encapsulated by a light-transmitting encapsulant between a light-transparent front cover...
Matches 1 - 50 out of 345 1 2 3 4 5 6 7 >