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7413923 Method of manufacturing CMOS image sensor  
Provided is a manufacturing method of a CMOS image sensor. The method includes forming an interlayer insulating layer, a color filter layer, and a planarizing layer. A first photoresist is applied...
7413922 Fabricating method of a pixel structure  
A method of fabricating a pixel structure is disclosed. A substrate having a color filter layer thereon and a leveling layer further covers the color filter layer is provided. A first metal layer...
7410822 Method for forming color filter  
A method for forming a color filter is provided. The method comprises steps of providing a substrate having a passivasion layer formed thereon. The substrate has at least one complementary...
7388270 Method of fabricating CMOS image sensor  
A method of fabricating a CMOS image sensor is provided, in which a trapezoidal microlens pattern profile is formed to facilitate reflowing the microlens pattern and by which a curvature of the...
7384813 Method for fabricating CMOS image sensor  
A method for fabricating a CMOS image sensor forms silicon nitride (SiN) layer on a pad. Microlenses, having a minimum height and footprint according to a desired packing density of the lenses, are...
7378295 CMOS image sensor and fabricating method thereof  
A CMOS image sensor and fabricating method thereof enable enhanced photo-response characteristics and protect a microlens in packaging by embedding the microlens in a passivation layer pattern. The...
7365298 Image sensor and method for manufacturing the same  
The present invention discloses an image sensor and a method for manufacturing the same which is capable of increasing the light-collection efficiency of a photodiode. The image sensor comprises:...
7364936 CMOS image sensor and method for fabricating the same  
A CMOS image sensor and a method for fabricating the same improve photosensitivity by imparting a color filter layer with the function of a microlens layer. The CMOS image sensor includes a...
7364933 Image sensor and method for forming the same  
A method for forming an image sensor is provided. The method includes providing a semiconductor substrate having a pixel region and a peripheral circuit region, forming a photoelectric...
7358110 Image sensor having inner lens  
An image sensor includes an inner lens to enable incident light to reach a condensing lens, so that the incident light may further reach photodiodes. Light loss can be reduced and photosensitivity...
7354791 Solid-state imaging device, method for manufacturing the same, and method for driving the same  
In a solid-state imaging device in which a N-type photoelectric conversion region is formed in a P − -type well region, a light-blocking film and a transparent conductive film are formed on the...
7354784 Method for fabricating liquid crystal display device of color-filter on transistor type  
A method for fabricating a color-filter on transistor (COT) type LCD device, to improve the yield by simplifying the fabrication process with diffraction exposure, which includes the steps of...
7348198 Liquid crystal display device and fabricating method thereof  
A liquid crystal display device and a fabricating method thereof for simplifying a process and improving an aperture ratio are disclosed, including forming a first mask pattern group including a...
7344911 CMOS image sensor and method for fabricating the same  
A CMOS image sensor and a method for fabricating the same are provided, in which an N type region of a photodiode is prevented from adjoining a device isolation film and a dark current is reduced....
7341885 CMOS image sensor and method for fabricating the same  
A CMOS image sensor and method for fabricating the same improve image characteristics by eliminating the thickness of a planarization layer. The CMOS image sensor includes a semiconductor...
7297570 Complementary metal oxide semiconductor image sensor and method for fabricating the same  
A CMOS image sensor and a method for fabricating the same is disclosed, to enhance the efficiency in condensing the light by forming a multi-layered micro lens with various materials having...
7294524 Method for fabricating image sensor without LTO-based passivation layer  
A method for fabricating an image sensor including a first region, which is a light receiving region, and a second region, which is a pad region, includes forming a metal line in the second region...
7294372 Conductive color filters  
A conductive color filter includes a layer of carbon nanotubes covered by a colored polymeric resin binder.
7288428 Solid state image pickup device and manufacturing method thereof and semiconductor integrated circuit device and manufacturing method thereof  
A method of manufacturing a solid-state image pickup device comprises a process for forming a plurality of photoelectric conversion elements PD within a semiconductor substrate 4 , a process for...
7279354 Microlens of CMOS image sensor and method of manufacturing the same  
A method of a microlens of a CMOS image sensor eliminates a flattened gap between the curvatures of adjacent microlenses. A plurality of color filter layers is formed on a semiconductor substrate...
7279353 Passivation planarization  
A pixel cell is formed by locating a first passivation layer over the final layer of metal lines. Subsequently, the uneven, non-uniform passivation layer is subjected to a planarization process...
7268009 Method for fabricating a CMOS image sensor  
A method for fabricating a complementary metal-oxide semiconductor (CMOS) image sensor is disclosed. An example method forms a metal pad in a pad area of a substrate having an active area and a pad...
7264976 Advance ridge structure for microlens gapless approach  
A method of manufacturing a plurality of microlenses on a substrate comprises forming a grid having raised ridges defining a plurality of openings on the substrate and forming a plurality of...
7262073 CMOS image sensor and method of manufacturing same  
Disclosed are a complementary metal oxide semiconductor (CMOS) image sensor and a method of forming the same. The CMOS image sensor comprises a semiconductor substrate having a photodiode region...
7262072 CMOS image sensor and method for fabricating the same  
A CMOS image sensor and a method for fabricating the same are disclosed, in which double microlenses are formed using materials having different refractive indexes to improve concentration...
7259791 Method of making solid-state image pickup device in-layer lens with antireflection film with intermediate index of refraction  
In a solid-state image pickup device including a light receiving sensor portion in a surface layer portion of a substrate, an in-layer lens disposed above the light receiving sensor portion, a...
7241639 Color filter, manufacturing method thereof, electrooptical device and electronic equipment  
A method for manufacturing a color filter having a picture element part surrounded by a partition wall and provided in the plural number on a substrate including a step of forming the partition...
7232698 Method for fabricating CMOS image sensor protecting low temperature oxide delamination  
A method for fabricating a complementary metal oxide semiconductor image sensor is capable of protecting a low temperature oxide from delaminating a passivation layer. The method includes the steps...
7229676 Thermal imaging processes and products of electroactive organic material  
Processes for effecting thermal transfer of electroactive organic material are disclosed wherein unwanted portions of a layer of electroactive organic material supported by a donor element are...
7227078 Colored solar cell unit  
The invention pertains to a solar cell unit comprising a back electrode, a photovoltaic (PV) layer, and, optionally, a front electrode, with part of the surface of the solar cell unit not...
7223625 CMOS image sensor and method for fabricating the same  
A complementary metal-oxide semiconductor (CMOS) image sensor and a method for fabricating the same are disclosed. The CMOS image sensor a plurality of photosensitive devices formed on a...
7217590 Color image sensor with enhanced colorimetry and method for making same  
The invention relates to very small-sized color image sensors. The sensor according to the invention is made by the following method: the formation, on the front face of the semiconductive...
7214959 Method of forming thin film patterning substrate including formation of banks  
Display devices such as EL elements or LED elements, are formed from thin film elements having banks of prescribed height and a thin film layer formed by an ink jet method in areas to be coated...
7214560 CMOS image sensor and method for fabricating the same  
A CMOS image sensor and a method for fabricating the same is disclosed, to improve reliability of a driving part transistor and to improve an output voltage of a photodiode, which includes a...
7214116 Light-emitting diode and method for its production  
A light-emitting diode with no fluctuations in optical properties and good sealing properties, and a simple production method for producing this light-emitting diode. The light-emitting diode has a...
7202103 Overlapped color filter fabrication technique  
A solid state image pickup element which can exponentially reduce the in-plane photoelectric conversion portion characteristic distribution created in forming color filters by a common...
7188530 Micro-mechanical capacitive inductive sensor for detection of relative or absolute pressure  
A micro-mechanical pressure transducer is disclosed in which a capacitive transducer structure is integrated with an inductor coil to form a LC tank circuit, resonance frequency of which may be...
7180112 Solid-state imaging apparatus having an upwardly convex color filter layer and method of manufacturing the same  
In a solid-state imaging apparatus, a plurality of pixel units are arranged, the pixel units including (i) a photoelectric conversion element formed above a semiconductor substrate and (ii) a color...
7172912 Pattern forming method and wiring pattern forming method, and electro-optic device and electronic equipment  
To provide a pattern forming method enabling a thin film to be patterned with high precision by easy and low cost techniques. A thin film 2 is provided on a base material 1 containing a...
7166489 Complementary metal oxide semiconductor image sensor and method for fabricating the same  
A CMOS image sensor and a method for fabricating the same is disclosed, to enhance the image-sensing efficiency by forming a concave lens area for improving the light-condensing efficiency in a...
7163834 CMOS image sensor and method of fabricating the same  
A complementary metal-oxide semiconductor (CMOS) image sensor and a method of fabricating the same are disclosed. In a complementary metal-oxide semiconductor (CMOS) image sensor including a...
7163832 Method for manufacturing CMOS image sensor  
The present invention discloses a method for manufacturing an image sensor which makes the boundaries between microlenses clear by forming a guide layer in advance and can increase the focal...
7157302 Imaging device and method of manufacture  
An imaging chip is packaged in transparent injection molded material. The chip may have photosensitive elements arranged in a two-dimensional array on semiconductor material. Each element...
7132724 Complete-charge-transfer vertical color filter detector  
A vertical-color-filter detector disposed in a semiconductor structure comprises a complete-charge-transfer detector comprising semiconductor material doped to a first conductivity type and has a...
7129108 CMOS image sensor and manufacturing method thereof  
A CMOS image sensor according to the present invention includes a substrate having a light receiving region, an interlayer insulating film formed on the substrate, a plurality of metal wirings...
7125738 Method of fabricating a photosensitive structure  
A method of fabrication of a photosensitive device is disclosed. A substrate with at least an insulator layer formed thereon is provided. The insulator layer comprises a plurality of photoreceiving...
7105372 Magnetic tunneling junction film structure with process determined in-plane magnetic anisotropy  
A method of forming an MTJ memory cell and/or an array of such cells is provided wherein each such cell has a small circular horizontal cross-section of 1.0 microns or less in diameter and wherein...
7101727 Passivation planarization  
A pixel cell is formed by locating a first passivation layer over the final layer of metal lines. Subsequently, the uneven, non-uniform passivation layer is subjected to a planarization process...
7101726 Solid-state imaging device and method of manufacturing solid-state imaging device background of the invention  
A solid state imaging device having a back-illuminated type structure in which a lens is formed on the back side of a silicon layer with a light-receiving sensor portion being formed thereon....
7078258 Image sensor and manufacturing method of image sensor  
In a manufacturing method of an image sensor, a lightproof film (an antireflective film for avoiding flares) is formed over a wiring area; a transparent film is formed over an imaging area using a...
Matches 1 - 50 out of 189 1 2 3 4 >