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7616290 |
Exposure apparatus and method
An exposure apparatus including a projection optical system for projecting a pattern of a reticle onto a plate to be exposed, via a liquid that is filled in a space between the projection optical...
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7615721 |
Laser processing method and laser processing apparatus
A laser beam machining method and a laser beam machining device capable of cutting a work without producing a fusing and a cracking out of a predetermined cutting line on the surface of the work,...
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7612895 |
Apparatus and method for in-situ monitoring of wafer bonding time
An apparatus and a method for semiconductor wafer bonding provide in-situ and real time monitoring of semiconductor wafer bonding time. Deflection of the wafer edges during the last phase of the...
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7605008 |
Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma
A method and apparatus for igniting a gas mixture into plasma using capacitive coupling techniques, shielding the plasma and other contents of the plasma reactor from the capacitively-coupled...
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7601549 |
Method of processing semiconductor wafers
A method of processing semiconductor wafers comprises forming a pattern of recesses in an exposed surface of each wafer in a lot, prior to an epitaxy step. At least one recessed test structure is...
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7598098 |
Monitoring the reduction in thickness as material is removed from a wafer composite and test structure for monitoring removal of material
The aim of the invention is to create a simple monitoring or testing method for monitoring a reduction in thickness as material is removed from a bonded semiconductor wafer pair, which prevents...
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7586608 |
Wafer-level testing of optical and optoelectronic chips
This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light from top of the wafer.
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7572648 |
Method of manufacturing optical sensor
A cubic element of photonic crystal is integrally formed on the surface of a photo-detection element, and a portion of the photonic crystal cubic element is irradiated with ultraviolet rays thereby...
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7568379 |
Method of measuring porosity by means of ellipsometry and device for implementing one such method
The method for measuring the porosity of an element is performed by means of a measuring device comprising a measuring chamber in which the element is disposed, a solvent tank associated with an...
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7566181 |
Controlling critical dimensions of structures formed on a wafer in semiconductor processing
In semiconductor processing, the critical dimensions of structures formed on a wafer are controlled by first developing photoresist on top of a film layer on a wafer using a developer tool, the...
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7563626 |
Manufacturing method of complementary metal oxide silicon image sensor
A manufacturing method of a CMOS image sensor including at least one of the following steps. Forming an under-structure including a photodiode, a metal wire, and an interlayer insulation film for...
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7556972 |
Detection and characterization of SiCOH-based dielectric materials during device fabrication
Processes and apparatuses are disclosed for detecting and characterizing SiCOH-based dielectric materials during integrated circuit fabrication. The processes generally include chromatographically...
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7553678 |
Method for detecting semiconductor manufacturing conditions
A method for detecting semiconductor-manufacturing conditions includes providing a photomask with a plurality of pattern areas each having a plurality of test lines with different pitches, exposing...
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7544619 |
Method of fabricating semiconductor device
An insulating film is formed on a main surface of a substrate. A conductive film is formed on the insulating film. A lower layer resist film, an intermediate layer, an anti-reflection film and an...
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7541201 |
Apparatus and methods for determining overlay of structures having rotational or mirror symmetry
Disclosed are overlay targets having flexible symmetry characteristics and metrology techniques for measuring the overlay error between two or more successive layers of such targets. In one...
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7541230 |
Method and apparatus for crystallizing semiconductor with laser beams
Laser beams emitted by a plurality of laser sources are divided into a plurality of sub-beams, which are irradiated onto selected portions of an amorphous semiconductor on a substrate to...
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7537941 |
Variable overlap of dummy shapes for improved rapid thermal anneal uniformity
Embodiments of the invention provide a method, structure, service, etc. for variable overlap of dummy shapes for improved rapid thermal anneal uniformity. A method of providing uniform temperatures...
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7517705 |
Phosphorus-containing polymers for optical signal transducers
The invention relates to a phosphorus-containing polymer for coating dielectric materials, to processes for its preparation and to its use, as well as to an optical signal transducer having a...
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7514277 |
Etching method and apparatus
An etching method capable of controlling the film thickness of a hard mask layer uniformly is provided. A plasma etching is performed on a native oxide film by using an etching gas containing, for...
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7514940 |
System and method for determining effective channel dimensions of metal oxide semiconductor devices
A system and method are disclosed for determining the effective channel width (Weff) and the effective channel length (Leff) of metal oxide semiconductor devices. One advantageous embodiment of the...
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7498106 |
Method and apparatus for controlling etch processes during fabrication of semiconductor devices
A method for controlling etch processes during fabrication of semiconductor devices comprises tests and measurements performed on non-product and product substrates to define an N-parameter CD...
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7493713 |
Image sensor and related method of fabrication
An image sensor and related method of fabrication are disclosed. The image sensor comprises a plurality of photoelectric conversion regions disposed in a predetermined field of a semiconductor...
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7482177 |
Method for manufacturing optical device, and optical device wafer
A method for manufacturing an optical device includes the steps of: forming a first multilayer film, including forming a first mirror above a substrate, forming an active layer above the first...
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7457736 |
Automated creation of metrology recipes
An automated metrology recipe set up process is described for a manufacturing process, in which patterns to be formed on a device are defined using a design database. The design database is...
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7449348 |
Feedback control of imprint mask feature profile using scatterometry and spacer etchback
The present invention relates generally to photolithographic systems and methods, and more particularly to systems and methodologies that facilitate compensating for retrograde feature profiles on...
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7446868 |
Micro defects in semi-conductors
The invention relates to a method and apparatus for detecting defects in a semiconductor or silicon structure at room temperature, and in an efficient time, using photoluminescence. The invention...
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7427764 |
Laser crystallization apparatus and laser crystallization method
A laser crystallization apparatus which capable of correcting both shift in imaging position caused by thermal lens effect of the imaging optical system and shift due to flatness of the substrate...
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7427518 |
Semiconductor device fabrication method and fabrication apparatus
According to the present invention, there is provided a semiconductor device fabrication method comprising:
measuring light emission intensity of at least one type of wavelength contained in...
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7410815 |
Apparatus and method for non-contact assessment of a constituent in semiconductor substrates
Methods and apparatus for assessing a constituent in a semiconductor substrate. Several embodiments of the invention are directed toward non-contact methods and systems for identifying an atom...
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7409260 |
Substrate thickness measuring during polishing
A method for determining a polishing endpoint includes obtaining spectra from different zones on a substrate during different times in a polishing sequence, matching the spectra with indexes in a...
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7407821 |
Substrate processing method
There is provided a substrate processing method and apparatus which can measure and monitor thickness and/or properties of a film formed on a substrate as needed, and quickly correct a deviation in...
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7399647 |
Multi beam scanning with bright/dark field imaging
Bright and dark field imaging operations in an optical inspection system occur along substantially the same optical path using the same light source by producing either a circular or an annular...
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7399711 |
Method for controlling a recess etch process
A method of controlling a recess etch process for a multilayered substrate having a trench therein and a column of material deposited in the trench includes determining a first dimension from a...
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7381654 |
Method for fabricating right-angle holes in a substrate
A method is disclosed for forming right-angle contact/via holes for semiconductor devices. A device is provided on a substrate and covered with a first dielectric layer. A second dielectric layer...
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7344900 |
Laser scribe on front side of semiconductor wafer
Disclosed are a semiconductor wafer ( 10 ) having a front side laser scribe ( 22 ) and the methods for manufacturing the same. The methods of the invention include the formation of a scribe...
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7335315 |
Method and device for measuring wafer potential or temperature
The present invention attracts a wafer 6 , placed on a susceptor 5 , toward the susceptor 5 by the electrostatic attractive power of an electrostatic chuck electrode 7 , varies the output...
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7332438 |
Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, a characteristic of a polishing pad, or a characteristic of a...
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7326580 |
Method of observing monolayer ultraviolet decomposition process, method of controlling degree of surface decomposition, and patterning method
Aspects of the invention can provide a method of effectively observing the photodecomposition process of a monolayer in real time. The invention can provide a method of observing the decomposition...
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7319944 |
Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist
A computer implemented method for development profile simulation in accordance with an embodiment of the present invention includes calculating optical intensities in a photosensitive resist,...
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7316934 |
Personalized hardware
A system for personalizing one or more electrical circuits having plurality of layers with electrical characteristics. The layers being produced by an electrical characteristic determination...
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7316982 |
Controlling carbon nanotubes using optical traps
An embodiment of the present invention is a technique to control carbon nanotubes (CNTs). A laser beam is focused to a carbon nanotube (CNT) in a fluid. The CNT is responsive to a trapping...
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7314766 |
Semiconductor wafer treatment method, semiconductor wafer inspection method, semiconductor device development method and semiconductor wafer treatment apparatus
A treatment method of a semiconductor wafer includes treating the semiconductor wafer in a first solution having at least one kind of an oxidative acid and an oxidizing agent and treating the...
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7311738 |
Positioning apparatus
A positioning apparatus for positioning a substrate. The positioning apparatus includes a setting system which selectively sets one of a center of the substrate and a specific portion of an edge of...
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7306959 |
Methods of fabricating integrated optoelectronic devices
This disclosure concerns methods for fabrication of integrated high speed optoelectronic devices. In one example of such a method, a device region that includes a top surface and a bottom surface...
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7306696 |
Interferometric endpoint determination in a substrate etching process
In determining an endpoint of etching a substrate, light that is directed toward the substrate is reflected from the substrate. A wavelength of the light is selected to locally maximize the...
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7303928 |
Process monitor and system for producing semiconductor
A sensor on a semiconductor wafer is used as a process monitor and a capacitor is employed as a power supply for the sensor. The capacitor can be formed by stacking a poly-silicon layer and a...
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7297287 |
Method and apparatus for endpoint detection using partial least squares
An apparatus and method for detection of a feature etch completion within an etching reactor. The method includes determining a correlation matrix by recording first measured data regarding a first...
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7296103 |
Method and system for dynamically selecting wafer lots for metrology processing
The present invention is generally directed to various methods and systems for dynamically controlling metrology work in progress. In one illustrative embodiment, the method comprises providing a...
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7282374 |
Method and apparatus for comparing device and non-device structures
The present invention provides a method and apparatus for comparing device and non-device structures. The method includes determining at least one characteristic parameter associated with at least...
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7264976 |
Advance ridge structure for microlens gapless approach
A method of manufacturing a plurality of microlenses on a substrate comprises forming a grid having raised ridges defining a plurality of openings on the substrate and forming a plurality of...
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