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7622319 |
CMOS image sensor and manufacturing method thereof
A CMOS image sensor includes isolation regions and a photo diode region formed in a substrate, gate electrodes formed on the substrate, impurity injection regions formed in the substrate...
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7615414 |
Dental intraoral radiological image sensor with a fiber-optic plate
The invention relates to dental radiological image sensors for intraoral use. What is described is a method of fabricating an image sensor, comprising steps for the collective production of a...
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7592196 |
Method for fabricating a CMOS image sensor
A method for fabricating a CMOS image sensor may include forming an isolation layer defining an active area on a semiconductor substrate, forming first and second gate electrodes in the transistor...
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7588956 |
CMOS image sensor and method of manufacturing the same
Disclosed herein are a CMOS image sensor and a method of manufacturing the same, which can reduce current leakage through a plug connecting a photodiode and a transfer transistor to each other, and...
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7586169 |
Image sensor and method for manufacturing the same
An image sensor that can include a photodiode formed on one side of a substrate to receive light and then generate signal charges based on the light; and a transistor converting the signal charges...
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7582502 |
Method for manufacturing back side illumination image sensor
Provided are methods for manufacturing a back side illumination image sensor. In one method, an ion implantation layer is formed in an entire region of a front side of a first substrate. A device...
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7582499 |
Photo sensor and a method for manufacturing thereof
A photo sensor has an insulator layer for covering a diode stack, and the insulator layer is made of photoresist to reduce a side leakage current.
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7579197 |
Method of forming a magnetic tunnel junction structure
In a particular illustrative embodiment, a method of forming a magnetic tunnel junction (MTJ) device is disclosed that includes forming a trench in a substrate. The method further includes...
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7563637 |
Image sensor
Embodiments relate to and image sensor. In embodiments, the image sensor may include a semiconductor substrate, a photodiode region, a gate electrode, a dummy gate, and an interlayer dielectric...
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7547573 |
Image sensor and method of manufacturing the same
An image sensor and a method of manufacturing the same, in which, a planarized layer is formed on a semiconductor substrate including a pixel array region, an optical black region, and a logic...
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7544530 |
CMOS image sensor and manufacturing method thereof
Disclosed are a CMOS image sensor and a manufacturing method thereof. The method includes the steps of: forming an isolation layer on a semiconductor substrate, defining an active region that...
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7527986 |
Method for fabricating magnetic tunnel junction cell
A method for fabricating a magnetic tunnel junction cell comprises forming an insulation layer with an opening, forming a first pattern including multiple layers of a first electrode pattern on a...
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7524695 |
Image sensor and pixel having an optimized floating diffusion
An active pixel includes a a photosensitive element formed in a semiconductor substrate. A transfer transistor is formed between the photosensitive element and a floating diffusion and selectively...
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7517714 |
Image sensors for reducing dark current and methods of fabricating the same
An image sensor includes a semiconductor substrate of a first conductivity type, a photodiode of a second conductivity type located in the substrate, a hole accumulated device (HAD) region of the...
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7510900 |
Methods of forming a double pinned photodiode
A pinned photodiode, which is a double pinned photodiode having increased electron capacitance, and a method for forming the same are disclosed. The invention provides a pinned photodiode structure...
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7504278 |
Image sensor and method for manufacturing the same
An image sensor is disclosed where individual photo diodes of the respective unit cells separated by an element isolating layer are physically integrated into a single large scale pixel formed...
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7494832 |
Semiconductor optical devices and method for forming
A semiconductor optical device includes an insulating layer, a photoelectric region formed on the insulating layer, a first electrode having a first conductivity type formed on the insulating layer...
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7476560 |
Photoelectric conversion device, and process for its fabrication
In a photoelectric conversion device comprising a photoelectric-conversion section and a peripheral circuit section where signals sent from the photoelectric-conversion section are processed, the...
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7470560 |
Image sensor having a charge storage region provided within an implant region
A deep implanted region of a first conductivity type located below a transistor array of a pixel sensor cell and adjacent a doped region of a second conductivity type of a photodiode of the pixel...
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7462507 |
Structure of a CMOS image sensor and method for fabricating the same
An image sensor device and method for forming the same include a photodiode formed in a substrate, at least one electrical interconnection line electrically associated with the photodiode, a light...
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7459332 |
CMOS image sensor and method for manufacturing the same
A CMOS image sensor and method for fabricating same are provided. The CMOS image sensor can include a gate electrode formed on an active area of a first conductive type semiconductor substrate, on...
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7442572 |
CMOS image sensor and method for manufacturing the same
A CMOS image sensor and a method for manufacturing the same improves photosensitivity and prevent loss of light by forming a photo-sensing unit under a color filter. The CMOS image sensor may...
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7425725 |
Temperature sensor for a liquid crystal display panel
A sensor is provided, which includes a substrate, an insulating layer formed on the substrate, a semiconductor formed on the insulating layer, an ohmic contact formed on the semiconductor, a sensor...
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7402451 |
Optimized transistor for imager device
An imager device that has mitigated dark current leakage and punch-through protection. The transistor associated with the photoconversion device is formed with a single (i.e, one-sided) active area...
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7399997 |
Semiconductor laser device and fabrication method thereof
A semiconductor laser device aimed to be reduced in size and that can maintain high position accuracy, and a fabrication method of such a semiconductor laser device are achieved. A semiconductor...
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7387907 |
Image sensor with optical guard ring and fabrication method thereof
An image sensor device and fabrication method thereof wherein a substrate having at least one shallow trench isolation structure therein is provided. At least one photosensor and at least one light...
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7361526 |
Germanium photo detector having planar surface through germanium epitaxial overgrowth
A method of fabricating a germanium photo detector includes preparing a silicon substrate wafer and depositing and planarizing a silicon oxide layer on the silicon substrate. Contact holes are...
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7358107 |
Method of fabricating a germanium photo detector on a high quality germanium epitaxial overgrowth layer
A method of fabricating a germanium photo detector includes preparing a silicon substrate; depositing and planarizing a silicon oxide layer; forming contact holes in the silicon oxide layer which...
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7351605 |
Method of manufacturing a semiconductor device
The number of masks is reduced in a method of manufacturing a semiconductor device that has a transistor and a photoelectric conversion element on an insulating surface. In a manufacturing method...
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7326656 |
Method of forming a metal oxide dielectric
A semiconductor device comprising a semiconductor body having a top surface and a first and second laterally opposite sidewalls as formed on an insulating substrate is claimed. A gate dielectric is...
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7326590 |
Method for manufacturing ball grid array package
A method for manufacturing a ball grid array package includes the steps of providing a substrate strip having a plurality of sub-substrate strips wherein each has an upper surface and a lower...
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7316937 |
Method for manufacturing a solid-state image sensing device, such as a CCD
Light detecting elements are formed in areas marked off by scribe lines on a semiconductor substrate, and color filters are deposited in such a manner as to cover the formed areas of the light...
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7271025 |
Image sensor with SOI substrate
An imager pixel utilizing a silicon-on-insulator substrate, a photodiode in said substrate below the buried oxide, and a dual contact to said photodiode and methods of forming said imager pixel....
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7264987 |
Method of fabricating optoelectronic integrated circuit chip
Provided is a method of fabricating an optoelectronic integrated circuit chip. In particular, a method of fabricating an optoelectronic integrated circuit chip is provided, in which an optical...
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7259323 |
Thin film solar cell thermal radiator
A thin film solar cell thermal radiator configuration uses an embedded power bus to collect vertically migrating waste heat from electronic devices mounted on a thin film multilayer printed circuit...
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7238544 |
Imaging with gate controlled charge storage
A pixel cell comprises a photo-conversion device for generating charge and a gate controlled charge storage region for storing photo-generated charge under control of a control gate. The charge...
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7226803 |
Photodiode with ultra-shallow junction for high quantum efficiency CMOS image sensor and method of formation
A pinned photodiode with an ultra-shallow highly-doped surface layer of a first conductivity type and a method of formation are disclosed. The ultra-shallow highly-doped surface layer has a...
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7193267 |
Cross-point resistor memory array
Resistive cross-point memory devices are provided, along with methods of manufacture and use. The memory devices are comprised by an active layer of resistive memory material interposed between...
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7192826 |
Semiconductor device and process for fabrication thereof
Disclosed is a semiconductor device in which the capacitive element of MIMC structure has a low parasitic capacity. A process for fabrication of said semiconductor device. The semiconductor device...
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7172920 |
Method of manufacturing an image device
An imaging device comprises a select line, a first signal line crossing the select line, and a first pixel provided at a portion corresponding to a crossing portion of the select line and the first...
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7157300 |
Fabrication of thin film germanium infrared sensor by bonding to silicon wafer
A method of fabricating a thin film germanium photodetector includes preparing a silicon substrate; fabricating a CMOS device on the silicon substrate; preparing a germanium substrate; preparing...
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7154758 |
Method and semi-product for producing a chip card with a coil
The invention describes a method for producing chip cards with contactless and/or contact-type operation having a multilayer card body, an integrated circuit and at least one coil ( 2, 21 ) for...
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7154524 |
Exposure apparatus including a controller configured to read electrical signals from an array of photoelectric converters
An exposure apparatus for exposing a substrate to a light pulse via a mask. The apparatus includes an array of photoelectric converters to detect the light pulse, and a read circuit to read...
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7134187 |
Method for making an inkjet-head chip structure
A structure of inkjet-head chip and a method for making the same are disclosed. Driven by the need of making a thin insulator layer to lower the working power of the inkjet-head chip, we separately...
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7115439 |
High photosensitivity CMOS image sensor pixel architecture
The photosensitive volume of a pixel is extended beyond the photodiode region, which allows the pixel sensitivity to be relatively independent of the photodiode region. In an example embodiment,...
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7109051 |
Method of integrating optical devices and electronic devices on an integrated circuit
A method for integrating an optical device and an electronic device on a semiconductor substrate comprises forming openings within an active semiconductor layer in a first region of the...
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7084000 |
Solid-state imaging device and method for manufacturing the same
A solid-state imaging device according to the present invention includes a semiconductor substrate; a photoelectric conversion portion formed on the semiconductor substrate; a gate insulating film...
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7083998 |
Si/SiGe optoelectronic integrated circuits
An integrated optoelectronic circuit and process for making is described incorporating a photodetector and a MODFET on a chip. The chip contains a single-crystal semiconductor substrate, a buffer...
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7052928 |
Solid state imaging device, method for producing the same, and portable electronic device
A method for producing a solid-state imaging device comprising a plurality of unit pixel sections, including a first unit pixel section, is provided. The method includes the steps of forming a...
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7037807 |
Electric field induced spin-polarized current
A device and a method for generating an electric-field-induced spin current are disclosed. A highly spin-polarized electric current is generated using a semiconductor structure and an applied...
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