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6743655 Negative differential resistance reoxidized nitride silicon-based photodiode and method  
A photodiode that exhibits a photo-induced negative differential resistance region upon biasing and illumination is described. The photodiode includes an N+ silicon substrate, a silicon nitride...
6734037 Method and device for producing solar cells  
The present invention concerns a process for fabricating a solar cell, wherein material is deposited on a multicrystalline silicon substrate and passivation is performed by means of hydrogen...
6734452 Infrared radiation-detecting device  
An Al x Ga 1−x As/GaAs/Al x Ga 1−x As quantum well exhibiting a bound-to-quasibound intersubband absorptive transition is described. The bound-to-quasibound transition exists when the first...
6730536 Pre-drilled image sensor package fabrication method  
A central aperture is formed in a substrate. Traces are formed on a lower surface of the substrate, the traces having tabs protecting beyond a sidewall of the central aperture. An image sensor is...
6725528 Microsolenoid coil and its manufacturing method  
A photosensitive material is coated on an insulating material ( 13 ) stacked on a substrate ( 1 ) (FIG. 16 A), and exposed and developed using a mask having a light-shielding film capable of...
6720202 Photovoltaic cells  
Improved photovoltaic cells utilizing for a semiconductor layer, titanium dioxide powders, consisting of porous particles, ranging in size from 0.1 to 10 microns (10 −6 meters), and possess...
6709886 Method of fabricating micromachined devices  
A method for fabricating a module for at least partially intercepting a light beam propagating along a beam path includes providing a single crystal silicon substrate with a first substrate surface...
6706550 Photodiode having a plurality of PN injections and image sensor having the same  
The present invention relates to a pinned photodiode for an image sensor and a method for manufacturing the same; and, more particularly, to a pinned photodiode of an image sensor fabricated by...
6706962 Hybrid solar cells with thermal deposited semiconductive oxide layer  
Method for producing a hybrid organic solar cell having the general structure Substrate+EM/HTM/dye/SOL/EM, or Substrate+EM/SOL/dye/HTM/EM, or Substrate+EM/HTM/SOL/EM, in which EM is the electrode...
6696738 Miniaturized image sensor  
An image sensor includes a substrate, a frame layer, a photosensitive chip and a transparent layer. The substrate is composed of spaced metal sheets. Each metal sheet includes a first board, a...
6694614 Laser processing method and equipment for printed circuit board  
A laser processes a circuit board including at least two layers. The two layers are a conductive layer with a plurality of holes and an insulating layer. The conductive layer is disposed on a...
6692981 Method of manufacturing a solar cell  
A method of manufacturing a solar cell comprises interposing an intermediate layer containing p-type or n-type impurity between a silicon thin film and a support substrate, and heating all or part...
6689950 Paint solar cell and its fabrication  
A solar cell has an active structure including a paint voltage source having a first paint layer structure comprising p-type pigment particles dispersed in a first-layer binder, and a second paint...
6686291 Undercut process with isotropic plasma etching at package level  
A method ( 30 ) of fabricating a micromechanical device ( 10 ) by performing spacer layer undercutting ( 46 ) and passivation at the package level. A back-end assembly process utilizes a full-cut...
6682960 Method of producing semiconductor device with a thin film transistor and a photoelectric conversion element  
The present invention is a method of producing a semiconductor device usable as a photodetector having a plurality of pixels, each composed of an MIS photoelectric conversion element and a...
6680216 Method of making imager structure  
In an imager having an array of light-sensitive elements and employing striped common electrodes, exposed edges of preimidized polyimide layers above the light-sensitive imaging elements are sealed...
6674106 Display device such as electro-optic element and thin film transistor and display device manufacturing method  
A display device includes pixels disposed in a matrix on a transparent base plate. Each pixel includes an opening region, in which an electro-optic element for emitting light through the base plate...
6670544 Silicon-germanium solar cell having a high power efficiency  
A silicon-germanium thin-film solar cell having a quantum well structure as an active base layer within the space-charge region of the silicon p-n diode junction. The quantum well structure is...
6670213 Method of preparing photoresponsive devices, and devices made thereby  
A method of preparing an efficient photoresponsive device includes the steps of providing a first electrode on a substrate, providing a layer of an organic material including a blend of at least...
6661080 Structure for backside saw cavity protection  
A structure includes holes formed in a layer of tape. The holes are aligned over active areas on chips formed in a wafer. A custom vacuum chuck with a plurality of suction ports is aligned on the...
6661025 Method of manufacturing electro-optical apparatus substrate, electro-optical apparatus substrate, electro-optical apparatus and electronic apparatus  
A method of manufacturing an electro-optical apparatus substrate ( 10 ), includes the processes of: forming a light shield layer on one surface of an optically transparent substrate; patterning the...
6660553 Semiconductor device having solid-state image sensor with suppressed variation in impurity concentration distribution within semiconductor substrate, and method of manufacturing the same  
Photolithography is used to form a photoresist ( 30 ) having an opening over an end portion of a gate structure ( 15 ) and over a region adjacent to the gate structure ( 15 ) where a photodiode (...
6660552 Reduced surface charging in silicon-based devices  
A grating light valve with reduced surface charging is disclosed. Surface charging is measured by the propensity an insulating surface to accept and transport a charge. The grating light valve of...
6660555 X-ray image sensor and method for fabricating the same  
An X-ray image sensor having a photoelectric conversion part that converts X-ray photons into electric charges. The X-ray image sensor includes a pixel electrode for collecting the electric charges...
6656760 Solid state imaging sensor in a submicron technology and method of manufacturing and use of a solid state imaging sensor  
A detector and a camera system for electromagnetic radiation being integrated in a solid state substrate are disclosed. Said substrate comprises a first region of a first conductivity and a second...
6656761 Method for forming a semiconductor device for detecting light  
A method of forming a resonant cavity device useful for optoelectronic applications is disclosed. A monocrystalline top semiconductor substrate is wafer bonded to a mirror formed over or within a...
6656762 Method for manufacturing semiconductor image sensor with color filters and bonding pads  
In a method for fabricating a semiconductor device suitable for an image sensor, a bonding pad is formed on a lower insulating layer after the lower insulating layer is formed on a substrate. Then,...
6653164 Solid state imaging device, manufacturing method thereof, and solid state imaging apparatus  
A sole state imaging device includes a photodetection diode and an insulated gate field effect transistor provided adjacent to the photodetection diode for optical signal detection. In a method of...
6645789 On chip alpha-particle detector  
An IC chip comprising, a nearby or remote source capable of particle emissions; circuitry formed in the IC chip that is adversely affected by impacts of particle emissions from said source; and a...
6638786 Image sensor having large micro-lenses at the peripheral regions  
An image sensor includes an array of pixels formed in a semiconductor substrate. The pixels are grouped as a center portion of pixels and an outer portion of pixels. A first set of micro-lenses is...
6635507 Monolithic bypass-diode and solar-cell string assembly  
An apparatus and method are described for making a solar cell with an integrated bypass diode. The method comprises the steps of depositing a second layer having a first type of dopant on a first...
6632699 Process for making a color selective Si detector array  
A multiplicity of components form a photodiode array on a substrate. Each of the components consists of a transistor of the p-n-p type with the outermost p-doped layer being transformed into an...
6627475 Buried photodiode structure for CMOS image sensor  
A method of forming an image sensor is disclosed. A partially processed semiconductor wafer is provided, containing a p-type region. An n-type photodiode region is formed within the p-type region....
6627474 Increasing pixel conversion gain in CMOS image sensors  
A pixel sensor system includes a photo-sensor, an output amplifier, and a feedback capacitor. The photo-sensor is configured to receive photons and to convert the photons into charge. The output...
6613974 Tandem Si-Ge solar cell with improved conversion efficiency  
P-type and n-type regions are defined in the first surface of a substrate upon which is formed an epitaxial layer of preferably Si—Ge material, preferably capped by Si material. During epitaxy...
6607935 Method for fabricating array substrate for X-ray detector  
An array substrate for use in an X-ray sensing device is fabricated using an etching stopper that enables good control of the etching process and that prevents over-etch of drain electrodes and...
6605488 Layout technique for semiconductor processing using stitching  
A technique and structure for simplifying the stitching process is disclosed. According to one aspect of the present system, a floor plan that minimizes the number of blocks for a two-dimensional...
6600157 Semiconductor device, and radiation detection device and radiation detection system having same  
A semiconductor device is provided which comprises a thin film transistor (TFT) comprising a gate electrode formed on an insulating substrate, a gate insulating film formed on the gate electrode,...
6599771 Thermal infrared sensor and a method of manufacturing the same  
A thermal type infrared sensor and a method of manufacturing the same that have a high degree of freedom of structure and a low cost. An infrared ray detecting portion and a support leg are formed...
6593164 Silicon photoelectric conversion device, method of manufacturing the same and method of processing the same  
A cyano process of introducing cyano ions (CN − ) into an amorphous silicon layer is performed after the amorphous silicon layer has been formed over a substrate or after the layer has been...
6590150 Combination photovoltaic cell and RF antenna and method  
A combination photovoltaic cell and RF antenna in a single unit performs the dual functions of transmitting and receiving RF signals to and from a transceiver and converting light waves to electric...
6586270 Process for producing a photovoltaic element  
A process for producing a stable photovoltaic element having an electrode structure comprising a collecting electrode and a metal bus bar which are connected to have an improved connection between...
6586718 Photodetector and method for fabricating the same  
A photodetector includes semiconductor conductive layer, light-absorbing layer and wide bandgap layer, which are stacked in this order on a semi-insulating semiconductor substrate. The conductive...
6583350 Thermophotovoltaic energy conversion using photonic bandgap selective emitters  
A method for thermophotovoltaic generation of electricity comprises heating a metallic photonic crystal to provide selective emission of radiation that is matched to the peak spectral response of a...
6579739 Optical transmitting and receiving device and the manufacturing method  
An insulation film (silicon dioxide film) is laminated on a platform substrate of Si, etc., and a transmitting unit wiring pattern and a receiving unit wiring pattern are provided on the insulation...
6579740 Method of making a thin film sensor  
In a thin-film infrared sensor, (100)-oriented semiconductor substrate is used for the sensor fabrication. A surface of the substrate is partially masked to provide an unmasked section where a...
6573118 Method of forming a photo sensor in a photo diode  
The surface of the semiconductor wafer includes a silicon substrate containing first-type dopants, a well of first-type dopants positioned in a predetermined region on the substrate, a photo diode...
6569707 Method for improving performance of organic semiconductors in bottom electrode structure  
A method for improving the performance of an organic thin film field effect transistor including the steps of: (a) forming a transistor structure having patterned source and drain electrodes; and...
6566159 Method of manufacturing tandem thin-film solar cell  
A method of manufacturing a tandem thin-film solar cell is provided, the solar cell including a plurality of photoelectric conversion units stacked on a substrate, the photoelectric conversion...
6566595 Solar cell and process of manufacturing the same  
A solar cell having a p-type semiconductor layer and an n-type semiconductor layer made of a first compound semiconductor material, and a semiconductor layer sandwiched between the p-type...