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8178387 |
Methods for reducing recrystallization time for a phase change material
A method for reducing recrystallization time for a phase change material of a memory cell element in conjunction with the manufacture of a memory cell device can be carried out as follows. A phase...
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8173451 |
Etch stage measurement system
Provided is a system for measuring an etch stage of an etch process involving one or more layers in a substrate, the etch stage measurement system configured to meet two or more etch stage...
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8173450 |
Method of designing an etch stage measurement system
Provided is a method for designing an etch stage measurement system involving an etch process for one or more layers on a substrate using an etch process tool. The etch process tool uses two or...
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8163570 |
Method of initiating molecular bonding
A method of initiating molecular bonding, comprising bringing one face of a first wafer to face one face of a second wafer and initiating a point of contact between the two facing faces. The point...
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8163571 |
Multi-step deposition control
For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two...
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8153450 |
Method for manufacturing SIMOX wafer
At oxygen ion implanting steps in manufacture of a SIMOX wafer, a path is formed inside or on a back surface of wafer holding means, and oxygen ions are implanted while heating an outer peripheral...
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8148175 |
Manufacturing apparatus for semiconductor device and manufacturing method for semiconductor device
A manufacturing apparatus for a semiconductor device, treating a SiN film formed on a wafer with phosphoric acid solution, including a processing bath to store phosphoric acid solution provided for...
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8143074 |
Semiconductor processing system and method of processing a semiconductor wafer
A method of processing semiconductor wafers includes applying reactive gas through a plurality of inlets to the semiconductor wafers. The method further includes removing exhaust gas resulting from...
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8126588 |
Method and system for controlling transport sequencing in a process tool by a look-ahead mode
By providing a look-ahead functionality for a tool internal substrate handling system of process tools on the basis of a process history, the tool internal substrate sequencing may be significantly...
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8110412 |
Integrated circuit wafer system with control strategy
An integrated circuit wafer system includes an integrated circuit wafer, measuring thicknesses of the integrated circuit wafer, calculating a change in temperature ramp rates and thickness offsets...
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8097474 |
Integrated circuit chip design flow methodology including insertion of on-chip or scribe line wireless process monitoring and feedback circuitry
Disclosed are embodiments of a design and manufacturing system and an associated method that allow for design analysis and for insertion, during wafer manufacture, of intra-process monitoring...
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8097473 |
Alignment method, exposure method, pattern forming method, and exposure apparatus
An alignment method is provided in which a substrate including first and second layers is aligned in forming a second pattern in the second layer. The method includes storing first alignment...
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8095230 |
Method for optimizing the routing of wafers/lots based on yield
A method for increasing overall yield in semiconductor manufacturing including routing wafers or wafer lots based on process variation data obtained from the wafers or wafer lots and on process...
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8088632 |
Elemental analysis method and semiconductor device manufacturing method
Protons are entered into a substrate to be analyzed at a proton incident angle larger than 0° and smaller 90°. Excited by the entered protons and emitted from the substrate to be analyzed, the c...
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8088693 |
Substrate treatment method
There is provided a substrate treatment method for performing treatment by feeding a chemical liquid to a surface of a substrate, in which, before feeding the chemical liquid to a predetermined...
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8071397 |
Semiconductor fabricating apparatus with function of determining etching processing state
A semiconductor fabricating method including: placing the semiconductor wafer having a film thereon inside of a chamber; generating plasma; detecting a quantity of interference lights for each of...
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8073667 |
System and method for using first-principles simulation to control a semiconductor manufacturing process
A method, system and computer readable medium for controlling a process performed by a semiconductor processing tool includes inputting data relating to a process performed by the semiconductor...
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8053748 |
Integrated circuits with phase change devices
Embodiments include methods, apparatus, and systems with integrated circuits having phase change devices. One embodiment includes an integrated circuit die and a phase change die having a phase...
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8053253 |
Method for manufacturing semiconductor device
An object is to provide a highly reliable semiconductor device that has tolerance to external stress and electrostatic discharge. Another object is to prevent defective shapes and defective...
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8053254 |
Apparatus for forming thin film and method of manufacturing semiconductor film
An apparatus including a vacuum chamber having a substrate holding unit that holds a substrate and a plasma electrode facing the substrate, a first gas supply unit that supplies a H2 gas to the...
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8050900 |
System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process
A method, system, and computer readable medium for facilitating a process performed by a semiconductor processing tool. The method includes inputting data relating to a process performed by the...
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8048806 |
Methods to avoid unstable plasma states during a process transition
In some implementations, a method is provided in a plasma processing chamber for stabilizing etch-rate distributions during a process transition from one process step to another process step. The...
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8038401 |
Wind turbine blade with a light beacon at the tip
Wind turbine blade (11) with a flashing beacon on its tip which is connected to the wind turbine rotor hub (13) where this beacon includes a lighting module (21) in the tip area of the blade (11)...
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8036869 |
System and method for using first-principles simulation to control a semiconductor manufacturing process via a simulation result or a derived empirical model
A method, system and computer readable medium for controlling a process performed by a semiconductor processing tool. The method includes inputting data relating to a process performed by the...
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8032348 |
System and method for using first-principles simulation to facilitate a semiconductor manufacturing process
A method, system and computer readable medium for facilitating a process performed by a semiconductor processing tool. The method includes inputting data relating to a process performed by the...
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8026515 |
Platform-independent system and method for controlling a temperature of an integrated circuit
A platform-independent temperature controller system and method are provided. Included is a sensor is in communication with an integrated circuit. Further, a platform-independent temperature...
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8021984 |
Method for manufacturing semiconductor
A method for manufacturing a semiconductor includes forming an active region for an ESD device, an active region for a first polygate and the semiconductor, and a second polygate having a form of a...
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8021563 |
Etch depth determination for SGT technology
A method for determining the depth etch, a method of forming a shielded gate trench (SGT) structure and a semiconductor device wafer are disclosed. A material layer is formed over part of a...
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8014991 |
System and method for using first-principles simulation to characterize a semiconductor manufacturing process
A method, system and computer readable medium for facilitating a process performed by a semiconductor processing tool. The method includes inputting data relating to a process performed by the...
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8010468 |
Method for wafer analysis with artificial neural network and system thereof
A method for wafer analysis with artificial neural network and the system thereof are disclosed. The method of the system of the present invention has several steps, including: first of all,...
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8010221 |
Cleaning apparatus and method for immersion light exposure
A cleaning apparatus for immersion light exposure includes a cleaning apparatus main body including a mechanism configured to perform a cleaning process on the substrate, and a control section...
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8002463 |
Method and device for determining the temperature of a substrate
The publication discloses a method for determining a temperature of a substrate, comprising: providing a gas channel that is confined by at least one wall having a certain wall temperature;...
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8003411 |
Device for processing a substrate, method of processing a substrate and method of manufacturing semiconductor device
Provided is a substrate processing apparatus and a method of manufacturing a semiconductor device, which are hard to cause a defect in processing a substrate owing to that a pressure inside a...
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7993937 |
DC and RF hybrid processing system
The invention can provide apparatus and methods for processing substrates and/or wafers in real-time using at least one Direct Current (DC)/Radio Frequency (RF) Hybrid (DC/RFH) processing system...
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7993698 |
Techniques for temperature controlled ion implantation
Techniques for temperature-controlled ion implantation are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for temperature-controlled ion...
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7993800 |
Multilayer active mask lithography
An active mask emits a patterned energy flux in response to an energy input.
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7993801 |
Multilayer active mask lithography
An active mask emits a patterned energy flux in response to an energy input.
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7986146 |
Method and system for detecting existence of an undesirable particle during semiconductor fabrication
One exemplary embodiment is a method for detecting existence of an undesirable particle between a planar lithographic object, such as a semiconductor wafer or a lithographic mask, and a chuck...
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7981700 |
Semiconductor oxidation apparatus and method of producing semiconductor element
A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a...
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7973386 |
ESD protection bipolar device with internal avalanche diode
In a bipolar device an intrinsic Zener like diode is formed for controlling the triggering voltage and leakage current, the Zener-like diode being formed between the n-collector and the p-base,...
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7968353 |
Apparatus and methods for manufacturing thin-film solar cells
Improved methods and apparatus for forming thin-film layers of semiconductor material absorber layers on a substrate web. According to the present teachings, a semiconductor layer may be formed in...
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7960187 |
Recovery processing method to be adopted in substrate processing apparatus, substrate processing apparatus and program
The present invention provides a recovery processing method to restore the substrate processing apparatus to an operating state after correcting an abnormality having occurred in the substrate...
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7955986 |
Capacitively coupled plasma reactor with magnetic plasma control
A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar...
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7957827 |
Method of controlling statuses of wafers
A method of controlling statuses of a plurality of wafers is described. A status of a wafer among the wafers is determined. An action related to the status is taken, according to the status...
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7955874 |
Method of producing bonded silicon wafer
A bonded silicon wafer is produced by a method comprising a step of implanting oxygen ions from one surface of a silicon wafer for active layer to form an oxygen ion implanted layer, a step of...
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7955943 |
High voltage sensor device and method therefor
In one embodiment, a high voltage element is formed overlying a doped semiconductor region that can be depleted during the operation of the high voltage element includes a conductor overlying a...
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7951672 |
Measurement and control of strained devices
A method that includes measuring stress on at least one of a monitor substrate, a production substrate, and a proxy device on a production substrate to produce stress data, measuring shape on at...
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7935545 |
Method and apparatus for performing a site-dependent dual patterning procedure
The present invention includes a method of performing a double-patterning (DP) processing sequence using a plurality of Site-Dependent (S-D) procedures, the method including receiving a first set...
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7935549 |
Seminconductor device
The present invention provides a signal transmitting/receiving method comprising: disposing a ferromagnetic film between a semiconductor device having an inductor and an external device which...
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7927892 |
Thermal treatment apparatus, thermal treatment method and method of manufacturing semiconductor device
A thermal treatment apparatus having a first light source emitting a first light having light diffusion property, a reflectance measuring unit irradiating a treatment target with the light from...
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