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8183609 |
Solid-state imaging device and camera
Disclosed is a solid-state imaging device which includes a plurality of pixels in an arrangement, each of the pixels including a photoelectric conversion element, pixel transistors including a...
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8183083 |
Method for manufacturing back side illumination image sensor
Disclosed is a method for manufacturing a back side illumination image sensor. The method includes defining a pixel area by forming a first isolation area in a first substrate; forming a photo...
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8178369 |
Nanoscale multi-junction quantum dot device and fabrication method thereof
The present invention relates to a method of fabricating a nanoscale multi-junction quantum dot device wherein it can minimize constraints depending on the number or shape of patterns and a line...
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8174084 |
Stress sensor for in-situ measurement of package-induced stress in semiconductor devices
A stress sensor is disclosed herein. The stress sensor includes a plurality of carbon nanotubes in a substrate, and first and second contacts electrically connectable with the plurality of carbon...
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8173446 |
Method of producing an integrated micromagnet sensor assembly
A method of integrating a permanent bias magnet within a magnetoresistance sensor comprising depositing an alternating pattern of a metal material and a semiconductor material on or within a...
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8173483 |
Method of manufacturing solar cell
A method of manufacturing a solar cell includes forming a transparent conductive layer on a substrate by depositing a transparent conductive oxide under room temperature, crystallizing the...
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8168463 |
Zinc oxide film method and structure for CIGS cell
A method for fabricating a thin film photovoltaic device. The method includes providing a substrate comprising an absorber layer and an overlying window layer. The substrate is loaded into a...
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8168523 |
Manufacturing method of semiconductor device
The invention provides a technique to manufacture a highly reliable semiconductor device and a display device at high yield. As an exposure mask, an exposure mask provided with a diffraction...
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8168545 |
Solar cell fabrication using extruded dopant-bearing materials
Wafer-based solar cells are efficiently produced by extruding a dopant bearing material (dopant ink) onto one or more predetermined surface areas of a semiconductor wafer, and then thermally...
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8163571 |
Multi-step deposition control
For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two...
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8164126 |
CMOS image sensors including backside illumination structure
An image sensor having a backside illumination structure can include a photo diode unit in a first wafer, where the photo diode unit includes photo diodes and transfer gate transistors coupled to...
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8158492 |
MEMS microphone with cavity and method therefor
A device comprises a substrate, a micro electro-mechanical systems (MEMS) structure, and a dielectric film. The substrate has a first side and a second side, the second side opposite the first...
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8153523 |
Method of etching a layer of a semiconductor device using an etchant layer
A method of semiconductor fabrication including an etching process is provided. The method includes providing a substrate and forming a target layer on the substrate. An etchant layer is formed on...
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8154021 |
Array substrate for liquid crystal display device and method of fabricating the same
Array substrates for liquid crystal display (LCD) devices are formed on a substrate with first and second gate lines crossing a data line to define first and second pixel regions. A thin film...
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8153468 |
Light emitting device and method of manufacturing the same
A light emitting device and a method of manufacturing the same are provided. The light emitting device comprises a substrate, a gate electrode positioned on the substrate, a first insulating layer...
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8148234 |
Method for manufacturing a semiconductor structure, and a corresponding Semiconductor Structure
A method for manufacturing a semiconductor structure is provided which includes the following operations: supplying a crystalline semiconductor substrate, providing a porous region adjacent to a...
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8143689 |
Sensor device
A sensor device for sensing air flow speed at the exterior of an aircraft, comprising a substrate having an upper side on which is mounted a diaphragm over an aperture or recess in the substrate,...
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8138564 |
Image sensor unit and image sensor apparatus
An image sensor unit includes a fixed substrate, a movable substrate, an actuate section including an actuator for moving the movable substrate against the fixed substrate, an image sensor having...
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8138531 |
Structures, design structures and methods of fabricating global shutter pixel sensor cells
Pixel sensor cells, method of fabricating pixel sensor cells and design structure for pixel sensor cells. The pixel sensor cells including: a photodiode body in a first region of a semiconductor...
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8138004 |
Photoelectric conversion device, manufacturing method thereof and semiconductor device
A manufacturing method of a photoelectric conversion device includes the following steps: forming a first electrode over a substrate; and, over the first electrode, forming a photoelectric...
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8138566 |
Integrated circuit chip made secure against the action of electromagnetic radiation
A chip for a chip-incorporating portable article having a card format, such as for smartcards. The chip includes a silicon substrate layer having integrated circuits in its active face defining a...
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8138496 |
Addressable transistor chip for conducting assays
A bioelectronic microchip formed on a substrate (16) includes a plurality of field effect transistors (10), each including first (12) and second (14) electrodes on the substrate; and a channel (18)...
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8133753 |
Solid-state image pickup device and method for manufacturing same
In a solid-state image pick up device, a first conduction type semiconductor layer which has a first surface side. A second surface side which is located the opposite side of the first surface side...
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8129803 |
Micromachined microphone and multisensor and method for producing same
A micromachined microphone is formed from a silicon or silicon-on-insulator (SOI) wafer. A fixed sensing electrode for the microphone is formed from a top silicon layer of the wafer. Various...
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8129728 |
Light emitting device and method for enhancing light extraction thereof
A method for enhancing light extraction of a light emitting device is disclosed. The method includes the steps of: providing a site layer on the light emitting device; placing a protection layer on...
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8129765 |
CMOS image sensor with photo-detector protecting layers
An image sensor includes a logic region and an APS region having a first gate electrode, a photo-detector, a first protecting layer, first spacers, and a second protecting layer. The first gate...
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8124436 |
MEMS switch capping and passivation method
A MEMS switch with a platinum-series contact is capped through a process that also passivates the contact by controlling, over time, the amount of oxygen in the environment, pressures and...
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8120078 |
Photodiode structure
A photodiode structure including a semiconductor of a first conductivity type, the semiconductor having a main surface, a first well formed in the semiconductor at the main surface thereof, the...
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8119439 |
Methods of manufacturing an image sensor having an air gap
In an example embodiment, the method of manufacturing an image sensor includes forming an interlayer dielectric (ILD) on a substrate. The substrate may have a plurality of pixels arranged thereon...
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8114696 |
CMOS image sensor with asymmetric well structure of source follower
Provided is a CMOS image sensor with an asymmetric well structure of a source follower. The CMOS image sensor includes: a well disposed in an active region of a substrate; a drive transistor having...
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8114694 |
Method for manufacturing back side illuminaton image sensor
A method of manufacturing a back side illumination image sensor according to an embodiment includes: forming an ion implantation layer by implanting ions throughout the front side of a first...
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8114715 |
Resistive random access memory and method for manufacturing the same
A resistive random access memory including, an insulating layer, a hard mask layer, a bottom electrode, a memory cell and a top electrode is provided. The insulating layer is disposed on the bottom...
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8114699 |
Integration manufacturing process for MEMS device
A method for manufacturing an MEMS device is provided. The method includes steps of a) providing a first substrate having a concavity located thereon, b) providing a second substrate having a...
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8114695 |
Solid-state image pickup element, solid-state image pickup device and production method therefor
A method of producing a solid-state image pickup element includes forming a hole portion, forming a first-conductive type high-concentration impurity region in a bottom wall of the hole portion,...
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8115267 |
Semiconductor device and fabrication method of the same
A semiconductor device which comprises an SOI substrate having an insulating layer between a semiconductor substrate layer and a semiconductor layer in a surface of which a semiconductor element is...
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8114703 |
Organic EL device
According to one embodiment, a method of manufacturing an organic EL device includes providing a structure including a substrate and an electrode positioned above the substrate, and forming an...
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8110832 |
Electro-optical substrate, method for designing the same, electro-optical device, and electronic apparatus
An electro-optical substrate, including: a transparent substrate; a first light-shielding layer arranged on a first surface of the transparent substrate, in at least part of a region surrounding an...
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8110432 |
Gate-planarized thin film transistor substrates and related methods of fabrication
Thin film transistor substrates with conductor components in conjunction therewith, and related methods of fabrication.
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8110427 |
Stacked-layered thin film solar cell and manufacturing method thereof
A stacked-layered thin film solar cell and a manufacturing method thereof are provided. The stacked-layered thin film solar cell includes a front electrode layer, a stacked-layered light-absorbing...
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8110419 |
Process of manufacturing photovoltaic device
An inline process for manufacturing a photovoltaic device on a removable substrate is disclosed. The process discloses two semiconductor layers forming an active region; at least one of the...
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8105858 |
CMOS imager having a nitride dielectric
An imaging device formed as a CMOS semiconductor integrated circuit includes a nitrogen containing insulating material beneath a photogate. The nitrogen containing insulating material, preferably...
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8105860 |
Support with integrated deposit of gas absorbing material for manufacturing microelectronic microoptoelectronic or micromechanical devices
The specification teaches a device for use in the manufacturing of microelectronic, microoptoelectronic or micromechanical devices (microdevices) in which a contaminant absorption layer improves...
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8106429 |
Image sensor and manufacturing method thereof
Disclosed is an image sensor. The image sensor includes a semiconductor substrate including a lower interconnection, a plurality of upper interconnection sections protruding upward from the...
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8097904 |
Method and apparatus for backside illuminated image sensors using capacitively coupled readout integrated circuits
The images sensor includes a readout circuit capacitatively coupled to a memory circuit. The readout circuit includes: (i) a photon detector to receive a plurality of photons and to provide a...
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8093091 |
Photonic crystal-based lens elements for use in an image sensor
The invention, in various exemplary embodiments, incorporates a photonic crystal lens element into an image sensor. The photonic crystal lens element comprises a substrate and a plurality of...
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8093095 |
Semiconductor device with a bulk single crystal on a substrate
Device and method of forming a device in which a substrate (10) is fabricated with at least part of an electronic circuit for processing signals. A bulk single crystal material (14) is formed on...
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8093080 |
Optical device having light sensor employing horizontal electrical field
The device includes an optical waveguide on a base. The waveguide is configured to guide a light signal through a light-transmitting medium. A light sensor is also positioned on the base. The light...
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8093084 |
Semiconductor device with photonics
A method for forming a semiconductor structure having a transistor region and an optical device region includes forming a transistor in and on a first semiconductor layer of the semiconductor...
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8093674 |
Manufacturing method for molding image sensor package structure and image sensor package structure thereof
A manufacturing method for molding an image sensor package structure and the image sensor package structure thereof are disclosed. The manufacturing method includes following steps of providing a...
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8080856 |
Photoelectric structure and method of manufacturing thereof
A photoelectric structure is presented, comprising one or more PiN cells. The PiN cell is formed by an intrinsic semiconductor bulk having front and rear surfaces enclosed between p- and n-type...
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