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7138068 Printed circuit patterned embedded capacitance layer  
A method is disclosed for fabricating a patterned embedded capacitance layer. The method includes fabricating ( 1305, 1310 ) a ceramic oxide layer ( 510 ) overlying a conductive metal layer ( 515 )...
7135366 Method for fabricating a lateral metal-insulator-metal capacitor  
A lateral metal-insulator-metal capacitor fabricated with consistent dummy fill and slotting patterns that assure predictable and controlled performance from the metalization layout while...
7132297 Multi-layer inductor formed in a semiconductor substrate and having a core of ferromagnetic material  
A thin-film multilayer high-Q inductor having a ferromagnetic core and spanning at least three metal layers is formed by forming a plurality of parallel first metal runners on the semiconductor...
7132360 Method for treating a semiconductor surface to form a metal-containing layer  
A method for treating a semiconductor surface to form a metal-containing layer includes providing a semiconductor substrate having an exposed surface. The exposed surface of the semiconductor...
7132709 Semiconductor device including a capacitor having a capacitive insulating film of an insulating metal oxide  
A capacitor 11 made up of a lower electrode 8, a capacitive insulating film 9 of an insulating metal oxide and an upper electrode 10 is formed over a semiconductor substrate 1. A...
7129145 Method of manufacturing an IC coil mounted in an information carrier  
An information carrier in which an IC element formed integrally with a coil is mounted and which has an extended communication range and a method of manufacturing the same and a structure of the IC...
7125788 Circuit device and method of manufacturing the circuit device  
A circuit device includes at least one under bump metal formed on a surface of a substrate and a connection bump provided on the uppermost layer of the under bump metal. At least one laminated...
7122422 Methods of forming capacitors  
This invention includes methods of forming capacitors. In one implementation, a first capacitor electrode material is formed over a substrate. The first capacitor electrode material is exposed to a...
7118984 Method for fabricating semiconductor component  
Electrode layers ( 1, 2 ) are arranged on both sides of a dielectric layer ( 3 ) facing each other so as to configure a capacitor. Lead electrodes ( 4, 5 ) are formed in the electrode layers ( 1, 2...
7112502 Method to fabricate passive components using conductive polymer  
A method and structure for an integrated circuit chip has a logic core which includes a plurality of insulating and conducting levels, an exterior conductor level and passive devices having a...
7109088 Multilayer analog interconnecting line layout for a mixed-signal integrated circuit  
A mixed-signal integrated circuit includes a metal-insulator-metal or polysilicon-insulator-polysilicon capacitor. The electrical path from one electrode of the capacitor passes through a first...
7101757 Nonvolatile memory cells with buried channel transistors  
In a nonvolatile memory cell ( 110 ), the select gate transistor is formed as a buried channel transistor to increase the transistor current.
7098044 Method of forming an etched metal trace with reduced RF impedance resulting from the skin effect  
The RF impedance of a metal trace at gigahertz frequencies is reduced by forming the metal trace to have a base region and a number of fingers that extend away from the base region. When formed to...
7094657 Method for protecting against oxidation of a conductive layer in said device  
In a semiconductor device including a first conductive layer, the first conductive layer is treated with a nitrogen/hydrogen plasma before an additional layer is deposited thereover. The treatment...
7094611 Method of producing ferroelectric capacitor  
A method of producing a ferroelectric capacitor includes preparing a semiconductor substrate having MOSFETs with an impurity diffused area in a memory cell area and a peripheral circuit area;...
7087519 Method for forming contact having low resistivity using porous plug and method for forming semiconductor devices using the same  
A method for forming a contact of a semiconductor device is disclosed. A first interlevel dielectric (ILD) layer is formed on a conductive region, e.g., an active region. The first ILD layer is...
7087438 Encapsulation of conductive lines of semiconductor devices  
The invention relates to a method of encapsulating conductive lines of semiconductor devices and a structure thereof. An encapsulating protective material, such as TaN, Ta, Ti, TiN, or combinations...
7087479 Method of forming integrated circuit contacts  
Contacts are formed to integrated circuit devices by first forming a conductive layer ( 80 ) on a semiconductor device. An optional dielectric layer ( 130 ) is formed over the conductive layer and...
7078259 Method for integrating thermistor  
A structure and method are provided for forming a thermistor. Isolation structures are formed in a substrate including at least an upper layer of a single crystal semiconductor. A layer of salicide...
7078243 Shielding arrangement to protect a circuit from stray magnetic fields  
A shielding arrangement for protecting a circuit containing magnetically sensitive materials from external stray magnetic fields. A shield of a material having a relatively high permeability is...
7074688 Method of making an electrode for an electrochemical capacitor and the method of making an electrochemical capacitor  
The present invention provides a method of making an electrochemical capacitor electrode comprising a collector and an electronically conductive porous layer formed on the collector while keeping...
7074667 Semiconductor memory device including storage nodes and resistors and method of manufacturing the same  
A semiconductor memory device according to embodiments of the invention includes storage nodes and resistors. A method of manufacturing the semiconductor memory device according to some embodiments...
7071007 Method of forming a low voltage drive ferroelectric capacitor  
A method of forming a low-voltage drive thin film ferroelectric capacitor includes the steps of depositing a ferroelectric and platinum thin film dielectric layer over a bottom electrode, annealing...
7071070 Method of fabricating capacitor  
A method of fabricating a capacitor is described. A dielectric layer is formed over a substrate. An upper electrode having multiple openings therein is formed over the dielectric layer. Then, a...
7071052 Resistor with reduced leakage  
A resistor 100 is formed in a semiconductor layer 106 , e.g., a silicon layer on an SOI substrate. A body region 108 is formed in a portion of the semiconductor layer 106 and is doped to a...
7064414 Heater for annealing trapped charge in a semiconductor device  
A structure and associated method for annealing a trapped charge from a semiconductor device. The semiconductor structure comprises a substrate and a first heating element. The substrate comprises...
7056801 Radio frequency integrated circuit, and method for manufacturing the same  
The present invention discloses a radio frequency integrated circuit and a method for manufacturing the same. The radio frequency integrated circuit is manufactured by forming an inductor and a...
7056800 Printed circuit embedded capacitors  
One of a plurality of capacitors embedded in a printed circuit structure includes a first electrode ( 415 ) overlaying a first substrate layer ( 505 ) of the printed circuit structure, a...
7053747 Method for producing a spiral inductance on a substrate, and a device fabricated according to such a method  
A device and a method for producing such a device is provided, whereby the windings of a spiral inductance are embedded in a membrane such that they are freely suspended over a completely...
7049197 Method of manufacturing a semiconductor device  
In a method of manufacturing a semiconductor device including independent gate patterns separated from each other, an active region is defined by forming a field region on a substrate. A gate oxide...
7045420 Semiconductor device comprising capacitor and method of fabricating the same  
A high density semiconductor device is formed with a constant capacitor capacitance. The semiconductor device includes a memory cell region and a peripheral circuit region. An insulating film,...
7045419 Elimination of the fast-erase phenomena in flash memory  
A method of forming a semiconductor device that includes providing a semiconductor substrate, forming a first insulating layer over the semiconductor substrate, forming a floating gate over the...
7041552 Integrated metal-insulator-metal capacitor and metal gate transistor  
An integrated circuit structure is disclosed that comprises a pair of capacitors, each having metal plates separated by an insulator, and metal gate semiconductor transistors electrically connected...
7041565 Method for fabricating a capacitor in a semiconductor device  
A method for fabricating a capacitor in a semiconductor device that includes providing a semiconductor substrate, forming at least one shallow trench isolation structure in the semiconductor...
7041511 Pt/PGO etching process for FeRAM applications  
A method of etching a noble metal top electrode on a ferroelectric layer while preserving the ferroelectric properties of the ferroelectric layer and removing etching residue includes preparing a...
7041566 Method for forming inductor in semiconductor device  
The present invention relates to a method for forming an inductor in a semiconductor device. The method comprises the steps of forming a first metal layer on a semiconductor substrate in which a...
7037800 Radio frequency semiconductor device and method of manufacturing the same  
The present invention discloses a high frequency device including a first wafer providing an inductor having via contact plugs passing through the first wafer and a second wafer bonded to the first...
7033880 Inductor for semiconductor device and method of making same  
An inductor for a semiconductor device is formed within a groove in an insulating layer on a semiconductor substrate. A number of lower conductive lines are formed across the groove. A cylindrical...
7029970 Method for fabricating semiconductor device  
A method for fabricating a semiconductor device capable of preventing an electric short between lower electrodes caused by leaning lower electrodes, or lifted lower electrodes and of securing a...
7026206 Method of making resistive element having a stable contact resistance  
A semiconductor apparatus includes a MOS transistor and a resistive element having insulative first polysilicon and conductive second polysilicon films, an insulating film for a resistive element,...
7015109 Interdigital capacitor and method for adjusting the same  
An interdigital capacitor includes a semiconductor substrate, and a pair of comb-like electrodes formed on the semiconductor substrate. At least one of the pair of comb-like electrodes includes a...
7015152 Method of film deposition, and fabrication of structures  
A method of fabricating aluminum oxide films utilizing aluminum alkoxide precursors is described. The aluminum oxide film is formed by (a) providing an aluminum alkoxide precursor that is...
7005377 Bimetal layer manufacturing method  
A bimetal layer manufacturing method includes the procedure of: forming a first dielectric layer on the surface of a semiconductor substrate which has a first metal layer (conductive layer) of a...
7005360 Method for fabricating a microelectronic circuit including applying metal over and thickening the integrated coil to increase conductivity  
A method for fabricating a microelectronic circuit having an improved electrically conductive element. The method includes providing a finished processed microelectronic circuit having a...
6998321 Method for forming inductor in semiconductor device  
The present invention relates to a method for forming an inductor being a passive device in RE MEMS, RFCMOS, Bipolor/SiGe, BiCMOS semiconductor devices. According to the present method, a lower...
6992366 Stacked variable inductor  
Disclosed is a stacked variable inductors manufactured by stacking M (M≧2) metal layers on a semiconductor substrate, and provides stacked variable inductors comprising, 1 to N inductors...
6991992 Method for forming inductor in semiconductor device  
The present invention relates to a method for manufacturing an inductor being a passive device in RE MEMS, RFCMOS, Bipolor/SiGe and BiCMOS semiconductor devices. According to the present invention,...
6990725 Fabrication approaches for the formation of planar inductors and transformers  
This invention relates to the fabrication of planar inductive components whereby the design in cross-section describes a conductor surrounded by magnetic material along the length of the conductor;...
6984869 High performance diode implanted voltage controlled p-type diffusion resistor  
The present invention provides a diffusion resistor that is formed in the substrate. A diffusion region is formed within the substrate that contains first and second contact regions extending...
6979526 Lithography alignment and overlay measurement marks formed by resist mask blocking for MRAMs  
A method of manufacturing a resistive semiconductor memory device ( 10 ), comprising depositing an insulating layer ( 34 ) over a workpiece ( 30 ), and defining a pattern for a plurality of...