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7588987 |
Semiconductor device and method for fabricating the same
A semiconductor device and a method for fabricating the same selectively forms a nitride layer having high tensile stress in an NMOS transistor area, to thereby form a strained-silicon structure in...
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7573095 |
Memory cells with improved program/erase windows
A semiconductor structure includes a memory cell in a first region and a logic MOS device in a second region of a semiconductor substrate. The memory cell includes a first gate electrode over the...
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7547941 |
NAND non-volatile two-bit memory and fabrication method
A NAND non-volatile two-bit memory cell comprises a cell stack and two select stacks disposed on an active area of a substrate. Each select stack is respectively disposed on a side of the cell...
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7504309 |
Pre-silicide spacer removal
A method forms a gate conductor over a substrate, and simultaneously forms spacers on sides of the gate conductor and a gate cap on the top of the gate conductor. Isolation regions are formed in...
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7488653 |
Semiconductor device and method for implantation of doping agents in a channel
A semiconductor device includes a substrate of a first type of conductivity provided with at least one gate on one of its faces, and at least two doped regions of a second type of conductivity for...
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7442610 |
Low thermal budget fabrication method for a mask read only memory device
A low thermal budget fabrication method for a mask ROM is described. The method includes providing a substrate having a gate oxide layer thereon. A first conductive layer is formed on the gate...
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7396727 |
Transistor of semiconductor device and method for fabricating the same
A transistor which may effectively control the short channel effect with a vertical transistor structure. This structure may prevent the degradation of a transistor's performance caused by the hot...
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7393737 |
Semiconductor device and a method of manufacturing the same
A semiconductor device which, in spite of the existence of a dummy active region, eliminates the need for a larger chip area and improves the surface flatness of the semiconductor substrate. In the...
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7364973 |
Method of manufacturing NOR-type mask ROM device and semiconductor device including the same
A method of manufacturing a NOR-type mask ROM device includes forming a first gate electrode for an OFF cell and a second gate electrode for an ON cell on a semiconductor substrate of a first...
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7364951 |
Nonvolatile semiconductor memory device and method for manufacturing the same
A method for manufacturing a nonvolatile semiconductor memory device having a step of forming a first gate electrode on a peripheral circuit portion and a second gate electrode on a memory cell...
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7344951 |
Surface preparation method for selective and non-selective epitaxial growth
According to one embodiment of the invention, a surface preparation method for selective and non-selective epitaxial growth includes providing a substrate having a gate region, a source region, and...
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7320917 |
Semiconductor device and method for manufacturing the same
Gate length is 110 nm±15 nm or shorter (130 nm or shorter in a design rule) or an aspect ratio of an area between adjacent gate electrode structures thereof (ratio of the height of the gate...
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7300842 |
Method of fabricating a mask ROM
A mask ROM and fabrication method thereof are disclosed, in which a bit line is formed of a conductive material such as polysilicon, by which a device size can be minimized, and by which resistance...
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7259070 |
Semiconductor devices and methods for fabricating the same
Disclosed are semiconductor devices and methods for fabricating the same. According to one embodiment, the method includes sequentially forming a gate insulation layer and a conductive layer on a...
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7244653 |
Method and structure in the manufacture of mask read only memory
A method and structure of manufacture of mask ROM device is provided. Firstly, a semiconductor structure is provided that comprises a first dielectric layer, a plurality of buried bit lines and a...
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7230877 |
Method of making a semiconductor memory device
A method for fabricating a semiconductor memory device is described. An insulating layer is disposed on a semiconductor substrate. A matrix of semiconductor memory elements is disposed in the...
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7179712 |
Multibit ROM cell and method therefor
To increase the density of memory cells, a multibit memory cell ( 10, 50, 80, 110 ) can be manufactured by preventing the formation of at least one of the extension regions usually formed for the...
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7169671 |
Method of recording information in nonvolatile semiconductor memory
A nonvolatile semiconductor memory includes a transistor, one or two resistance-change portions, and one or two charge accumulation portions. The transistor has a control electrode, first main...
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7163891 |
High density DRAM with reduced peripheral device area and method of manufacture
A dynamic random access memory (DRAM) structure having a distance less than 0.14 um between the contacts to silicon and the gate conductor is disclosed. In addition a method for forming the...
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7132334 |
Methods of code programming a mask ROM device
A method of code programming a mask read only memory (ROM) is disclosed. A method of the present invention includes forming a layer of developable anti-reflective coating over a plurality of code...
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7122434 |
Method for generating an electrical contact with buried track conductors
A semiconductor structure 300 comprises a plurality of first track conductors 303 , a plurality of second track conductors 304 , which are insulated with respect to the first track conductors ...
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7094649 |
Method for forming multi-level mask ROM cell and NAND multi-level mask ROM
The present invention relates to a multi-level read only memory cell that can store two bits and the fabrication method thereof. The multi-level ROM cell has the storage capacity of two bits and...
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7084036 |
Data writing method for mask read only memory
A data writing method for mask read only memory using different doses of ion implantations to perform the data writing of Mask Read Only Memory. A semiconductor substrate having a plurality of gate...
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7064035 |
Mask ROM and fabrication thereof
A Mask ROM and a method for fabricating the same are described. The Mask ROM comprises a substrate, a plurality of gates on the substrate, a gate oxide layer between the gates and the substrate, a...
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7053447 |
Charge-trapping semiconductor memory device
Memory cells are formed by preferably cylindrical recesses at the main surface of a semiconductor substrate, containing a memory layer sequence at sidewalls and a gate electrode and being provided...
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7029956 |
Memory system capable of operating at high temperatures and method for fabricating the same
A memory system having a plurality of T-RAM cells arranged in an array is presented where each T-RAM cell has dual vertical devices and is fabricated over a SiC substrate. Each T-RAM cell has a...
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7008849 |
Method for providing bitline contacts in a memory cell array and a memory cell array having bitline contacts
A method for providing bitline contacts in a memory cell array includes a plurality of bitlines disposed in a first direction, the bitlines being covered by an isolating layer, a plurality of...
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7008848 |
Mask ROM fabrication method
A mask read only memory (ROM) and a method of fabricating the same is provided. This mask ROM and related method is capable of reducing the pitch of buried impurity diffusion regions. In the mask...
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6998316 |
Method for fabricating read only memory including a first and second exposures to a photoresist layer
A fabrication method for a read only memory provides a substrate having a memory cell region and a periphery circuit region. A memory cell region has a memory cell array and the periphery circuit...
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6991988 |
Static pass transistor logic with transistors with multiple vertical gates
Static pass transistor logic having transistors with multiple vertical gates are described. Multiple vertical gates are edge defined with only a single transistor being required for multiple logic...
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6989307 |
Mask ROM, and fabrication method thereof
The present invention discloses a mask ROM which has excellent compatibility with a logic process and improves integration of a memory cell, and a fabrication method thereof. The mask ROM includes:...
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6908819 |
Method of fabricating flat-cell mask read-only memory devices
According to embodiments of the invention, a first gate insulating pattern and a mask pattern are sequentially stacked on a semiconductor substrate. Subsequently an impurity region is formed in the...
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6902979 |
Method for manufacturing mask ROM
A method for manufacturing a mask ROM of flat cell structure. The method includes the steps of: providing a semiconductor substrate having a flat cell array region and a peripheral circuit region;...
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6893923 |
Reduced mask count process for manufacture of mosgated device
A process for forming a power MOSFET enables the connection a metal gate electrode to the conductive polysilicon gates in the active area without an additional mask step. In the process, a groove...
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6885066 |
SOI type MOSFET
A buried insulating film is formed in an LDD region between a source region and a drain region, and a non-doped silicon film is formed in the SOI layer above the buried insulating film. The SOI...
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6875659 |
Methods of code programming a mask ROM
A method of code programming a mask read only memory (ROM) is disclosed. According to the method, a first photoresist layer is formed over word lines and a gate oxide layer of a substrate already...
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6870233 |
Multi-bit ROM cell with bi-directional read and a method for making thereof
A multi-bit Read Only Memory (ROM) cell has a semiconductor substrate of a first conductivity type with a first concentration. A first and second regions of a second conductivity type spaced apart...
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6867103 |
Method of fabricating an ESD device on SOI
A method to form transistors having improved ESD performance in the manufacture of an integrated circuit device is achieved. The method includes providing a SOI substrate with a doped silicon layer...
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6864142 |
Method to produce a factory programmable IC using standard IC wafers and the structure
A method for programming a semiconductor element in a semiconductor structure such as an IC involves reducing the backside thickness of the substrate and directing an energy beam through the...
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6808985 |
Products derived from embedded flash/EEPROM products
A method of fabricating ROM products through the use of embedded flash/EEPROM prototypes is disclosed. This is accomplished by first forming a Flash/EEPROM prototype, performing programming...
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6806142 |
Method for coding semiconductor permanent store ROM
A method for manufacturing a ROM device includes a semiconductor substrate having an array of field-effect transistors within a ROM region. A first dielectric layer covers the array and all...
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6800527 |
One time programmable semiconductor nonvolatile memory device and method for production of same
A semiconductor nonvolatile memory device improving reproducibility and reliability of insulation breakage of a silicon oxide film and capable of reducing the manufacturing cost and a method for...
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6780716 |
Chip differentiation at the level of a reticle
A method for differentiating integrated circuits implementing identical functions by storage of a binary code in a non-volatile storage element provided in each circuit, including providing, for...
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6762100 |
Mask ROM cell and method of fabricating the same
Mask ROM cell and method of fabricating the same, is disclosed, including a semiconductor substrate of a first conductivity type, a plurality of impurity diffusion regions of a second conductivity...
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6756275 |
Method for minimizing product turn-around time for making semiconductor permanent store ROM cell
A method for manufacturing a ROM device includes a semiconductor substrate having an array of field-effect transistors within a ROM region. A first dielectric layer covers the array of field-effect...
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6753235 |
Method of manufacturing CMOS thin film transistor
A method of manufacturing a CMOS TFT including forming first and second semiconductor layers on an insulating substrate using a first mask, respectively, the substrate having first and second...
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6743679 |
Integrated circuit devices with high and low voltage components and processes for manufacturing these devices
The present invention includes a technique for making a dual voltage integrated circuit device. A gate dielectric layer is formed on a semiconductor substrate and a gate material layer is formed on...
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6727145 |
Method for fabricating post-process one-time programmable read only memory cell
The present invention generally relates to a method for fabricating a post-process one-time programmable (OTP) read only memory cell (ROM cell). The OTP ROM cell has two oxide layers positioned on...
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6723649 |
Method of fabricating a semiconductor memory device
A method of fabricating a semiconductor memory device, particularly a mask ROM. A sacrificial oxide layer is formed on a silicon substrate and then a photoresist layer is formed on the sacrificial...
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6713821 |
Structure of a mask ROM device
A mask ROM device is described. The mask ROM device includes a substrate, a gate, a double diffused source/drain region that comprises a first doped region and a second doped region, a channel...
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