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7622307 |
Semiconductor devices having a planarized insulating layer and methods of forming the same
A semiconductor device includes at least one phase-change pattern disposed on a semiconductor substrate. A planarized capping layer, a planarized protecting layer, and a planarized insulating layer...
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7619278 |
Semiconductor memory device
A semiconductor-memory device that reduces leak off due to miniaturization of memory cells, and comprises as a single unit cell: a substrate 1 having a trench section 1 a ; a selector gate 3 ...
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7615448 |
Method of forming low resistance void-free contacts
A plug is formed by depositing a first material to partially fill an opening, leaving an unfilled portion with a lower aspect ratio than the original opening. A second material is then deposited to...
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7611948 |
Methods of forming non-volatile memory device
A method of forming a non-volatile memory device includes forming first mask patterns, which can have relatively large distances therebetween. A distance regulating layer is formed that conformally...
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7611947 |
Method of manufacturing semiconductor device
A method of manufacturing a semiconductor device of the present invention consists of forming a trench in a trench-type cell transistor region; forming a gate insulating film and a gate material...
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7608507 |
NAND flash memory devices and methods of fabricating the same
A NAND includes a device isolation pattern disposed in a region of a substrate defining a plurality of active regions. Memory transistors having memory gate patterns, constituting a cell string,...
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7608506 |
Body-contacted semiconductor structures and methods of fabricating such body-contacted semiconductor structures
A semiconductor structure for a dynamic random access memory (DRAM) cell array that includes a plurality of vertical memory cells built on a semiconductor-on-insulator (SOI) wafer and a body...
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7605036 |
Method of forming floating gate array of flash memory device
The method of forming a floating gate array of a flash memory device includes: (a) forming a plurality of device isolations, which define active device regions, in a semiconductor substrate, the...
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7601591 |
Method of manufacturing sidewall spacers on a memory device, and device comprising same
The present invention is generally directed to a method of manufacturing sidewall spacers on a memory device, and a memory device comprising such sidewall spacers. In one illustrative embodiment,...
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7601590 |
Electronic memory circuit and related manufacturing method
An electronic memory circuit comprises a matrix of EEPROM memory cells. Each memory cell includes a MOS floating gate transistor and a selection transistor. The matrix includes a plurality of rows...
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7598139 |
Single chip data processing device with embedded nonvolatile memory and method thereof
A device is described comprising a substrate of a first conductivity type having a first dopant concentration, a first well formed in the substrate, a second well of the first conductivity type...
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7595237 |
Non-volatile memory cell with a hybrid access transistor
A non-volatile memory cell includes an access and a storage transistor coupled in series. The memory cell is formed on a thin gate well tailored for transistors with thin gate dielectrics. The...
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7592223 |
Methods of fabricating non-volatile memory with integrated select and peripheral circuitry and post-isolation memory cell formation
Non-volatile semiconductor memory devices with dual control gate memory cells and methods of forming the same using integrated select and peripheral circuitry formation are provided. Strips of...
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7589373 |
Semiconductor device
The present invention provides a semiconductor device, which includes a substrate and a sensing memory device. The substrate includes a metal-oxide-semiconductor transistor having a gate. The...
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7589006 |
Method for manufacturing semiconductor device
A method for manufacturing a semiconductor device includes forming a plurality of gate lines on a substrate, forming a first cell spacer on the gate lines, forming a second cell spacer on the first...
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7585726 |
Nonvolatile semiconductor memory devices and the fabrication process of them
The present invention enables to avoid a reduction in coupling ratio in a nonvolatile semiconductor memory device. The reduction is coupling ratio is caused due to difficulties in batch forming of...
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7582529 |
Methods of fabricating non-volatile memory with integrated peripheral circuitry and pre-isolation memory cell formation
Non-volatile semiconductor memory devices with dual control gate memory cells and methods of forming the same using integrated peripheral circuitry formation are provided. Strips of charge storage...
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7582528 |
Method of fabricating a flash memory device
In a method of fabricating a flash memory device, an interlayer dielectric layer is formed on a semiconductor substrate. The interlayer dielectric layer is etched to form first contact holes...
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7579647 |
Non-volatile semiconductor memory device having memory cell array suitable for high density and high integration
First and second semiconductor regions are formed apart from each other on a semiconductor body. A stacked gate is formed on the semiconductor body between the first and second semiconductor...
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7579239 |
Method for the manufacture of a non-volatile memory device and memory device thus obtained
The present invention relates to a method for processing of a non-volatile memory cell ( 50 ) which comprises a double gate stack and a single access gate. The method combines a way of processing...
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7579237 |
Nonvolatile memory device and method of manufacturing the same
A method of manufacturing a nonvolatile memory device includes forming a plurality of device isolation regions in a semiconductor substrate, forming a tunneling insulation layer on the...
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7575973 |
Method of making three dimensional NAND memory
A method of making a monolithic, three dimensional NAND string including a first memory cell located over a second memory cell, includes growing a semiconductor active region of second memory cell,...
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7572699 |
Process of forming an electronic device including fins and discontinuous storage elements
An electronic device can include a substrate including a fin lying between a first trench and a second trench, wherein the fin is no more than approximately 90 nm wide. The electronic device can...
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7569881 |
Semiconductor integrated circuit device with reduced leakage current
The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a...
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7564093 |
Semiconductor device
A semiconductor device comprises static random access memory (SRAM) cells formed in a semiconductor substrate, first deep trenches isolating each boundary of an n-well and a p-well of the SRAM...
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7563676 |
NOR-type flash memory cell array and method for manufacturing the same
Disclosed is a non-volatile (e.g., NOR type flash) memory cell array and a method for manufacturing the same. The memory cell array includes a plurality of isolation layers on a semiconductor...
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7563662 |
Processes for forming electronic devices including non-volatile memory
A process for forming an electronic device can be performed, such that as little as one gate electric layer may be formed within each region of the electronic device. In one embodiment, the...
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7560342 |
Method of manufacturing a semiconductor device having a plurality of memory and non-memory devices
Embodiments relate to a method of manufacturing a semiconductor device that may simplify a manufacturing process and may reduce process costs. According to embodiments, the method may include...
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7560339 |
Nonvolatile memory cell comprising a reduced height vertical diode
A nonvolatile memory cell according to the present invention comprises a bottom conductor, a semiconductor pillar, and a top conductor. The semiconductor pillar comprises a junction diode,...
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7560335 |
Memory device transistors
Method and device embodiments are described for fabricating MOSFET transistors in a semiconductor also containing non-volatile floating gate transistors. MOSFET transistor gate dielectric smiling,...
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7557405 |
High-density nonvolatile memory
An improved nonvolatile memory cell made by a method for fabricating a three dimensional monolithic memory with increased density. The memory cell includes at least a part of a first conductor, a...
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7557004 |
Method for fabricating semiconductor device
The method for fabricating the semiconductor device includes the steps of: forming an insulating film 20 , a conductive film 22 and an insulating film 24 over a semiconductor substrate 10 ...
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7553730 |
Methods of fabrication employing nanoscale mandrels
Synthetic nanopore fabrication methods and structures are provided. Nanoscale transistor fabrication methods and structures are provided.
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7553721 |
Flash memory devices and methods of fabricating the same
Flash memory devices and methods for fabricating the same. In one example embodiment, a method of fabricating a flash memory includes various acts. First, a tunnel oxide layer is formed on an...
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7550350 |
Methods of forming flash memory device
The present disclosure relates to methods of forming a flash memory device. A plurality of cells, a plurality of select transistors, and a transistor are formed over a semiconductor substrate...
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7550349 |
Method for forming gate dielectric layers
A method for forming gate dielectric layers having different thicknesses is provided, The method includes forming a lower oxide layer, a nitride layer, and an upper oxide layer on a semiconductor...
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7550348 |
Source side injection storage device with spacer gates and method therefor
A storage device structure ( 10 ) has two bits of storage per control gate ( 34 ) and uses source side injection (SSI) to provide lower programming current. A control gate ( 34 ) overlies a drain...
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7550347 |
Methods of forming integrated circuit device gate structures
Methods of forming a gate structure for an integrated circuit memory device include forming a first dielectric layer having a dielectric constant of under 7 on an integrated circuit substrate. Ions...
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7550344 |
Semiconductor device and method for fabricating the same
A semiconductor device includes: a lower hydrogen-barrier film; a capacitor formed on the lower hydrogen-barrier film and including a lower electrode, a capacitive insulating film, and an upper...
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7547602 |
Semiconductor integrated circuit device and its manufacturing method
A method of manufacturing a semiconductor integrated circuit device is provided including providing a substrate with projecting island regions formed in stripes, with first regions of the substrate...
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7544569 |
Bidirectional split gate NAND flash memory structure and array, method of programming, erasing and reading thereof, and method of manufacturing
A split gate NAND flash memory structure is formed on a semiconductor substrate of a first conductivity type. The NAND structure comprises a first region of a second conductivity type and a second...
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7544567 |
Method of manufacturing a flash memory device
In a method of manufacturing an SONOS type flash memory device, a first oxide layer and a buffer poly layer are formed over a surface of a semiconductor except for a memory cell region of a cell...
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7537993 |
Methods of forming semiconductor devices having tunnel and gate insulating layers
A semiconductor device includes a semiconductor substrate having a surface, buried isolation regions protruding from the surface of the semiconductor substrate, and a first insulating layer on the...
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7528036 |
Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making device
A semiconductor device, which ensures device reliability especially in fine regions and enables great capacitance and high-speed operations, has memory cells including, in a first region of a main...
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7521317 |
Method of forming a semiconductor device and structure thereof
A method for forming a semiconductor device includes providing a semiconductor substrate comprising silicon, forming a layer of dielectric on the surface of the semiconductor substrate, forming a...
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7518176 |
Programmable nonvolatile memory and semiconductor integrated circuit device
Distance λm between a floating gate and a drain contact of a floating gate transistor forming a memory cell is set to be greater than a distance λ determined based on a minimum design dimension...
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7514321 |
Method of making three dimensional NAND memory
A method of making a monolithic, three dimensional NAND string, includes forming a semiconductor active region of a first memory cell over a semiconductor active region of a second memory cell. The...
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7511333 |
Nonvolatile memory cell with multiple floating gates and a connection region in the channel
A memory cell ( 110 ) has a plurality of floating gates ( 120 L, 120 R). The channel region ( 170 ) comprises a plurality of sub-regions ( 220 L, 220 R) adjacent to the respective floating gates,...
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7510943 |
Semiconductor devices and methods of manufacture thereof
A first gate dielectric of a first transistor is disposed over a workpiece in a first region, and a second gate dielectric of a second transistor is disposed over the workpiece in a second region....
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7510932 |
Semiconductor devices having a field effect transistor and methods of fabricating the same
A semiconductor device having a field effect transistor and a method of forming the same are provided. The semiconductor device preferably includes a device active pattern disposed on a...
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