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8183099 Method for manufacturing transistor  
A hydrogen barrier layer is selectively provided over an oxide semiconductor layer including hydrogen and hydrogen is selectively desorbed from a given region in the oxide semiconductor layer by...
8183097 Thin-film transistor substrate and method of manufacturing the same  
A thin-film transistor (TFT) substrate includes a semiconductor pattern, a conductive pattern, a first wiring pattern, an insulation pattern and a second wiring pattern. The semiconductor pattern...
8183070 Array substrate for liquid crystal display device and method of fabricating the same  
A method of fabricating an array substrate for a liquid crystal display device includes: forming an initial photoresist (PR) pattern on a metallic material layer; etching the metallic material...
8183102 Semiconductor device and manufacturing method thereof  
To improve field effect mobility of an inverted-staggered TFT using amorphous silicon. In an inverted-staggered TFT, a thin amorphous semiconductor layer which is made to have n-type conductivity...
8183098 SOI device with contact trenches formed during epitaxial growing  
A method for manufacturing an integrated electronic device. The method includes providing an SOI substrate having a semiconductor substrate, an insulating layer on the semiconductor substrate, and...
8178438 Manufacturing method of semiconductor device and electronic device  
Silicide films with high quality are formed with treatment of laser light irradiation, so that miniaturization and higher performance is achieved in a field-effect transistor that is formed over an...
8178398 Manufacturing method of display device  
To improve a deposition rate of a microcrystalline semiconductor layer by using a deposition method and to improve productivity of a display device including a TFT of a microcrystalline...
8178397 Field effect transistor  
A field effect transistor including a gate insulation portion, an organic semiconductor portion, a source electrode and a drain electrode, wherein when a voltage is applied to the gate at 70° C. ...
8174012 Organic light emitting diode display device and method of manufacturing the same  
An organic light emitting diode display device (OLED display device) having uniform electrical characteristics and a method of manufacturing the same. The OLED display device includes: a substrate;...
8174069 Power semiconductor device and a method of forming a power semiconductor device  
A power semiconductor device has a top surface and an opposed bottom surface below a part of which is a thick portion of semiconductor substrate. At least a portion of a drift region of the device...
8173478 Method of manufacturing metal wiring and method of manufacturing semiconductor device  
A metal wiring suitable for a substrate of large size is provided. The present invention is characterized in that at least one layer of conductive film is formed on an insulating surface, a resist...
8174055 Formation of FinFET gate spacer  
Gate spacers are formed in FinFETS having a bottom portion of a first material extending to the height of the fins, and a top portion of a second material extending above the fins. An embodiment...
8173495 Semiconductor on insulator  
A method and apparatus for producing a relatively thin, relatively uniform semiconductor layer which has improved carrier mobility. In an embodiment, a lattice-matched insulator layer is formed on...
8173492 Method of manufacturing thin film transistor substrate  
Provided are a wire structure, a method of forming a wire, a thin film transistor (TFT) substrate, and a method of manufacturing the TFT substrate. The wire structure includes a barrier layer...
8174019 Static-tolerant display apparatus  
A display apparatus includes a thin film transistor having a top-gate structure and a storage capacitor that are arranged on a first substrate. An upper electrode of the storage capacitor has a...
8174068 Semiconductor device having vertical transistor, manufacturing method thereof, and data processing system  
A semiconductor device includes: a semiconductor substrate; a silicon pillar provided perpendicularly to a main surface of the semiconductor substrate; a gate dielectric film that covers a portion...
8173494 Thin film transistor array and method of manufacturing the same  
A thin film transistor array and method of manufacturing the same include a pixel electrode formed of a transparent conductive layer on a substrate, a gate line formed of the transparent conductive...
8173493 Thin film transistor array panel and fabrication  
The present invention provides a manufacturing method of a thin film transistor array panel, which includes forming a gate line on a substrate; forming a gate insulating layer, a semiconductor...
8168484 Display device and manufacturing method thereof, and semiconductor device and manufacturing method thereof  
A method of forming a display device including source/drain electrodes on a substrate, a pixel electrode, an insulating partition wall layer, a channel-region semiconductor layer. The source/drain...
8168482 Semiconductor device, an electronic device and an electronic apparatus  
A method for manufacturing a semiconductor device comprises preparing a base; forming a silicon oxide film including hydrogen or deuterium on the base; diffusing nitrogen into the silicon oxide...
8168481 Method of manufacturing SOI substrate  
The method of one embodiment of the present invention includes: a first step of irradiating a bond substrate with ions to form an embrittlement region in the bond substrate; a second step of...
8168979 Crystallization method, thin film transistor manufacturing method, thin film transistor, display, and semiconductor device  
According to a crystallization method, in the crystallization by irradiating a non-single semiconductor thin film of 40 to 100 nm provided on an insulation substrate with a laser light, a light...
8158464 Method of manufacturing a liquid crystal display device with a semiconductor film including zinc oxide  
To provide a semiconductor device in which a defect or fault is not generated and a manufacturing method thereof even if a ZnO semiconductor film is used and a ZnO film to which an n-type or p-type...
8158538 Single electron transistor operating at room temperature and manufacturing method for same  
The present invention relates to a single-electron transistor (SET) operating at room temperature and a method of manufacturing the same, and to be specific, to a single-electron transistor...
8158465 Vertical coffee-stain method for forming self-organized line structures  
A “vertical” coffee-stain method for producing self-organized line structures and other very fine features that involves disposing a target structure in a solution made up of a fine particle sol...
8158466 Array substrate for display device and method of fabricating the same  
An array substrate including a substrate having a pixel region, a gate line and a gate electrode on the substrate, the gate electrode being connected to the gate line, a gate insulating layer on...
8159008 Method of fabricating a trench-generated transistor structure  
Trench-generated transistor structures, methods for fabricating transistors using a trench defined in a semiconductor-on-insulator (SOI) wafer, design structures for a trench-generated transistor,...
8158467 Liquid crystal display device and method of fabricating the same  
A liquid crystal display device includes a plurality of gate lines and data lines on a first substrate defining a plurality of pixel regions, a thin film transistor within the pixel regions, a...
8158985 Thin film transistor devices with different electrical characteristics and method for fabricating the same  
A system for displaying images. The system includes a thin film transistor (TFT) device including a first insulating layer covering a first region and a second region of a substrate. A first...
8158463 Process and method for manufacturing a MOS device with intercell ion implant using one or more parallel enrichment windows  
A process for manufacturing a MOS device includes forming a semiconductor layer having a first type of conductivity; forming an insulated gate structure having an electrode region (25), above the...
8158491 IC card and booking-account system using the IC card  
It is an object of the present invention to provide a highly sophisticated functional IC card that can ensure security by preventing forgery such as changing a picture of a face, and display other...
8154059 Semiconductor device and method for manufacturing the same  
An object of the present invention is to prevent the deterioration of a TFT (thin film transistor). The deterioration of the TFT by a BT test is prevented by forming a silicon oxide nitride film...
8153463 Method of manufacturing thin film transistor substrate  
A method of manufacturing a thin film transistor substrate includes a first process in which a gate line pattern including a gate line and a gate electrode is formed with a first conductive...
8154021 Array substrate for liquid crystal display device and method of fabricating the same  
Array substrates for liquid crystal display (LCD) devices are formed on a substrate with first and second gate lines crossing a data line to define first and second pixel regions. A thin film...
8148213 Method of producing a biosensor  
A method for manufacturing a biosensor includes forming a laminate of a first silicon oxide film and a polysilicon film on one surface of a silicon substrate; forming a second silicon oxide film on...
8148724 Liquid crystal display device and method of manufacturing the same  
A liquid crystal display device includes a gate line and a data line on a substrate crossing each other to define a pixel region; a thin film transistor in the pixel region and connected to the...
8149198 Liquid crystal display device  
Gray scale display is performed by combining time ratio gray scale and voltage gray scale in a liquid crystal display device which performs display in OCB mode. In doing so, one frame is divided...
8148185 Method for fabricating active device array substrate  
A method for fabricating an active device array substrate is provided. First, a substrate having a display area and a sensing area is provided. Then, a first patterned conductor layer is formed on...
8148243 Zero capacitor RAM with reliable drain voltage application and method for manufacturing the same  
The following discloses and describes a zero capacitor RAM as well as a method for manufacturing the same. The zero capacitor RAM includes an SOI substrate. This SOI substrate is composed of a...
8143113 Omega shaped nanowire tunnel field effect transistors fabrication  
A method for forming a nanowire tunnel field effect transistor device includes forming a nanowire connected to a first pad region and a second pad region, the nanowire including a core portion and...
8143116 Thin film transistor array substrate and manufacturing method thereof  
A thin film transistor array substrate includes a gate line disposed on a substrate, the gate line comprising a gate electrode including a lower film and an upper film thicker than the lower film,...
8143170 Manufacturing method of semiconductor device  
A single crystal semiconductor layer is provided over a base substrate with a second insulating film, a first conductive film, and a first insulating film interposed therebetween; an impurity...
8143168 Etching method and manufacturing method of semiconductor device  
The present invention discloses technique of etching selectively a layer containing siloxane. The present invention provides a semiconductor device with reduced operation deterioration due to...
8143114 System and method for source/drain contact processing  
System and method for reducing contact resistance and prevent variations due to misalignment of contacts is disclosed. A preferred embodiment comprises a non-planar transistor with source/drain...
8143118 TFT device with channel region above convex insulator portions and source/drain in concave between convex insulator portions  
A semiconductor device having a highly responsive thin film transistor (TFT) with low subthreshold swing and suppressed decrease in the on-state current and a manufacturing method thereof are...
8138030 Asymmetric finFET device with improved parasitic resistance and capacitance  
A method for forming a fin field effect transistor (finFET) device includes, forming a fin structure in a substrate, forming a gate stack structure perpendicular to the fin structure, and...
8138064 Method for producing silicon film-transferred insulator wafer  
A method for producing a silicon film-transferred insulator wafer is disclosed. The method includes a surface activation step of performing a surface activation treatment on at least one of a...
8138029 Structure and method having asymmetrical junction or reverse halo profile for semiconductor on insulator (SOI) metal oxide semiconductor field effect transistor (MOSFET)  
A device and method is provided that in one embodiment provides a first semiconductor device including a first gate structure on a first channel region, in which a first source region and a first...
8134156 Semiconductor device including zinc oxide containing semiconductor film  
To provide a semiconductor device in which a defect or fault is not generated and a manufacturing method thereof even if a ZnO semiconductor film is used and a ZnO film to which an n-type or p-type...
8129724 Display device including first, second, and third semiconductor films  
A display device including a transparent substrate, and a plurality of thin film transistors formed on the transparent substrate, wherein each of the thin film transistors have a gate electrode, a...