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7622308 |
Process control using process data and yield data
A method for monitoring a manufacturing process features acquiring metrology data for semiconductor wafers at the conclusion of a final process step for the manufacturing process (“Step a”)....
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7622052 |
Methods for chemical mechanical planarization and for detecting endpoint of a CMP operation
Methods are provided for chemical mechanical planarization of a layer and for determining the endpoint of a CMP operation. In accordance with one embodiment the method for determining an endpoint...
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7611922 |
Image sensor and method for manufacturing the same
A method for manufacturing an image sensor includes forming first to third photodiodes and first to third color filters corresponding thereto; forming a photoresist film including photosensitive...
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7605008 |
Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma
A method and apparatus for igniting a gas mixture into plasma using capacitive coupling techniques, shielding the plasma and other contents of the plasma reactor from the capacitively-coupled...
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7598100 |
Manufacturing method of semiconductor integrated circuit device
As the thickness of the card holder for preventing warping of a multilayered wiring substrate 1 is increased, there occurs a problem that a thin film sheet 2 is buried in a card holder and...
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7592190 |
Method of evaluating characteristics of and forming of an insulating film for a semiconductor device
A method of evaluating characteristics of an insulating film 1 is disclosed. The insulating film 1 is formed of an insulative inorganic material as a main material, the insulative inorganic...
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7582490 |
Controlled fabrication of gaps in electrically conducting structures
A method for controlling a gap in an electrically conducting solid state structure provided with a gap. The structure is exposed to a fabrication process environment conditions of which are...
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7573006 |
Apparatus relating to the reconstruction of semiconductor wafers for wafer-level processing
Apparatus, systems and methods relating to the reconstruction of semiconductor wafers for wafer-level processing are disclosed. Selected semiconductor dice having alignment cavities formed in a...
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7556971 |
Testing electromigration at multiple points of a single node
Systems and methods for testing the reliability of a semiconductor component are disclosed herein. One embodiment of a method for testing reliability, among others, comprises providing simulation...
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7553679 |
Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current
Plasma parameters such as plasma ion density, wafer voltage, etch rate and wafer current in the chamber are determined from external measurements on the applied RF bias electrical parameters such...
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7537941 |
Variable overlap of dummy shapes for improved rapid thermal anneal uniformity
Embodiments of the invention provide a method, structure, service, etc. for variable overlap of dummy shapes for improved rapid thermal anneal uniformity. A method of providing uniform temperatures...
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7510884 |
Semiconductor production system and semiconductor production process
A semiconductor manufacturing apparatus according to the present invention comprises: a treating unit that treats a substrate to manufacture thereon a semiconductor device; a fluid supplying...
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7498192 |
Methods of providing a family of related integrated circuits of different sizes
Methods of manufacturing a family of packaged integrated circuits (ICs) having at least two different logic capacities. A first IC die includes two different portions, of which at least one portion...
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7488937 |
Method and apparatus for the improvement of material/voltage contrast
A method and system for registering a CAD layout to a Focused Ion Beam image for through-the substrate probing, without using an optical image and without requiring biasing, includes an improved...
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RE40623 |
Method and apparatus for identifying integrated circuits
An integrated circuit and method for identifying same is described. The integrated circuit includes a programmable identification circuit for storing electronic identification information. The...
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7422913 |
Method for checking a condition of a heat treatment
A method for connecting terminals is provided. The method includes steps of a) providing a board having a first terminal thereon; b) performing a check of a heat treatment by using a thermal...
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7421358 |
Method and system for measurement data evaluation in semiconductor processing by correlation-based data filtering
By performing a contingency-based correlation test of measurement data, such as defect data, with respect to electrical test data after progressively filtering the measurement data, an enhanced...
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7407874 |
Plasma doping method
A plasma doping method that can control a dose precisely is realized. In-plane uniformity of the dose is improved. It has been found that, if a bias is applied by irradiating B 2 H 6 /He plasma...
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7402801 |
Inspecting method of a defect inspection device
An inspecting method comprises the following steps. A plurality of defect inspection devices is formed on a wafer. Each defect inspection device comprises an insulating layer and a conductive layer...
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7397047 |
Technique for tuning an ion implanter system
A technique for tuning an ion implanter system is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for tuning an ion implanter system having multiple...
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7395170 |
Methods and apparatus for data analysis
A method and apparatus for data analysis according to various aspects of the present invention is configured to automatically select one or more outlier identification algorithms for identifying...
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7384802 |
ESD protection device for high voltage
An electrostatic discharge (ESD) protection structure and a method for forming the same are provided. The structure includes a substrate having a buried layer, and a first and a second high-voltage...
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7354778 |
Method for determining the end point for a cleaning etching process
A method is provided for determining the end point during cleaning etching of processing chambers by means of plasma etching, which is used for carrying out coating or etching processes during the...
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7351596 |
Method and system for operating a physical vapor deposition process
A method for fabricating semiconductor wafers using physical vapor deposition. The method includes maintaining a substrate on a susceptor in a chamber. The substrate has a face positioned within a...
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7351595 |
Method for manufacturing semiconductor device
In a manufacturing method for a semiconductor device, a main body wafer having an interlayer insulating film is formed, and a monitor wafer on which a monitor element is formed is provided....
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7338817 |
Body bias compensation for aged transistors
Embodiments of the invention include on-chip transistor degradation detection and compensation. In one embodiment of the invention, an integrated circuit is provided including a circuit with a body...
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7335602 |
Charge-free layer by layer etching of dielectrics
A method for etching a dielectric film is provided herein. In accordance with the method, a device ( 201 ) is provided which comprises a first chamber ( 203 ) equipped with a first gas supply ( 209...
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7332368 |
Light guide for image sensor
A new method to form an image sensor device is achieved. The method comprises forming an image sensing array in a substrate comprising a plurality of light detecting diodes with spaces between the...
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7332358 |
MOSFET temperature sensing
A MOSFET has its gate voltage controlled to provide a constant drain current of the MOSFET, for example to limit inrush current for charging a capacitance of a power supply arrangement. A decrease...
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7323350 |
Method of fabricating thin film calibration features for electron/ion beam image based metrology
A method of making and using thin film calibration features is described. To fabricate a calibration standard according to the invention raised features are first formed from an electrically...
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7282374 |
Method and apparatus for comparing device and non-device structures
The present invention provides a method and apparatus for comparing device and non-device structures. The method includes determining at least one characteristic parameter associated with at least...
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7276135 |
Vacuum plasma processor including control in response to DC bias voltage
A plasma processor chamber includes a bottom electrode and a top electrode assembly having a center electrode surrounded by a grounded electrode. RF excited plasma between the electrodes induces a...
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7258838 |
Solid state molecular probe device
A solid state nanopore device including two or more materials and a method for fabricating the same. The device includes a solid state insulating membrane having an exposed surface, a conductive...
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7256399 |
Non-destructive in-situ elemental profiling
A non-destructive in-situ elemental profiling of a layer in a set of layers method and system are disclosed. In one embodiment, a first emission of a plurality of photoelectrons is caused from the...
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7220603 |
Method for manufacturing display device and manufacturing apparatus
It is an object of the present invention to provide a method of manufacturing a display device, which can display images favorably by insulating a short-circuit portion between an anode and a...
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7214549 |
Correcting device, exposure apparatus, device production method, and device produced by the device production method
A correcting device that properly maintains the flatness of a mask, an exposure apparatus in which overlay accuracy is increased by making use of the correcting device, and a device production...
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7208327 |
Metal oxide sensors and method of forming
A metal oxide sensor is provided on a semiconductor substrate to provide on-chip sensing of gases. The sensor may include a metal layer that may have pores formed by lithography to be of a certain...
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7205165 |
Method for determining the reliability of dielectric layers
The present invention is generally directed to various methods for determining the reliability of dielectric layers. In one illustrative embodiment, the method comprises providing a device having a...
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7192789 |
Method for monitoring an ion implanter
A method for monitoring an ion implanter is disclosed. In one embodiment, the method comprises providing a wafer, forming a barrier layer on the surface of the wafer wherein the barrier layer has a...
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7192505 |
Wafer probe for measuring plasma and surface characteristics in plasma processing environments
There is provided by this invention a wafer probe for measuring plasma and surface characteristics in plasma processing environment that utilizes integrated sensors on a wafer substrate. A...
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7183122 |
Physical nano-machining with a scanning probe system for integrated circuit modification
Nano-machining for circuit edits through the front side or backside of an integrated circuit may be performed using a scanning probe system. The system may create access holes with smaller...
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7162400 |
Simulation method, simulation program, and semiconductor device manufacturing method each employing boundary conditions
An aspect of the present invention provides a method of carrying out a simulation with simulation data, including, determining whether or not the simulation data includes boundary conditions set...
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7141440 |
Apparatus and method for measuring a property of a layer in a multilayered structure
A property of a layer is measured by: (1) focusing a heating beam on a region (also called “heated region”) of a conductive layer (2) modulating the power of the heating beam at a predetermined...
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7139671 |
Semiconductor device fabrication method
A semiconductor device fabrication method comprises; a first step S 1 of fabricating a plurality of semiconductor chips on a plurality of semiconductor wafers, respectively; a second step S 4 of...
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7135412 |
Method to control a management system to control semiconductor manufacturing equipment
In the control method in a management system of semiconductor manufacturing equipment to enhance a product yield through a control of etching process, information of a corresponding lot for the...
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7135344 |
Design-based monitoring
A method for monitoring fabrication of an integrated circuit (IC) on a semiconductor wafer includes generating a product design profile (PDP) using an electronic design automation (EDA) tool, the...
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7129099 |
Method for manufacturing semiconductor device
A manufacturing method for a semiconductor device which is capable of manufacturing the semiconductor device with a high quality in high yields while reducing variations in electric characteristic...
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7127358 |
Method and system for run-to-run control
A method and system of controlling a process from run-to-run for semiconductor manufacturing. The method of control utilizes a process model to establish a relationship between process control...
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7115425 |
Integrated circuit process monitoring and metrology system
A method for monitoring polishing process parameters for an integrated circuit structure on a substrate. A first metrology site is constructed on the substrate. The first metrology site represents...
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7105364 |
Method of increasing reliability of packaged semiconductor integrated circuit dice
Semiconductor dice are electrically tested prior to final assembly. Dice failing the test are identified and not packaged. However, “good dice” (i.e., those dice that passed testing) in...
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