Matches 1 - 50 out of 182 1 2 3 4 >


Match Document Document Title
8007275 Methods and apparatuses for heating semiconductor wafers  
Methods and apparatuses for heat treatment of semiconductor wafers are disclosed herein. A method of heating a semiconductor wafer in accordance with one embodiment includes heating the wafer in a...
7887323 Method and apparatus for manufacturing semiconductor device  
A method and apparatus for manufacturing a semiconductor device is disclosed. In particular, the application discloses a method that performs a lithography process using a material capable of...
7806684 Method of semiconductor process and semiconductor apparatus system  
A method of a semiconductor process is provided. The semiconductor process at least includes a first high temperature furnace process and a second high temperature furnace process. In the method,...
7798811 Vertical type heat processing apparatus and vertical type heating method  
A vertical type heat processing apparatus prevents falling-down of a boat placed on a heat insulating mount due to an external force, such as an earthquake. The apparatus includes a heating furnace...
7547209 Vertical heat treatment system and automatic teaching method for transfer mechanism  
A transfer mechanism 21 of a vertical heat treatment system 1 includes a base capable of vertical movement and turning movement, and plural substrate support devices, disposed on the base so as to...
7544058 Method for high-temperature annealing a multilayer wafer  
A method for annealing a multilayer wafer by subjecting the wafer to a high temperature treatment that includes at least a temperature ramp-up between a boat-in temperature and a process of at...
7527497 Heat treating apparatus, heat treating method, and storage medium  
A heat treating apparatus includes a heating plate for heating a substrate coated with a coating liquid, a cooling plate for cooling the substrate and a heat pipe provided in the cooling plate, a...
7410355 Method for the heat treatment of substrates  
A substrate undergoes a semiconductor fabrication process at different temperatures in a reactor without changing the temperature of the reactor. The substrate is held suspended by flowing gas...
7204887 Wafer holding, wafer support member, wafer boat and heat treatment furnace  
The present invention provides a wafer holder, a wafer support member, a wafer boat and a heat treatment furnace, which are capable of sufficiently suppressing slip dislocations, without lowering...
6940047 Heat treatment apparatus with temperature control system  
A floating substrate reactor allows heat treatment of a series of semiconductor substrates, one by one. The heat treatment occurs while flowing gas suspends a substrate between two heated surfaces...
6905333 Method of heating a substrate in a variable temperature process using a fixed temperature chuck  
A method is provided for heating a substrate in a process chamber using a heated chuck. In accordance with the method, the substrate is lowered onto the chuck and heated to a first temperature less...
6902395 Multilevel pedestal for furnace  
A pedestal for use in a high temperature vertical furnace for the processing of semiconductor wafers provides a closure and heat insulation for the lower end of the furnace and is a wafer boat...
6896513 Large area substrate processing system  
A system and method for processing large area substrates is provided. In one embodiment, a processing system includes a transfer chamber having at least one processing chamber and a substrate...
6796795 Method and apparatus for loading substrate in semiconductor manufacturing apparatus  
A method and apparatus for loading a substrate is applied to a semiconductor manufacturing apparatus in which a substrate is carried in a vacuum-processing chamber, and loaded on a heated...
6764304 Furnace having increased energy efficiency and reduced pollutant formation  
A furnace design that combines the benefits of oxygen enriched combustion, intense flame radiation, highly preheated combustion air, exhaust gas recirculation, buoyancy driven flows and NOx reburn...
6746240 Process tube support sleeve with circumferential channels  
A support sleeve for supporting a high temperature process tube comprises one or more circumferential channels, each channel connected to either a feed for gas or a vacuum exhaust. One...
6682343 Substrate processing apparatus  
A substrate processing apparatus includes a substrate holder for holding a substrate with a holding angle of 45 degrees to 90 degrees with respect to a horizontal plane, a conveying system to...
6672864 Method and apparatus for processing substrates in a system having high and low pressure areas  
A positive pressure gradient is maintained across an open access port of an interface chamber such as a load lock chamber which provides an interface between a low pressure chamber such as a...
6582221 Wafer boat and method for treatment of substrates  
A substrate holder for vertical furnaces is configured to support substrates in slots at inner portions of the substrates, rather than solely at the edges. The holder allows sufficient clearance...
6561796 Method of semiconductor wafer heating to prevent bowing  
Bowing of semiconductor wafers during heating is reduced by heating the wafers in a gas with a thermal conductivity and mean free path greater than that of oxygen, or by heating the wafers in a...
6511315 Substrate processing apparatus  
In a substrate processing apparatus, processing units are stacked in a multistage manner around a transport robot arranged at the center of a processing area for forming a processing part. In a...
6444974 Method for transferring a dummy wafer  
Dummy wafers of SiC having low light transmission properties to light from the light source of a photo-sensor are used, and when wafers undergoes a heat treatment, the dummy wafers are transferred...
6435868 Multi-function chamber for a substrate processing system  
A load lock chamber includes a chamber body having an aperture to allow a substrate to be transferred into or out of the chamber. The load lock chamber is configurable in several configurations,...
6354832 Substrate processing apparatus and substrate processing method  
In a heat processing apparatus of a low-oxygen curing and cooling processing station, a plurality of blast ports are provided in a ring shutter along a thickness direction of a wafer and a heated...
6290491 Method for heating a semiconductor wafer in a process chamber by a shower head, and process chamber  
Heating (200) a semiconductor wafer (150) in a process chamber (100) is performed in the order of: placing (210) the wafer (100) with the backside (152) on a plurality of support elements (112)...
6250914 Wafer heating device and method of controlling the same  
The present invention provides a wafer heating device which can improve uniformity of a temperature distribution within a surface area of a wafer, with a relatively simple structure. A wafer is...
RE36921 Low profile kiln apparatus and method of using same  
A manufacturing method and apparatus is provided for making building and other types of brick. The apparatus requires a minimum of excess (or surge) production, utilizes automated equipment which...
6097002 Device for heating plastics sections  
The invention concerns a device for heating plastics profile sections, in particular for heating PVC profile sections (35), the device comprising a box for holding the profile section. Said box has...
6036482 Heat treatment method  
6033215 Heat treatment apparatus and heat treatment boat  
A heat treatment boat houses a plurality of semiconductor wafers in a manner separated at intervals for heat-treating the wafers in a heat treatment furnace. The heat treatment boat includes a...
5915957 Method of transferring target substrates in semiconductor processing system  
Semiconductor wafers are transferred from a closed type cassette into a wafer boat. First, the lowermost five wafers of 13 wafers held in the cassette are simultaneously transferred by five arms...
5829969 Vertical heat treating apparatus  
A vertical heat treating apparatus includes a first boat elevator for carrying a first wafer boat between a wafer transfer region and a predetermined position in a heat treating furnace, and a...
5820367 Boat for heat treatment  
Support members are provided in a vertically spaced relation on a plurality of upright columns. A wafer support member comprises a projection formed to be annular along an inner peripheral edge of...
5816798 Conveying apparatus and continuous furnace equipped therewith  
A conveying apparatus for a continuous furnace comprises at least one conveying-beam pair and at least one retaining-beam pair, which are located opposite one another in each case with the...
5813851 Heat treatment method  
When a wafer boat having wafers, objects to be treated, placed thereon is loaded into a reaction tube, which is then raised in temperature by a heating section at a speed of 50° C./min or more, a ...
5785518 Masking element fixture  
A fixture for holding a plurality of masking elements while the masking elements are being baked to remove impurities is disclosed. The masking elements are used to mask dies used for forming...
5752819 Exhaust system for high temperature furnace  
An exhaust system for use with a high temperature furnace used to perform oxidation and/or annealing operations of the type used in semiconductor fabrication. The exhaust system is designed to...
5746591 Semiconductor furnace for reducing particulates in a quartz tube and boat  
The present invention is an improved semiconductor furnace system that reduces particles in the quartz tube and wafer boat. The cooling rate of conventional furnaces is too rapid in currently used...
5718574 Heat treatment apparatus  
A substrate holding assembly for horizontally holding a substrate to be treated is provided in a heat treatment chamber of a heat treatment apparatus. The substrate holding assembly has an annular...
5716207 Heating furnace  
A heating furnace and a method for uniformly thermo-setting a paste applied onto the surface of a substrate, and for manufacturing a high quality substrate. The heating furnace can be installed in...
5709543 Vertical heat treatment apparatus  
The vertical heat treatment apparatus according to the present invention in which a substrate holder holding a plurality of substrates-to-be-processed at a vertical interval is mounted on the top...
5707228 Heat treatment machine having a cooling chamber  
The present invention relates to a heat treatment machine for laboratory use which has a cooling chamber incorporated with a heating chamber of a furnace, both chambers are formed with a vacuum...
5679168 Thermal processing apparatus and process  
A thermal treatment boat having a plurality of annular, coaxial, spaced apart bands having substantially the same inner diameters. The bands are separated by a band spacing distance of from about...
5678989 Heat treatment method using a vertical processing tube  
An object holder is raised, a mount portion is stopped at a middle stop position higher than a lower stop position, and an object of treatment is preheated. Thereafter, the object holder is further...
5662470 Vertical furnace  
A vertical furnace for processing wavers positioned on a support structure. The furnace comprises an inner sleeve, heating means and an outer sleeve. To support the inner sleeve on the support...
5651670 Heat treatment method and apparatus thereof  
The present invention relates to a thermal processing method wherein a cylindrical process tube that has at one end an entrance/exit is provided at the other end thereof with a heat source, and...
5618351 Thermal processing apparatus and process  
Thermal treatment boat comprising a cylinder having a central axis and a plurality of band slots having opposed upper and lower surfaces in planes perpendicular to said central axis and spaced at...
5616024 Apparatuses for heating semiconductor wafers, ceramic heaters and a process for manufacturing the same, a process for manufacturing ceramic articles  
A ceramic heater composed of a ceramic substrate and a resistant heating element embedded within the ceramic substrate along a predetermined planar pattern is obtained by holding a convolution of a...
5591026 Baking oven having a minimized access opening  
In a baking oven for baking a relatively planar work such as semiconductor substrates, LCD panels and integrated circuit boards, a laterally elongated slot is formed in a shutter door which is...
5588827 Passive gas substrate thermal conditioning apparatus and method  
A substrate thermal conditioning apparatus with a chamber, a plate located in the chamber and a gas supply. The plate has a top heat transfer surface with grooves therealong. A substrate is placed...
Matches 1 - 50 out of 182 1 2 3 4 >